Patents by Inventor Kouji Iwasaki

Kouji Iwasaki has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Ion beam processing position correction method
    Patent number: 6593583
    Abstract: The present invention provides a focused ion beam method in which positional correction is performed with reference to reference points on a sample and for carrying out processing using an ion beam, in which reference point conformation does not take up a lot of time, and which is capable of accurate fine processing. The present invention performs high precision processing with correction performed at short intervals using reference mark confirmation when fine processing requiring accuracy is performed, while positional correction is carried out at long intervals when accuracy is not required, which means there is no wasted time because inefficient correction processing is omitted.
    Type: Grant
    Filed: March 22, 2001
    Date of Patent: July 15, 2003
    Assignee: Seiko Instruments Inc.
    Inventor: Kouji Iwasaki
  • Micromachining method for workpiece observation
    Patent number: 6395347
    Abstract: A method for preparing a sample for observation, by the steps of: contacting a first predetermined area of the sample surface with an organic compound vapor while irradiating the first predetermined area with an ion beam to decompose the organic compound into a layer having a mask function, the layer covering the first predetermined area; and contacting a second predetermined area of the sample surface with an etching gas while irradiating the second predetermined area with an ion beam in order to remove material from the sample surface at the second predetermined area, wherein the second predetermined area includes at least part of the first predetermined area and the layer covering the first predetermined area prevents removal of material from the sample surface in the first predetermined area.
    Type: Grant
    Filed: November 30, 1994
    Date of Patent: May 28, 2002
    Assignee: Seiko Instruments Inc.
    Inventors: Tatsuya Adachi, Takashi Kaito, Yoshihiro Koyama, Kouji Iwasaki
  • Ion beam processing position correction method
    Publication number: 20010032936
    Abstract: The present invention provides a focused ion beam method in which positional correction is performed with reference to reference points on a sample and for carrying out processing using an ion beam, in which reference point conformation does not take up a lot of time, and which is capable of accurate fine processing.
    Type: Application
    Filed: March 22, 2001
    Publication date: October 25, 2001
    Inventor: Kouji Iwasaki