Abstract: Methods for generating a standard reference die for use in a die to standard reference die inspection and methods for inspecting a wafer are provided. One computer-implemented method for generating a standard reference die for use in a die to standard reference die inspection includes acquiring output of an inspection system for a centrally located die on a wafer and one or more dies located on the wafer. The method also includes combining the output for the centrally located die and the one or more dies based on within die positions of the output. In addition, the method includes generating the standard reference die based on results of the combining step.

Abstract: Disclosed are methods and apparatus for facilitating procedures implemented on an analysis tool are provided herein. In one embodiment, an apparatus includes an analyzer module arranged for managing an analyzer tool and causing a high resolution image generated by the analyzer tool to be presented in a display. The apparatus also includes an inspector interface module arranged for simulating an inspector interface in the display. The inspector interface includes features that are available on a corresponding inspection tool, and the inspector interface is based at least in part on defect results from the inspection tool. In one embodiment, the analyzer module executes without knowledge of the inspector interface module and visa versa, and the apparatus includes a synchronization mechanism that knows about these two modules and also is capable of communicating with these two modules.

Abstract: Methods and systems for determining a characteristic of a wafer are provided. One method includes generating output responsive to light from the wafer using an inspection system. The output includes first output corresponding to defects on the wafer and second output that does not correspond to the defects. The method also includes determining the characteristic of the wafer using the second output. One system includes an inspection subsystem configured to illuminate the wafer and to generate output responsive to light from the wafer. The output includes first output corresponding to defects on the wafer and second output that does not correspond to the defects. The system also includes a processor configured to determine the characteristic of the wafer using the second output.

Abstract: Disclosed are methods and apparatus for facilitating procedures implemented on an analysis tool (e.g., review or metrology tool) are provided herein. In one embodiment, an apparatus for analyzing defects includes an analysis tool arranged for imaging a defect and generating a high resolution image and at least one display device arranged for presenting the high resolution image generated by the analysis tool. The apparatus further includes an analyzer module arranged for managing the analyzer tool and causing the high resolution image generated by the analyzer tool to be presented in the at least one display. The apparatus also includes an inspector interface module arranged for simulating an inspector interface in the at least one display device, wherein the inspector interface includes features that are available on a corresponding inspection tool, and wherein the inspector interface is based at least in part on defect results from the inspection tool.