Patents by Inventor Krishna K. Parat

Krishna K. Parat has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20170110198
    Abstract: Some embodiments include apparatuses and methods having a memory cell string including memory cells located in different levels of the apparatus and a data line coupled to the memory cell string. The memory cell string includes a pillar body associated with the memory cells. At least one of such apparatus can include a module configured to store information in a memory cell among memory cells and/or to determine a value of information stored in a memory cell among memory cells. The module can also be configured to apply a voltage having a positive value to the data line and/or a source to control a potential of the body. Other embodiments are described.
    Type: Application
    Filed: December 29, 2016
    Publication date: April 20, 2017
    Inventors: Han Zhao, Akira Goda, Krishna K. Parat, Aurelio Giancarlo Mauri, Haitao Liu, Toru Tanzawa, Shigekazu Yamada, Koji Sakui
  • Patent number: 9564471
    Abstract: A method of forming circuitry components includes forming a stack of horizontally extending and vertically overlapping features. The stack has a primary portion and an end portion. At least some of the features extend farther in the horizontal direction in the end portion moving deeper into the stack in the end portion. Operative structures are formed vertically through the features in the primary portion and dummy structures are formed vertically through the features in the end portion. Horizontally elongated openings are formed through the features to form horizontally elongated and vertically overlapping lines from material of the features. The lines individually extend from the primary portion into the end portion, and individually laterally about sides of vertically extending portions of both the operative structures and the dummy structures.
    Type: Grant
    Filed: April 11, 2016
    Date of Patent: February 7, 2017
    Assignee: Micron Technology, Inc.
    Inventors: Sanh D. Tang, Roger W. Lindsay, Krishna K. Parat
  • Patent number: 9536618
    Abstract: Some embodiments include apparatuses and methods having a memory cell string including memory cells located in different levels of the apparatus and a data line coupled to the memory cell string. The memory cell string includes a pillar body associated with the memory cells. At least one of such apparatus can include a module configured to store information in a memory cell among memory cells and/or to determine a value of information stored in a memory cell among memory cells. The module can also be configured to apply a voltage having a positive value to the data line and/or a source to control a potential of the body. Other embodiments are described.
    Type: Grant
    Filed: June 22, 2015
    Date of Patent: January 3, 2017
    Assignee: Micron Technology, Inc.
    Inventors: Han Zhao, Akira Goda, Krishna K. Parat, Aurielo Giancarlo Mauri, Haitao Liu, Toru Tanzawa, Shigekazu Yamada, Koji Sakui
  • Publication number: 20160372207
    Abstract: The inhibit voltage is a voltage applied to wordlines adjacent to a program wordline having a memory cell to write during the program operation. The inhibit voltage for a program operation can be ramped up during the program pulse. Instead of applying a constant high inhibit voltage that results in the initial boosted channel potential reducing drastically due to leakage, a system can start the inhibit voltage lower and ramp the inhibit voltage up during the program pulse. The ramping up can be a continuous ramp or in finite discrete steps during the program pulse. Such ramping of inhibit voltage can provide better tradeoff between program disturb and inhibit disturb.
    Type: Application
    Filed: June 15, 2016
    Publication date: December 22, 2016
    Inventors: Shantanu R. Rajwade, Pranav Kalavade, Neal R. Mielke, Krishna K. Parat, Shyam Sunder Raghunathan
  • Publication number: 20160372556
    Abstract: Some embodiments include a memory cell string having a body having a channel extending therein and in contact with a source/drain, a select gate adjacent to the body, a plurality of access lines adjacent to the body, and a dielectric in a portion of the body between the source/drain and a level corresponding to an end of the plurality of access lines most adjacent to the select gate. The dielectric in the portion of the body does not extend along an entire length of the body. Other embodiments are described and claimed.
    Type: Application
    Filed: September 2, 2016
    Publication date: December 22, 2016
    Inventors: Haitao Liu, Akira Goda, Chandra Mouli, Krishna K. Parat
  • Publication number: 20160343438
    Abstract: Apparatus and methods are disclosed, such as an apparatus that includes a string of charge storage devices associated with a pillar (e.g., of semiconductor material), a source gate device, and a source select device coupled between the source gate device and the string. Additional apparatus and methods are described.
    Type: Application
    Filed: May 26, 2016
    Publication date: November 24, 2016
    Inventors: Akira Goda, Shafqat Ahmed, Khaled Hasnat, Krishna K. Parat
  • Publication number: 20160336073
    Abstract: Methods, and apparatuses to erase and or soft program a block of NAND memory may include performing an erase cycle on a block of NAND memory comprising two or more sub-blocks, verifying the two or more sub-blocks until a sub-block fails to verify, stopping the verification in response to the failed verify, performing another erase cycle on the block of NAND memory, and re-starting to verify the two or more sub-blocks at the sub-block that failed to verify
    Type: Application
    Filed: February 23, 2016
    Publication date: November 17, 2016
    Applicant: Intel Corporation
    Inventors: Krishna K. Parat, Pranav Kalavade, Koichi Kawai, Akira Goda
  • Publication number: 20160307622
    Abstract: Methods of operating a memory include applying a multi-step pass voltage to a plurality of memory cells selected for a programming operation, applying a programming pulse to the plurality of memory cells selected for the programming operation after applying a voltage level of a particular step of the multi-step pass voltage to the plurality of memory cells selected for the programming operation, applying a particular voltage level to any data lines coupled to a first subset of memory cells of the plurality of memory cells selected for the programming operation prior to applying a voltage level of a certain step of the multi-step pass voltage, and applying the particular voltage level to any data lines coupled to a second subset of memory cells of the plurality of memory cells selected for the programming operation only after applying the voltage level of the certain step of the multi-step pass voltage.
    Type: Application
    Filed: June 22, 2016
    Publication date: October 20, 2016
    Applicant: MICRON TECHNOLOGY, INC.
    Inventors: Shyam Sunder Raghunathan, Pranav Kalavade, Krishna K. Parat, Charan Srinivasan
  • Patent number: 9437608
    Abstract: Some embodiments include a memory cell string having a body having a channel extending therein and in contact with a source/drain, a select gate adjacent to the body, a plurality of access lines adjacent to the body, and a dielectric in a portion of the body between the source/drain and a level corresponding to an end of the plurality of access lines most adjacent to the select gate. The dielectric in the portion of the body does not extend along an entire length of the body. Other embodiments are described and claimed.
    Type: Grant
    Filed: December 23, 2014
    Date of Patent: September 6, 2016
    Assignee: Micron Technology, Inc.
    Inventors: Haitao Liu, Akira Goda, Chandra Mouli, Krishna K. Parat
  • Patent number: 9418752
    Abstract: The inhibit voltage is a voltage applied to wordlines adjacent to a program wordline having a memory cell to write during the program operation. The inhibit voltage for a program operation can be ramped up during the program pulse. Instead of applying a constant high inhibit voltage that results in the initial boosted channel potential reducing drastically due to leakage, a system can start the inhibit voltage lower and ramp the inhibit voltage up during the program pulse. The ramping up can be a continuous ramp or in finite discrete steps during the program pulse. Such ramping of inhibit voltage can provide better tradeoff between program disturb and inhibit disturb.
    Type: Grant
    Filed: March 27, 2014
    Date of Patent: August 16, 2016
    Assignee: Intel Corporation
    Inventors: Shantanu R Rajwade, Pranav Kalavade, Neal R Mielke, Krishna K Parat, Shyam Sunder Raghunathan
  • Patent number: 9418000
    Abstract: Apparatus, systems, and methods to implement dynamic memory management in nonvolatile memory devices are described. In one example, a controller comprises logic to monitor at least one performance parameter of a nonvolatile memory, determine when the at least one performance parameter passes a threshold which indicates a degradation in performance for the nonvolatile memory, and in response to the at least one performance parameter passing the threshold, to modify at least one operational attribute of the nonvolatile memory. Other examples are also disclosed and claimed.
    Type: Grant
    Filed: December 22, 2014
    Date of Patent: August 16, 2016
    Assignee: Intel Corporation
    Inventors: Shyam Sunder Raghunathan, Iwen Chao, Xin Guo, Pranav Kalavade, Krishna K. Parat, Feng Zhu
  • Publication number: 20160225822
    Abstract: A method of forming circuitry components includes forming a stack of horizontally extending and vertically overlapping features. The stack has a primary portion and an end portion. At least some of the features extend farther in the horizontal direction in the end portion moving deeper into the stack in the end portion. Operative structures are formed vertically through the features in the primary portion and dummy structures are formed vertically through the features in the end portion. Horizontally elongated openings are formed through the features to form horizontally elongated and vertically overlapping lines from material of the features. The lines individually extend from the primary portion into the end portion, and individually laterally about sides of vertically extending portions of both the operative structures and the dummy structures.
    Type: Application
    Filed: April 11, 2016
    Publication date: August 4, 2016
    Inventors: Sanh D. Tang, Roger W. Lindsay, Krishna K. Parat
  • Patent number: 9396791
    Abstract: Memories and methods for programming memories with multi-level pass signals are provided. One method includes programming cells of the memory selected to be programmed to a particular target data state of the memory, using program disturb to program cells of the memory selected to be programmed to target data states that are lower than the particular target data state while programming cells of the memory selected to be programmed to the particular target data state, and boosting a channel voltage for cells of the memory selected to be programmed to the target data states that are lower than the particular target data state. Boosting may include using a multi-step pass signal.
    Type: Grant
    Filed: July 18, 2014
    Date of Patent: July 19, 2016
    Assignee: Micron Technology, Inc.
    Inventors: Shyam Sunder Raghunathan, Pranav Kalavade, Krishna K. Parat, Charan Srinivasan
  • Patent number: 9384995
    Abstract: A non-volatile memory device and a method for forming the non-volatile memory device are disclosed. During fabrication of the memory device, a tungsten salicide is utilized as an etch-stop layer in place of a conventionally used aluminum oxide to form channel pillars having a high aspect ratio. Use of the tungsten salicide is useful for eliminating an undesired etch-stop recess and an undesired floating gate that is formed when an Al oxide etch-stop layer is conventionally used.
    Type: Grant
    Filed: March 2, 2015
    Date of Patent: July 5, 2016
    Assignee: Intel Corporation
    Inventors: Fatma Arzum Simsek-Ege, Krishna K Parat
  • Patent number: 9378839
    Abstract: Apparatus and methods are disclosed, such as an apparatus that includes a string of charge storage devices associated with a pillar (e.g., of semiconductor material), a source gate device, and a source select device coupled between the source gate device and the string. Additional apparatus and methods are described.
    Type: Grant
    Filed: August 4, 2014
    Date of Patent: June 28, 2016
    Assignee: Micron Technology, Inc.
    Inventors: Akira Goda, Shafqat Ahmed, Khaled Hasnat, Krishna K. Parat
  • Publication number: 20160181323
    Abstract: Various embodiments comprise apparatuses and methods, such as a memory stack having a continuous cell pillar. In various embodiments, the apparatus includes a source material, a buffer material, a select gate drain (SGD), and a memory stack arranged between the source material and the SGD. The memory stack comprises alternating levels of conductor materials and dielectric materials. A continuous channel-fill material forms a cell pillar that is continuous from the source material to at least a level corresponding to the SGD.
    Type: Application
    Filed: February 29, 2016
    Publication date: June 23, 2016
    Inventors: Fatma Arzum Simsek-Ege, Krishna K. Parat
  • Publication number: 20160180958
    Abstract: Apparatus, systems, and methods to implement dynamic memory management in nonvolatile memory devices are described. In one example, a controller comprises logic to monitor at least one performance parameter of a nonvolatile memory, determine when the at least one performance parameter passes a threshold which indicates a degradation in performance for the nonvolatile memory, and in response to the at least one performance parameter passing the threshold, to modify at least one operational attribute of the nonvolatile memory. Other examples are also disclosed and claimed.
    Type: Application
    Filed: December 22, 2014
    Publication date: June 23, 2016
    Applicant: Intel Corporation
    Inventors: SHYAM SUNDER RAGHUNATHAN, IWEN CHAO, XIN GUO, PRANAV KALAVADE, KRISHNA K. PARAT, FENG ZHU
  • Publication number: 20160133638
    Abstract: Some embodiments include apparatuses and methods having a source material, a dielectric material over the source material, a select gate material over the dielectric material, a memory cell stack over the select gate material, a conductive plug located in an opening of the dielectric material and contacting a portion of the source material, and a channel material extending through the memory cell stack and the select gate material and contacting the conductive plug.
    Type: Application
    Filed: November 7, 2014
    Publication date: May 12, 2016
    Inventors: Fatma Arzum Simsek-Ege, Krishna K. Parat, Luan C. Tran, Meng-Wei Kuo, Yushi Hu
  • Patent number: 9318430
    Abstract: A method of forming circuitry components includes forming a stack of horizontally extending and vertically overlapping features. The stack has a primary portion and an end portion. At least some of the features extend farther in the horizontal direction in the end portion moving deeper into the stack in the end portion. Operative structures are formed vertically through the features in the primary portion and dummy structures are formed vertically through the features in the end portion. Horizontally elongated openings are formed through the features to form horizontally elongated and vertically overlapping lines from material of the features. The lines individually extend from the primary portion into the end portion, and individually laterally about sides of vertically extending portions of both the operative structures and the dummy structures.
    Type: Grant
    Filed: January 22, 2015
    Date of Patent: April 19, 2016
    Assignee: Micron Technology, Inc.
    Inventors: Sanh D. Tang, Roger W. Lindsay, Krishna K. Parat
  • Patent number: 9305654
    Abstract: Methods, and apparatuses to erase and or soft program a block of NAND memory may include performing an erase cycle on a block of NAND memory comprising two or more sub-blocks, verifying the two or more sub-blocks until a sub-block fails to verify, stopping the verification in response to the failed verify, performing another erase cycle on the block of NAND memory, and re-starting to verify the two or more sub-blocks at the sub-block that failed to verify.
    Type: Grant
    Filed: December 19, 2012
    Date of Patent: April 5, 2016
    Assignee: Intel Corporation
    Inventors: Krishna K. Parat, Pranav Kalavade, Koichi Kawai, Akira Goda