Abstract: A light-emitting device includes a substrate, a light-emitting diode, a first layer, a color filter layer, and a second layer. The light-emitting diode is disposed on the substrate. The first layer is disposed on the substrate and has an opening. At least a portion of the light-emitting diode is disposed in the opening of the first layer. The color filter layer is disposed on the light-emitting diode. The second layer is disposed on the first layer and has an opening overlapped with the opening of the first layer. The second layer is configured to shield light emitted from the light-emitting diode. In the cross-sectional view of the light-emitting device, the minimum width of the opening of the first layer is less than the minimum width of the opening of the second layer.

Abstract: An electronic device includes a substrate; and a coil structure disposed on the substrate. The coil structure is provided with a first conductor layer including a connection line; a second conductor layer including a plurality of line segments separated from each other; and a first insulation layer disposed between the first conductor layer and the second conductor layer, and provided with a plurality of first openings, wherein adjacent two of the plurality of line segments are electrically connected to the connection line through the plurality of first openings.

Abstract: A method of forming a semiconductor device includes forming semiconductor strips protruding above a substrate and isolation regions between the semiconductor strips; forming hybrid fins on the isolation regions, the hybrid fins comprising dielectric fins and dielectric structures over the dielectric fins; forming a dummy gate structure over the semiconductor strip; forming source/drain regions over the semiconductor strips and on opposing sides of the dummy gate structure; forming nanowires under the dummy gate structure, where the nanowires are over and aligned with respective semiconductor strips, and the source/drain regions are at opposing ends of the nanowires, where the hybrid fins extend further from the substrate than the nanowires; after forming the nanowires, reducing widths of center portions of the hybrid fins while keeping widths of end portions of the hybrid fins unchanged, and forming an electrically conductive material around the nanowires.

Abstract: A semiconductor device according to the present disclosure includes a source feature and a drain feature, a plurality of semiconductor nanostructures extending between the source feature and the drain feature, a gate structure wrapping around each of the plurality of semiconductor nanostructures, a bottom dielectric layer over the gate structure and the drain feature, a backside power rail disposed over the bottom dielectric layer, and a backside source contact disposed between the source feature and the backside power rail. The backside source contact extends through the bottom dielectric layer.

Abstract: Semiconductor structures including active fin structures, dummy fin structures, epitaxy layers, a Ge containing oxide layer and methods of manufacture thereof are described. By implementing the Ge containing oxide layer on the surface of the epitaxy layers formed on the source/drain regions of some of the FinFET devices, a self-aligned epitaxy process is enabled. By implementing dummy fin structures and a self-aligned etch, both the epitaxy layers and metal gate structures from adjacent FinFET devices are isolated in a self-aligned manner.

Abstract: A structure includes first nanostructures vertically spaced one from another over a substrate in a core region of the semiconductor structure, a first interfacial layer wrapping around each of the first nanostructures, a first high-k dielectric layer over the first interfacial layer and wrapping around each of the first nanostructures, second nanostructures vertically spaced one from another over the substrate in an I/O region of the semiconductor structure, a second interfacial layer wrapping around each of the second nanostructures, a second high-k dielectric layer over the second interfacial layer and wrapping around each of the second nanostructures. The first nanostructures have a first vertical pitch, the second nanostructures have a second vertical pitch substantially equal to the first vertical pitch, the first nanostructures have a first vertical spacing, the second nanostructures have a second vertical spacing greater than the first vertical spacing by about 4 ? to about 20 ?.

Abstract: A semiconductor device structure, along with methods of forming such, are described. The structure includes a semiconductor fin having a first portion having a first width and a second portion having a second width substantially less than the first width. The first portion has a first surface, the second portion has a second surface, and the first and second surfaces are connected by a third surface. The third surface forms an angle with respect to the second surface, and the angle ranges from about 90 degrees to about 130 degrees. The structure further includes a gate electrode layer disposed over the semiconductor fin and source/drain epitaxial features disposed on the semiconductor fin on opposite sides of the gate electrode layer.

Abstract: A semiconductor structure includes a first stack of semiconductor layers disposed over a semiconductor substrate, where the first stack of semiconductor layers includes a first SiGe layer and a plurality of Si layers disposed over the first SiGe layer and the Si layers are substantially free of Ge, and a second stack of semiconductor layers disposed adjacent to the first stack of semiconductor layers, where the second stack of semiconductor layers includes the first SiGe layer and a plurality of second SiGe layers disposed over the first SiGe layer, and where the first SiGe layer and the second SiGe layers have different compositions. The semiconductor structure further includes a first metal gate stack interleaved with the first stack of semiconductor layers to form a first device and a second metal gate stack interleaved with the second stack of semiconductor layers to form a second device different from the first device.

Abstract: An electrostatic discharge protection structure includes a semiconductor substrate and a first n-type well region, a p-type well region, a first p-type doped region, a second p-type doped region, and an isolation structure disposed in the semiconductor substrate. The p-type well region is located adjacent to the first n-type well region. The first p-type doped region and the second p-type doped region are located above the first n-type well region and the p-type well region, respectively. A first portion of the isolation structure is located between the first p-type doped region and the second p-type doped region in a horizontal direction. An edge of the first n-type well region is located under the first portion. A distance between the first p-type doped region and the edge of the first n-type well region in the horizontal direction is less than a length of the first portion in the horizontal direction.

Abstract: A device includes a first memory bank and a second memory bank. The first memory bank is configured to operate according to a write data signal and a first global write signal associated with a first clock signal. The second memory bank is configured to operate according to the write data signal and a second global write signal associated with a second clock signal. One of the first clock signal and the second clock signal is in oscillation when another one of the first clock signal and the second clock signal is in suspension.

Abstract: This disclosure is directed to a liquid cooling device having at least two collecting tanks and at least one pair of heat-exchange plates. The tanks are separated from each other. Each of the collecting tanks has a joint tube. Each of the heat-exchange plates is in elongated shape and the collecting tanks are connected serially by the heat-exchange plates. The two collecting tanks are connected by the pair of heat-exchange plates. Each of the heat-exchange plates has a channel extended along the longitudinal direction thereof. The channels in the heat-exchange plates are connected to the collecting tanks at two ends of the heat-exchange plates, respectively. The longitudinal directions of the channels of the heat-exchange plates between the collecting tanks are parallel to each other.

Abstract: The present application relates to a multi-layer ceramic capacitor and a method for producing the same. Internal electrode layers and ceramic dielectric layers are firstly formed, and the internal electrode layers and the ceramic dielectric layers are alternately laminated to form a laminated stack. The internal electrode layers are formed from specific metal particles. Next, a sintering process is performed to the laminated stack to form a laminated ceramic body, and then end electrodes are formed on two ends of the laminated ceramic body, thereby producing the multi-layer ceramic capacitor of the present application with excellent continuity of the internal electrode and better capacitor properties and reliability.

Abstract: A semiconductor structure is provided. The semiconductor structure includes at least one metal gate structure and a device to be tested. The metal gate structure is disposed on a substrate. The device to be tested is disposed on the metal gate structure and electrically separated from the metal gate structure. The device to be tested is heated by a heat generated when the metal gate structure is applied with a voltage.

Abstract: An electrostatic discharge device including a gate structure, a plurality of first doped regions, and a plurality of second doped regions. The gate structure is disposed on a substrate. The gate structure includes a body part and a plurality of extension parts. The extension parts are connected with the body part, and an extension direction of the body part is different from an extension direction of the extension parts. The first doped regions are located in the substrate between the extension parts. The second doped regions are located in the substrate at two outer sides of the extension parts. The first doped regions and the second doped regions have different conductivity types.

Abstract: A dust-proof sensing device includes a mechanical body, a feeding path, a first photoelectric sensor disposed above the feeding path, a second photoelectric sensor disposed under the feeding path, and an upper bracket. The mechanical body has a feeding path. The upper bracket is mounted above the feeding path. The upper bracket has an upper fastening portion fastened to the mechanical body, an upper wedging portion fastened at the upper fastening portion, an L-shaped upper light guiding holder fastened at the upper fastening portion, and a first light guider fastened at the upper light guiding holder. The upper fastening portion has a first inclined section. An inner edge of an upper surface of the first inclined section is intersected with a top edge of an inner surface of the upper wedging portion to form a clamping angle.

Abstract: An image rendering device and an image rendering method are disclosed. For the elements of the image rendering device, a first sensor and a second sensor are configured to sense a target object in a two-dimensional (2D) mode and three-dimensional (3D) mode to generate a first surface-color-signal, a first 3D-depth-signal, a second surface-color-signal and a second 3D-depth-signal respectively. An IR projector is configured to generate an IR-dot-pattern. A processor is configured to control the IR projector to project the IR-dot-pattern on the target object in the 3D mode, and configured to process the first surface-color-signal, the second surface-color-signal, the first 3D-depth-signal and the second 3D-depth-signal to obtain a color 3D model of the target object.

Abstract: A polishing pad, a polishing apparatus and a method of manufacturing a semiconductor package using the same are provided. In some embodiments, a polishing pad includes a sub-pad portion and a top pad portion over the sub-pad portion. The top pad portion includes a plurality of grooves having a first width and a plurality of openings having a second width different from the first width, and the openings are located in a center zone of the polishing pad.

Abstract: A method includes: turning on a first switch coupled between a first array of memory and a voltage supply according to a first charge signal; turning on a second switch coupled between a second array of memory and the voltage supply according to a second charge signal different from the first charge signal; and generating the first charge signal and the second charge signal according to a word line address. The second array of memory is located between the second switch and the first array of memory.

Abstract: A latch circuit includes a latch clock generator configured to generate a latched clock signal based on a clock signal and an enable signal, and an input latch coupled to the latch clock generator to receive the latched clock signal. The input latch is configured to generate a latched output signal based on the latched clock signal and an input signal. In response to the enable signal having a disabling logic level, the latch clock generator is configured to set a logic level of the latched clock signal to a corresponding disabling logic level, regardless of the clock signal. In response to the corresponding disabling logic level of the latched clock signal, the input latch is configured to hold a logic level of the latched output signal unchanged, regardless of the input signal having one or more logic level switchings, while the enable signal is having the disabling logic level.

Abstract: A circuit includes a series of a first latch circuit, selection circuit, second latch circuit, and pre-decoder. A control circuit, based on a clock signal, outputs control signals to the selection circuit and first and second latch circuits, and, to the pre-decoder, a pulse signal including a first pulse during a first portion of a clock period in response to a read enable signal having a first logical state, and a second pulse during a second portion of the clock period in response to a write enable signal having the first logical state. Based on the control signals, the selection circuit and first and second latch circuits output read and write addresses to the pre-decoder during the respective first and second clock period portions, and the pre-decoder outputs a partially decoded address in response to each of the read address and first pulse, and the write address and second pulse.