Abstract: Synthetic amino acid-modified polymers and methods of making the same and using the same are disclosed. The synthetic amino acid-modified polymers possess distinct thermosensitive, improved water-erosion resistant, and enhanced mechanical properties, and are suitable of reducing or preventing formation of postoperative tissue adhesions. Additionally, the amino acid-modified polymers can also be used as a vector to deliver pharmaceutically active agents.

Abstract: A method for fabricating a semiconductor device structure is shown. A gate dielectric layer is formed on a substrate. A portion of the gate dielectric layer, which is located on a part of the substrate in which an S/D region is to be formed, is removed. A gate electrode is formed on the remaining gate dielectric layer. A spacer is formed on the sidewall of the gate electrode and the sidewall of the gate dielectric layer. The S/D region is then formed in the part of the substrate beside the spacer.

Abstract: This invention relates to a device, a system and a method for applying a volume of liquid to a treatment surface. The device includes a container for containing the liquid, a pump for extracting liquid from the container, an actuator for operating the pump, and a collapsible receptacle for accommodating extracted liquid.

Abstract: A continuous derailleur of a bicycle contains: a drive shaft, a rotary shaft, a brake shaft, and a braking device. The rotary shaft is mounted on the drive shaft. The drive shaft includes a bevel gear member having a first bevel gear and a second bevel gear. The drive shaft includes a first pedal shaft, and the brake shaft includes a first interactive bevel gear and includes the braking device. The rotary shaft includes a second interactive bevel gear and a third interactive bevel gear, and the second interactive bevel gear and the third interactive bevel gear mesh with the second bevel gear of the bevel gear member. The continuous derailleur further contains an output bevel gear, and the output bevel gear is rotatably fitted on the drive shaft, hence the second interactive bevel gear and the third interactive bevel gear mesh with the output bevel gear.

Abstract: A doping method for a semiconductor device including the following steps is provided. A substrate is provided. The substrate has a channel region. The channel region includes a first edge region, a second edge region and a center region in a channel width direction substantially perpendicular to a channel length direction, and the center region is located between the first edge region and the second edge region. A first doping process is performed on the first edge region, the second edge region and the center region by using a first conductive type dopant. A second doping process is performed on the center region by using a second conductive type dopant.

Abstract: A high voltage device includes a semiconductor substrate, an ion well, a Schottky diode in the ion well, an isolation structure in the ion well surrounding the Schottky diode, and an assistant gate surrounding the Schottky diode. The assistant gate is disposed only on the isolation structure and is not in direct contact with the ion well.

Abstract: A high voltage device includes a semiconductor substrate, an ion well, a Schottky diode in the ion well, an isolation structure in the ion well surrounding the Schottky diode, and an assistant gate surrounding the Schottky diode. The assistant gate is disposed only on the isolation structure and is not in direct contact with the ion well.

Abstract: A continuous derailleur of a bicycle contains: a drive shaft, a rotary shaft, a brake shaft, and a braking device. The rotary shaft is mounted on the drive shaft. The drive shaft includes a bevel gear member having a first bevel gear and a second bevel gear. The drive shaft includes a first pedal shaft, and the brake shaft includes a first interactive bevel gear and includes the braking device. The rotary shaft includes a second interactive bevel gear and a third interactive bevel gear, and the second interactive bevel gear and the third interactive bevel gear mesh with the second bevel gear of the bevel gear member. The continuous derailleur further contains an output bevel gear, and the output bevel gear is rotatably fitted on the drive shaft, hence the second interactive bevel gear and the third interactive bevel gear mesh with the output bevel gear.

Abstract: Color display systems are disclosed, wherein the color display system includes a main display unit and a secondary display unit. The main display unit can include a plurality of rotatable color selection pods where one side of the color selection pod displays a color(s) and the other side of the color selection pod includes receptacles that can hold color chips. The color selection pods are arranged in columns, and each column can represent a particular color family or color category. The secondary display unit can include a first sub-display and a second sub-display, with each sub-display displaying colors of particular categories or themes. The color display system can also include a central work center which can include a work table and rotating color display.

Abstract: A doping method for a semiconductor device including the following steps is provided. A substrate is provided. The substrate has a channel region. The channel region includes a first edge region, a second edge region and a center region in a channel width direction substantially perpendicular to a channel length direction, and the center region is located between the first edge region and the second edge region. A first doping process is performed on the first edge region, the second edge region and the center region by using a first conductive type dopant. A second doping process is performed on the center region by using a second conductive type dopant.

Abstract: A method for fabricating a semiconductor device structure is shown. A gate dielectric layer is formed on a substrate. A portion of the gate dielectric layer, which is located on a part of the substrate in which an S/D region is to be formed, is removed. A gate electrode is formed on the remaining gate dielectric layer. A spacer is formed on the sidewall of the gate electrode and the sidewall of the gate dielectric layer. The S/D region is then formed in the part of the substrate beside the spacer.

Abstract: A high-voltage MOS transistor includes a semiconductor substrate, a gate oxide layer on the semiconductor substrate, a gate on the gate oxide layer, a spacer covering a sidewall of the gate, a source on one side of the gate, and a drain on the other side of the gate. The gate includes at least a first discrete segment and a second discrete segment. The first discrete segment is not in direct contact with the second discrete segment. The spacer fills into a gap between the first discrete segment and the second discrete segment.

Abstract: A bipolar junction transistor (BJT) device includes a semiconductor substrate, a first doping region with a first conductivity, a second doping region with a second conductivity, a third doping region with the first conductivity, at least one stacked block and a conductive contact. The first doping region is formed in the semiconductor substrate. The second doping region is formed in the first doping region. The at least one stacked block is formed on and insulated from the second doping region. The third doping region is formed in the second doping region and disposed adjacent to the at least one stacked block. The conductive contact electrically connects the at least one stacked block with the third doping region.

Abstract: A high-voltage MOS transistor includes a semiconductor substrate, a gate oxide layer on the semiconductor substrate, a gate on the gate oxide layer, a spacer covering a sidewall of the gate, a source on one side of the gate, and a drain on the other side of the gate. The gate includes at least a first discrete segment and a second discrete segment. The first discrete segment is not in direct contact with the second discrete segment. The spacer fills into a gap between the first discrete segment and the second discrete segment.

Abstract: A method for fabricating a semiconductor device structure is shown. A gate dielectric layer is formed on a substrate. A portion of the gate dielectric layer, which is located on a part of the substrate in which an S/D region is to be formed, is removed. A gate electrode is formed on the remaining gate dielectric layer. A spacer is formed on the sidewall of the gate electrode and the sidewall of the gate dielectric layer. The S/D region is then formed in the part of the substrate beside the spacer.

Abstract: A bipolar junction transistor (BJT) device includes a semiconductor substrate, a first doping region with a first conductivity, a second doping region with a second conductivity, a third doping region with the first conductivity, at least one stacked block and a conductive contact. The first doping region is formed in the semiconductor substrate. The second doping region is formed in the first doping region. The at least one stacked block is formed on and insulated from the second doping region. The third doping region is formed in the second doping region and disposed adjacent to the at least one stacked block. The conductive contact electrically connects the at least one stacked block with the third doping region.

Abstract: A high-voltage MOS transistor includes a semiconductor substrate, a gate oxide layer on the semiconductor substrate, a gate on the gate oxide layer, a spacer covering a sidewall of the gate, a source on one side of the gate, and a drain on the other side of the gate. The gate includes at least a first discrete segment and a second discrete segment. The first discrete segment is not in direct contact with the second discrete segment. The spacer fills into a gap between the first discrete segment and the second discrete segment.

Abstract: A high-voltage MOS transistor includes a semiconductor substrate, a gate oxide layer on the semiconductor substrate, a gate on the gate oxide layer, a spacer covering a sidewall of the gate, a source on one side of the gate, and a drain on the other side of the gate. The gate includes at least a first discrete segment and a second discrete segment. The first discrete segment is not in direct contact with the second discrete segment. The spacer fills into a gap between the first discrete segment and the second discrete segment.