Patents by Inventor Kun Lung Hsieh

Kun Lung Hsieh has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 11143952
    Abstract: A method of removing a pellicle from a photomask includes removing a portion of a membrane from a pellicle frame, wherein the pellicle frame remains attached to the photomask following the removing of the portion of the membrane. The method further includes removing the pellicle frame from the photomask. The method further includes cleaning the photomask.
    Type: Grant
    Filed: October 31, 2017
    Date of Patent: October 12, 2021
    Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.
    Inventors: Chue San Yoo, Chih-Chiang Tu, Chien-Cheng Chen, Jong-Yuh Chang, Kun-Lung Hsieh, Pei-Cheng Hsu, Hsin-Chang Lee, Yun-Yue Lin
  • Patent number: 11119539
    Abstract: A display, including a supporting layer and a flexible display panel, is provided. The supporting layer has at least two extending sections and at least one bending section, connected therebetween and adapted to be bent along an axis as a rotation axis. The supporting layer has at least one groove at the bending section and at least one indentation at a bottom surface of the groove. An extending direction of the groove is parallel to the axis. An extending direction of the indentation is not parallel to the axis. The supporting layer has a first thickness at each extending section, a second thickness at the groove, and a third thickness at the indentation. The first, second, and third thicknesses are different from one another. The flexible display is disposed on the supporting layer. The groove and the flexible display are respectively located on two opposite sides of the supporting layer.
    Type: Grant
    Filed: July 9, 2020
    Date of Patent: September 14, 2021
    Assignee: Au Optronics Corporation
    Inventors: Chih-Tsung Lee, Zih-Shuo Huang, Kun-Lung Hsieh, Kai-Yu Yu
  • Publication number: 20210216007
    Abstract: A method of testing a photomask assembly includes placing the photomask assembly into a chamber, wherein the photomask assembly includes a pellicle attached to a first side of a photomask. The method further includes exposing the photomask assembly to a radiation source having a wavelength ranging from about 160 nm to 180 nm in the chamber to accelerate haze development, wherein the exposing of the photomask assembly includes illuminating an entirety of an area of the photomask covered by the pellicle throughout an entire illumination time and illuminating a frame adhesive attaching the pellicle to the photomask. The method further includes detecting haze of the photomask following exposing the photomask assembly to the radiation source. The method further includes predicting performance of the photomask assembly during a manufacturing process based on the detected haze of the photomask following exposing the photomask assembly to the radiation source.
    Type: Application
    Filed: March 25, 2021
    Publication date: July 15, 2021
    Inventors: Wu-Hung KO, Kun-Lung HSIEH, Chih-Wei WEN
  • Patent number: 10983430
    Abstract: A method of testing a photomask assembly is disclosed. The method includes placing a photomask assembly into a chamber. The photomask assembly includes a pellicle attached to a first side of a photomask. The method further includes exposing the photomask assembly to a radiation source in the chamber. The exposing of the photomask assembly includes illuminating an entirety of an area of the photomask covered by the pellicle throughout an entire illumination time.
    Type: Grant
    Filed: February 22, 2018
    Date of Patent: April 20, 2021
    Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.
    Inventors: Wu-Hung Ko, Chih-Wei Wen, Kun-Lung Hsieh
  • Publication number: 20210103212
    Abstract: An apparatus for removing a pellicle frame from a photomask includes a heater, a shower head, and a gripper. The heater is configured to soften a portion of an adhesive between the pellicle frame and the photomask. The shower head facing to the heater and configured to provide a flow from a patterned area of the photomask toward the pellicle frame and the adhesive. The gripper is configured to secure the pellicle frame against the flow and to remove the adhesive and the pellicle frame from the photomask. A method of removing a pellicle frame from a photomask includes providing a flow from a pattern area of the photomask toward the pellicle frame and an adhesive; securing the pellicle frame in a force-transmitting manner against the flow; soften at least a portion of the adhesive; and leveraging the pellicle frame to remove the adhesive and the pellicle frame.
    Type: Application
    Filed: December 15, 2020
    Publication date: April 8, 2021
    Inventors: WEI CHENG HUANG, KUN-LUNG HSIEH
  • Publication number: 20210027668
    Abstract: A flexible display device includes a base film, a display panel on the base film, a protective film on a surface of the display panel away from the base film, and an adhesive layer. An area of the base film is substantially identical to that of the display panel. An area of the protective film is less than that of the display panel. The adhesive layer is located on the surface of the display panel away from the base film. The adhesive layer and the protective film include an overlapping portion. The adhesive layer has a thickness and Young's modulus between 10 and 500 ?m and between 0.1 and 10 GPa, respectively. A side edge of the base film, a side edge of the display panel, and a side edge of the adhesive layer are substantially aligned. A manufacturing method of a flexible display device is also provided.
    Type: Application
    Filed: June 10, 2020
    Publication date: January 28, 2021
    Applicant: Au Optronics Corporation
    Inventor: Kun-Lung Hsieh
  • Publication number: 20210026412
    Abstract: A display, including a supporting layer and a flexible display panel, is provided. The supporting layer has at least two extending sections and at least one bending section, connected therebetween and adapted to be bent along an axis as a rotation axis. The supporting layer has at least one groove at the bending section and at least one indentation at a bottom surface of the groove. An extending direction of the groove is parallel to the axis. An extending direction of the indentation is not parallel to the axis. The supporting layer has a first thickness at each extending section, a second thickness at the groove, and a third thickness at the indentation. The first, second, and third thicknesses are different from one another. The flexible display is disposed on the supporting layer. The groove and the flexible display are respectively located on two opposite sides of the supporting layer.
    Type: Application
    Filed: July 9, 2020
    Publication date: January 28, 2021
    Applicant: Au Optronics Corporation
    Inventors: Chih-Tsung Lee, Zih-Shuo Huang, Kun-Lung Hsieh, Kai-Yu Yu
  • Patent number: 10877369
    Abstract: An apparatus for removing a pellicle frame from a photomask includes a shower head and a gripper. The shower head is configured to provide an air curtain between the pellicle frame and a patterned area of the photomask. The gripper is configured to secure the pellicle frame from a direction against the flow blown from the air curtain. The flow is substantially directed toward a periphery of the photomask. A method of removing a pellicle frame from a photomask includes providing an air curtain between the pellicle frame and a patterned area of the photomask, and generating a temperature difference between the photomask and the pellicle frame. The flow of the air curtain is substantially directed toward a periphery of the photomask. The temperature of the photomask is higher than the temperature of the pellicle frame.
    Type: Grant
    Filed: August 28, 2018
    Date of Patent: December 29, 2020
    Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY LTD.
    Inventors: Wei Cheng Huang, Kun-Lung Hsieh
  • Publication number: 20200371432
    Abstract: In a method of cleaning a photomask, a wiper tape is guided from a wiper tape supplying reel, over a cleaning head, and then onto a wiper tape collecting reel. A section of the wiper tape over the cleaning head is brought into contact with an adhesive residue on a surface of the photomask. A relative movement is caused between the photomask and the section of the wiper tape to remove the adhesive residue from the surface of the photomask.
    Type: Application
    Filed: August 11, 2020
    Publication date: November 26, 2020
    Inventors: Yi-Hsun Pan, Kun-Lung Hsieh
  • Publication number: 20200278810
    Abstract: A method for mitigating writing performance variation comprises the steps of receiving a request, determining whether status of a SSD is normal or constrained, fulfilling the request if the status is normal, inserting the request in a queue if the status is constrained, monitoring a first request in the queue and calculating expected time of waiting, determining whether elapsed time of the first request is shorter than the expected time of waiting, waiting for some time before returning to the step of monitoring the first request and calculating the expected time of waiting if the elapsed time is shorter than the expected time of waiting, fulfilling and removing the first request from the queue if the elapsed time is not shorter than the expected time of waiting, determining whether the queue is empty, returning to the step of waiting if the queue is not empty.
    Type: Application
    Filed: March 1, 2019
    Publication date: September 3, 2020
    Inventors: Po-Chien Chang, Yen-Lan Hsu, Kun-Lung Hsieh
  • Patent number: 10747105
    Abstract: In a method of cleaning a photomask, a wiper tape is guided from a wiper tape supplying reel, over a cleaning head, and then onto a wiper tape collecting reel. A section of the wiper tape over the cleaning head is brought into contact with an adhesive residue on a surface of the photomask. A relative movement is caused between the photomask and the section of the wiper tape to remove the adhesive residue from the surface of the photomask.
    Type: Grant
    Filed: December 29, 2017
    Date of Patent: August 18, 2020
    Assignee: Taiwan Semiconductor Manufacturing Company, Ltd.
    Inventors: Yi-Hsun Pan, Kun-Lung Hsieh
  • Patent number: 10671313
    Abstract: A data storage apparatus includes a cache memory module and a NAND flash memory module including a cache memory mirror and a user data storage zone. The cache memory module is connected to the cache memory mirror via a path and electrically connected to the user data storage zone via another path. The cache memory module receives a write command that includes user data from a host, writes a copy of the user data into the user data storage zone in a write-back mode, and writes another copy of the user data cache memory mirror in a write-through mode. If some of the user data are lost from the cache memory module before they are written into the user data storage zone, the user data written in the cache memory mirror are copied and written into the cache memory module when the data storage apparatus is initiated again.
    Type: Grant
    Filed: January 23, 2018
    Date of Patent: June 2, 2020
    Assignee: GOKE US RESEARCH LABORATORY
    Inventors: Kun-Lung Hsieh, Bo-Shian Hsu, Po-Chien Chang
  • Publication number: 20200073231
    Abstract: An apparatus for removing a pellicle frame from a photomask includes a shower head and a gripper. The shower head is configured to provide an air curtain between the pellicle frame and a patterned area of the photomask. The gripper is configured to secure the pellicle frame from a direction against the flow blown from the air curtain. The flow is substantially directed toward a periphery of the photomask. A method of removing a pellicle frame from a photomask includes providing an air curtain between the pellicle frame and a patterned area of the photomask, and generating a temperature difference between the photomask and the pellicle frame. The flow of the air curtain is substantially directed toward a periphery of the photomask. The temperature of the photomask is higher than the temperature of the pellicle frame.
    Type: Application
    Filed: August 28, 2018
    Publication date: March 5, 2020
    Inventors: Wei Cheng HUANG, Kun-Lung HSIEH
  • Publication number: 20190258155
    Abstract: A method of testing a photomask assembly is disclosed. The method includes placing a photomask assembly into a chamber. The photomask assembly includes a pellicle attached to a first side of a photomask. The method further includes exposing the photomask assembly to a radiation source in the chamber. The exposing of the photomask assembly includes illuminating an entirety of an area of the photomask covered by the pellicle throughout an entire illumination time.
    Type: Application
    Filed: February 22, 2018
    Publication date: August 22, 2019
    Inventors: Wu-Hung KO, Chih-Wei WEN, Kun-Lung HSIEH
  • Publication number: 20190227708
    Abstract: A data storage apparatus includes a cache memory module and a NAND flash memory module including a cache memory mirror and a user data storage zone. The cache memory module is connected to the cache memory mirror via a path and electrically connected to the user data storage zone via another path. The cache memory module receives a write command that includes user data from a host, writes a copy of the user data into the user data storage zone in a write-back mode, and writes another copy of the user data cache memory mirror in a write-through mode. If some of the user data are lost from the cache memory module before they are written into the user data storage zone, the user data written in the cache memory mirror are copied and written into the cache memory module when the data storage apparatus is initiated again.
    Type: Application
    Filed: January 23, 2018
    Publication date: July 25, 2019
    Inventors: Kun-Lung Hsieh, Bo-Shian Hsu, Po-Chien Chang
  • Publication number: 20190094683
    Abstract: A method of removing a pellicle from a photomask includes removing a portion of a membrane from a pellicle frame, wherein the pellicle frame remains attached to the photomask following the removing of the portion of the membrane. The method further includes removing the pellicle frame from the photomask. The method further includes cleaning the photomask.
    Type: Application
    Filed: October 31, 2017
    Publication date: March 28, 2019
    Inventors: Chue San YOO, Chih-Chiang TU, Chien-Cheng CHEN, Jong-Yuh CHANG, Kun-Lung HSIEH, Pei-Cheng HSU, Hsin-Chang LEE, Yun-Yue LIN
  • Publication number: 20180129132
    Abstract: In a method of cleaning a photomask, a wiper tape is guided from a wiper tape supplying reel, over a cleaning head, and then onto a wiper tape collecting reel. A section of the wiper tape over the cleaning head is brought into contact with an adhesive residue on a surface of the photomask. A relative movement is caused between the photomask and the section of the wiper tape to remove the adhesive residue from the surface of the photomask.
    Type: Application
    Filed: December 29, 2017
    Publication date: May 10, 2018
    Inventors: Yi-Hsun Pan, Kun-Lung Hsieh
  • Patent number: 9857680
    Abstract: In a method of cleaning a photomask, a wiper tape is guided from a wiper tape supplying reel, over a cleaning head, and then onto a wiper tape collecting reel. A section of the wiper tape over the cleaning head is brought into contact with an adhesive residue on a surface of the photomask. A relative movement is caused between the photomask and the section of the wiper tape to remove the adhesive residue from the surface of the photomask.
    Type: Grant
    Filed: January 14, 2014
    Date of Patent: January 2, 2018
    Assignee: Taiwan Semiconductor Manufacturing Company, Ltd.
    Inventors: Yi Hsun Pan, Kun-Lung Hsieh
  • Patent number: 9726990
    Abstract: Lithography mask repair methods are disclosed. In one embodiment, a method of repairing a lithography mask includes providing a lithography mask, exposing a back side of the lithography mask to vacuum ultraviolet (VUV) energy, and cleaning the lithography mask.
    Type: Grant
    Filed: March 1, 2013
    Date of Patent: August 8, 2017
    Assignee: Taiwan Semiconductor Manufacturing Company, Ltd.
    Inventors: Wu Hung Ko, Kun-Lung Hsieh
  • Patent number: 9656278
    Abstract: A jet spray nozzle for cleaning a photolithographic mask or semiconductor wafer and method for cleaning the same. The jet spray nozzle in one embodiment includes a water supply inlet, a gas supply inlet, a first row of gas injection nozzles communicating with the gas supply inlet, a mixing cavity defining a jet spray nozzle outlet, and a flow mixing baffle disposed in the cavity. The mixing baffle preferably is configured and arranged to combine gas and water in the jet spray nozzle for delivering a concentrated stream of gas with a cluster of micro water droplets entrained in the gas for removing contaminant particles from the mask. The jet spray nozzle is capable of cleaning photo masks or wafers without the use of chemicals. In one embodiment, the water may be deionized water and the gas may be nitrogen. In another embodiment, the jet spray nozzle further includes a second row of gas injection nozzles spaced above or below the first row of gas injection nozzles that communicate with the gas supply inlet.
    Type: Grant
    Filed: May 15, 2014
    Date of Patent: May 23, 2017
    Assignee: Taiwan Semiconductor Manufacturing Co., Ltd.
    Inventors: Kun-Lung Hsieh, Chien-Hsing Lu