Patents by Inventor Kun Lung Hsieh
Kun Lung Hsieh has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Publication number: 20240085398Abstract: A semiconductor device includes a circuit layer and a nanopore layer. The nanopore layer is formed on the circuit layer and is formed with a pore therethrough. The circuit layer includes a circuit unit configured to drive a biomolecule through the pore and to detect a current associated with a resistance of the nanopore layer, whereby a characteristic of the biomolecule can be determined using the currents detected by the circuit unit.Type: ApplicationFiled: November 21, 2023Publication date: March 14, 2024Inventors: Kun-Lung Chen, Tung-Tsun Chen, Cheng-Hsiang Hsieh, Yu-Jie Huang, Jui-Cheng Huang
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Patent number: 11862050Abstract: A flexible display device includes a base film, a display panel on the base film, a protective film on a surface of the display panel away from the base film, and an adhesive layer. An area of the protective film is less than that of the display panel. The adhesive layer and the protective film has an overlapping portion. The adhesive layer has a thickness and Young's modulus between 10 and 500 ?m and between 0.1 and 10 GPa, respectively. A side edge of the base film, a side edge of the display panel, and a side edge of the adhesive layer are substantially aligned.Type: GrantFiled: February 15, 2023Date of Patent: January 2, 2024Assignee: AUO CorporationInventor: Kun-Lung Hsieh
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Publication number: 20230333465Abstract: In pellicle cleaning, a gas is flowed on a pellicle using at least one gas nozzle. During the flowing, the pellicle is moved respective to the at least one gas nozzle. During the flowing, the pellicle is exposed to ionized gas generated by at least one alpha ionizer. Also during the flowing, an ultrasonic wave is applied to the pellicle using an ultrasound transducer or transducer array. The gas nozzle may have a nozzle aperture comprising a slit or a linear array of apertures arranged parallel with a pellicle membrane of the pellicle.Type: ApplicationFiled: April 15, 2022Publication date: October 19, 2023Inventors: Kun-Lung Hsieh, Tzu Han Liu, Hao-En Luo, Chih-Wei Wen
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Patent number: 11714348Abstract: An apparatus for removing a pellicle frame from a photomask includes a heater configured to soften an adhesive between the pellicle frame and the photomask; a shower head including a plate, a central region of the plate is configured to overlap with a pattern area of the photomask, and a periphery region of the plate is configured to provide a flow from the periphery region of the plate toward the pellicle frame and the adhesive; and a gripper configured to secure the pellicle frame against the flow and remove the adhesive and the pellicle frame from the photomask. A method of removing a pellicle frame, includes providing a plate overlapped with a pattern area of the photomask; providing a flow from the plate toward the pellicle frame and an adhesive; securing the pellicle frame; soften the adhesive; and leveraging the pellicle frame to remove the adhesive and the pellicle frame.Type: GrantFiled: July 6, 2022Date of Patent: August 1, 2023Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY LTD.Inventors: Wei Cheng Huang, Kun-Lung Hsieh
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Patent number: 11703752Abstract: A method of testing a photomask assembly includes placing the photomask assembly into a chamber, wherein the photomask assembly includes a pellicle attached to a first side of a photomask. The method further includes exposing the photomask assembly to a radiation source having a wavelength ranging from about 160 nm to 180 nm in the chamber to accelerate haze development, wherein the exposing of the photomask assembly includes illuminating an entirety of an area of the photomask covered by the pellicle throughout an entire illumination time and illuminating a frame adhesive attaching the pellicle to the photomask. The method further includes detecting haze of the photomask following exposing the photomask assembly to the radiation source. The method further includes predicting performance of the photomask assembly during a manufacturing process based on the detected haze of the photomask following exposing the photomask assembly to the radiation source.Type: GrantFiled: March 25, 2021Date of Patent: July 18, 2023Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.Inventors: Wu-Hung Ko, Kun-Lung Hsieh, Chih-Wei Wen
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Publication number: 20230196950Abstract: A flexible display device includes a base film, a display panel on the base film, a protective film on a surface of the display panel away from the base film, and an adhesive layer. An area of the protective film is less than that of the display panel. The adhesive layer and the protective film has an overlapping portion. The adhesive layer has a thickness and Young's modulus between 10 and 500 ?m and between 0.1 and 10 GPa, respectively. A side edge of the base film, a side edge of the display panel, and a side edge of the adhesive layer are substantially aligned.Type: ApplicationFiled: February 15, 2023Publication date: June 22, 2023Applicant: AUO CorporationInventor: Kun-Lung Hsieh
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Patent number: 11605314Abstract: A flexible display device includes a base film, a display panel on the base film, a protective film on a surface of the display panel away from the base film, and an adhesive layer. An area of the base film is substantially identical to that of the display panel. An area of the protective film is less than that of the display panel. The adhesive layer is located on the surface of the display panel away from the base film. The adhesive layer and the protective film include an overlapping portion. The adhesive layer has a thickness and Young's modulus between 10 and 500 ?m and between 0.1 and 10 GPa, respectively. A side edge of the base film, a side edge of the display panel, and a side edge of the adhesive layer are substantially aligned. A manufacturing method of a flexible display device is also provided.Type: GrantFiled: June 10, 2020Date of Patent: March 14, 2023Assignee: Au Optronics CorporationInventor: Kun-Lung Hsieh
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Publication number: 20220334465Abstract: An apparatus for removing a pellicle frame from a photomask includes a heater configured to soften an adhesive between the pellicle frame and the photomask; a shower head including a plate, a central region of the plate is configured to overlap with a pattern area of the photomask, and a periphery region of the plate is configured to provide a flow from the periphery region of the plate toward the pellicle frame and the adhesive; and a gripper configured to secure the pellicle frame against the flow and remove the adhesive and the pellicle frame from the photomask. A method of removing a pellicle frame, includes providing a plate overlapped with a pattern area of the photomask; providing a flow from the plate toward the pellicle frame and an adhesive; securing the pellicle frame; soften the adhesive; and leveraging the pellicle frame to remove the adhesive and the pellicle frame.Type: ApplicationFiled: July 6, 2022Publication date: October 20, 2022Inventors: WEI CHENG HUANG, KUN-LUNG HSIEH
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Patent number: 11392025Abstract: An apparatus for removing a pellicle frame from a photomask includes a heater, a shower head, and a gripper. The heater is configured to soften a portion of an adhesive between the pellicle frame and the photomask. The shower head facing to the heater and configured to provide a flow from a patterned area of the photomask toward the pellicle frame and the adhesive. The gripper is configured to secure the pellicle frame against the flow and to remove the adhesive and the pellicle frame from the photomask. A method of removing a pellicle frame from a photomask includes providing a flow from a pattern area of the photomask toward the pellicle frame and an adhesive; securing the pellicle frame in a force-transmitting manner against the flow; soften at least a portion of the adhesive; and leveraging the pellicle frame to remove the adhesive and the pellicle frame.Type: GrantFiled: December 15, 2020Date of Patent: July 19, 2022Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY LTD.Inventors: Wei Cheng Huang, Kun-Lung Hsieh
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Patent number: 11237478Abstract: In a method of cleaning a photomask, a wiper tape is guided from a wiper tape supplying reel, over a cleaning head, and then onto a wiper tape collecting reel. A section of the wiper tape over the cleaning head is brought into contact with an adhesive residue on a surface of the photomask. A relative movement is caused between the photomask and the section of the wiper tape to remove the adhesive residue from the surface of the photomask.Type: GrantFiled: August 11, 2020Date of Patent: February 1, 2022Assignee: Taiwan Semiconductor Manufacturing Company, Ltd.Inventors: Yi-Hsun Pan, Kun-Lung Hsieh
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Publication number: 20220026797Abstract: A pellicle includes a frame configured to attach to a photomask, wherein the frame includes a vent hole. The pellicle further includes a filter covering the vent hole, wherein the filter directly connects to an outer surface of the frame. The pellicle further includes a membrane extending over a top surface of the frame. The pellicle further includes a mount between the frame and the membrane, wherein the mount is attachable to the frame by an adhesive.Type: ApplicationFiled: October 8, 2021Publication date: January 27, 2022Inventors: Chue San YOO, Chih-Chiang TU, Chien-Cheng CHEN, Jong-Yuh CHANG, Kun-Lung HSIEH, Pei-Cheng HSU, Hsin-Chang LEE, Yun-Yue LIN
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Patent number: 11143952Abstract: A method of removing a pellicle from a photomask includes removing a portion of a membrane from a pellicle frame, wherein the pellicle frame remains attached to the photomask following the removing of the portion of the membrane. The method further includes removing the pellicle frame from the photomask. The method further includes cleaning the photomask.Type: GrantFiled: October 31, 2017Date of Patent: October 12, 2021Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.Inventors: Chue San Yoo, Chih-Chiang Tu, Chien-Cheng Chen, Jong-Yuh Chang, Kun-Lung Hsieh, Pei-Cheng Hsu, Hsin-Chang Lee, Yun-Yue Lin
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Patent number: 11119539Abstract: A display, including a supporting layer and a flexible display panel, is provided. The supporting layer has at least two extending sections and at least one bending section, connected therebetween and adapted to be bent along an axis as a rotation axis. The supporting layer has at least one groove at the bending section and at least one indentation at a bottom surface of the groove. An extending direction of the groove is parallel to the axis. An extending direction of the indentation is not parallel to the axis. The supporting layer has a first thickness at each extending section, a second thickness at the groove, and a third thickness at the indentation. The first, second, and third thicknesses are different from one another. The flexible display is disposed on the supporting layer. The groove and the flexible display are respectively located on two opposite sides of the supporting layer.Type: GrantFiled: July 9, 2020Date of Patent: September 14, 2021Assignee: Au Optronics CorporationInventors: Chih-Tsung Lee, Zih-Shuo Huang, Kun-Lung Hsieh, Kai-Yu Yu
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Publication number: 20210216007Abstract: A method of testing a photomask assembly includes placing the photomask assembly into a chamber, wherein the photomask assembly includes a pellicle attached to a first side of a photomask. The method further includes exposing the photomask assembly to a radiation source having a wavelength ranging from about 160 nm to 180 nm in the chamber to accelerate haze development, wherein the exposing of the photomask assembly includes illuminating an entirety of an area of the photomask covered by the pellicle throughout an entire illumination time and illuminating a frame adhesive attaching the pellicle to the photomask. The method further includes detecting haze of the photomask following exposing the photomask assembly to the radiation source. The method further includes predicting performance of the photomask assembly during a manufacturing process based on the detected haze of the photomask following exposing the photomask assembly to the radiation source.Type: ApplicationFiled: March 25, 2021Publication date: July 15, 2021Inventors: Wu-Hung KO, Kun-Lung HSIEH, Chih-Wei WEN
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Patent number: 10983430Abstract: A method of testing a photomask assembly is disclosed. The method includes placing a photomask assembly into a chamber. The photomask assembly includes a pellicle attached to a first side of a photomask. The method further includes exposing the photomask assembly to a radiation source in the chamber. The exposing of the photomask assembly includes illuminating an entirety of an area of the photomask covered by the pellicle throughout an entire illumination time.Type: GrantFiled: February 22, 2018Date of Patent: April 20, 2021Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.Inventors: Wu-Hung Ko, Chih-Wei Wen, Kun-Lung Hsieh
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Publication number: 20210103212Abstract: An apparatus for removing a pellicle frame from a photomask includes a heater, a shower head, and a gripper. The heater is configured to soften a portion of an adhesive between the pellicle frame and the photomask. The shower head facing to the heater and configured to provide a flow from a patterned area of the photomask toward the pellicle frame and the adhesive. The gripper is configured to secure the pellicle frame against the flow and to remove the adhesive and the pellicle frame from the photomask. A method of removing a pellicle frame from a photomask includes providing a flow from a pattern area of the photomask toward the pellicle frame and an adhesive; securing the pellicle frame in a force-transmitting manner against the flow; soften at least a portion of the adhesive; and leveraging the pellicle frame to remove the adhesive and the pellicle frame.Type: ApplicationFiled: December 15, 2020Publication date: April 8, 2021Inventors: WEI CHENG HUANG, KUN-LUNG HSIEH
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Publication number: 20210027668Abstract: A flexible display device includes a base film, a display panel on the base film, a protective film on a surface of the display panel away from the base film, and an adhesive layer. An area of the base film is substantially identical to that of the display panel. An area of the protective film is less than that of the display panel. The adhesive layer is located on the surface of the display panel away from the base film. The adhesive layer and the protective film include an overlapping portion. The adhesive layer has a thickness and Young's modulus between 10 and 500 ?m and between 0.1 and 10 GPa, respectively. A side edge of the base film, a side edge of the display panel, and a side edge of the adhesive layer are substantially aligned. A manufacturing method of a flexible display device is also provided.Type: ApplicationFiled: June 10, 2020Publication date: January 28, 2021Applicant: Au Optronics CorporationInventor: Kun-Lung Hsieh
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Publication number: 20210026412Abstract: A display, including a supporting layer and a flexible display panel, is provided. The supporting layer has at least two extending sections and at least one bending section, connected therebetween and adapted to be bent along an axis as a rotation axis. The supporting layer has at least one groove at the bending section and at least one indentation at a bottom surface of the groove. An extending direction of the groove is parallel to the axis. An extending direction of the indentation is not parallel to the axis. The supporting layer has a first thickness at each extending section, a second thickness at the groove, and a third thickness at the indentation. The first, second, and third thicknesses are different from one another. The flexible display is disposed on the supporting layer. The groove and the flexible display are respectively located on two opposite sides of the supporting layer.Type: ApplicationFiled: July 9, 2020Publication date: January 28, 2021Applicant: Au Optronics CorporationInventors: Chih-Tsung Lee, Zih-Shuo Huang, Kun-Lung Hsieh, Kai-Yu Yu
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Patent number: 10877369Abstract: An apparatus for removing a pellicle frame from a photomask includes a shower head and a gripper. The shower head is configured to provide an air curtain between the pellicle frame and a patterned area of the photomask. The gripper is configured to secure the pellicle frame from a direction against the flow blown from the air curtain. The flow is substantially directed toward a periphery of the photomask. A method of removing a pellicle frame from a photomask includes providing an air curtain between the pellicle frame and a patterned area of the photomask, and generating a temperature difference between the photomask and the pellicle frame. The flow of the air curtain is substantially directed toward a periphery of the photomask. The temperature of the photomask is higher than the temperature of the pellicle frame.Type: GrantFiled: August 28, 2018Date of Patent: December 29, 2020Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY LTD.Inventors: Wei Cheng Huang, Kun-Lung Hsieh
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Publication number: 20200371432Abstract: In a method of cleaning a photomask, a wiper tape is guided from a wiper tape supplying reel, over a cleaning head, and then onto a wiper tape collecting reel. A section of the wiper tape over the cleaning head is brought into contact with an adhesive residue on a surface of the photomask. A relative movement is caused between the photomask and the section of the wiper tape to remove the adhesive residue from the surface of the photomask.Type: ApplicationFiled: August 11, 2020Publication date: November 26, 2020Inventors: Yi-Hsun Pan, Kun-Lung Hsieh