Patents by Inventor Kun Lung Hsieh

Kun Lung Hsieh has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20200278810
    Abstract: A method for mitigating writing performance variation comprises the steps of receiving a request, determining whether status of a SSD is normal or constrained, fulfilling the request if the status is normal, inserting the request in a queue if the status is constrained, monitoring a first request in the queue and calculating expected time of waiting, determining whether elapsed time of the first request is shorter than the expected time of waiting, waiting for some time before returning to the step of monitoring the first request and calculating the expected time of waiting if the elapsed time is shorter than the expected time of waiting, fulfilling and removing the first request from the queue if the elapsed time is not shorter than the expected time of waiting, determining whether the queue is empty, returning to the step of waiting if the queue is not empty.
    Type: Application
    Filed: March 1, 2019
    Publication date: September 3, 2020
    Inventors: Po-Chien Chang, Yen-Lan Hsu, Kun-Lung Hsieh
  • Patent number: 10747105
    Abstract: In a method of cleaning a photomask, a wiper tape is guided from a wiper tape supplying reel, over a cleaning head, and then onto a wiper tape collecting reel. A section of the wiper tape over the cleaning head is brought into contact with an adhesive residue on a surface of the photomask. A relative movement is caused between the photomask and the section of the wiper tape to remove the adhesive residue from the surface of the photomask.
    Type: Grant
    Filed: December 29, 2017
    Date of Patent: August 18, 2020
    Assignee: Taiwan Semiconductor Manufacturing Company, Ltd.
    Inventors: Yi-Hsun Pan, Kun-Lung Hsieh
  • Patent number: 10671313
    Abstract: A data storage apparatus includes a cache memory module and a NAND flash memory module including a cache memory mirror and a user data storage zone. The cache memory module is connected to the cache memory mirror via a path and electrically connected to the user data storage zone via another path. The cache memory module receives a write command that includes user data from a host, writes a copy of the user data into the user data storage zone in a write-back mode, and writes another copy of the user data cache memory mirror in a write-through mode. If some of the user data are lost from the cache memory module before they are written into the user data storage zone, the user data written in the cache memory mirror are copied and written into the cache memory module when the data storage apparatus is initiated again.
    Type: Grant
    Filed: January 23, 2018
    Date of Patent: June 2, 2020
    Assignee: GOKE US RESEARCH LABORATORY
    Inventors: Kun-Lung Hsieh, Bo-Shian Hsu, Po-Chien Chang
  • Publication number: 20200073231
    Abstract: An apparatus for removing a pellicle frame from a photomask includes a shower head and a gripper. The shower head is configured to provide an air curtain between the pellicle frame and a patterned area of the photomask. The gripper is configured to secure the pellicle frame from a direction against the flow blown from the air curtain. The flow is substantially directed toward a periphery of the photomask. A method of removing a pellicle frame from a photomask includes providing an air curtain between the pellicle frame and a patterned area of the photomask, and generating a temperature difference between the photomask and the pellicle frame. The flow of the air curtain is substantially directed toward a periphery of the photomask. The temperature of the photomask is higher than the temperature of the pellicle frame.
    Type: Application
    Filed: August 28, 2018
    Publication date: March 5, 2020
    Inventors: Wei Cheng HUANG, Kun-Lung HSIEH
  • Publication number: 20190258155
    Abstract: A method of testing a photomask assembly is disclosed. The method includes placing a photomask assembly into a chamber. The photomask assembly includes a pellicle attached to a first side of a photomask. The method further includes exposing the photomask assembly to a radiation source in the chamber. The exposing of the photomask assembly includes illuminating an entirety of an area of the photomask covered by the pellicle throughout an entire illumination time.
    Type: Application
    Filed: February 22, 2018
    Publication date: August 22, 2019
    Inventors: Wu-Hung KO, Chih-Wei WEN, Kun-Lung HSIEH
  • Publication number: 20190227708
    Abstract: A data storage apparatus includes a cache memory module and a NAND flash memory module including a cache memory mirror and a user data storage zone. The cache memory module is connected to the cache memory mirror via a path and electrically connected to the user data storage zone via another path. The cache memory module receives a write command that includes user data from a host, writes a copy of the user data into the user data storage zone in a write-back mode, and writes another copy of the user data cache memory mirror in a write-through mode. If some of the user data are lost from the cache memory module before they are written into the user data storage zone, the user data written in the cache memory mirror are copied and written into the cache memory module when the data storage apparatus is initiated again.
    Type: Application
    Filed: January 23, 2018
    Publication date: July 25, 2019
    Inventors: Kun-Lung Hsieh, Bo-Shian Hsu, Po-Chien Chang
  • Publication number: 20190094683
    Abstract: A method of removing a pellicle from a photomask includes removing a portion of a membrane from a pellicle frame, wherein the pellicle frame remains attached to the photomask following the removing of the portion of the membrane. The method further includes removing the pellicle frame from the photomask. The method further includes cleaning the photomask.
    Type: Application
    Filed: October 31, 2017
    Publication date: March 28, 2019
    Inventors: Chue San YOO, Chih-Chiang TU, Chien-Cheng CHEN, Jong-Yuh CHANG, Kun-Lung HSIEH, Pei-Cheng HSU, Hsin-Chang LEE, Yun-Yue LIN
  • Publication number: 20180129132
    Abstract: In a method of cleaning a photomask, a wiper tape is guided from a wiper tape supplying reel, over a cleaning head, and then onto a wiper tape collecting reel. A section of the wiper tape over the cleaning head is brought into contact with an adhesive residue on a surface of the photomask. A relative movement is caused between the photomask and the section of the wiper tape to remove the adhesive residue from the surface of the photomask.
    Type: Application
    Filed: December 29, 2017
    Publication date: May 10, 2018
    Inventors: Yi-Hsun Pan, Kun-Lung Hsieh
  • Patent number: 9857680
    Abstract: In a method of cleaning a photomask, a wiper tape is guided from a wiper tape supplying reel, over a cleaning head, and then onto a wiper tape collecting reel. A section of the wiper tape over the cleaning head is brought into contact with an adhesive residue on a surface of the photomask. A relative movement is caused between the photomask and the section of the wiper tape to remove the adhesive residue from the surface of the photomask.
    Type: Grant
    Filed: January 14, 2014
    Date of Patent: January 2, 2018
    Assignee: Taiwan Semiconductor Manufacturing Company, Ltd.
    Inventors: Yi Hsun Pan, Kun-Lung Hsieh
  • Patent number: 9726990
    Abstract: Lithography mask repair methods are disclosed. In one embodiment, a method of repairing a lithography mask includes providing a lithography mask, exposing a back side of the lithography mask to vacuum ultraviolet (VUV) energy, and cleaning the lithography mask.
    Type: Grant
    Filed: March 1, 2013
    Date of Patent: August 8, 2017
    Assignee: Taiwan Semiconductor Manufacturing Company, Ltd.
    Inventors: Wu Hung Ko, Kun-Lung Hsieh
  • Patent number: 9656278
    Abstract: A jet spray nozzle for cleaning a photolithographic mask or semiconductor wafer and method for cleaning the same. The jet spray nozzle in one embodiment includes a water supply inlet, a gas supply inlet, a first row of gas injection nozzles communicating with the gas supply inlet, a mixing cavity defining a jet spray nozzle outlet, and a flow mixing baffle disposed in the cavity. The mixing baffle preferably is configured and arranged to combine gas and water in the jet spray nozzle for delivering a concentrated stream of gas with a cluster of micro water droplets entrained in the gas for removing contaminant particles from the mask. The jet spray nozzle is capable of cleaning photo masks or wafers without the use of chemicals. In one embodiment, the water may be deionized water and the gas may be nitrogen. In another embodiment, the jet spray nozzle further includes a second row of gas injection nozzles spaced above or below the first row of gas injection nozzles that communicate with the gas supply inlet.
    Type: Grant
    Filed: May 15, 2014
    Date of Patent: May 23, 2017
    Assignee: Taiwan Semiconductor Manufacturing Co., Ltd.
    Inventors: Kun-Lung Hsieh, Chien-Hsing Lu
  • Patent number: 9610255
    Abstract: A dietary supplement is disclosed comprising lycopene and resveratrol in a range of ratio of lycopene:resveratrol from 1:10 to 10:1. Preferably, the ratio is 1:2 to 1:4. Lycopene is preferably of ?95% purity and resveratrol is of ?98% purity. Both lycopene and resveratrol may preferably comprise of nano-sized particles in crystal powder to optimize oral intake in the form of capsule or tablet. In small dosage, it should preferably include a minimum of 5 mg of lycopene and 10 mg of resveratrol. Various range of ratios of lycopene:resveratrol are provided for specific therapeutic purposes including 1:4 for symptomatic relief of arthritis, 1:2 for inhibiting melanoma or carcinoma malignancy, and 1:3 for inhibiting hyperlipoidemia. Generally, our dietary supplement composition may be used as an agent for anti-ageing, anti-oxidative, inhibiting cardiovascular diseases, relieving menopause symptoms and remission of post-operative cancer patients.
    Type: Grant
    Filed: November 7, 2014
    Date of Patent: April 4, 2017
    Assignee: HSIEHS BIOTECH (SINGAPORE) PTE LTD
    Inventor: Kun Lung Hsieh
  • Publication number: 20150198875
    Abstract: In a method of cleaning a photomask, a wiper tape is guided from a wiper tape supplying reel, over a cleaning head, and then onto a wiper tape collecting reel. A section of the wiper tape over the cleaning head is brought into contact with an adhesive residue on a surface of the photomask. A relative movement is caused between the photomask and the section of the wiper tape to remove the adhesive residue from the surface of the photomask.
    Type: Application
    Filed: January 14, 2014
    Publication date: July 16, 2015
    Applicant: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.
    Inventors: Yi Hsun PAN, Kun-Lung HSIEH
  • Publication number: 20150132373
    Abstract: A dietary supplement is disclosed comprising lycopene and resveratrol in a range of ratio of lycopene:resveratrol from 1:10 to 10:1. Preferably, the ratio is 1:2 to 1:4. Lycopene is preferably of ?95% purity and resveratrol is of ?98% purity. Both lycopene and resveratrol may preferably comprise of nano-sized particles in crystal powder to optimize oral intake in the form of capsule or tablet. In small dosage, it should preferably include a minimum of 5 mg of lycopene and 10 mg of resveratrol. Various range of ratios of lycopene:resveratrol are provided for specific therapeutic purposes including 1:4 for symptomatic relief of arthritis, 1:2 for inhibiting melanoma or carcinoma malignancy, and 1:3 for inhibiting hyperlipoidemia. Generally, our dietary supplement composition may be used as an agent for anti-ageing, anti-oxidative, inhibiting cardiovascular diseases, relieving menopause symptoms and remission of post-operative cancer patients.
    Type: Application
    Filed: November 7, 2014
    Publication date: May 14, 2015
    Inventor: Kun Lung HSIEH
  • Publication number: 20140291416
    Abstract: A jet spray nozzle for cleaning a photolithographic mask or semiconductor wafer and method for cleaning the same. The jet spray nozzle in one embodiment includes a water supply inlet, a gas supply inlet, a first row of gas injection nozzles communicating with the gas supply inlet, a mixing cavity defining a jet spray nozzle outlet, and a flow mixing baffle disposed in the cavity. The mixing baffle preferably is configured and arranged to combine gas and water in the jet spray nozzle for delivering a concentrated stream of gas with a cluster of micro water droplets entrained in the gas for removing contaminant particles from the mask. The jet spray nozzle is capable of cleaning photo masks or wafers without the use of chemicals. In one embodiment, the water may be deionized water and the gas may be nitrogen. In another embodiment, the jet spray nozzle further includes a second row of gas injection nozzles spaced above or below the first row of gas injection nozzles that communicate with the gas supply inlet.
    Type: Application
    Filed: May 15, 2014
    Publication date: October 2, 2014
    Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.
    Inventors: Kun-Lung HSIEH, Chien-Hsing LU
  • Patent number: 8802732
    Abstract: A carotenoid and a terpenoid in therapeutically-effective amounts is disclosed such that, upon ingestion in one preparation, or in two separated preparations, simultaneous or sequentially, and upon metabolism, the activity of natural killer (NK) cells is elevated. Specifically, the composition comprises lycopene and resveratrol in the range of 1:10 to 10:1 by molar; more preferably 1:1 to 3:1 by molar, and most preferably at 3:1. Alternatively, the preferred ratio may be expressed as 1:4 to 25:1 by weight; more preferably 2½:1 to 7½:1 by weight, and most preferably at 7½:1. The composition may be formulated for oral intake as a pharmaceutical, dietary supplement or food product and provided in therapeutically effective amounts to a mammal, preferably in a dosage of about 3.5 mg per day per 20 g of a mammalian body mass in a ratio of 2½:1 by weight, which can be translated to about 400 mg to 1000 mg per day for a typical human in need of elevating NK cell activity.
    Type: Grant
    Filed: April 13, 2010
    Date of Patent: August 12, 2014
    Assignee: Hsiehs Biotech (Singapore) Pte Ltd
    Inventor: Kun Lung Hsieh
  • Patent number: 8703364
    Abstract: A method for repairing a defect, such as a pinhole, on a photomask is described. In an example, a laser beam is used to form a matrix of laser burn spots in a substrate of the photomask proximate a defect, such as a pinhole, of the photomask. Each laser burn spot is formed at a focal point of the laser beam inside the substrate by melting a material of the substrate proximate to the defect. In an example, the defect is surrounded and covered by the matrix of laser burn spots. The matrix of laser burn spots can attenuate or block light from passing through the defect, such as the pinhole. The matrix of laser burn spots may repair the defect of the photomask without removing a pellicle and pellicle frame mounted on the photomask.
    Type: Grant
    Filed: May 7, 2012
    Date of Patent: April 22, 2014
    Assignee: Taiwan Semiconductor Manufacturing Company, Ltd.
    Inventors: Kun-Lung Hsieh, Chung-Hung Lin, Min-An Yang, Chih Wei Wen, Wu Hung Ko
  • Publication number: 20130295494
    Abstract: A method for repairing a defect, such as a pinhole, on a photomask is described. In an example, a laser beam is used to form a matrix of laser burn spots in a substrate of the photomask proximate a defect, such as a pinhole, of the photomask. Each laser burn spot is formed at a focal point of the laser beam inside the substrate by melting a material of the substrate proximate to the defect. In an example, the defect is surrounded and covered by the matrix of laser burn spots. The matrix of laser burn spots can attenuate or block light from passing through the defect, such as the pinhole. The matrix of laser burn spots may repair the defect of the photomask without removing a pellicle and pellicle frame mounted on the photomask.
    Type: Application
    Filed: May 7, 2012
    Publication date: November 7, 2013
    Applicant: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.
    Inventors: Kun-Lung Hsieh, Chung-Hung Lin, Min-An Yang, Chih Wei Wen, Wu Hung Ko
  • Publication number: 20120136061
    Abstract: A carotenoid and a terpenoid in therapeutically-effective amounts is disclosed such that, upon ingestion in one preparation, or in two separated preparations, simultaneous or sequentially, and upon metabolism, the activity of natural killer (NK) cells is elevated. Specifically, the composition comprises lycopene and resveratrol in the range of 1:10 to 10:1 by molar; more preferably 1:1 to 3:1 by molar, and most preferably at 3:1. Alternatively, the preferred ratio may be expressed as 1:4 to 25:1 by weight; more preferably 2½:1 to 7½:1 by weight, and most preferably at 7½:1. The composition may be formulated for oral intake as a pharmaceutical, dietary supplement or food product and provided in therapeutically effective amounts to a mammal, preferably in a dosage of about 3.5 mg per day per 20 g of a mammalian body mass in a ratio of 2½:1 by weight, which can be translated to about 400 mg to 1000 mg per day for a typical human in need of elevating NK cell activity.
    Type: Application
    Filed: April 13, 2010
    Publication date: May 31, 2012
    Applicant: HSIEHS BIOTECH (SINGAPORE) PTE LTD
    Inventor: Kun Lung Hsieh
  • Publication number: 20120121699
    Abstract: A dietary supplement is disclosed comprising lycopene and resveratrol in a range of ratio of lycopene:resveratrol from 1:10 to 10:1. Preferably, the ratio is 1:2 to 1:4. Lycopene is preferably of ?95% purity and resveratrol is of ?98% purity. Both lycopene and resveratrol may preferably comprise of nano-sized particles in crystal powder to optimize oral intake in the form of capsule or tablet. In small dosage, it should preferably include a minimum of 5 mg of lycopene and 10 mg of resveratrol. Various range of ratios of lycopene:resveratrol are provided for specific therapeutic purposes including 1:4 for symptomatic relief of arthritis, 1:2 for inhibiting melanoma or carcinoma malignancy, and 1:3 for inhibiting hyperlipoidemia. Generally, our dietary supplement composition may be used as an agent for anti-ageing, anti-oxidative, inhibiting cardiovascular diseases, relieving menopause symptoms and remission of post-operative cancer patients.
    Type: Application
    Filed: August 27, 2009
    Publication date: May 17, 2012
    Applicant: HSIEHS BIOTECH (SINGAPORE) PTE LTD
    Inventor: Kun Lung Hsieh