Abstract: An apparatus for removing a pellicle frame from a photomask includes a heater, a shower head, and a gripper. The heater is configured to soften a portion of an adhesive between the pellicle frame and the photomask. The shower head facing to the heater and configured to provide a flow from a patterned area of the photomask toward the pellicle frame and the adhesive. The gripper is configured to secure the pellicle frame against the flow and to remove the adhesive and the pellicle frame from the photomask. A method of removing a pellicle frame from a photomask includes providing a flow from a pattern area of the photomask toward the pellicle frame and an adhesive; securing the pellicle frame in a force-transmitting manner against the flow; soften at least a portion of the adhesive; and leveraging the pellicle frame to remove the adhesive and the pellicle frame.

Abstract: A flexible display device includes a base film, a display panel on the base film, a protective film on a surface of the display panel away from the base film, and an adhesive layer. An area of the base film is substantially identical to that of the display panel. An area of the protective film is less than that of the display panel. The adhesive layer is located on the surface of the display panel away from the base film. The adhesive layer and the protective film include an overlapping portion. The adhesive layer has a thickness and Young's modulus between 10 and 500 ?m and between 0.1 and 10 GPa, respectively. A side edge of the base film, a side edge of the display panel, and a side edge of the adhesive layer are substantially aligned. A manufacturing method of a flexible display device is also provided.

Abstract: A display, including a supporting layer and a flexible display panel, is provided. The supporting layer has at least two extending sections and at least one bending section, connected therebetween and adapted to be bent along an axis as a rotation axis. The supporting layer has at least one groove at the bending section and at least one indentation at a bottom surface of the groove. An extending direction of the groove is parallel to the axis. An extending direction of the indentation is not parallel to the axis. The supporting layer has a first thickness at each extending section, a second thickness at the groove, and a third thickness at the indentation. The first, second, and third thicknesses are different from one another. The flexible display is disposed on the supporting layer. The groove and the flexible display are respectively located on two opposite sides of the supporting layer.

Abstract: An apparatus for removing a pellicle frame from a photomask includes a shower head and a gripper. The shower head is configured to provide an air curtain between the pellicle frame and a patterned area of the photomask. The gripper is configured to secure the pellicle frame from a direction against the flow blown from the air curtain. The flow is substantially directed toward a periphery of the photomask. A method of removing a pellicle frame from a photomask includes providing an air curtain between the pellicle frame and a patterned area of the photomask, and generating a temperature difference between the photomask and the pellicle frame. The flow of the air curtain is substantially directed toward a periphery of the photomask. The temperature of the photomask is higher than the temperature of the pellicle frame.

Abstract: In a method of cleaning a photomask, a wiper tape is guided from a wiper tape supplying reel, over a cleaning head, and then onto a wiper tape collecting reel. A section of the wiper tape over the cleaning head is brought into contact with an adhesive residue on a surface of the photomask. A relative movement is caused between the photomask and the section of the wiper tape to remove the adhesive residue from the surface of the photomask.

Abstract: A method for mitigating writing performance variation comprises the steps of receiving a request, determining whether status of a SSD is normal or constrained, fulfilling the request if the status is normal, inserting the request in a queue if the status is constrained, monitoring a first request in the queue and calculating expected time of waiting, determining whether elapsed time of the first request is shorter than the expected time of waiting, waiting for some time before returning to the step of monitoring the first request and calculating the expected time of waiting if the elapsed time is shorter than the expected time of waiting, fulfilling and removing the first request from the queue if the elapsed time is not shorter than the expected time of waiting, determining whether the queue is empty, returning to the step of waiting if the queue is not empty.

Abstract: In a method of cleaning a photomask, a wiper tape is guided from a wiper tape supplying reel, over a cleaning head, and then onto a wiper tape collecting reel. A section of the wiper tape over the cleaning head is brought into contact with an adhesive residue on a surface of the photomask. A relative movement is caused between the photomask and the section of the wiper tape to remove the adhesive residue from the surface of the photomask.

Abstract: A data storage apparatus includes a cache memory module and a NAND flash memory module including a cache memory mirror and a user data storage zone. The cache memory module is connected to the cache memory mirror via a path and electrically connected to the user data storage zone via another path. The cache memory module receives a write command that includes user data from a host, writes a copy of the user data into the user data storage zone in a write-back mode, and writes another copy of the user data cache memory mirror in a write-through mode. If some of the user data are lost from the cache memory module before they are written into the user data storage zone, the user data written in the cache memory mirror are copied and written into the cache memory module when the data storage apparatus is initiated again.

Abstract: An apparatus for removing a pellicle frame from a photomask includes a shower head and a gripper. The shower head is configured to provide an air curtain between the pellicle frame and a patterned area of the photomask. The gripper is configured to secure the pellicle frame from a direction against the flow blown from the air curtain. The flow is substantially directed toward a periphery of the photomask. A method of removing a pellicle frame from a photomask includes providing an air curtain between the pellicle frame and a patterned area of the photomask, and generating a temperature difference between the photomask and the pellicle frame. The flow of the air curtain is substantially directed toward a periphery of the photomask. The temperature of the photomask is higher than the temperature of the pellicle frame.

Abstract: A method of testing a photomask assembly is disclosed. The method includes placing a photomask assembly into a chamber. The photomask assembly includes a pellicle attached to a first side of a photomask. The method further includes exposing the photomask assembly to a radiation source in the chamber. The exposing of the photomask assembly includes illuminating an entirety of an area of the photomask covered by the pellicle throughout an entire illumination time.

Abstract: A data storage apparatus includes a cache memory module and a NAND flash memory module including a cache memory mirror and a user data storage zone. The cache memory module is connected to the cache memory mirror via a path and electrically connected to the user data storage zone via another path. The cache memory module receives a write command that includes user data from a host, writes a copy of the user data into the user data storage zone in a write-back mode, and writes another copy of the user data cache memory mirror in a write-through mode. If some of the user data are lost from the cache memory module before they are written into the user data storage zone, the user data written in the cache memory mirror are copied and written into the cache memory module when the data storage apparatus is initiated again.

Abstract: A method of removing a pellicle from a photomask includes removing a portion of a membrane from a pellicle frame, wherein the pellicle frame remains attached to the photomask following the removing of the portion of the membrane. The method further includes removing the pellicle frame from the photomask. The method further includes cleaning the photomask.

Abstract: In a method of cleaning a photomask, a wiper tape is guided from a wiper tape supplying reel, over a cleaning head, and then onto a wiper tape collecting reel. A section of the wiper tape over the cleaning head is brought into contact with an adhesive residue on a surface of the photomask. A relative movement is caused between the photomask and the section of the wiper tape to remove the adhesive residue from the surface of the photomask.

Abstract: In a method of cleaning a photomask, a wiper tape is guided from a wiper tape supplying reel, over a cleaning head, and then onto a wiper tape collecting reel. A section of the wiper tape over the cleaning head is brought into contact with an adhesive residue on a surface of the photomask. A relative movement is caused between the photomask and the section of the wiper tape to remove the adhesive residue from the surface of the photomask.

Abstract: Lithography mask repair methods are disclosed. In one embodiment, a method of repairing a lithography mask includes providing a lithography mask, exposing a back side of the lithography mask to vacuum ultraviolet (VUV) energy, and cleaning the lithography mask.

Abstract: A jet spray nozzle for cleaning a photolithographic mask or semiconductor wafer and method for cleaning the same. The jet spray nozzle in one embodiment includes a water supply inlet, a gas supply inlet, a first row of gas injection nozzles communicating with the gas supply inlet, a mixing cavity defining a jet spray nozzle outlet, and a flow mixing baffle disposed in the cavity. The mixing baffle preferably is configured and arranged to combine gas and water in the jet spray nozzle for delivering a concentrated stream of gas with a cluster of micro water droplets entrained in the gas for removing contaminant particles from the mask. The jet spray nozzle is capable of cleaning photo masks or wafers without the use of chemicals. In one embodiment, the water may be deionized water and the gas may be nitrogen. In another embodiment, the jet spray nozzle further includes a second row of gas injection nozzles spaced above or below the first row of gas injection nozzles that communicate with the gas supply inlet.

Abstract: A dietary supplement is disclosed comprising lycopene and resveratrol in a range of ratio of lycopene:resveratrol from 1:10 to 10:1. Preferably, the ratio is 1:2 to 1:4. Lycopene is preferably of ?95% purity and resveratrol is of ?98% purity. Both lycopene and resveratrol may preferably comprise of nano-sized particles in crystal powder to optimize oral intake in the form of capsule or tablet. In small dosage, it should preferably include a minimum of 5 mg of lycopene and 10 mg of resveratrol. Various range of ratios of lycopene:resveratrol are provided for specific therapeutic purposes including 1:4 for symptomatic relief of arthritis, 1:2 for inhibiting melanoma or carcinoma malignancy, and 1:3 for inhibiting hyperlipoidemia. Generally, our dietary supplement composition may be used as an agent for anti-ageing, anti-oxidative, inhibiting cardiovascular diseases, relieving menopause symptoms and remission of post-operative cancer patients.

Abstract: In a method of cleaning a photomask, a wiper tape is guided from a wiper tape supplying reel, over a cleaning head, and then onto a wiper tape collecting reel. A section of the wiper tape over the cleaning head is brought into contact with an adhesive residue on a surface of the photomask. A relative movement is caused between the photomask and the section of the wiper tape to remove the adhesive residue from the surface of the photomask.

Abstract: A dietary supplement is disclosed comprising lycopene and resveratrol in a range of ratio of lycopene:resveratrol from 1:10 to 10:1. Preferably, the ratio is 1:2 to 1:4. Lycopene is preferably of ?95% purity and resveratrol is of ?98% purity. Both lycopene and resveratrol may preferably comprise of nano-sized particles in crystal powder to optimize oral intake in the form of capsule or tablet. In small dosage, it should preferably include a minimum of 5 mg of lycopene and 10 mg of resveratrol. Various range of ratios of lycopene:resveratrol are provided for specific therapeutic purposes including 1:4 for symptomatic relief of arthritis, 1:2 for inhibiting melanoma or carcinoma malignancy, and 1:3 for inhibiting hyperlipoidemia. Generally, our dietary supplement composition may be used as an agent for anti-ageing, anti-oxidative, inhibiting cardiovascular diseases, relieving menopause symptoms and remission of post-operative cancer patients.

Abstract: A jet spray nozzle for cleaning a photolithographic mask or semiconductor wafer and method for cleaning the same. The jet spray nozzle in one embodiment includes a water supply inlet, a gas supply inlet, a first row of gas injection nozzles communicating with the gas supply inlet, a mixing cavity defining a jet spray nozzle outlet, and a flow mixing baffle disposed in the cavity. The mixing baffle preferably is configured and arranged to combine gas and water in the jet spray nozzle for delivering a concentrated stream of gas with a cluster of micro water droplets entrained in the gas for removing contaminant particles from the mask. The jet spray nozzle is capable of cleaning photo masks or wafers without the use of chemicals. In one embodiment, the water may be deionized water and the gas may be nitrogen. In another embodiment, the jet spray nozzle further includes a second row of gas injection nozzles spaced above or below the first row of gas injection nozzles that communicate with the gas supply inlet.