Patents by Inventor Kun Lung Hsieh
Kun Lung Hsieh has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Publication number: 20200278810Abstract: A method for mitigating writing performance variation comprises the steps of receiving a request, determining whether status of a SSD is normal or constrained, fulfilling the request if the status is normal, inserting the request in a queue if the status is constrained, monitoring a first request in the queue and calculating expected time of waiting, determining whether elapsed time of the first request is shorter than the expected time of waiting, waiting for some time before returning to the step of monitoring the first request and calculating the expected time of waiting if the elapsed time is shorter than the expected time of waiting, fulfilling and removing the first request from the queue if the elapsed time is not shorter than the expected time of waiting, determining whether the queue is empty, returning to the step of waiting if the queue is not empty.Type: ApplicationFiled: March 1, 2019Publication date: September 3, 2020Inventors: Po-Chien Chang, Yen-Lan Hsu, Kun-Lung Hsieh
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Patent number: 10747105Abstract: In a method of cleaning a photomask, a wiper tape is guided from a wiper tape supplying reel, over a cleaning head, and then onto a wiper tape collecting reel. A section of the wiper tape over the cleaning head is brought into contact with an adhesive residue on a surface of the photomask. A relative movement is caused between the photomask and the section of the wiper tape to remove the adhesive residue from the surface of the photomask.Type: GrantFiled: December 29, 2017Date of Patent: August 18, 2020Assignee: Taiwan Semiconductor Manufacturing Company, Ltd.Inventors: Yi-Hsun Pan, Kun-Lung Hsieh
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Patent number: 10671313Abstract: A data storage apparatus includes a cache memory module and a NAND flash memory module including a cache memory mirror and a user data storage zone. The cache memory module is connected to the cache memory mirror via a path and electrically connected to the user data storage zone via another path. The cache memory module receives a write command that includes user data from a host, writes a copy of the user data into the user data storage zone in a write-back mode, and writes another copy of the user data cache memory mirror in a write-through mode. If some of the user data are lost from the cache memory module before they are written into the user data storage zone, the user data written in the cache memory mirror are copied and written into the cache memory module when the data storage apparatus is initiated again.Type: GrantFiled: January 23, 2018Date of Patent: June 2, 2020Assignee: GOKE US RESEARCH LABORATORYInventors: Kun-Lung Hsieh, Bo-Shian Hsu, Po-Chien Chang
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Publication number: 20200073231Abstract: An apparatus for removing a pellicle frame from a photomask includes a shower head and a gripper. The shower head is configured to provide an air curtain between the pellicle frame and a patterned area of the photomask. The gripper is configured to secure the pellicle frame from a direction against the flow blown from the air curtain. The flow is substantially directed toward a periphery of the photomask. A method of removing a pellicle frame from a photomask includes providing an air curtain between the pellicle frame and a patterned area of the photomask, and generating a temperature difference between the photomask and the pellicle frame. The flow of the air curtain is substantially directed toward a periphery of the photomask. The temperature of the photomask is higher than the temperature of the pellicle frame.Type: ApplicationFiled: August 28, 2018Publication date: March 5, 2020Inventors: Wei Cheng HUANG, Kun-Lung HSIEH
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Publication number: 20190258155Abstract: A method of testing a photomask assembly is disclosed. The method includes placing a photomask assembly into a chamber. The photomask assembly includes a pellicle attached to a first side of a photomask. The method further includes exposing the photomask assembly to a radiation source in the chamber. The exposing of the photomask assembly includes illuminating an entirety of an area of the photomask covered by the pellicle throughout an entire illumination time.Type: ApplicationFiled: February 22, 2018Publication date: August 22, 2019Inventors: Wu-Hung KO, Chih-Wei WEN, Kun-Lung HSIEH
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Publication number: 20190227708Abstract: A data storage apparatus includes a cache memory module and a NAND flash memory module including a cache memory mirror and a user data storage zone. The cache memory module is connected to the cache memory mirror via a path and electrically connected to the user data storage zone via another path. The cache memory module receives a write command that includes user data from a host, writes a copy of the user data into the user data storage zone in a write-back mode, and writes another copy of the user data cache memory mirror in a write-through mode. If some of the user data are lost from the cache memory module before they are written into the user data storage zone, the user data written in the cache memory mirror are copied and written into the cache memory module when the data storage apparatus is initiated again.Type: ApplicationFiled: January 23, 2018Publication date: July 25, 2019Inventors: Kun-Lung Hsieh, Bo-Shian Hsu, Po-Chien Chang
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Publication number: 20190094683Abstract: A method of removing a pellicle from a photomask includes removing a portion of a membrane from a pellicle frame, wherein the pellicle frame remains attached to the photomask following the removing of the portion of the membrane. The method further includes removing the pellicle frame from the photomask. The method further includes cleaning the photomask.Type: ApplicationFiled: October 31, 2017Publication date: March 28, 2019Inventors: Chue San YOO, Chih-Chiang TU, Chien-Cheng CHEN, Jong-Yuh CHANG, Kun-Lung HSIEH, Pei-Cheng HSU, Hsin-Chang LEE, Yun-Yue LIN
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Publication number: 20180129132Abstract: In a method of cleaning a photomask, a wiper tape is guided from a wiper tape supplying reel, over a cleaning head, and then onto a wiper tape collecting reel. A section of the wiper tape over the cleaning head is brought into contact with an adhesive residue on a surface of the photomask. A relative movement is caused between the photomask and the section of the wiper tape to remove the adhesive residue from the surface of the photomask.Type: ApplicationFiled: December 29, 2017Publication date: May 10, 2018Inventors: Yi-Hsun Pan, Kun-Lung Hsieh
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Patent number: 9857680Abstract: In a method of cleaning a photomask, a wiper tape is guided from a wiper tape supplying reel, over a cleaning head, and then onto a wiper tape collecting reel. A section of the wiper tape over the cleaning head is brought into contact with an adhesive residue on a surface of the photomask. A relative movement is caused between the photomask and the section of the wiper tape to remove the adhesive residue from the surface of the photomask.Type: GrantFiled: January 14, 2014Date of Patent: January 2, 2018Assignee: Taiwan Semiconductor Manufacturing Company, Ltd.Inventors: Yi Hsun Pan, Kun-Lung Hsieh
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Patent number: 9726990Abstract: Lithography mask repair methods are disclosed. In one embodiment, a method of repairing a lithography mask includes providing a lithography mask, exposing a back side of the lithography mask to vacuum ultraviolet (VUV) energy, and cleaning the lithography mask.Type: GrantFiled: March 1, 2013Date of Patent: August 8, 2017Assignee: Taiwan Semiconductor Manufacturing Company, Ltd.Inventors: Wu Hung Ko, Kun-Lung Hsieh
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Patent number: 9656278Abstract: A jet spray nozzle for cleaning a photolithographic mask or semiconductor wafer and method for cleaning the same. The jet spray nozzle in one embodiment includes a water supply inlet, a gas supply inlet, a first row of gas injection nozzles communicating with the gas supply inlet, a mixing cavity defining a jet spray nozzle outlet, and a flow mixing baffle disposed in the cavity. The mixing baffle preferably is configured and arranged to combine gas and water in the jet spray nozzle for delivering a concentrated stream of gas with a cluster of micro water droplets entrained in the gas for removing contaminant particles from the mask. The jet spray nozzle is capable of cleaning photo masks or wafers without the use of chemicals. In one embodiment, the water may be deionized water and the gas may be nitrogen. In another embodiment, the jet spray nozzle further includes a second row of gas injection nozzles spaced above or below the first row of gas injection nozzles that communicate with the gas supply inlet.Type: GrantFiled: May 15, 2014Date of Patent: May 23, 2017Assignee: Taiwan Semiconductor Manufacturing Co., Ltd.Inventors: Kun-Lung Hsieh, Chien-Hsing Lu
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Patent number: 9610255Abstract: A dietary supplement is disclosed comprising lycopene and resveratrol in a range of ratio of lycopene:resveratrol from 1:10 to 10:1. Preferably, the ratio is 1:2 to 1:4. Lycopene is preferably of ?95% purity and resveratrol is of ?98% purity. Both lycopene and resveratrol may preferably comprise of nano-sized particles in crystal powder to optimize oral intake in the form of capsule or tablet. In small dosage, it should preferably include a minimum of 5 mg of lycopene and 10 mg of resveratrol. Various range of ratios of lycopene:resveratrol are provided for specific therapeutic purposes including 1:4 for symptomatic relief of arthritis, 1:2 for inhibiting melanoma or carcinoma malignancy, and 1:3 for inhibiting hyperlipoidemia. Generally, our dietary supplement composition may be used as an agent for anti-ageing, anti-oxidative, inhibiting cardiovascular diseases, relieving menopause symptoms and remission of post-operative cancer patients.Type: GrantFiled: November 7, 2014Date of Patent: April 4, 2017Assignee: HSIEHS BIOTECH (SINGAPORE) PTE LTDInventor: Kun Lung Hsieh
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Publication number: 20150198875Abstract: In a method of cleaning a photomask, a wiper tape is guided from a wiper tape supplying reel, over a cleaning head, and then onto a wiper tape collecting reel. A section of the wiper tape over the cleaning head is brought into contact with an adhesive residue on a surface of the photomask. A relative movement is caused between the photomask and the section of the wiper tape to remove the adhesive residue from the surface of the photomask.Type: ApplicationFiled: January 14, 2014Publication date: July 16, 2015Applicant: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.Inventors: Yi Hsun PAN, Kun-Lung HSIEH
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Publication number: 20150132373Abstract: A dietary supplement is disclosed comprising lycopene and resveratrol in a range of ratio of lycopene:resveratrol from 1:10 to 10:1. Preferably, the ratio is 1:2 to 1:4. Lycopene is preferably of ?95% purity and resveratrol is of ?98% purity. Both lycopene and resveratrol may preferably comprise of nano-sized particles in crystal powder to optimize oral intake in the form of capsule or tablet. In small dosage, it should preferably include a minimum of 5 mg of lycopene and 10 mg of resveratrol. Various range of ratios of lycopene:resveratrol are provided for specific therapeutic purposes including 1:4 for symptomatic relief of arthritis, 1:2 for inhibiting melanoma or carcinoma malignancy, and 1:3 for inhibiting hyperlipoidemia. Generally, our dietary supplement composition may be used as an agent for anti-ageing, anti-oxidative, inhibiting cardiovascular diseases, relieving menopause symptoms and remission of post-operative cancer patients.Type: ApplicationFiled: November 7, 2014Publication date: May 14, 2015Inventor: Kun Lung HSIEH
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Publication number: 20140291416Abstract: A jet spray nozzle for cleaning a photolithographic mask or semiconductor wafer and method for cleaning the same. The jet spray nozzle in one embodiment includes a water supply inlet, a gas supply inlet, a first row of gas injection nozzles communicating with the gas supply inlet, a mixing cavity defining a jet spray nozzle outlet, and a flow mixing baffle disposed in the cavity. The mixing baffle preferably is configured and arranged to combine gas and water in the jet spray nozzle for delivering a concentrated stream of gas with a cluster of micro water droplets entrained in the gas for removing contaminant particles from the mask. The jet spray nozzle is capable of cleaning photo masks or wafers without the use of chemicals. In one embodiment, the water may be deionized water and the gas may be nitrogen. In another embodiment, the jet spray nozzle further includes a second row of gas injection nozzles spaced above or below the first row of gas injection nozzles that communicate with the gas supply inlet.Type: ApplicationFiled: May 15, 2014Publication date: October 2, 2014Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.Inventors: Kun-Lung HSIEH, Chien-Hsing LU
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Patent number: 8802732Abstract: A carotenoid and a terpenoid in therapeutically-effective amounts is disclosed such that, upon ingestion in one preparation, or in two separated preparations, simultaneous or sequentially, and upon metabolism, the activity of natural killer (NK) cells is elevated. Specifically, the composition comprises lycopene and resveratrol in the range of 1:10 to 10:1 by molar; more preferably 1:1 to 3:1 by molar, and most preferably at 3:1. Alternatively, the preferred ratio may be expressed as 1:4 to 25:1 by weight; more preferably 2½:1 to 7½:1 by weight, and most preferably at 7½:1. The composition may be formulated for oral intake as a pharmaceutical, dietary supplement or food product and provided in therapeutically effective amounts to a mammal, preferably in a dosage of about 3.5 mg per day per 20 g of a mammalian body mass in a ratio of 2½:1 by weight, which can be translated to about 400 mg to 1000 mg per day for a typical human in need of elevating NK cell activity.Type: GrantFiled: April 13, 2010Date of Patent: August 12, 2014Assignee: Hsiehs Biotech (Singapore) Pte LtdInventor: Kun Lung Hsieh
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Patent number: 8703364Abstract: A method for repairing a defect, such as a pinhole, on a photomask is described. In an example, a laser beam is used to form a matrix of laser burn spots in a substrate of the photomask proximate a defect, such as a pinhole, of the photomask. Each laser burn spot is formed at a focal point of the laser beam inside the substrate by melting a material of the substrate proximate to the defect. In an example, the defect is surrounded and covered by the matrix of laser burn spots. The matrix of laser burn spots can attenuate or block light from passing through the defect, such as the pinhole. The matrix of laser burn spots may repair the defect of the photomask without removing a pellicle and pellicle frame mounted on the photomask.Type: GrantFiled: May 7, 2012Date of Patent: April 22, 2014Assignee: Taiwan Semiconductor Manufacturing Company, Ltd.Inventors: Kun-Lung Hsieh, Chung-Hung Lin, Min-An Yang, Chih Wei Wen, Wu Hung Ko
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Publication number: 20130295494Abstract: A method for repairing a defect, such as a pinhole, on a photomask is described. In an example, a laser beam is used to form a matrix of laser burn spots in a substrate of the photomask proximate a defect, such as a pinhole, of the photomask. Each laser burn spot is formed at a focal point of the laser beam inside the substrate by melting a material of the substrate proximate to the defect. In an example, the defect is surrounded and covered by the matrix of laser burn spots. The matrix of laser burn spots can attenuate or block light from passing through the defect, such as the pinhole. The matrix of laser burn spots may repair the defect of the photomask without removing a pellicle and pellicle frame mounted on the photomask.Type: ApplicationFiled: May 7, 2012Publication date: November 7, 2013Applicant: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.Inventors: Kun-Lung Hsieh, Chung-Hung Lin, Min-An Yang, Chih Wei Wen, Wu Hung Ko
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Publication number: 20120136061Abstract: A carotenoid and a terpenoid in therapeutically-effective amounts is disclosed such that, upon ingestion in one preparation, or in two separated preparations, simultaneous or sequentially, and upon metabolism, the activity of natural killer (NK) cells is elevated. Specifically, the composition comprises lycopene and resveratrol in the range of 1:10 to 10:1 by molar; more preferably 1:1 to 3:1 by molar, and most preferably at 3:1. Alternatively, the preferred ratio may be expressed as 1:4 to 25:1 by weight; more preferably 2½:1 to 7½:1 by weight, and most preferably at 7½:1. The composition may be formulated for oral intake as a pharmaceutical, dietary supplement or food product and provided in therapeutically effective amounts to a mammal, preferably in a dosage of about 3.5 mg per day per 20 g of a mammalian body mass in a ratio of 2½:1 by weight, which can be translated to about 400 mg to 1000 mg per day for a typical human in need of elevating NK cell activity.Type: ApplicationFiled: April 13, 2010Publication date: May 31, 2012Applicant: HSIEHS BIOTECH (SINGAPORE) PTE LTDInventor: Kun Lung Hsieh
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Publication number: 20120121699Abstract: A dietary supplement is disclosed comprising lycopene and resveratrol in a range of ratio of lycopene:resveratrol from 1:10 to 10:1. Preferably, the ratio is 1:2 to 1:4. Lycopene is preferably of ?95% purity and resveratrol is of ?98% purity. Both lycopene and resveratrol may preferably comprise of nano-sized particles in crystal powder to optimize oral intake in the form of capsule or tablet. In small dosage, it should preferably include a minimum of 5 mg of lycopene and 10 mg of resveratrol. Various range of ratios of lycopene:resveratrol are provided for specific therapeutic purposes including 1:4 for symptomatic relief of arthritis, 1:2 for inhibiting melanoma or carcinoma malignancy, and 1:3 for inhibiting hyperlipoidemia. Generally, our dietary supplement composition may be used as an agent for anti-ageing, anti-oxidative, inhibiting cardiovascular diseases, relieving menopause symptoms and remission of post-operative cancer patients.Type: ApplicationFiled: August 27, 2009Publication date: May 17, 2012Applicant: HSIEHS BIOTECH (SINGAPORE) PTE LTDInventor: Kun Lung Hsieh