Patents by Inventor Kunihiro Ichimura
Kunihiro Ichimura has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 8119323Abstract: A process for producing a film pattern, in which a layer of photosensitive resin composition is formed on a substrate and exposed selectively through a mask to light to thereby obtain a film pattern provided on its surface with protrusions and depressions without the need to remove the layer of photosensitive resin composition at unexposed regions or exposed regions by, for example, development; and a photosensitive resin composition for use in the above process for producing a film pattern.Type: GrantFiled: October 19, 2006Date of Patent: February 21, 2012Assignee: Sekisui Chemical Co., Ltd.Inventors: Hiroji Fukui, Kenichi Aoki, Kunihiro Ichimura, Minoru Suezaki, Toshio Enami, Hideaki Ishizawa, Takao Unate, Hiroshi Kobayashi
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Patent number: 7767381Abstract: This invention relates to a photosensitive composition characterized by comprising components A, B and C, and a photosensitive film and a stencil for screen printing using the photosensitive composition; Component A: a poly(vinyl alcohol) polymer represented by formula (1) or (2) wherein R1 represents a hydrogen atom, an alkyl or aralkyl group having 1 to 10 carbon atoms, wherein the alkyl and aralkyl groups may be substituted by a hydroxyl or carbamoyl group and the bond between carbon atoms thereof may be present through an oxygen atom or an unsaturated bond; R2 represents a hydrogen atom or an alkyl group having 1 to 3 carbon atoms; m is an integer of 1 to 6; n is 0 or 1; and X? represents a halogen ion, a phosphate ion, a methosulfate ion, or a sulfonate ion, or a mixture of the anions; component B: a radical polymerizable monomer containing at least one ethylenically unsaturated bond and possesses an anion dissociating capability; and component C: a radical photoinitiator.Type: GrantFiled: May 17, 2006Date of Patent: August 3, 2010Assignee: Murakami Co., Ltd.Inventors: Kunihiro Ichimura, Junichi Kawanobe, Chieko Hotta, Eri Nagabuchi
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Patent number: 7736708Abstract: The present invention relates to a micropattern retardation element requiring no stretch processing and no extremely high positioning accuracy in cutting films, and the like, and having the retardation region controlled in width of a micron unit, and a producing method therefore. Said micropattern retardation element can be obtained by forming a liquid crystalline or non liquid crystalline polymer thin film layer having photoactive groups, on a substrate, and then, after orientation treatment in a micropattern form, forming a birefringence layer so as to contact with said polymer thin film layer, so that birefringence molecules of said birefringence layer are oriented according to orientation of photoactive groups in said thin film. Said retardation element is used in a three-dimensional display, and the like.Type: GrantFiled: March 29, 2005Date of Patent: June 15, 2010Assignees: National Institute Of Advanced Industrial Science and Technology, Nippon Kayaku Kabushiki KaishaInventors: Daisaku Matsunaga, Masanori Hashimoto, Christian Ruslim, Takashi Tamaki, Kunihiro Ichimura
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Patent number: 7714162Abstract: To provide such a base multiplying agent capable of being used for crosslinking reaction, for example of a epoxy compound and the like, that generates another base by action of a base, and can efficiently perform base multiplying reaction, and a base-reactive curable composition using the base multiplying agent. The base generating agent of the invention is represented by the following formula (1): (In the formula (1), X represents a hydrogen atom, a substituted alkyl group or an unsubstituted alkyl group; Y represents a substituted or unsubstituted alkylene chain; and n represents an integer of from 1 to 4.Type: GrantFiled: March 6, 2006Date of Patent: May 11, 2010Assignee: Sekisui Chemical Co., Ltd.Inventors: Kenichi Aoki, Kunihiro Ichimura, Motoi Nagano, Hiroji Fukui
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Publication number: 20090202942Abstract: A process for producing a film pattern, in which a layer of photosensitive resin composition is formed on a substrate and exposed selectively through a mask to light to thereby obtain a film pattern provided on its surface with protrusions and depressions without the need to remove the layer of photosensitive resin composition at unexposed regions or exposed regions by, for example, development; and a photosensitive resin composition for use in the above process for producing a film pattern.Type: ApplicationFiled: October 19, 2006Publication date: August 13, 2009Inventors: Hiroji Fukui, Kenichi Aoki, Kunihiro Ichimura, Minoru Suezaki, Toshio Enami, Hideaki Ishizawa, Takao Unate, Hiroshi Kobayashi
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Publication number: 20090099275Abstract: This invention relates to a photosensitive composition characterized by comprising components A, B and C, and a photosensitive film and a stencil for screen printing using the photosensitive composition; Component A: a poly(vinyl alcohol) polymer represented by formula (1) or (2) wherein R1 represents a hydrogen atom, an alkyl or aralkyl group having 1 to 10 carbon atoms, wherein the alkyl and aralkyl groups may be substituted by a hydroxyl or carbamoyl group and the bond between carbon atoms thereof may be present through an oxygen atom or an unsaturated bond; R2 represents a hydrogen atom or an alkyl group having 1 to 3 carbon atoms; m is an integer of 1 to 6; n is 0 or 1; and X? represents a halogen ion, a phosphate ion, a methosulfate ion, or a sulfonate ion, or a mixture of the anions; component B: a radical polymerizable monomer containing at least one ethylenically unsaturated bond and possesses an anion dissociating capability; and component C: a radical photoinitiator.Type: ApplicationFiled: May 17, 2006Publication date: April 16, 2009Applicant: MURAKAMI CO., LTD.Inventors: Kunihiro Ichimura, Junichi Kawanobe, Chieko Hotta, Eri Nagabuchi
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Publication number: 20080200580Abstract: To provide such a base multiplying agent capable of being used for crosslinking reaction, for example of a epoxy compound and the like, that generates another base by action of a base, and can efficiently perform base multiplying reaction, and a base-reactive curable composition using the base multiplying agent. The base generating agent of the invention is represented by the following formula (1): (In the formula (1), X represents a hydrogen atom, a substituted alkyl group or an unsubstituted alkyl group; Y represents a substituted or unsubstituted alkylene chain; and n represents an integer of from 1 to 4.Type: ApplicationFiled: March 6, 2006Publication date: August 21, 2008Applicant: SEKISUI CHEMICAL CO., LTDInventors: Kenichi Aoki, Kunihiro Ichimura, Motoi Nagano, Hiroji Fukui
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Patent number: 7157025Abstract: The transparent coloring composition comprises a solvent and an organic-inorganic composite pigment comprising (i) fine white inorganic particles and an organic pigment adhered to the surface of the respective fine white inorganic particles, or (ii) fine white inorganic particles, a surface modifier coated on the surface of the respective fine white inorganic particles and an organic pigment adhered onto the surface modifier coating layer, primary particles of the composite pigment having an average particle diameter of 1 to 100 nm. The transparent coloring composition for color filter comprises the above transparent coloring composition and a transparent resin containing at least one acid group and/or latent acid group. The color filter is produced by applying a film-forming material made of the above transparent coloring composition for color filter on a substrate.Type: GrantFiled: March 25, 2004Date of Patent: January 2, 2007Assignee: Toda Kogyo CorporationInventors: Kunihiro Ichimura, Kazuyuki Hayashi, Hiroko Morii
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Publication number: 20050227166Abstract: An activation energy ray-sensitive composition permitting development with neutral water. Provided is an activation energy ray-sensitive composition characterized by comprising a dispersion which comprises an aqueous solution of a water-soluble resin, and an acid former dispersed in the aqueous solution in the form of fine powder, the acid former being insoluble or sparingly soluble in water and generating an acid by the action of activation energy rays, and an acid-reactive insolubilizing agent dissolved or dispersed in the dispersion and insolubilizing the water-soluble resin by the action of the acid.Type: ApplicationFiled: July 4, 2003Publication date: October 13, 2005Inventors: Kunihiro Ichimura, Tomoyuki Morita, Junichi Kawanobe, Daisaku Adachi, Kazuo Inoue
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Publication number: 20050148690Abstract: A coloring composition added to a solid such as a solid resin is disclosed. The composition includes (i) a soluble coloring agent precursor obtained by substituting a hydrogen atom of a NH group of a pigment molecule having at least one NH group with an alkoxycarbonyl group of the following general formula (1): wherein R represents a tert-butyl group, a tert-amyl group, a 2-phenyl-2-propyl group or a diphenylmethyl group, (ii) an acid proliferation agent newly generating an acid by an action of an acid, and (iii) an acid former generating an acid by the action of activation energy rays or heat.Type: ApplicationFiled: March 2, 2005Publication date: July 7, 2005Inventors: Kunihiro Ichimura, Koji Arimitsu, Masaru Tahara, Eiichi Kurita
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Publication number: 20040235985Abstract: The transparent coloring composition comprises a solvent and an organic-inorganic composite pigment comprising (i) fine white inorganic particles and an organic pigment adhered to the surface of the respective fine white inorganic particles, or (ii) fine white inorganic particles, a surface modifier coated on the surface of the respective fine white inorganic particles and an organic pigment adhered onto the surface modifier coating layer, primary particles of the composite pigment having an average particle diameter of 1 to 100 nm. The transparent coloring composition for color filter comprises the above transparent coloring composition and a transparent resin containing at least one acid group and/or latent acid group. The color filter is produced by applying a film-forming material made of the above transparent coloring composition for color filter on a substrate.Type: ApplicationFiled: March 25, 2004Publication date: November 25, 2004Applicant: Toda Kogyo CorporationInventors: Kunihiro Ichimura, Kazuyuki Hayashi, Hiroko Morii
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Patent number: 6696218Abstract: A chemical amplification type positive resist composition that enables a resist pattern free from deformation in a side wall thereof and excellent in evenness and is excellent in sensitivity as well as resolution is provided and the chemical amplification type positive resist composition comprises a resin which has a polymerization unit derived from p-hydroxystyrene and a polymerization unit having a group unstable against acid, and is insoluble or hardly soluble in an alkaline medium itself but becoming alkaline-soluble after the acid-unstable group being cleaved by the action of the generated acid; an acid generating agent; and a compound represented by the following formula (I): wherein R1 and R2 each independently represents an alkyl group having 1 to 15 carbon atoms, an alkyl group having 1 to 8 carbon atoms wherein at least 3 hydrogen atoms are substituted by fluorine atoms, or an aryl group having 6 to 10 carbon atoms.Type: GrantFiled: March 28, 2002Date of Patent: February 24, 2004Assignees: Sumitomo Chemical Company, LimitedInventors: Kunihiro Ichimura, Tsugio Okudaira, Masumi Suetsugu, Yasunori Uetani, Katsuhiko Namba
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Patent number: 6541185Abstract: A polarized element formed by arranging a dichroic molecule in a micropattern form on a thin film layer of a liquid crystalline resin having a photoactive group irradiated by a linearly polarized light. The micropattern polarized element can be produced without need of a very high position-matching precision as sticking.Type: GrantFiled: September 20, 2000Date of Patent: April 1, 2003Assignees: Japan Chemical Innovation Institute, Agency of Industrial Science and TechnologyInventors: Daisaku Matsunaga, Kunihiro Ichimura, Takashi Tamaki
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Publication number: 20030013038Abstract: A chemical amplification type positive resist composition that enables a resist pattern free from deformation in a side wall thereof and excellent in evenness and is excellent in sensitivity as well as resolution is provided and the chemical amplification type positive resist composition comprises a resin which has a polymerization unit derived from p-hydroxystyrene and a polymerization unit having a group unstable against acid, and is insoluble or hardly soluble in an alkaline medium itself but becoming alkaline-soluble after the acid-unstable group being cleaved by the action of the generated acid; an acid generating agent; and a compound represented by the following formula (I): 1Type: ApplicationFiled: March 28, 2002Publication date: January 16, 2003Inventors: Kunihiro Ichimura, Tsugio Okudaira, Masumi Suetsugu, Yasunori Uetani, Katsuhiko Namba
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Publication number: 20020123005Abstract: A coloring composition added to a solid such as a solid resin is disclosed.Type: ApplicationFiled: April 4, 2002Publication date: September 5, 2002Inventors: Kunihiro Ichimura, Koji Arimitsu, Masaru Tahara, Eiichi Kurita
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Patent number: 6001277Abstract: Related to a liquid-crystal alignment film that can align liquid-crystal molecules without resort to the rubbing.The liquid-crystal alignment film of the present invention comprises a resin (e.g., a polyimide) containing a photoisomerizable and dichroic structural unit (e.g., a stilbene derivative), and is furnished with the ability to align liquid-crystal molecules when a film formed of the resin is irradiated with linearly polarized light; the ability to align liquid-crystal molecules being held and fixed.The liquid-crystal alignment film of the present invention is used in electric-filed driven type liquid-crystal display devices.Type: GrantFiled: July 16, 1998Date of Patent: December 14, 1999Assignee: Hitachi Chemical Company, Ltd.Inventors: Kunihiro Ichimura, Nobuo Miyadera, Yasuo Miyadera, Yutaka Honda, Iwao Fukuchi, Naoto Ohta, Perminder Singh Johar
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Patent number: 5706131Abstract: A polarizing element or polarizing plate comprising a layer having photoactive molecules and a layer containing dichroic molecules formed in contact with said layer, which can easily be produced without a stretching procedure so as to have a complicated pattern, a curved surface or a large area; and a process for producing said polarizing element or polarizing plate which is characterized by irradiating a layer having photoactive molecules on a substrate with linear polarized light, and then forming a dichroic molecular layer on the irradiated layer.Type: GrantFiled: April 28, 1995Date of Patent: January 6, 1998Assignee: Nippon Kayaku Kabushiki KaishaInventors: Kunihiro Ichimura, Norio Ishizuki, Junji Toda
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Patent number: 5688998Abstract: The disclosure describes a surface reforming agent comprising a cone-type calix ?4! resorcinarene compound represented by the formula (I): ##STR1## wherein R is an alkyl group having 3 to 18 carbon atoms, an alkenyl group having 3 to 18 carbon atoms, an aralkyl group having 3 to 18 carbon atoms or a substituted or non-substituted aryl group; R.sup.1 is a hydrogen atom, a carboxyalkyl group in which the alkyl group has 1 to 3 carbon atoms, or a hydroxyalkyl group having 2 to 4 carbon atoms.Type: GrantFiled: March 10, 1995Date of Patent: November 18, 1997Assignee: Toda Kogyo CorporationInventors: Kunihiro Ichimura, Eiichi Kurita, Masahide Ueda
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Patent number: 5296321Abstract: A photorecording element consists essentially of a transparent substrate, a layer of a macromolecular compound capable of undergoing a reversible change in structure upon exposure to light, deposited by adsorption on the transparent substrate, and a liquid crystal layer disposed directly on the layer of macromolecular compound. A method for the production of the photorecording element comprises applying on a transparent substrate a mixture of a liquid crystal substance with a macromolecular compound capable of undergoing a reversible change in structure upon exposure to light and allowing the applied layer of the mixture to stand at rest or by first applying the macromolecular compound on the transparent substrate and then adding the liquid crystal substance thereto. A liquid crystal cell incorporating the photorecording element is also disclosed.Type: GrantFiled: December 29, 1992Date of Patent: March 22, 1994Assignees: Agency of Industrial Science & Technology, Ministry of International Trade & IndustryInventors: Yuji Kawanishi, Kunihiro Ichimura, Takashi Tamaki, Takahiro Seki, Mitsuhiro Ikeda
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Patent number: 5246815Abstract: A photosensitive material for screen processing comprising a photosensitive resin composition (A) applied to a plastic film, and including a water-soluble or water-dispersible polymer or copolymer, an unsaturated compound, and a photopolymerization initiator, and a photosensitive resin composition (B) applied in a thickness of at least 0.1 .mu.m to the coated composition (A) and including a film-forming polymeric compound; and a photo-crosslinking polyvinyl alcohol partially containing photo-cross-linkable units provides a coating film which is water-developable, highly sensitive, and excellent in water and solvent resistances.Type: GrantFiled: May 20, 1992Date of Patent: September 21, 1993Assignees: Gen. Director of the Agency of Industrial Science & Technology, Daicel Chemical Industries, Ltd.Inventors: Kunihiro Ichimura, Keiji Kubo