Patents by Inventor Kunihiro Ichimura

Kunihiro Ichimura has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 5051362
    Abstract: Enzyme-occluding polymer particles are produced by a method including the steps of dissolving an enzyme in an aqueous solution of poly(vinyl alcohol) possessing a styrylpyridinium group or a styrylquinolinium group, spray drying the aqueous solution, and exposing the resultant dry particles to an actinic ray, thereby photo-crosslinking the particles.
    Type: Grant
    Filed: March 13, 1989
    Date of Patent: September 24, 1991
    Assignee: Agency of Industrial Science & Technology Ministry of International Trade & Industry
    Inventors: Tetsuro Suehiro, deceased, Kunihiro Ichimura
  • Patent number: 5021505
    Abstract: A photosensitive poly(vinyl alcohol) derivative comprising units of the fula ##STR1## wherein R.sub.1 is alkylene, R.sub.2 is hydrogen or a lower alkoxy, ##STR2## is a quaternary aromatic nitrogen-containing heterocycle, X.sup.- is SO.sub.3.sup.- or CO.sub.2.sup.-, m is 0 or 1, and n is an integer of 1 to 6 capable of being developed with an aqueous developing solution.
    Type: Grant
    Filed: December 1, 1989
    Date of Patent: June 4, 1991
    Assignees: Director General of the Agency of Industrial Science and Technology, Toyo Gosei Kogyo Co., Ltd.
    Inventors: Kunihiro Ichimura, Noriaki Tochizawa, Hideo Kikuchi
  • Patent number: 4963448
    Abstract: A photorecording element is disclosed which consists of a transparent substrate, a molecular layer of an organic compound with an ability to change structure reversibly by virtue of light and disposed in direct contact with the transparent substrate, and a layer of liquid crystals disposed in direct contact with the molecular layer. A liquid crystal cell comprising the photorecording element is also disclosed. A modification having fine deformations on the surface of the transparent substrate and a modification having a dichroic dye contained in the layer of liquid crystals are embraced by the present invention.
    Type: Grant
    Filed: August 31, 1988
    Date of Patent: October 16, 1990
    Assignees: Agency of Industrial Science & Technology, Ministry of International Trade & Industry
    Inventors: Kunihiro Ichimura, Yasuzo Suzuki, Takahiro Seki, Masako Sakuragi, Takashi Tamaki, Akira Hosoki, Koso Aoki
  • Patent number: 4925770
    Abstract: The invention provides a novel contrast-enhancing agent for photolithography which is used as an overcoating on a positive-working photoresist layer for enhancing the contrast of the photoresist in a low-contrast exposure to light. The composition comprises, in addition to a watersoluble polymer, e.g., poly(vinyl alcohol), poly(vinyl pyrroilidone) and pullulan, as the binder, a specific photo-bleachable organic compound having, in a molecule, at least one nitrogen-containing heterocyclic aromatic structure represented by the general formula ##STR1## in which Z is a divalent group to form the heterocyclic aromatic ring with the nitrogen atom, X is an anionic group of monovalency and n is a positive integer of, e.g., 1 or 2.
    Type: Grant
    Filed: December 14, 1988
    Date of Patent: May 15, 1990
    Assignees: Director General of Agency of Industrial Science and Technology, Toyo Gosei Kogyo Co., Ltd.
    Inventors: Kunihiro Ichimura, Teruhiko Yonezawa, Hideo Kikuchi, Nariaki Tochizawa, Keiichi Hayashi
  • Patent number: 4920030
    Abstract: A photosensitive coating emulsion for a plastic film comprising an emulsion ontaining a film-forming polymer and a photocrosslinkable polyvinyl alochol containing a photocrosslinkable constituent unit, which further comprises (1) an aliphatic alcohol having eight carbon atoms as an anti-foaming agent, or (2) a dispersion medium of the emulsion composed of 95 to 50% by weight of water and 5 to 50% by weight of at least one lower aliphatic alcohol selected from the group consisting of methyl, ethyl, n-propyl and i-propyl alcohols, or (3) an acetylenic glycol or alcohol as an anti-foaming agent. These emulsions can give a coating film free from unevenness in coating.
    Type: Grant
    Filed: January 19, 1989
    Date of Patent: April 24, 1990
    Assignees: General Director of the Agency of Industrial Science and Technology, Daicel Chemical Industries, Ltd.
    Inventors: Kunihiro Ichimura, Keiji Kubo
  • Patent number: 4891300
    Abstract: A photosensitive resin composition comprising a photosensitive saponified poly(vinyl acetate) derivative containing in the backbone thereof at least one of a first group of photosensitive units which are represented by the general formula (I) ##STR1## wherein represents a vinyl alcohol residue in the backbone of the saponified poly(vinyl acetate) derivative; Y represents a member selected from the group consisting of the following general formulae (II) and (III) ##STR2## m denotes an integer of 1-6; n denotes 0 or 1; R.sub.1 represents a member selected from a hydrogen atom, an unsubstituted alkyl and an unsubstituted aralkyl group, a hydroxyl group, a carbamoyl group, an ether bond and an unsaturated bond; R.sub.2 represents a member selected from a hydrogen atom and a lower alkyl group; and X.sup.
    Type: Grant
    Filed: September 23, 1987
    Date of Patent: January 2, 1990
    Assignees: Director-General of Agency of Industrial Science & Technology Ministry of International Trade and Industry, Oji Kako Co., Ltd.
    Inventors: Kunihiro Ichimura, Hiroshi Itoh, Shuuichi Nakazato, Hideaki Takazawa
  • Patent number: 4777114
    Abstract: A photosensitive resin emulsion composition comprising an aqueous emulsion of a film-forming resin and a protective colloid for said emulsion, wherein the protective colloid comprises at least one photosensitive saponified polyvinyl acetate derivative which is at least partially grafted onto the film-forming resin, and the photosensitive saponified polyvinyl acetate derivative comprises a backbone formed of saponified polyvinyl acetate and at least one photosensitive unit and at least one hydrophobic unit bonded to the backbone.
    Type: Grant
    Filed: September 18, 1987
    Date of Patent: October 11, 1988
    Assignees: Agency of Industrial Science and Technology, Oji Paper Company, Ltd.
    Inventors: Kunihiro Ichimura, Masataka Ito, Masahiro Yamana, Hiroshi Ito
  • Patent number: 4742164
    Abstract: A molding material having high dynamic strength which contains bacterial cellulose having ribbon-shaped microfibrils.Such material is advantageously used as a reinforcing material for composite plastics having high strength, as high quality paper or as acoustic diaphragms for percussion instruments.
    Type: Grant
    Filed: April 16, 1986
    Date of Patent: May 3, 1988
    Assignees: Agency of Industrial Science and Technology, Sony Corporation, Ajinomoto Co., Inc.
    Inventors: Masatoshi Iguchi, Shigenobu Mitsuhashi, Kunihiro Ichimura, Yoshio Nishi, Masaru Uryu, Shigeru Yamanaka, Kunihiko Watanabe
  • Patent number: 4678844
    Abstract: A novel chelate resin is produced by causing a 2-hydroxybenzoic acid derivative to react upon a high molecular compound, i.e. a cross-linked polyethyleneimine or a cross-linked polyethyleneimine derivative, thereby linking a 2-hydroxybenzoyl group to the nitrogen atom in the imine chain of the high molecular compound. This chelate resin is capable of collecting, by adsorption and at high efficiency, such a metal as uranium dissolved in a trace amount in water.
    Type: Grant
    Filed: February 24, 1986
    Date of Patent: July 7, 1987
    Assignees: Agency of Industrial Science & Technology, Ministry of International Trade & Industry
    Inventors: Masako Sakuragi, Kunihiro Ichimura
  • Patent number: 4564580
    Abstract: Disclosed is a photosensitive resin composition comprising an aqueous dispersion or emulsion comprising components (1), (3) and (4) as indispensable components and optionally the following component (2):(1) a water-soluble saponified vinyl acetate polymer to which a styrylpyridinium or styrylquinolinium group has been added;(2) a water-dispersible or hydrophobic polymer;(3) a photo-polymerizable unsaturated compound having an ethylenically unsaturated group; and(4) a photo-polymerization initiator.This composition has excellent dispersion stability, sensitivity and resolving power and produces a hardened product having good solvent resistance, water resistance and abrasion resistance.
    Type: Grant
    Filed: June 26, 1984
    Date of Patent: January 14, 1986
    Assignees: Kogyo Gijutsuin, Murakami Screen Kabushiki Kaisha
    Inventors: Kunihiro Ichimura, Tsuguo Yamaoka, Sadayoshi Kaneda, Toru Shibuya
  • Patent number: 4444868
    Abstract: A photosensitive composition, comprising a photo-insolubilizable resin having a styryl type nitrogen-containing heterocyclic residue and an acid and a photosensitive high molecular compound, having high sensitivity for an extremely small photosensitive group content.
    Type: Grant
    Filed: August 3, 1982
    Date of Patent: April 24, 1984
    Assignees: Agency of Industrial Science & Technology, Ministry of International Trade & Industry
    Inventor: Kunihiro Ichimura
  • Patent number: 4350833
    Abstract: Terephthaldialdehyde monoacetals represented by the general formula: ##STR1## (wherein, R.sub.1 and R.sub.2 are lower alkyl groups) are novel compounds, and they are produced by the reaction of terephthaldialdehyde with alcohols in the presence of a strongly acidic substance as a catalyst.
    Type: Grant
    Filed: January 28, 1981
    Date of Patent: September 21, 1982
    Inventor: Kunihiro Ichimura
  • Patent number: 4339524
    Abstract: A partially saponified polyvinyl acetate having at least one stilbazolium group-containing photosensitive unit represented by the following general formula: ##STR1## (wherein R.sub.1 is hydrogen atom, an unsubstituted or substituted alkyl group, an alkenyl group or an aralkyl group, R.sub.2 is hydrogen atom or an unsubstituted or substituted alkyl group, Y is a conjugated base of an inorganic or organic acid, m is an integer of 1 to 6, and n is 0 or 1) and an acetal unit represented by the following general formula: ##STR2## (wherein R.sub.3 is hydrogen atom or an alkyl group); the acetal units being contained therein in an amount of approximately 0.5 to 10.0 mol % with respect to mole of the polyvinylalcohol units thereof; the stilbazolium group-containing units being contained therein in an amount of approximately 0.5 to 5.
    Type: Grant
    Filed: April 14, 1981
    Date of Patent: July 13, 1982
    Assignees: Agency of Industrial Science & Technology Ministry of International Trade and Industry, Sony Corporation, Oji Paper Co., Ltd.
    Inventors: Kunihiro Ichimura, Osamu Takeuchi, Hideo Kusama, Kazuo Yamazaki, Akira Saka, Hiroshi Ito, Kunitaka Toyofuku
  • Patent number: 4287335
    Abstract: A novel compound represented by the general formula: ##STR1## [wherein, A is one member selected from the group consisting of ##STR2## (where R.sub.2 and R.sub.3 are each an alkyl group and R.sub.4 is an alkylene group), Y is one member selected from the group consisting of ##STR3## (where R.sub.1 is one member selected from the class consisting of alkyl group, aryl group and aralkyl group)] is obtained by causing a compound of the general formula: ##STR4## (wherein, A and n have the same meaning as described above) to react with a compound of the general formula:Y--CH.sub.3(wherein, Y has the same meaning as described above).
    Type: Grant
    Filed: June 25, 1980
    Date of Patent: September 1, 1981
    Assignees: Agency of Industrial Science & Technology, Ministry of International Trade & Industry
    Inventor: Kunihiro Ichimura
  • Patent number: 4272620
    Abstract: A hydrophilic resin comprising a polyvinyl alcohol polymeric backbone and containing styrylpyridinium groups is a photosensitive resin. The photosensitive resin is prepared by reacting a styrylpyridinium salt containing a formyl or acetal group with a polyvinyl alcohol compound.
    Type: Grant
    Filed: July 31, 1979
    Date of Patent: June 9, 1981
    Assignees: Agency of Industrial Science and Technology, Ministry of International Trade & Industry
    Inventor: Kunihiro Ichimura
  • Patent number: 4269941
    Abstract: Enzymes are immobilized by dissolving in water a photo-crosslinking resin containing stilbazolium groups, vinyl alcohol units and vinyl acetate units, adding an enzyme to the resultant aqueous solution and exposing the enzyme-containing resin solution to light to induce a crosslinking reaction of the photo-crosslinking resin and produce a polymer containing the enzyme entrapped therein.
    Type: Grant
    Filed: July 31, 1979
    Date of Patent: May 26, 1981
    Assignees: Agency of Industrial Science and Technology, Ministry of International Trade & Industry
    Inventor: Kunihiro Ichimura