Patents by Inventor Kunio Fujiwara
Kunio Fujiwara has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 8216417Abstract: A substrate treating apparatus for performing a predetermined treatment of substrates with a treating liquid. The apparatus includes a treating tank for storing the treating liquid; a lifter having holding elements for holding the substrates, and vertically movable between a standby position above the treating tank and a treating position inside the treating tank; lower nozzles arranged on opposite sides at a bottom of the treating tank for supplying the treating liquid; upper nozzles arranged above the lower nozzles for supplying the treating liquid toward the holding elements of the lifter; and a control device for controlling a flow ratio of the treating liquid between the upper nozzles and the lower nozzles according to the treatment.Type: GrantFiled: March 24, 2009Date of Patent: July 10, 2012Assignee: Dainippon Screen Mfg. Co., Ltd.Inventors: Kunio Fujiwara, Junichi Yoshida
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Publication number: 20090242517Abstract: A substrate treating apparatus for performing a predetermined treatment of substrates with a treating liquid. The apparatus includes a treating tank for storing the treating liquid; a lifter having holding elements for holding the substrates, and vertically movable between a standby position above the treating tank and a treating position inside the treating tank; lower nozzles arranged on opposite sides at a bottom of the treating tank for supplying the treating liquid; upper nozzles arranged above the lower nozzles for supplying the treating liquid toward the holding elements of the lifter; and a control device for controlling a flow ratio of the treating liquid between the upper nozzles and the lower nozzles according to the treatment.Type: ApplicationFiled: March 24, 2009Publication date: October 1, 2009Inventors: Kunio Fujiwara, Junichi Yoshida
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Publication number: 20090239384Abstract: A discharge hole of a lower nozzle is directed at an angle of 5 degrees to 40 degrees slanting inward with respect to a normal to the upper surface of a bottom plate. Thus, the flow pressure of a processing solution discharged through the discharge hole is not excessively reduced. Further, a circulation area of the processing solution does not expand widely in an inner bath. As a result, the processing solution in the inner bath is effectively displaced while the processing solution smoothly flows into gaps between substrates.Type: ApplicationFiled: February 12, 2009Publication date: September 24, 2009Inventors: Kunio Fujiwara, Akihiro Hosokawa, Kozo Terashima, Atsushi Osawa
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Patent number: 7291312Abstract: An object of the present invention is to solve problems of conventional ozone-scavenging materials and to provide an ozone-scavenging material capable of effectively decomposing/removing ozone at low cost. To attain the above object, the present invention provides an ozone-scavenging material characterized in that a metal having ozone-decomposing ability or an oxide thereof is supported on an organic polymer base having a polymer side chain having an ion exchange group on the backbone of a polymer. Said ozone-scavenging material can be prepared by introducing a polymer side chain having an ion exchange group onto the backbone of an organic polymer base, bringing the resulting organic polymer material into contact with a salt of a metal having ozone-decomposing ability to support the ion of said metal on the ion exchange group, and then precipitating fine particles of said metal or an oxide of said metal on the organic polymer material by oxidation or reduction.Type: GrantFiled: July 17, 2001Date of Patent: November 6, 2007Assignee: Ebara CorporationInventors: Seiji Iimura, Kazuyoshi Takeda, Kunio Fujiwara, Mari Katsumine
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Publication number: 20070007196Abstract: It is the purpose of the present invention to provide filter cartridges which can suitably be utilized in purifying chemical fluids for treating the surface of an electronic device substrate to be used in the semiconductor industry, particularly fluids containing a basic compound such as ammonia and an ammonium salt, or hydrofluoric acid (HF). The filter cartridges relating to the present invention which are used in removing metallic impurities contained in a chemical fluid for treating the surface of an electronic device substrate by treating the chemical fluid, is characterized by having a filter material incorporated therein, into which functional groups compatible with the existing morphology of the metallic impurities to be removed are incorporated in compliance with the constituents of the chemical fluid to be treated and the types of the metallic impurities to be removed.Type: ApplicationFiled: April 28, 2004Publication date: January 11, 2007Applicant: EBARA CORPORATIONInventors: Makoto Komatsu, Kunio Fujiwara, Yukio Hashimoto
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Publication number: 20050218068Abstract: The present invention has an object to provide a filter cartridge for purifying a chemical which can efficiently remove metal ions and impurities in the form of fine particles in a liquid to be filtered. The present invention provides, as the means to achieve the above described object, a filter cartridge comprising a fiber membrane material obtained by introducing ion exchange groups and/or chelate groups into an organic polymer fiber membrane base material having an average fiber diameter of 0.1 ?m to 20 ?m and an average pore size of 1 ?m to 20 ?m or a filter cartridge. And also present invention provides, as the means to achieve the above described object, comprising a bi-layered or laminated structure of filter membranes prepared from fiber membrane material obtained by introducing ion exchange groups and/or chelate groups into an organic polymer fiber membrane base material and a micro porous membrane material.Type: ApplicationFiled: February 27, 2003Publication date: October 6, 2005Inventors: Makoto Komatsu, Kunio Fujiwara, Kazuyoshi Takeda, Yukio Hashimoto, Eriko Usui, Mutsuhiro Amari
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Patent number: 6852233Abstract: An object of the present invention is to provide a structure of a metal collecting material for use in seawater or river water or industrial wastewater to give the most excellent adsorption efficiency. Another object of the present invention is to provide a process for efficiently separating and recovering valuable metals or noxious metals from a metal collecting material having collected said valuable metals from seawater or noxious metals from river water or wastewater with the least possible waste generation. A metal collector according to an aspect of the present invention is formed by stacking at least partially alternate layers of a fibrous metal collecting material with a spacer for introducing a liquid to be treated into said collecting material, wherein the area of spacer side faces represents 25-75% of the total area of collecting material side faces and spacer side faces in the side faces of the stack.Type: GrantFiled: April 25, 2000Date of Patent: February 8, 2005Assignee: Ebara CorporationInventors: Takanobu Sugo, Akio Katakai, Noriaki Seko, Shin Hasegawa, Kunio Fujiwara, Hiroshi Nagai, Hideo Kawazu, Kazuyoshi Takeda, Satoshi Konishi, Hideyuki Misawa, Takashi Kawakami, Junichi Kanno, Keiji Hasegawa, Masaji Akahori
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Patent number: 6852802Abstract: An object of the present invention is to provide a heavy metal ion scavenger having more excellent scavenging performance than previously. In order to attain this object, organic polymer materials of the present invention are characterized in that they have a polymer side chain derived from a haloalkyl-substituted styrene on the backbone of an organic polymer base and a functional group capable of forming a complex with a heavy metal ion has been introduced onto said polymer side chain. These organic polymer materials have excellent heavy metal ion scavenging performance so that they can be suitably used as heavy metal ion scavengers.Type: GrantFiled: October 20, 2000Date of Patent: February 8, 2005Assignee: Ebara CorporationInventors: Makoto Komatsu, Kazuyoshi Takeda, Kunio Fujiwara, Takeshi Takai
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Patent number: 6844371Abstract: An object of the present invention is to provide a separation functional material having more excellent adsorptive separation performance than previously. In order to attain this object, separation functional materials of the present invention are characterized in that they are formed by introducing a polymer side chain derived from a p-haloalkylstyrene onto the backbone of an organic polymer base and introducing a functional group onto the polymer side chain.Type: GrantFiled: October 20, 2000Date of Patent: January 18, 2005Assignee: Ebara CorporationInventors: Makoto Komatsu, Kazuyoshi Takeda, Kunio Fujiwara, Takeshi Takai
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Publication number: 20040256237Abstract: There is provided an electrolytic processing apparatus and method which, while omitting a CMP treatment entirely or reducing a load upon a CMP treatment to the least possible extent, can process a conductive material formed in the surface of a substrate to flatten the material, or can remove (clean) extraneous matter adhering to the surface of a workpiece such as a substrate. The electrolytic processing apparatus includes: a pair of electrodes disposed at a given distance; an ion exchange disposed between the pair of electrodes; and a liquid supply section for supplying a liquid between the pair of electrodes. The electrolytic processing method includes: providing an electrode section having, a pair of electrodes disposed at a given distance with an ion exchanger being interposed: and bringing the electrode into contact with or close to a workpiece while supplying a fluid to the ion exchanger, thereby processing the surface of the workpiece.Type: ApplicationFiled: August 9, 2004Publication date: December 23, 2004Inventors: Itsuki Kobata, Mitsuhiko Shirakashi, Masayuki Kumekawa, Takayuki Saito, Yasushi Toma, Tsukuru Suzuki, Kaoru Yamada, Yuji Makita, Hozumi Yasuda, Ikutaro Noji, Kunio Fujiwara, Osamu Nabeya
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Publication number: 20040238350Abstract: The present invention provides ion exchangers for an electrical deionization apparatus that can be operated at low voltages by preventing voltage buildup in the electrical deionization apparatus, and an electrical deionization apparatus incorporating said ion exchangers. The present invention provides an ion exchanger for an electrical deionization apparatus, which is to be used as an ion exchanger placed in at least one of a deionization compartment and/or concentration compartment and, which at least partially has a plurality of different functional groups, or which has a graft chain having an ion exchange group on the backbone of an organic polymer substrate and further has a second graft chain on said graft chain, or which has a crosslinked graft chain having an ion exchange group on the backbone of an organic polymer substrate.Type: ApplicationFiled: January 27, 2004Publication date: December 2, 2004Inventors: Yohei Takahashi, Kunio Fujiwara, Takayoshi Kawamoto, Syu Nakanishi, Toru Akiyama
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Patent number: 6818038Abstract: A radiation graft treated material in the form of a woven or non-woven fabric material that is composed of polymer monofilament fiber of which only the surface has undergone a radiation-induced graft polymerization but of which the center remains unaffected by grafting.Type: GrantFiled: December 4, 2002Date of Patent: November 16, 2004Assignee: Ebara CorporationInventors: Takanobu Sugo, Kunio Fujiwara, Hideo Kawazu, Teruo Masubuchi, Junichi Kanno, Naotoshi Endo, Masaji Akahori
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Patent number: 6811771Abstract: An object of the present invention is to provide a filter material capable of killing microorganisms, bacteria, fungi or viruses in air or liquids. Antimicrobial organic polymer materials of the present invention comprise an organic polymer material having a polymer side chain containing a unit derived from an N-alkyl-N-vinylalkylamide on a backbone of a polymer substrate, wherein triiodide ion is carried on said organic polymer material.Type: GrantFiled: January 30, 2002Date of Patent: November 2, 2004Assignees: Ebara Corporation, Japan Atomic Energy Research InstituteInventors: Takanobu Sugo, Kazuyoshi Takeda, Kunio Fujiwara, Tadashi Adachi, Hideo Kawazu, Makoto Komatsu, Junichi Kanno, Takeshi Takai
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Publication number: 20040188258Abstract: The object of the present invention is to provide an electrical deionization apparatus capable of long-term operation at a low voltage. To achieve this object, the present invention is directed to an electrical deionization apparatus based on a completely new compartment configuration and provides an electrical deionization apparatus comprising multiple compartments separated by cation- and anion-exchange membranes arranged between anode and cathode, wherein the anion-exchange membrane on the anode side and the cation-exchange membrane on the cathode side together define a water splitting compartment, and wherein an anion deionization compartment defined between anion-exchange membranes is placed on the anode side of the water splitting compartment, and a cation deionization compartment defined between cation-exchange membranes is placed on the cathode side of the water splitting compartment.Type: ApplicationFiled: January 21, 2004Publication date: September 30, 2004Inventors: Yohei Takahashi, Kunio Fujiwara, Takayoshi Kawamoto, Syu Nakanishi, Toru Akiyama, Masaji Akahori, Jun Aoyama
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Patent number: 6773654Abstract: A method for performing radiation-inducted graft polymerization on substrates in the form of webs of woven or non-woven fabric, which includes the steps of exposing a substrate woven or non-woven fabric composed of polymer fiber to electron beams in a nitrogen atmosphere, contacting the irradiated substrate with a specified amount of monomer in a nitrogen atmosphere, and subjecting the monomer and the substrate in mutual contact to graft polymerization in a nitrogen atmosphere, characterized in that the first through third steps are performed in succession.Type: GrantFiled: December 4, 2002Date of Patent: August 10, 2004Assignee: Ebara CoporationInventors: Takanobu Sugo, Kunio Fujiwara, Hideo Kawazu, Teruo Masubuchi, Junichi Kanno, Naotoshi Endo, Masaji Akahori
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Publication number: 20040087677Abstract: The present invention aims to provide a graft polymerization method that can be applied to even organic polymer substrates having relatively low strength while overcoming the problem of inhomogeneous grafting.Type: ApplicationFiled: December 10, 2003Publication date: May 6, 2004Inventors: Takanobu Sugo, Noriaki Seko, Kunio Fujiwara
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Patent number: 6703432Abstract: An object of the present invention is to provide a water adsorbing/desorbing organic polymer material having excellent water adsorbing/desorbing performance and which is inexpensive and readily disposable by incineration or the like. In order to attain this object, water adsorbing/desorbing organic polymer materials of the present invention are characterized by having a polymer side chain containing a hydrophilic group on the backbone of an organic polymer base.Type: GrantFiled: August 7, 2002Date of Patent: March 9, 2004Assignee: Ebara CorporationInventors: Kunio Fujiwara, Kazuyoshi Takeda, Hiroshi Yokota, Hidenobu Arimitsu
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Publication number: 20040028575Abstract: An object of the present invention is to solve problems of conventional ozone-scavenging materials and to provide an ozone-scavenging material capable of effectively decomposing/removing ozone at low cost. To attain the above object, the present invention provides an ozone-scavenging material characterized in that a metal having ozone-decomposing ability or an oxide thereof is supported on an organic polymer base having a polymer side chain having an ion exchange group on the backbone of a polymer. Said ozone-scavenging material can be prepared by introducing a polymer side chain having an ion exchange group onto the backbone of an organic polymer base, bringing the resulting organic polymer material into contact with a salt of a metal having ozone-decomposing ability to support the ion of said metal on the ion exchange group, and then precipitating fine particles of said metal or an oxide of said metal on the organic polymer material by oxidation or reduction.Type: ApplicationFiled: January 21, 2003Publication date: February 12, 2004Inventors: Seiji Iimura, Kazuyoshi Takeda, Kunio Fujiwara, Mari Katsumine
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Patent number: 6659751Abstract: A polymer substrate for radiation-induced graft polymerization in the form of a woven or non-woven fabric that comprises a woven or non-woven fabric composed of polymer fiber and a reinforcement polymer having a greater strength and a slower rate of radiation-induced graft polymerization than said polymer fiber. Also, radiation graft treated stock prepared from said polymer substrate. In another aspect, a radiation graft treated material in the form of a woven or non-woven fabric material that is composed of polymer monofilament fiber of which only the surface has undergone a radiation-induced graft polymerization but of which the center remains unaffected by grafting.Type: GrantFiled: February 9, 2001Date of Patent: December 9, 2003Assignee: Ebara CorporationInventors: Takanobu Sugo, Kunio Fujiwara, Hideo Kawazu, Teruo Masubuchi, Junichi Kanno, Naotoshi Endo, Masaji Akahori
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Publication number: 20030153225Abstract: A radiation graft treated material in the form of a woven or non-woven fabric material that is composed of polymer monofilament fiber of which only the surface has undergone a radiation-induced graft polymerization but of which the center remains unaffected by grafting.Type: ApplicationFiled: December 4, 2002Publication date: August 14, 2003Applicant: EBARA CORPORATIONInventors: Takanobu Sugo, Kunio Fujiwara, Hideo Kawazu, Teruo Masubuchi, Junichi Kanno, Naotoshi Endo, Masaji Akahori