Patents by Inventor Kunio Fujiwara

Kunio Fujiwara has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 4123483
    Abstract: A method of manufacturing an O-ring type optical waveguide wherein a layer of fused silica is formed on the smooth cylindrical surface of an elongated member of fused silica and thereafter a thin layer of doped fused silica having an index of refraction greater than that of said fused silica is formed over said layer of fused silica. A second layer of fused silica is then formed over the layer of doped fused silica and the composite structure is heated to its drawing temperatures and drawn to reduce the cross sectioned area thereof to form an optical waveguide having a cylindrical layer of higher refractive index interposed between a core and an outer cylindrical layer of lesser refractive index.
    Type: Grant
    Filed: October 12, 1973
    Date of Patent: October 31, 1978
    Assignee: Sumitomo Electric Industries, Ltd.
    Inventors: Tsuneo Nakahara, Masao Hoshikawa, Satoshi Shiraishi, Shiro Kurosaki, Kunio Fujiwara
  • Patent number: 4088388
    Abstract: An O-type optical waveguide comprising a rod of fused silica having formed thereon a layer of doped fused silica having an index of refraction which is greater than that of the rod, and an outside layer of fused silica over the layer of doped fused silica. The surfaces between of doped silica, having the higher refractive index, and the low adjacent layers between which it lies are extremely smooth and clean or free from foreign particles thereby preventing scattering loss due to the inclusion of foreign particles.
    Type: Grant
    Filed: July 26, 1976
    Date of Patent: May 9, 1978
    Assignee: Sumitomo Electric Industries, Ltd.
    Inventors: Tsuneo Nakahara, Masao Hoshikawa, Satoshi Shiraishi, Shiro Kurosaki, Kunio Fujiwara
  • Patent number: 4082420
    Abstract: A process for producing an optical transmission fiber is provided which comprises feeding highly pure halides, hydrides or organic compounds of Si and B by way of carrier gas on the outer surface of a fused silica rod or a fused silica pipe, or inner surface of a fused silica pipe, oxidizing them and depositing the products to form a pure fused silica layer or a doped fused silica layer containing B.sub.2 O.sub.3, melting the pipe and the deposited layer followed by a spinning. The SiO.sub.2 layer can alternatively contain fluorine instead of B.sub.2 O.sub.3. A further SiO.sub.2 layer can be deposited thereon to improve the spinning processability and lower the index of refraction of the B.sub.2 O.sub.3 containing layer.
    Type: Grant
    Filed: January 14, 1976
    Date of Patent: April 4, 1978
    Assignee: Sumitomo Electric Industries, Ltd.
    Inventors: Satoshi Shiraishi, Kunio Fujiwara, Shiro Kurosaki