Patents by Inventor Kuo H. Wu

Kuo H. Wu has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20110084365
    Abstract: A through silicon via architecture for integrated circuits is provided. The integrated circuit (IC) includes a substrate with a top surface and a bottom surface with circuitry formed on the top surface, a plurality of bonding pads formed along a periphery of the bottom surface, and a backside metal layer (BML) formed on the bottom surface and electrically coupled to a second subset of bonding pads in the plurality of bonding pads. A first subset of bonding pads in the plurality of bonding pads is electrically coupled to circuitry on the top surface with through silicon vias (TSV). The BML distributes electrical signals provided by the second subset of bonding pads.
    Type: Application
    Filed: July 16, 2010
    Publication date: April 14, 2011
    Applicant: Taiwan Semiconductor Manufacturing Company, Ltd.
    Inventors: Oscar M.K. Law, Kuo H. Wu, Wei-Chih Yeh
  • Publication number: 20110001249
    Abstract: An integrated circuit structure includes a chip including a substrate and a power distribution network. The power distribution network includes a plurality of power through-silicon vias (TSVs) penetrating the substrate, wherein the plurality of power TSVs forms a grid; and a plurality of metal lines in a bottom metallization layer (M1), wherein the plurality of metal lines couples the plurality of power TSVs to integrated circuit devices on the substrate.
    Type: Application
    Filed: April 28, 2010
    Publication date: January 6, 2011
    Applicant: Taiwan Semiconductor Manufacturing Company, Ltd.
    Inventors: Oscar M. K. Law, Kuo H. Wu, Wei-Chih Yeh
  • Publication number: 20100252934
    Abstract: A system and method for making semiconductor die connections with through-silicon vias (TSVs) are disclosed. TSVs are formed through the substrate to allow for signal connections as well as power and ground connections. In one embodiment this allows these connections to be made throughout the substrate instead of on the periphery of the substrate. In another embodiment, the TSVs are used as part of a power matrix to supply power and ground connections to the active devices and metallization layers through the substrate.
    Type: Application
    Filed: January 6, 2010
    Publication date: October 7, 2010
    Applicant: Taiwan Semiconductor Manufacturing Company, Ltd.
    Inventors: Oscar M.K. Law, Kuo H. Wu
  • Publication number: 20100225002
    Abstract: A system and method for making semiconductor die connections with through-silicon vias (TSVs) are disclosed. A semiconductor die is manufactured with both via-first TSVs as well as via-last TSVs in order to establish low resistance paths for die connections between adjacent dies as well as for providing a low resistance path for feedthrough channels between multiple dies.
    Type: Application
    Filed: December 4, 2009
    Publication date: September 9, 2010
    Applicant: Taiwan Semiconductor Manufacturing Company, Ltd.
    Inventors: Oscar M.K. Law, Kuo H. Wu
  • Publication number: 20100181600
    Abstract: A method of designing integrated circuits includes providing a first chip and a second chip identical to each other. Each of the first chip and the second chip includes a base layer including a Logic Transistor Unit (LTU) array. The LTU array includes LTUs identical to each other and arranged in rows and columns. The method further includes connecting the base layer of the first chip to form a first application chip; and connecting the base layer of the second chip to form a second application chip different from the first application chip.
    Type: Application
    Filed: November 12, 2009
    Publication date: July 22, 2010
    Inventors: Oscar M. K. Law, Kuo H. Wu
  • Publication number: 20100182042
    Abstract: A programmable transistor array circuit is disclosed comprising a semiconductor substrate; and a plurality of basic transistor units (BTUs) arranged in rows and columns of uniformly spaced cells, the BTUs further comprising PMOS transistor units (PTUs), NMOS transistor units (NTUs) and dummy transistor units (DTUs) each BTU having conductors arranged in a single direction running through the BTUs and the conductors being uniformly spaced with respect to each other. The arrangement of the BTUs is subject to restricted design rules. Logical transistor units (LTUs) are formed from the BTUs using first and second layers of metallization. Methods for producing integrated circuits are disclosed forming programmable transistor arrays and implementing customer specified system designs upon the programmable transistor arrays.
    Type: Application
    Filed: October 23, 2009
    Publication date: July 22, 2010
    Inventors: Oscar M.K. Law, Kuo H. Wu
  • Publication number: 20100114761
    Abstract: A method for manufacturing integrated circuits (“ICs”) is disclosed. The method pertains to providing third-party technology in the form of an IC design library to foundry customers for designing IC products using alternate rule sets. Aggressive rules pertaining to IC layout are used to reduce device size, resulting in more device per wafer for the customer. The method includes a library creator creating a slim cell library, a slim cell library being provided to a customer to enable the customer to generate a slim IC design; an IC fabricator charging the customer a per-wafer premium to fabricate the slim IC design; the IC fabricator providing a first portion of the premium to a first entity, wherein the first entity is a contributor of technology for enabling creation of the slim cell library; and the IC fabricator providing a second portion of the premium to the library creator.
    Type: Application
    Filed: October 20, 2009
    Publication date: May 6, 2010
    Applicant: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.
    Inventor: Kuo H. Wu
  • Publication number: 20070266346
    Abstract: Disclosed is a system and method for enhancing integrated circuit designs and predicting the manufacturability. Design for manufacturability, or DFM, is an integration of DFM advisories; a DFM data kit presented in a DFM unified format; and DFM utilities utilizing the DFM data kit and the DFM advisories for enhancing integrated circuit (IC) designing.
    Type: Application
    Filed: March 6, 2007
    Publication date: November 15, 2007
    Applicant: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.
    Inventor: Kuo H. Wu
  • Patent number: 5150456
    Abstract: A high speed, low cost real time graphic image printing system includes a host data processing system, a laser printer having a plug connector for receiving a font cartridge storing information defining an image of a printable character, and a cartridge pluggably connected to the font cartridge plug connector. A first communication path carries print commands from the host to the printer while a second communication path carries image defining information between the host and the data store. In operation the host writes information defining a portion of an image to be printed into a portion of the data store corresponding to a selected character and then commands the printing of the selected character. A ping-pong double buffer arrangement allows the host to write a next image portion while information defining a current image portion is read by the printer to form a print image.
    Type: Grant
    Filed: August 6, 1990
    Date of Patent: September 22, 1992
    Assignee: Elite High Technology, Inc.
    Inventors: Kuo H. Wu, Roger Schneider, Kelvin K. Ishigo
  • Patent number: 5142614
    Abstract: A high speed, low cost real time graphic image printing system includes a host data processing system, a laser printer having a font cartridge port, a font cartridge that is writable in real time by the host to facilitate high speed printing of graphic images and an expander cartridge. The expander cartridge plugs into the printer font cartridge port and in turn provides ports for pluggably receiving both a read only font cartridge and a real time font cartridge that is writable by the host. The expander cartridge serves as a multiplexer to couple a selected one of the two font cartridges to the printer.
    Type: Grant
    Filed: August 6, 1990
    Date of Patent: August 25, 1992
    Assignee: Elite High Technology, Inc.
    Inventors: Roger Schneider, Kuo H. Wu, Kelvin K. Ishigo