Patents by Inventor Kurt Dietliker

Kurt Dietliker has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20100234485
    Abstract: The present invention provides organometallic latent catalyst compounds, which are suitable as catalysts in polyaddition or polycondensation reactions which are catalysed by a Lewis acid type catalyst, in particular for the crosslinking of a blocked or unblocked isocyanate or isothiocyanate component with a polyol or polythiolto form a polyurethane (PU).
    Type: Application
    Filed: October 10, 2008
    Publication date: September 16, 2010
    Applicant: BASF SE
    Inventors: Rachel Kohli Steck, Caroline Lordelot, Thomas Vogel, Gisele Baudin, Paul Brown, Kurt Dietliker, Rinaldo Huesler, Tunja Jung, Peter Simmendinger, Katia Studer, Antoine Carroy
  • Patent number: 7732504
    Abstract: The invention relates to novel photoinitiators of formula (I) wherein each of the substituents is given the definition as set forth in the Specification and the claims. The photoinitiators can be used to prepare multifunctional photoinitiators.
    Type: Grant
    Filed: January 24, 2005
    Date of Patent: June 8, 2010
    Assignee: Ciba Specialty Chemicals Corporation
    Inventors: Kurt Dietliker, Rinaldo Hüsler, Jean-Luc Birbaum, Jean-Pierre Wolf
  • Publication number: 20100104979
    Abstract: Compounds of the Formula (I) wherein x is an integer from 1-4; p is an integer from 1-3; q is an integer from 0-3; Ar is phenyl, naphthyl, anthryl or phenanthryl each of which optionally is substituted by one or more Cl, CN, OR5, C3-C5alkenyl or C1-C6alkyl which optionally is substituted by one or more OR6, COOR or halogen; R1 if x is 1, is ORS, O—X+, NR8R9, C1-C20alkyl optionally substituted by one or more COOR10, or is C2-C20alkyl interrupted by one ore more O, or is C2-C5alkenyl or phenyl-C1-C4alkyl; R1 if x is 2, is for example C1-C20alkylene; R1 if x is 3, is for example a tri-valent radical; R1if x is 4, is for example a tetravalent radical; R2and R3are hydrogen or C1-C8alkyl, or R2and R3 together are O, C1-C3alkylene or CH?CH; R4 is C1-C4alkyl; R5, R6, R7, R8, R9 and R10 are for example hydrogen or C1-C4alkyl; and X is a x-valent cationic counter ion; are in particular suitable as photoinitiators for the curing with UV-A light (320-450 nm).
    Type: Application
    Filed: March 25, 2008
    Publication date: April 29, 2010
    Inventors: Kurt Dietliker, Peter Murer, Rinaldo Hüsler, Tunja Jung
  • Publication number: 20100105794
    Abstract: Compounds of the Formula (I), (II) and (III) wherein Ar is for example phenylene, biphenylene or naphthylene, all of which are unsubstituted or substituted by C1-C4-alkyl, C2-C4-alkenyl, CN, OR11, SR11, CH2OR11, COOR12, CONR12R13 or halogen; R1, R2, R7 and R8 independently of one another other are hydrogen or C1-C6-alkyl; R3 and R5 together and R4 and R6 together form a C2-C6-alkylene bridge which is unsubstituted or substituted by one or more C1-C4-alkyl; R11 is hydrogen or C1-C6-alkyl; R12 and R13 independently of one another for example are hydrogen, phenyl, C1-C18-alkyl, C1-C18-alkyl which is interrupted by one or more O; n is 1-10; X is O, S or NR10; A and A1 are suitable linking groups; are suitable as photolatent bases.
    Type: Application
    Filed: March 25, 2008
    Publication date: April 29, 2010
    Applicant: CIBA CORPORATION
    Inventors: Kurt Dietliker, Katharina Misteli, Katia Studer, Tunja Jung, Lothar Alexander Engelbrecht
  • Patent number: 7687657
    Abstract: The invention relates to a process for the preparation of (bis)acylphosphanes of formula I, wherein n and m are each independently of the other 1 or 2; R1 if n=1, is e.g. unsubstituted or substituted C1-C18alkyl or C2-C18alkenyl, or phenyl, R1 if n=2, is e.g. a divalent radical of the monovalent radical defined above; R2 is e.g. C1-C18alkyl, C3-C12cycloalkyl, C2-C18alkenyl, mesityl, phenyl, naphthyl; R3 is one of the radicals defined under R1; the process comprises the steps a) contacting e.g.
    Type: Grant
    Filed: November 14, 2005
    Date of Patent: March 30, 2010
    Assignee: Ciba Speciality Chemicals Corporation
    Inventors: Peter Murer, Jean-Pierre Wolf, Stephan Burkhardt, Hansjörg Grützmacher, Daniel Stein, Kurt Dietliker
  • Publication number: 20100022676
    Abstract: The invention provides a uv-curable colored composition, comprising (a) at least one selected ethylenically unsaturated photopolymerizable compound; (b) at least one selected curing agent; and (c) at least one selected colorant.
    Type: Application
    Filed: September 24, 2007
    Publication date: January 28, 2010
    Inventors: Jonathan Rogers, Johannes Benkhoff, Karin Powell, Tunja Jung, Kurt Dietliker, Pascal Hayoz, Jean-Luc Birbaum, Thomas Vogel, Rinaldo Hüsler
  • Publication number: 20090298962
    Abstract: The present invention pertains to a composition comprising (a) a photolatent base; (b) a blocked isocyanate or blocked isothiocyanate and (c) a hydrogen donor compound; and its applications.
    Type: Application
    Filed: September 19, 2007
    Publication date: December 3, 2009
    Inventors: Katia Studer, Kurt Dietliker, Tunja Jung
  • Publication number: 20090194708
    Abstract: The present application provides a composition showing a color change depending on the absorbed radiation-dose, comprising (a) an acid responsive colorant; (b) a photolatent acid; characterized in that (b) is a sulfonyloxime ester compound; and its use as a radiation dose indicator.
    Type: Application
    Filed: August 15, 2007
    Publication date: August 6, 2009
    Inventors: Katia Studer, Tunja Jung, Kurt Dietliker, Urs Lehmann
  • Patent number: 7538104
    Abstract: Compounds of the formula I R7?N—R6 RS—C,N—R4 H C, R?/I R, 3 R 2 (I) in which R, is an aromatic or heteroaromatic radical which is capable of absorbing light in the wave-length range from 200 nm to 650 nm and which is unsubstituted or substituted one or more times by C,—C,8alkyl, C2-C,ealkenyl, C2-C,8alkynyl, C,—C,ehaloalkyl, NO2, NR,OR, CN, OR,2, SR,2, C(O)R,3, C(O)OR,4, halogen or a radical of the formula II R˜—N? R6 1 R5-C,N.
    Type: Grant
    Filed: October 8, 2002
    Date of Patent: May 26, 2009
    Assignee: Ciba Specialty Chemicals Corporation
    Inventors: Gisèle Baudin, Kurt Dietliker, Tunja Jung
  • Publication number: 20090076200
    Abstract: Base-polymerizable or base-crosslinkable compositions comprising select bicyclic amines with benzylic substitution undergo photochemically induced, base-catalysed reactions upon photochemical conversion of the benzylically substituted amine to an amidine derivative.
    Type: Application
    Filed: November 12, 2008
    Publication date: March 19, 2009
    Inventors: Gisele Baudin, Kurt Dietliker, Tunja Jung
  • Publication number: 20080021126
    Abstract: The invention relates to novel photoinitiators of formula (I) wherein each of the substituents is given the definition as set forth in the Specification and the claims. The photoinitiators can be used to prepare multifunctional photoinitiators.
    Type: Application
    Filed: January 24, 2005
    Publication date: January 24, 2008
    Inventors: Kurt Dietliker, Rinaldo Husler, Jean-Luc Birbaum, Jean-Pierre Wolf
  • Publication number: 20080004464
    Abstract: The invention relates to a process for the preparation of (bis)acylphosphanes of formula I, wherein n and m are each independently of the other 1 or 2; R1 if n=1, is e.g. unsubstituted or substituted C1-C18alkyl or C2-C18alkenyl, or phenyl, R1 if n=2, is e.g. a divalent radical of the monovalent radical defined above; R2 is e.g. C1-C18alkyl, C3-C12cycloalkyl, C2-C18alkenyl, mesityl, phenyl, naphthyl; R3 is one of the radicals defined under R1; the process comprises the steps a) contacting e.g.
    Type: Application
    Filed: November 14, 2005
    Publication date: January 3, 2008
    Inventors: Peter Murer, Jean-Pierre Wolf, Stephan Burkhardt, Hansjorg Grutzmacher, Daniel Stein, Kurt Dietliker
  • Patent number: 7291654
    Abstract: Compounds of formula (I), wherein R1 is hydrogen or alkyl; R2 is C1-C4alkoxy or a morpholino radical; and R3 is hydrogen or C1-C4alkoxy, are suitable for improving the solubility of specific photoinitiators in formulations and accordingly enhance the storage stability of formulations comprising a photoinitiator and compounds of formula (I)
    Type: Grant
    Filed: October 17, 2003
    Date of Patent: November 6, 2007
    Assignee: Ciba Specialty Chemicals Corporation
    Inventors: Thomas Ulrich, Thomas Bolle, Kurt Dietliker, Jean-Pierre Wolf, André Fuchs
  • Publication number: 20070249484
    Abstract: The invention pertains to a process for the application of a specific photolatent catalyst (a) wherein a composition of matter, comprising said catalyst, is subjected to irradiation before being further processed.
    Type: Application
    Filed: July 11, 2005
    Publication date: October 25, 2007
    Inventors: Johannes Benkhoff, Tunja Jung, Andreas Valet, Kurt Dietliker, Eugene Sitzmann
  • Publication number: 20060100298
    Abstract: Compounds of formula (I), wherein R1 is hydrogen or alkyl; R2 is C1-C4alkoxy or a morpholino radical; and R3 is hydrogen or C1-C4alkoxy, are suitable for improving the solubility of specific photoinitiators in formulations and accordingly enhance the storage stability of formulations comprising a photoinitiator and compounds of formula (I).
    Type: Application
    Filed: October 17, 2003
    Publication date: May 11, 2006
    Inventors: Thomas Ulrich, Thomas Bolle, Kurt Dietliker, Jean-Pierre Wolf, Andre Fuchs
  • Publication number: 20050096406
    Abstract: The invention relates to new reactive diluents of the formulae (Ia, Ib, Ic, Id, Ie) and to an alkyd coating composition comprising them. In a preferred embodiment R1 and R2 are hydrogen; R3 is (meth)acryloyloxy-methyl or phenyl para substituted by vinyl, R4 is phenyl or phenyl para substituted by vinyl or (meth)acryloyloxy; or a substituted phenyl residue of the formula —C6H4CH2—W, wherein W is (meth)acryloyloxy, or an aliphatic residue of the formula —CH2—Y-A, wherein Y is a bond, O—C1-C12alkylene, wherein the alkylene linker is linear or branched and may be interrupted once or more than once by oxygen, A is hydroxy, C1-C6alkoxy, acetoxy, (meth)acryloyloxy, or a phthalate- or maleate-residue; R5 is hydrogen; n is 1; X is —(CH2)—. The invention further relates to a solvent-based or water-based alkyd coating composition comprising 0.3 to 10 wt. % of a mono-, bis- or trisacylphosphinoxide photoinitiator, especially Irgacure 819.
    Type: Application
    Filed: February 25, 2003
    Publication date: May 5, 2005
    Inventors: Roger Pretot, Andreas Muhlebach, Wolfgang Peter, Kurt Dietliker, Tunja Jung, Clemens Auschra, Hans Kirner, Paul Van Der Schaaf
  • Publication number: 20040242867
    Abstract: Compounds of the formula I R7″N—R6 RS—C,N—R4 H C, R′/I R, 3 R 2 (I) in which R, is an aromatic or heteroaromatic radical which is capable of absorbing light in the wave-length range from 200 nm to 650 nm and which is unsubstituted or substituted one or more times by C,—C,8alkyl, C2-C,ealkenyl, C2-C,8alkynyl, C,—C,ehaloalkyl, NO2, NR,OR, CN, OR,2, SR,2, C(O)R,3, C(O)OR,4, halogen or a radical of the formula II R˜—N′ R6 1 R5-C,N.
    Type: Application
    Filed: April 6, 2004
    Publication date: December 2, 2004
    Inventors: Gisele Baudin, Kurt Dietliker, Tunja Jung
  • Patent number: 6806024
    Abstract: Radically photopolymerizable compositions comprising (a) at least one ethylenically unsaturated photopolymerizable compound; (b) as photoinitiator, at least one compound of formulae (I, II, III, IV, V and/or VI), wherein m is 0 or 1; n is 0, 1, 2 or 3; x is 1 or 2; R1 is inter alia phenyl, naphthyl, anthracyl or phenanthryl, a heteroaryl radical, C2-C12alkenyl, C4-C8cycloalkenyl, or C6-C12bicycloalkenyl; R′1 is inter alia C2-C12alkylene, or phenylene; R2 has one of the meanings of R1 or inter alia is phenyl; y is 1 or 2; R3 if x is 1 inter alia is C1-C18alkylsulfonyl, or phenyl-C1-C3alkylsulfonyl, R3 if x is 2, is for example C2-C12alkylenedisulfonyl; R4 and R5 inter alia are hydrogen, halogen, or C1-C8alkyl; R6, R7, R8 inter alia are hydrogen, R26Y—, or phenyl; R9 inter alia is C5-C8cycloalkyl, or phenyl; A is for example —S—, —O—, or —NR10—; Q is C1-C8-alkylene optionally interrupted by —O—; X is —O— or —NR9—; R10 inter alia
    Type: Grant
    Filed: August 27, 2001
    Date of Patent: October 19, 2004
    Assignee: Ciba Specialty Chemicals Corporation
    Inventors: Hisatoshi Kura, Hitoshi Yamato, Masaki Ohwa, Kurt Dietliker
  • Patent number: 6770420
    Abstract: The invention describes the use of oxime alkyl sulfonate compounds of formula 1 R0 is either an R1—X group or R2; X is a direct bond, an oxygen atom or a sulfur atom; R1 is hydrogen, C1-C4alkyl or a phenyl group which is unsubstituted or substituted by a substituent selected from the group consisting of chloro, bromo, C1-C4alkyl and C1-C4-alkyloxy; R2 is hydrogen or C1-C4alkyl; and R3 is straight-chain or branched C1-C12alkyl which is unsubstituted or substituted by one or more than one halogen atom; as photosensitive add generator in a chemically amplified photoresist which is developable in alkaline medium and which is sensitive to radiation at a wavelength of 340 to 390 nanometers and correspondingly composed positive and negative photoresists for the above-mentioned wavelength range.
    Type: Grant
    Filed: July 2, 2003
    Date of Patent: August 3, 2004
    Assignee: Ciba Specialty Chemicals Corporation
    Inventors: Kurt Dietliker, Martin Kunz, Hitoshi Yamato, Christoph De Leo
  • Publication number: 20040013974
    Abstract: The invention describes the use of oxime alkyl sulfonate compounds of formula 1 1
    Type: Application
    Filed: July 2, 2003
    Publication date: January 22, 2004
    Inventors: Kurt Dietliker, Martin Kunz, Hitoshi Yamato, Christoph De Leo