Patents by Inventor Kurt Dietliker
Kurt Dietliker has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 6596445Abstract: Oximeester compounds of the formulae I, II, III and IV wherein R1 is phenyl, C1-C20alkyl or C2-C20alkyl optionally interrupted by —O—, C2-C20alkanoyl or benzoyl, or R1 is C2-C12alkoxycarbonyl or phenoxycarbonyl; R1′ is C2-C12alkoxycarbonyl, or R1′ is phenoxycarbonyl, or R1′ is —CONR10R11 or CN; R2 is C2-C12alkanoyl, C4-C6alkenoyl, benzoyl, C2-C6alkoxycarbonyl or phenoxycarbonyl; R3, R4, R5, R6 and R7 are hydrogen, halogen, C1-C12alkyl, cyclopentyl, cyclohexyl, phenyl, benzyl, benzoyl, C2-C12alkanoyl, C2-C12alkoxycarbonyl, phenoxycarbonyl or a group OR8, SR9, SOR9, SO2R9 or NR10R11; R4′, R5′ and R6′ are hydrogen, halogen, C1-C12alkyl, cyclopentyl, cyclohexyl, phenyl, benzyl, benzoyl, C2-C12-alkanoyl, C2-C12alkoxycarbonyl, phenoxycarbonyl, or are a group OR8, SR9, SOR9, SO2R9, NR10R11; provided that at least one of R3, R4, R5, R6, R7, R′4, R′5 and R′6 is OR8, SR9 or NR10R11; R8, R9, R10 and R11 are for example hydrogen, CType: GrantFiled: June 23, 1999Date of Patent: July 22, 2003Assignee: Ciba Specialty Chemicals CorporationInventors: Akira Matsumoto, Hidetaka Oka, Masaki Ohwa, Hisatoshi Kura, Jean-Luc Birbaum, Kurt Dietliker
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Patent number: 6512020Abstract: Compounds of formula I, II and III, wherein wherein R1 is for example hydrogen, C1-C12alkyl, C3-C30cycloalkyl, C2-C12alkenyl, C4-C8cycloalkenyl, phenyl, which is unsubstituted or substituted, naphthyl, anthracyl or phenanthryl, unsubstituted or substituted, heteroaryl radical which is unsubstituted or substituted; wherein all radicals R1 with the exception of hydrogen can additionally be substituted by a group having a —O—C-bond or a —O—Si-bond which cleaves upon the action of an acid; R′1 is for example phenylene, naphthylene, diphenylene or oxydiphenylene, wherein these radicals are unsubstituted or substituted; R2 is halogen or C1-C10haloalkyl; R3 is for example C1-C18alkylsulfonyl, phenylsulfonyl, naphthylsulfonyl, anthracylsulfonyl or phenanthrylsulfonyl, wherein the groups are unsubstituted or substituted, or R3 is e.g.Type: GrantFiled: March 28, 2001Date of Patent: January 28, 2003Assignee: Ciba Specialty Chemicals CorporationInventors: Toshikage Asakura, Hitoshi Yamato, Masaki Ohwa, Jean-Luc Birbaum, Kurt Dietliker, Junichi Tanabe
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Patent number: 6485886Abstract: New oxime derivatives of formula (I) or. (II), wherein m is 0 or 1; R1 inter alia is phenyl, naphthyl, anthracyl, phenanthryl or a heteroaryl radical; R′1 is for example C2-C12alkylene, phenylene, naphthylene; R2 is CN; R3 is C2-C6haloalkanoyl, halobenzoyl, a phosphoryl or an organosilyl group; R4, R5, R10 and R11 inter alia are hydrogen, C1-C6alkyl, C1-C6alkoxy; R6 inter alia is hydrogen phenyl, C1-C12alkyl; R7 and R8 inter alia are hydrogen, C1-C12alkyl; or R7 and R8, together with the nitrogen atom to which they are bonded, form a 5-, 6 or 7-membered ring; R9 is for example C1-C12alkyl; and A inter alia is S, O, NR7a; are useful as latent acids, especially in photoresist applications.Type: GrantFiled: April 24, 2001Date of Patent: November 26, 2002Assignee: Ciba Specialty Chemicals CorporationInventors: Hitoshi Yamato, Toshikage Asakura, Jean-Luc Birbaum, Kurt Dietliker
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Publication number: 20010037037Abstract: The invention relates to the use of oximesulfonic acid esters of formula I 1Type: ApplicationFiled: January 8, 2001Publication date: November 1, 2001Inventors: Kurt Dietliker, Martin Kunz
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Patent number: 6261738Abstract: Compounds of formula I, II and III, wherein wherein R1 is for example hydrogen, C1-C12alkyl, C3-C30cycloalkyl, C2-C12alkenyl, C4-C8cycloalkenyl, phenyl, which is unsubstituted or substituted, naphthyl, anthracyl or phenanthryl, unsubstituted or substituted, heteroaryl radical which is unsubstituted or substituted; wherein all radicals R1 with the exception of hydrogen can additionally be substituted by a group having a —O—C-bond or a —O—Si-bond which cleaves upon the action of an acid; R′1 is for example phenylene, naphthylene, diphenylene or oxydiphenylene, wherein these radicals are unsubstituted or substituted; R2 is halogen or C1-C10haloalkyl; R3 is for example C1-C18alkylsulfonyl, phenylsulfonyl, naphthylsulfonyl, anthracylsulfonyl or phenanthrylsulfonyl, wherein the groups are unsubstituted or substituted, or R3 is e.g.Type: GrantFiled: March 23, 2000Date of Patent: July 17, 2001Assignee: Ciba Specialty Chemicals CorporationInventors: Toshikage Asakura, Hitoshi Yamato, Masaki Ohwa, Jean-Luc Birbaum, Kurt Dietliker, Junichi Tanabe
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Patent number: 6204306Abstract: The present invention relates to &agr;-aminoacetophenones functionalized with organic diisocyanates, which can be used as reactive photoinitiators; to oligomers and polymers to which such functionalized &agr;-aminoacetophenones are bonded; to &agr;-aminoacetophenones having unsaturated polymerizable side-chain; to dimeric and trimeric photoinitiators; to the use of such photoinitiators; to materials coated with such photoinitiators; and to the use of the functionalized &agr;-aminoacetophenones for modifying surfaces.Type: GrantFiled: August 11, 1997Date of Patent: March 20, 2001Assignee: Novartis AGInventors: Peter Chabrecek, Kurt Dietliker, Dieter Lohmann
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Patent number: 6087412Abstract: The invention relates to crosslinked polymers, which are polymerisation products of a polymerisable mixture that comprises the following components:a) a macromer of formula C ##STR1## wherein Macro is an m-valent radical of a macromer from which the number m of groups Rx.sub.x --H has been removed,each R.sub.x, independently of the others, is a bond, --O--, --NR.sub.N -- or --S-- wherein R.sub.N is hydrogen or lower alkyl,PI* is a bivalent radical of a photoinitiator,R.sub.aa is the moiety of a photoinitiator that forms the less reactive free radical on cleavage of the photoinitiator, andm is an integer from 1 to 100,b) a copolymerisable vinyl monomer andc) a copolymerisable crosslinker.The polymers are suitable especially for the production of mouldings, such as for contact lenses.Type: GrantFiled: September 12, 1997Date of Patent: July 11, 2000Assignee: Novartis AGInventors: Peter Chabrecek, Dieter Lohmann, Kurt Dietliker
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Patent number: 6048667Abstract: Heterogeneous photoinitiator in microparticle form, which consists of a finely divided substrate material to which identical or different photoinitiators are covalently bonded. The photoinitiators are suitable for the radiation-induced polymerization of photopolymerizable or photocrosslinkable monomers for the production of moldings, protective coats and relief images.Type: GrantFiled: January 15, 1998Date of Patent: April 11, 2000Assignee: Ciba Specialty Chemicals Corp.Inventors: Sameer Hosam Eldin, Peter Grieshaber, Fran.cedilla.ois Rime, Kurt Dietliker
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Patent number: 6017675Abstract: The invention relates to the use of oximesulfonic acid esters of formula I ##STR1## m is 0 or 1 and x is 1 or 2; R.sub.1 is, for example, substituted phenyl, R.sub.2 has, for example, one of the meanings of R.sub.1 or is unsubstituted phenyl, C.sub.1 -C.sub.6 alkanoyl, unsubstituted or substituted benzoyl, C.sub.2 -C.sub.6 alkoxycarbonyl or phenoxycarbonyl; or R.sub.1 and R.sub.2, if necessary together with the CO group, form a ring, R.sub.3, when x is 1, is, for example, C.sub.1 -C.sub.18 alkyl, phenyl or phenanthryl, the radicals phenyl and phenanthryl being unsubstituted or substituted, or R.sub.3, when x is 2, is, for example, C.sub.2 -C.sub.12 alkylene, phenylene or oxydiphenylene, the radicals phenylene and oxydiphenylene being unsubstituted or substituted, as latent acid donors, especially at wavelengths over 390 nm, and to the use of the compounds in the production of photoresists.Type: GrantFiled: October 28, 1996Date of Patent: January 25, 2000Assignee: Ciba Specialty Chemials CorporationInventors: Kurt Dietliker, Martin Kunz
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Patent number: 6004724Abstract: New oximsulfonate compounds of the formulae I or II, ##STR1## wherein m is 0 or 1; x is 1 or 2; R.sub.1 is, for example phenyl, which is unsubstituted or substituted or R.sub.1 is a heteroaryl radical that is unsubstituted or substituted, or, if m is 0, R.sub.1 additionally is C.sub.2 -C.sub.6 alkoxycarbonyl, phenoxycarbonyl or CN; R'.sub.1 is for example C.sub.2 -C.sub.12 alkylene, phenylene; R.sub.2 has for example one of the meanings of R.sub.1 ; n is 1 or 2; R.sub.3 is for example C.sub.1 -C.sub.18 alkyl, R'.sub.3 when x is 1, has one of the meanings given for R.sub.3, or R'.sub.3 in the formula IV and when x is 2 in the formula 1, is for example C.sub.2 -C.sub.12 alkylene, phenylene; R.sub.4 and R.sub.5 are independently of each other for example hydrogen, halogen, C.sub.1 -C.sub.6 alkyl; R.sub.6 is for example hydrogen, phenyl; R.sub.7 and R.sub.8 are independently of each other for example hydrogen or C.sub.1 -C.sub.12 -alkyl; R.sub.9 is for example C.sub.1 -C.sub.12 alkyl; A is S, O, NR.sub.Type: GrantFiled: June 25, 1998Date of Patent: December 21, 1999Assignee: Ciba Specialty Chemicals CorporationInventors: Hitoshi Yamato, Hartmut Bleier, Jean-Luc Birbaum, Martin Kunz, Kurt Dietliker, Christoph De Leo, Toshikage Asakura
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Patent number: 5629356Abstract: Compounds of the formula I, II, III and IIIa ##STR1## in which Ar.sup.1 is an unsubstituted or substituted aromatic radical and at least one of the radicals R.sup.1 and R.sup.2 is an alkenyl, cycloalkenyl or arylmethyl group, are effective photoinitiators for photopolymerization of unsaturated compounds. They are particularly suitable for photocuring of pigmented systems.Type: GrantFiled: March 12, 1996Date of Patent: May 13, 1997Assignee: Ciba Geigy CorporationInventors: Vincent Desobry, Kurt Dietliker, Rinaldo H usler, Werner Rutsch, Manfred Rembold, Franciszek Sitek
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Patent number: 5554663Abstract: Compounds of the formula I, II, III and IIIa ##STR1## in which Ar.sup.1 is an unsubstituted or substituted aromatic radical and at least one of the radicals R.sup.1 and R.sup.2 is an alkenyl, cycloalkenyl or arylmethyl group, are effective photoinitiators for photopolymerization of unsaturated compounds. They are particularly suitable for photocuring of pigmented systems.Type: GrantFiled: June 6, 1995Date of Patent: September 10, 1996Assignee: Ciba-Geigy CorporationInventors: Vincent Desobry, Kurt Dietliker, Rinaldo H usler, Werner Rutsch, Manfred Rembold, Franciszek Sitek
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Patent number: 5534629Abstract: Compounds of the formula I, II, III and IIIa ##STR1## in which Ar.sup.1 is an unsubstituted or substituted aromatic radical and at least one of the radicals R.sup.1 and R.sup.2 is an alkenyl, cycloalkenyl or arylmethyl group, are effective photoinitiators for photopolymerization of unsaturated compounds. They are particularly suitable for photocuring of pigmented systems.Type: GrantFiled: May 1, 1995Date of Patent: July 9, 1996Assignee: Ciba-Geigy CorporationInventors: Vincent Desobry, Kurt Dietliker, Rinaldo Husler, Werner Rutsch, Manfred Rembold, Franciszek Sitek
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Patent number: 5306600Abstract: Titanocenes of the formula I ##STR1## in which R.sup.1 are cyclopentadienyl.sup..crclbar. groups and R.sup.2 and R.sup.3 are aromatic radicals which are substituted in both ortho-positions by fluorine and, in addition, are substituted by an acyloxy group are suitable as photoinitiators for the photopolymerization of ethylenically unsaturated compounds.Type: GrantFiled: November 12, 1992Date of Patent: April 26, 1994Assignee: Ciba-Geigy CorporationInventors: Eginhard Steiner, Harry Beyeler, Martin Riediker, Vincent Desobry, Kurt Dietliker, Rinaldo Husler
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Patent number: 5218009Abstract: Compounds of the formula I ##STR1## in which at least one of the radicals R.sub.1, R.sub.2 and R.sub.3 is a substituted alkyl radical or cycloalkyl radical, or R.sub.1 and R.sub.2 together with the phosphorus atom form a monocyclic or tricyclic ring, are effective photoinitiators for the photopolymerization of ethylenically unsaturated compounds.Type: GrantFiled: August 28, 1991Date of Patent: June 8, 1993Assignee: Ciba-Geigy CorporationInventors: Werner Rutsch, Kurt Dietliker, Roger G. Hall
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Patent number: 5192642Abstract: Titanocenes of the formula I ##STR1## in which R.sup.1 are cyclopentadienyl.sup..crclbar. groups and R.sup.2 and R.sup.3 are aromatic radicals which are substituted in both ortho-positions by fluorine and, in addition, are substituted by an acyloxy group are suitable as photoinitiators for the photopolymerization of ethylenically unsaturated compounds.Type: GrantFiled: May 23, 1990Date of Patent: March 9, 1993Assignee: Ciba-Geigy CorporationInventors: Eginhard Steiner, Harry Beyeler, Martin Riediker, Vincent Desobry, Kurt Dietliker, Rinaldo Husler
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Patent number: 5147901Abstract: Propiophenones of the formula I ##STR1## in which R.sup.1 is hydrogen or C.sub.1 -C.sub.4 -alkyl, --Si(CH.sub.3).sub.3, allyl or benzyl, R.sup.2 is hydrogen, C.sub.1 -C.sub.8 -alkyl, C.sub.1 -C.sub.4 -alkyl which is substituted by C.sub.1 -C.sub.4 -alkoxy or --OH, --(CH.sub.2 --CH.sub.2 --O).sub.n --R.sup.5 where n is 2 to 20 and R.sup.5 is H or C.sub.1 -C.sub.4 -alkyl, --Si(CH.sub.3).sub.3, benzyl, C.sub.3 -C.sub.6 -alkenyl, C.sub.3 -C.sub.4 -alkynyl or 2-tetrahydrofuranyl, or R.sup.1 and R.sup.2 together are a C.sub.1 -C.sub.6 -alkylidene radical or a C.sub.2 -C.sub.6 -alkylidene radical which is substituted by hydroxyl, C.sub.1 -C.sub.4 -alkoxy or phenyl, a linear or branched C.sub.2 -C.sub.6 -alkanediyl radical, a benzylidene, cyclopentylidene or cyclohexylidene radical or a 2,2,2-trichloroethylidene, 2-furylmethylidene or dimethylsilylidene radical, R.sup.3 is phenyl which is unsubstituted or substituted by one or more --Cl, C.sub.1 -C.sub.4 -alkyl, C.sub.1 -C.sub.4 -alkoxy or C.sub.1 -C.sub.Type: GrantFiled: September 22, 1989Date of Patent: September 15, 1992Assignee: Ciba-Geigy CorporationInventors: Werner Rutsch, Rudolf Kirchmayr, Rinaldo Husler, Kurt Dietliker
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Patent number: 5145885Abstract: The photopolymerizable composition described containsA) at least one ethylenically unsaturated photopolymerizable compound,B) a photoinitiator of the formula I ##STR1## and C) a photosensitizer from the group of aromatic carbonyl compounds having a triplet energy of 225-310 kJ/mol, for example xanthones, thioxanthones, coumarins, phthalimides, phenones and the like.Ar is phenyl substituted in the 4-position by a substituted amino group, R.sup.1 and R.sup.2 are alkyl, R.sup.3 and R.sup.4 are alkyl or alkoxyalkyl, or R.sup.3 and R.sup.4 together are 3-oxapentamethylene. Said sensitizers C) raise the activity of said photoinitiators (B) without shortening the shelf life of the mixtures. The photocurable mixtures are used especially as binders for printing inks or paints.Type: GrantFiled: November 13, 1990Date of Patent: September 8, 1992Assignee: Ciba-Geigy CorporationInventors: Godwin Berner, Kurt Meier, Kurt Dietliker, Rinaldo Husler
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Patent number: 5077402Abstract: Compounds of the formula I, II, III and IIIa ##STR1## in which Ar.sup.1 is an unsubstituted or substituted aromatic radical and at least one of the radicals R.sup.1 and R.sup.2 is an alkenyl, cycloalkenyl or arylmethyl group, are effective photoinitiators for photopolymerization of unsaturated compounds. They are particularly suitable for photocuring of pigmented systems.Type: GrantFiled: March 28, 1990Date of Patent: December 31, 1991Assignee: Ciba-Geigy CorporationInventors: Vincent Desobry, Kurt Dietliker, Rinaldo Husler, Werner Rutsch, Manfred Rembold, Franciszek Sitek
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Patent number: 4992547Abstract: The photopolymerizable mixture described contains(A) at least one ethylenically unsaturated photopolymerisable compound,(B) a photoinitiator of the formula I ##STR1## and (C) a photosensitiser from the group of aromatic carbonyl compounds having a triplet energy of 225-310 kJ/mol, for example xanthones, thioxianthones, coumarins, phthalimides, phenones and the like.Ar is phenyl substituted in the 4-position by a substituted amino group, R.sup.1 and R.sup.2 are alkyl, R.sup.3 and R.sup.4 are alkyl or alkoxyalkyl, or R.sup.3 and R.sup.4 together are 3-oxapentamethylene. Said sensitisers (C) raise the activity of said photoinitiators (B) without shortening the shelf life of the mixtures. The photocurable mixtures are used especially as binders for printing inks or paints.Type: GrantFiled: June 14, 1988Date of Patent: February 12, 1991Assignee: Ciba-Geigy CorporationInventors: Godwin Berner, Kurt Meier, Kurt Dietliker, Rinaldo Husler