Patents by Inventor Kurt Dietliker

Kurt Dietliker has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 6596445
    Abstract: Oximeester compounds of the formulae I, II, III and IV wherein R1 is phenyl, C1-C20alkyl or C2-C20alkyl optionally interrupted by —O—, C2-C20alkanoyl or benzoyl, or R1 is C2-C12alkoxycarbonyl or phenoxycarbonyl; R1′ is C2-C12alkoxycarbonyl, or R1′ is phenoxycarbonyl, or R1′ is —CONR10R11 or CN; R2 is C2-C12alkanoyl, C4-C6alkenoyl, benzoyl, C2-C6alkoxycarbonyl or phenoxycarbonyl; R3, R4, R5, R6 and R7 are hydrogen, halogen, C1-C12alkyl, cyclopentyl, cyclohexyl, phenyl, benzyl, benzoyl, C2-C12alkanoyl, C2-C12alkoxycarbonyl, phenoxycarbonyl or a group OR8, SR9, SOR9, SO2R9 or NR10R11; R4′, R5′ and R6′ are hydrogen, halogen, C1-C12alkyl, cyclopentyl, cyclohexyl, phenyl, benzyl, benzoyl, C2-C12-alkanoyl, C2-C12alkoxycarbonyl, phenoxycarbonyl, or are a group OR8, SR9, SOR9, SO2R9, NR10R11; provided that at least one of R3, R4, R5, R6, R7, R′4, R′5 and R′6 is OR8, SR9 or NR10R11; R8, R9, R10 and R11 are for example hydrogen, C
    Type: Grant
    Filed: June 23, 1999
    Date of Patent: July 22, 2003
    Assignee: Ciba Specialty Chemicals Corporation
    Inventors: Akira Matsumoto, Hidetaka Oka, Masaki Ohwa, Hisatoshi Kura, Jean-Luc Birbaum, Kurt Dietliker
  • Patent number: 6512020
    Abstract: Compounds of formula I, II and III, wherein wherein R1 is for example hydrogen, C1-C12alkyl, C3-C30cycloalkyl, C2-C12alkenyl, C4-C8cycloalkenyl, phenyl, which is unsubstituted or substituted, naphthyl, anthracyl or phenanthryl, unsubstituted or substituted, heteroaryl radical which is unsubstituted or substituted; wherein all radicals R1 with the exception of hydrogen can additionally be substituted by a group having a —O—C-bond or a —O—Si-bond which cleaves upon the action of an acid; R′1 is for example phenylene, naphthylene, diphenylene or oxydiphenylene, wherein these radicals are unsubstituted or substituted; R2 is halogen or C1-C10haloalkyl; R3 is for example C1-C18alkylsulfonyl, phenylsulfonyl, naphthylsulfonyl, anthracylsulfonyl or phenanthrylsulfonyl, wherein the groups are unsubstituted or substituted, or R3 is e.g.
    Type: Grant
    Filed: March 28, 2001
    Date of Patent: January 28, 2003
    Assignee: Ciba Specialty Chemicals Corporation
    Inventors: Toshikage Asakura, Hitoshi Yamato, Masaki Ohwa, Jean-Luc Birbaum, Kurt Dietliker, Junichi Tanabe
  • Patent number: 6485886
    Abstract: New oxime derivatives of formula (I) or. (II), wherein m is 0 or 1; R1 inter alia is phenyl, naphthyl, anthracyl, phenanthryl or a heteroaryl radical; R′1 is for example C2-C12alkylene, phenylene, naphthylene; R2 is CN; R3 is C2-C6haloalkanoyl, halobenzoyl, a phosphoryl or an organosilyl group; R4, R5, R10 and R11 inter alia are hydrogen, C1-C6alkyl, C1-C6alkoxy; R6 inter alia is hydrogen phenyl, C1-C12alkyl; R7 and R8 inter alia are hydrogen, C1-C12alkyl; or R7 and R8, together with the nitrogen atom to which they are bonded, form a 5-, 6 or 7-membered ring; R9 is for example C1-C12alkyl; and A inter alia is S, O, NR7a; are useful as latent acids, especially in photoresist applications.
    Type: Grant
    Filed: April 24, 2001
    Date of Patent: November 26, 2002
    Assignee: Ciba Specialty Chemicals Corporation
    Inventors: Hitoshi Yamato, Toshikage Asakura, Jean-Luc Birbaum, Kurt Dietliker
  • Publication number: 20010037037
    Abstract: The invention relates to the use of oximesulfonic acid esters of formula I 1
    Type: Application
    Filed: January 8, 2001
    Publication date: November 1, 2001
    Inventors: Kurt Dietliker, Martin Kunz
  • Patent number: 6261738
    Abstract: Compounds of formula I, II and III, wherein wherein R1 is for example hydrogen, C1-C12alkyl, C3-C30cycloalkyl, C2-C12alkenyl, C4-C8cycloalkenyl, phenyl, which is unsubstituted or substituted, naphthyl, anthracyl or phenanthryl, unsubstituted or substituted, heteroaryl radical which is unsubstituted or substituted; wherein all radicals R1 with the exception of hydrogen can additionally be substituted by a group having a —O—C-bond or a —O—Si-bond which cleaves upon the action of an acid; R′1 is for example phenylene, naphthylene, diphenylene or oxydiphenylene, wherein these radicals are unsubstituted or substituted; R2 is halogen or C1-C10haloalkyl; R3 is for example C1-C18alkylsulfonyl, phenylsulfonyl, naphthylsulfonyl, anthracylsulfonyl or phenanthrylsulfonyl, wherein the groups are unsubstituted or substituted, or R3 is e.g.
    Type: Grant
    Filed: March 23, 2000
    Date of Patent: July 17, 2001
    Assignee: Ciba Specialty Chemicals Corporation
    Inventors: Toshikage Asakura, Hitoshi Yamato, Masaki Ohwa, Jean-Luc Birbaum, Kurt Dietliker, Junichi Tanabe
  • Patent number: 6204306
    Abstract: The present invention relates to &agr;-aminoacetophenones functionalized with organic diisocyanates, which can be used as reactive photoinitiators; to oligomers and polymers to which such functionalized &agr;-aminoacetophenones are bonded; to &agr;-aminoacetophenones having unsaturated polymerizable side-chain; to dimeric and trimeric photoinitiators; to the use of such photoinitiators; to materials coated with such photoinitiators; and to the use of the functionalized &agr;-aminoacetophenones for modifying surfaces.
    Type: Grant
    Filed: August 11, 1997
    Date of Patent: March 20, 2001
    Assignee: Novartis AG
    Inventors: Peter Chabrecek, Kurt Dietliker, Dieter Lohmann
  • Patent number: 6087412
    Abstract: The invention relates to crosslinked polymers, which are polymerisation products of a polymerisable mixture that comprises the following components:a) a macromer of formula C ##STR1## wherein Macro is an m-valent radical of a macromer from which the number m of groups Rx.sub.x --H has been removed,each R.sub.x, independently of the others, is a bond, --O--, --NR.sub.N -- or --S-- wherein R.sub.N is hydrogen or lower alkyl,PI* is a bivalent radical of a photoinitiator,R.sub.aa is the moiety of a photoinitiator that forms the less reactive free radical on cleavage of the photoinitiator, andm is an integer from 1 to 100,b) a copolymerisable vinyl monomer andc) a copolymerisable crosslinker.The polymers are suitable especially for the production of mouldings, such as for contact lenses.
    Type: Grant
    Filed: September 12, 1997
    Date of Patent: July 11, 2000
    Assignee: Novartis AG
    Inventors: Peter Chabrecek, Dieter Lohmann, Kurt Dietliker
  • Patent number: 6048667
    Abstract: Heterogeneous photoinitiator in microparticle form, which consists of a finely divided substrate material to which identical or different photoinitiators are covalently bonded. The photoinitiators are suitable for the radiation-induced polymerization of photopolymerizable or photocrosslinkable monomers for the production of moldings, protective coats and relief images.
    Type: Grant
    Filed: January 15, 1998
    Date of Patent: April 11, 2000
    Assignee: Ciba Specialty Chemicals Corp.
    Inventors: Sameer Hosam Eldin, Peter Grieshaber, Fran.cedilla.ois Rime, Kurt Dietliker
  • Patent number: 6017675
    Abstract: The invention relates to the use of oximesulfonic acid esters of formula I ##STR1## m is 0 or 1 and x is 1 or 2; R.sub.1 is, for example, substituted phenyl, R.sub.2 has, for example, one of the meanings of R.sub.1 or is unsubstituted phenyl, C.sub.1 -C.sub.6 alkanoyl, unsubstituted or substituted benzoyl, C.sub.2 -C.sub.6 alkoxycarbonyl or phenoxycarbonyl; or R.sub.1 and R.sub.2, if necessary together with the CO group, form a ring, R.sub.3, when x is 1, is, for example, C.sub.1 -C.sub.18 alkyl, phenyl or phenanthryl, the radicals phenyl and phenanthryl being unsubstituted or substituted, or R.sub.3, when x is 2, is, for example, C.sub.2 -C.sub.12 alkylene, phenylene or oxydiphenylene, the radicals phenylene and oxydiphenylene being unsubstituted or substituted, as latent acid donors, especially at wavelengths over 390 nm, and to the use of the compounds in the production of photoresists.
    Type: Grant
    Filed: October 28, 1996
    Date of Patent: January 25, 2000
    Assignee: Ciba Specialty Chemials Corporation
    Inventors: Kurt Dietliker, Martin Kunz
  • Patent number: 6004724
    Abstract: New oximsulfonate compounds of the formulae I or II, ##STR1## wherein m is 0 or 1; x is 1 or 2; R.sub.1 is, for example phenyl, which is unsubstituted or substituted or R.sub.1 is a heteroaryl radical that is unsubstituted or substituted, or, if m is 0, R.sub.1 additionally is C.sub.2 -C.sub.6 alkoxycarbonyl, phenoxycarbonyl or CN; R'.sub.1 is for example C.sub.2 -C.sub.12 alkylene, phenylene; R.sub.2 has for example one of the meanings of R.sub.1 ; n is 1 or 2; R.sub.3 is for example C.sub.1 -C.sub.18 alkyl, R'.sub.3 when x is 1, has one of the meanings given for R.sub.3, or R'.sub.3 in the formula IV and when x is 2 in the formula 1, is for example C.sub.2 -C.sub.12 alkylene, phenylene; R.sub.4 and R.sub.5 are independently of each other for example hydrogen, halogen, C.sub.1 -C.sub.6 alkyl; R.sub.6 is for example hydrogen, phenyl; R.sub.7 and R.sub.8 are independently of each other for example hydrogen or C.sub.1 -C.sub.12 -alkyl; R.sub.9 is for example C.sub.1 -C.sub.12 alkyl; A is S, O, NR.sub.
    Type: Grant
    Filed: June 25, 1998
    Date of Patent: December 21, 1999
    Assignee: Ciba Specialty Chemicals Corporation
    Inventors: Hitoshi Yamato, Hartmut Bleier, Jean-Luc Birbaum, Martin Kunz, Kurt Dietliker, Christoph De Leo, Toshikage Asakura
  • Patent number: 5629356
    Abstract: Compounds of the formula I, II, III and IIIa ##STR1## in which Ar.sup.1 is an unsubstituted or substituted aromatic radical and at least one of the radicals R.sup.1 and R.sup.2 is an alkenyl, cycloalkenyl or arylmethyl group, are effective photoinitiators for photopolymerization of unsaturated compounds. They are particularly suitable for photocuring of pigmented systems.
    Type: Grant
    Filed: March 12, 1996
    Date of Patent: May 13, 1997
    Assignee: Ciba Geigy Corporation
    Inventors: Vincent Desobry, Kurt Dietliker, Rinaldo H usler, Werner Rutsch, Manfred Rembold, Franciszek Sitek
  • Patent number: 5554663
    Abstract: Compounds of the formula I, II, III and IIIa ##STR1## in which Ar.sup.1 is an unsubstituted or substituted aromatic radical and at least one of the radicals R.sup.1 and R.sup.2 is an alkenyl, cycloalkenyl or arylmethyl group, are effective photoinitiators for photopolymerization of unsaturated compounds. They are particularly suitable for photocuring of pigmented systems.
    Type: Grant
    Filed: June 6, 1995
    Date of Patent: September 10, 1996
    Assignee: Ciba-Geigy Corporation
    Inventors: Vincent Desobry, Kurt Dietliker, Rinaldo H usler, Werner Rutsch, Manfred Rembold, Franciszek Sitek
  • Patent number: 5534629
    Abstract: Compounds of the formula I, II, III and IIIa ##STR1## in which Ar.sup.1 is an unsubstituted or substituted aromatic radical and at least one of the radicals R.sup.1 and R.sup.2 is an alkenyl, cycloalkenyl or arylmethyl group, are effective photoinitiators for photopolymerization of unsaturated compounds. They are particularly suitable for photocuring of pigmented systems.
    Type: Grant
    Filed: May 1, 1995
    Date of Patent: July 9, 1996
    Assignee: Ciba-Geigy Corporation
    Inventors: Vincent Desobry, Kurt Dietliker, Rinaldo Husler, Werner Rutsch, Manfred Rembold, Franciszek Sitek
  • Patent number: 5306600
    Abstract: Titanocenes of the formula I ##STR1## in which R.sup.1 are cyclopentadienyl.sup..crclbar. groups and R.sup.2 and R.sup.3 are aromatic radicals which are substituted in both ortho-positions by fluorine and, in addition, are substituted by an acyloxy group are suitable as photoinitiators for the photopolymerization of ethylenically unsaturated compounds.
    Type: Grant
    Filed: November 12, 1992
    Date of Patent: April 26, 1994
    Assignee: Ciba-Geigy Corporation
    Inventors: Eginhard Steiner, Harry Beyeler, Martin Riediker, Vincent Desobry, Kurt Dietliker, Rinaldo Husler
  • Patent number: 5218009
    Abstract: Compounds of the formula I ##STR1## in which at least one of the radicals R.sub.1, R.sub.2 and R.sub.3 is a substituted alkyl radical or cycloalkyl radical, or R.sub.1 and R.sub.2 together with the phosphorus atom form a monocyclic or tricyclic ring, are effective photoinitiators for the photopolymerization of ethylenically unsaturated compounds.
    Type: Grant
    Filed: August 28, 1991
    Date of Patent: June 8, 1993
    Assignee: Ciba-Geigy Corporation
    Inventors: Werner Rutsch, Kurt Dietliker, Roger G. Hall
  • Patent number: 5192642
    Abstract: Titanocenes of the formula I ##STR1## in which R.sup.1 are cyclopentadienyl.sup..crclbar. groups and R.sup.2 and R.sup.3 are aromatic radicals which are substituted in both ortho-positions by fluorine and, in addition, are substituted by an acyloxy group are suitable as photoinitiators for the photopolymerization of ethylenically unsaturated compounds.
    Type: Grant
    Filed: May 23, 1990
    Date of Patent: March 9, 1993
    Assignee: Ciba-Geigy Corporation
    Inventors: Eginhard Steiner, Harry Beyeler, Martin Riediker, Vincent Desobry, Kurt Dietliker, Rinaldo Husler
  • Patent number: 5147901
    Abstract: Propiophenones of the formula I ##STR1## in which R.sup.1 is hydrogen or C.sub.1 -C.sub.4 -alkyl, --Si(CH.sub.3).sub.3, allyl or benzyl, R.sup.2 is hydrogen, C.sub.1 -C.sub.8 -alkyl, C.sub.1 -C.sub.4 -alkyl which is substituted by C.sub.1 -C.sub.4 -alkoxy or --OH, --(CH.sub.2 --CH.sub.2 --O).sub.n --R.sup.5 where n is 2 to 20 and R.sup.5 is H or C.sub.1 -C.sub.4 -alkyl, --Si(CH.sub.3).sub.3, benzyl, C.sub.3 -C.sub.6 -alkenyl, C.sub.3 -C.sub.4 -alkynyl or 2-tetrahydrofuranyl, or R.sup.1 and R.sup.2 together are a C.sub.1 -C.sub.6 -alkylidene radical or a C.sub.2 -C.sub.6 -alkylidene radical which is substituted by hydroxyl, C.sub.1 -C.sub.4 -alkoxy or phenyl, a linear or branched C.sub.2 -C.sub.6 -alkanediyl radical, a benzylidene, cyclopentylidene or cyclohexylidene radical or a 2,2,2-trichloroethylidene, 2-furylmethylidene or dimethylsilylidene radical, R.sup.3 is phenyl which is unsubstituted or substituted by one or more --Cl, C.sub.1 -C.sub.4 -alkyl, C.sub.1 -C.sub.4 -alkoxy or C.sub.1 -C.sub.
    Type: Grant
    Filed: September 22, 1989
    Date of Patent: September 15, 1992
    Assignee: Ciba-Geigy Corporation
    Inventors: Werner Rutsch, Rudolf Kirchmayr, Rinaldo Husler, Kurt Dietliker
  • Patent number: 5145885
    Abstract: The photopolymerizable composition described containsA) at least one ethylenically unsaturated photopolymerizable compound,B) a photoinitiator of the formula I ##STR1## and C) a photosensitizer from the group of aromatic carbonyl compounds having a triplet energy of 225-310 kJ/mol, for example xanthones, thioxanthones, coumarins, phthalimides, phenones and the like.Ar is phenyl substituted in the 4-position by a substituted amino group, R.sup.1 and R.sup.2 are alkyl, R.sup.3 and R.sup.4 are alkyl or alkoxyalkyl, or R.sup.3 and R.sup.4 together are 3-oxapentamethylene. Said sensitizers C) raise the activity of said photoinitiators (B) without shortening the shelf life of the mixtures. The photocurable mixtures are used especially as binders for printing inks or paints.
    Type: Grant
    Filed: November 13, 1990
    Date of Patent: September 8, 1992
    Assignee: Ciba-Geigy Corporation
    Inventors: Godwin Berner, Kurt Meier, Kurt Dietliker, Rinaldo Husler
  • Patent number: 5077402
    Abstract: Compounds of the formula I, II, III and IIIa ##STR1## in which Ar.sup.1 is an unsubstituted or substituted aromatic radical and at least one of the radicals R.sup.1 and R.sup.2 is an alkenyl, cycloalkenyl or arylmethyl group, are effective photoinitiators for photopolymerization of unsaturated compounds. They are particularly suitable for photocuring of pigmented systems.
    Type: Grant
    Filed: March 28, 1990
    Date of Patent: December 31, 1991
    Assignee: Ciba-Geigy Corporation
    Inventors: Vincent Desobry, Kurt Dietliker, Rinaldo Husler, Werner Rutsch, Manfred Rembold, Franciszek Sitek
  • Patent number: 4992547
    Abstract: The photopolymerizable mixture described contains(A) at least one ethylenically unsaturated photopolymerisable compound,(B) a photoinitiator of the formula I ##STR1## and (C) a photosensitiser from the group of aromatic carbonyl compounds having a triplet energy of 225-310 kJ/mol, for example xanthones, thioxianthones, coumarins, phthalimides, phenones and the like.Ar is phenyl substituted in the 4-position by a substituted amino group, R.sup.1 and R.sup.2 are alkyl, R.sup.3 and R.sup.4 are alkyl or alkoxyalkyl, or R.sup.3 and R.sup.4 together are 3-oxapentamethylene. Said sensitisers (C) raise the activity of said photoinitiators (B) without shortening the shelf life of the mixtures. The photocurable mixtures are used especially as binders for printing inks or paints.
    Type: Grant
    Filed: June 14, 1988
    Date of Patent: February 12, 1991
    Assignee: Ciba-Geigy Corporation
    Inventors: Godwin Berner, Kurt Meier, Kurt Dietliker, Rinaldo Husler