Patents by Inventor Kwang Shin

Kwang Shin has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20190034417
    Abstract: A method for analyzing digital contents is disclosed. According to an embodiment, a plurality of information sources are extracted from digital contents associated with a specific topic, an information source network is created on the basis of the plurality of information sources, and at least one of quantitative and qualitative analyses for the corresponding topic is performed on the basis of the information source network.
    Type: Application
    Filed: January 15, 2018
    Publication date: January 31, 2019
    Inventors: Byung Won On, Gyu Sang Choi, Hyun Kwang Shin
  • Publication number: 20180193998
    Abstract: The present disclosure relates to an IoT-based modular robotics system where a function button for changing from a program mode to an automatic mode is installed in a master block, enabling instant execution of the automatic mode in the master block.
    Type: Application
    Filed: November 25, 2016
    Publication date: July 12, 2018
    Inventor: Jae Kwang Shin
  • Publication number: 20180096897
    Abstract: A method of fabricating a semiconductor device including a diffused metal-oxide-semiconductor (DMOS) transistor, an n-type metal-oxide-semiconductor (NMOS) transistor, and a p-type metal-oxide-semiconductor (PMOS) transistor includes forming separation regions in a semiconductor substrate, forming a gate insulating film, forming a DMOS gate electrode on the gate insulating film, forming a first mask pattern on the semiconductor substrate, performing a first ion implantation process, forming a second mask pattern on the semiconductor substrate, performing a second ion implantation process, forming a third mask pattern on the semiconductor substrate and performing a third ion implantation process into the semiconductor substrate, and forming a fourth mask pattern on the semiconductor substrate and performing a fourth ion implantation process.
    Type: Application
    Filed: December 5, 2017
    Publication date: April 5, 2018
    Applicant: Magnachip Semiconductor, Ltd.
    Inventors: Hyun Kwang Shin, Jung Lee, Kyung Ho Lee
  • Publication number: 20180045697
    Abstract: A thermal desorption system including a chamber including a space in which a substrate is heated; a flow compartment within the chamber, the flow compartment providing a separate gas flow space within the chamber; a substrate support that supports the substrate within the flow compartment; a heater that heats the substrate within the flow compartment; and a gas pipe that introduces a carrier gas into the flow compartment and discharges the carrier gas from the flow compartment.
    Type: Application
    Filed: March 14, 2017
    Publication date: February 15, 2018
    Inventors: Kyung-Ju SUK, Eun-Hee PARK, Sang-Hwan KIM, Hye-Kyoung MOON, Jung-Dae PARK, Min-Soo SUH, Kwang-Shin LIM
  • Patent number: 9859410
    Abstract: A High electron mobility transistor (HEMT) includes a source electrode, a gate electrode, a drain electrode, a channel forming layer in which a two-dimensional electron gas (2DEG) channel is induced, and a channel supplying layer for inducing the 2DEG channel in the channel forming layer. The source electrode and the drain electrode are located on the channel supplying layer. A channel increase layer is between the channel supplying layer and the source and drain electrodes. A thickness of the channel supplying layer is less than about 15 nm.
    Type: Grant
    Filed: September 26, 2014
    Date of Patent: January 2, 2018
    Assignee: Samsung Electronics Co., Ltd.
    Inventors: In-jun Hwang, Jai-kwang Shin, Jae-joon Oh, Jong-seob Kim, Hyuk-soon Choi, Ki-ha Hong
  • Patent number: 9859168
    Abstract: A method of fabricating a semiconductor device including a diffused metal-oxide-semiconductor (DMOS) transistor, an n-type metal-oxide-semiconductor (NMOS) transistor, and a p-type metal-oxide-semiconductor (PMOS) transistor includes forming separation regions in a semiconductor substrate, forming a gate insulating film, forming a DMOS gate electrode on the gate insulating film, forming a first mask pattern on the semiconductor substrate, performing a first ion implantation process, forming a second mask pattern on the semiconductor substrate, performing a second ion implantation process, forming a third mask pattern on the semiconductor substrate and performing a third ion implantation process into the semiconductor substrate, and forming a fourth mask pattern on the semiconductor substrate and performing a fourth ion implantation process.
    Type: Grant
    Filed: January 17, 2017
    Date of Patent: January 2, 2018
    Assignee: Magnachip Semiconductor, Ltd.
    Inventors: Hyun Kwang Shin, Jung Lee, Kyung Ho Lee
  • Patent number: 9660048
    Abstract: High electron mobility transistors (HEMT) exhibiting dual depletion and methods of manufacturing the same. The HEMT includes a source electrode, a gate electrode and a drain electrode disposed on a plurality of semiconductor layers having different polarities. A dual depletion region exists between the source electrode and the drain electrode. The plurality of semiconductor layers includes an upper material layer, an intermediate material layer and a lower material layer, and a polarity of the intermediate material layer is different from polarities of the upper material layer and the lower material layer.
    Type: Grant
    Filed: January 28, 2011
    Date of Patent: May 23, 2017
    Assignee: Samsung Electronics Co., Ltd.
    Inventors: In-jun Hwang, Jong-seob Kim, Hyuk-soon Choi, Ki-ha Hong, Jai-kwang Shin, Jae-joon Oh
  • Patent number: 9649724
    Abstract: A charging device of a welding fixture of spacer grid comprises a base frame; a conveyor for conveying a welding fixture horizontally over the base frame; and a gripper located over the base frame for gripping a welding fixture conveyed along the conveyor to charge a welding fixture into a welding chamber, wherein the gripper comprises a gripper body; and a gripping part installed horizontal to the end of the gripper body for gripping a welding fixture and capable of tilting in vertical direction to the gripper body in case more than a predetermined load is applied as a vertical load.
    Type: Grant
    Filed: June 12, 2015
    Date of Patent: May 16, 2017
    Assignee: KEPCO NUCLEAR FUEL CO., LTD.
    Inventors: Byeong Eun Oh, Kwang Ho Yun, Dong Kwang Shin, Heui Seob Yang, Sang Jae Han, Jong Sung Hong
  • Publication number: 20170108476
    Abstract: A conductivity detector includes a flow channel, an electrode arrangement, and a detector. The flow channel has a tube shape with a channel diameter through which a solution including ion components flows. The electrode arrangement is on the flow channel and includes at least an anode and at least a cathode. The anode and cathode are spaced apart by an electrode gap less than or equal to the channel diameter. The detector is connected to the electrode arrangement to detect electrical conductivity of the ion components.
    Type: Application
    Filed: August 30, 2016
    Publication date: April 20, 2017
    Inventors: Sunghan JUNG, Ami CHOI, JungDae PARK, Dong-Soo LEE, Ji-Won EOM, Kyung-Soo CHAE, Kwang-Shin LIM
  • Publication number: 20170089871
    Abstract: An evaluation system of block copolymer patterns includes a supplier, a plurality of analyzers, and a homopolymer interference remover. The supplier provides a sample including a block copolymer and a homopolymer. The analyzers measure a molecular weight of the block copolymer in the sample, measure a preliminary block ratio, the preliminary block ratio corresponding to a total ratio in the sample of each block in the block copolymer, and selectively measure a ratio of the homopolymer in the sample. The homopolymer interference remover subtracts the ratio of the homopolymer from the preliminary block ratio.
    Type: Application
    Filed: August 22, 2016
    Publication date: March 30, 2017
    Inventors: Min-Soo SUH, Hyun-Young PARK, Jung-Dae PARK, Ki-Hyun KIM, Kwang-Shin LIM
  • Patent number: 9608100
    Abstract: According to example embodiments, a high electron mobility transistor (HEMT) includes: stack including a buffer layer, a channel layer containing a two dimensional electron gas (2DEG) channel, and a channel supply layer sequentially stacked on each other, the stack defining a first hole and a second hole that are spaced apart from each other. A first electrode, a second electrode, and third electrode are spaced apart from each other along a first surface of the channel supply layer. A first pad is on the buffer layer and extends through the first hole of the stack to the first electrode. A second pad is on the buffer layer and extends through the second hole of the stack to the second electrode. A third pad is under the stack and electrically connected to the third electrode.
    Type: Grant
    Filed: December 14, 2012
    Date of Patent: March 28, 2017
    Assignee: Samsung Electronics Co., Ltd.
    Inventors: Hyuk-soon Choi, Jong-seob Kim, Jai-kwang Shin, Jae-joon Oh, Jong-bong Ha, In-jun Hwang
  • Patent number: 9573521
    Abstract: An apparatus for generating a virtual engine sound is provided. The apparatus includes a rotating bracket member that is disposed within a wheel of a vehicle and includes movement space therein, and elastic bodies, each of which has a first end fixed to a substantial rotation center position of the rotating bracket member. In addition, the apparatus includes weight bodies which are fixed to a second end of the elastic body, and are configured to move within the movement space based on a rotation speed of the wheel of the vehicle, and selectively contact the rotating bracket member.
    Type: Grant
    Filed: November 22, 2014
    Date of Patent: February 21, 2017
    Assignee: Hyundai Motor Company
    Inventors: Kitae Lee, Sung Kwang Shin, Dong Kon Lee, Ji Hoon Jeong, Chang Beom Kim, Bong Ho Lee, Eun Seok Yoo
  • Patent number: 9570597
    Abstract: According to example embodiments, a high electron mobility transistor (HEMT) includes a channel supply layer that induces a two-dimensional electron gas (2DEG) in a channel layer, a source electrode and a drain electrode that are at sides of the channel supply layer, a depletion-forming layer that is on the channel supply layer and contacts the source electrode, a gate insulating layer on the depletion-forming layer, and a gate electrode on the gate insulating layer. The depletion-forming layer forms a depletion region in the 2DEG.
    Type: Grant
    Filed: January 2, 2013
    Date of Patent: February 14, 2017
    Assignee: Samsung Electronics Co., Ltd.
    Inventors: Woo-chul Jeon, Jong-seob Kim, Ki-yeol Park, Young-hwan Park, Jai-kwang Shin, Jae-joon Oh, Jong-bong Ha, Sun-kyu Hwang
  • Patent number: 9525410
    Abstract: A power management chip and a power management device including the power management chip. The power management chip includes at least one power switch and a driver unit for generating a driving signal for driving the at least one power switch, the driver unit including one or more circuit units formed on a same substrate as the at least one power switch.
    Type: Grant
    Filed: August 17, 2012
    Date of Patent: December 20, 2016
    Assignee: SAMSUNG ELECTRONICS CO., LTD.
    Inventors: Ho-jung Kim, Jai-kwang Shin, U-in Chung, Hyun-sik Choi
  • Publication number: 20160351545
    Abstract: A printed circuit board includes first and second insulating layers forming a cavity, a first heat releasing layer formed on an exterior surface of the cavity, and a circuit layer formed above or below the first the insulating layer and at least between a surface of the cavity and the first insulating layer. The heat releasing layer is electrically connected to at least a portion of the circuit layer.
    Type: Application
    Filed: May 26, 2016
    Publication date: December 1, 2016
    Applicant: SAMSUNG ELECTRO-MECHANICS CO., LTD.
    Inventors: Suk-Chang HONG, Hyo-Bin PARK, Dong-Kwang SHIN, Sang-Jin BAEK
  • Patent number: 9461637
    Abstract: According to example embodiments, a method for controlling a gate voltage applied to a gate electrode of a high electron mobility transistor (HEMT) may include measuring a voltage between a drain electrode and a source electrode of the HEMT, and adjusting a level of the gate voltage applied to the gate electrode of the HEMT according to the measured voltage. The level of the gate electrode may be adjusted if the voltage between the drain electrode and the source electrode is different than a set value.
    Type: Grant
    Filed: December 16, 2013
    Date of Patent: October 4, 2016
    Assignee: Samsung Electronics Co., Ltd.
    Inventors: Sun-kyu Hwang, Woo-chul Jeon, Joon-yong Kim, Ki-yeol Park, Young-hwan Park, Jai-kwang Shin, Jae-joon Oh, Jong-bong Ha
  • Patent number: 9450071
    Abstract: Field effect semiconductor devices and methods of manufacturing the same are provided, the field effect semiconductor devices include a second semiconductor layer on a first surface of a first semiconductor layer, a first and a second third semiconductor layer respectively on two sides of the second semiconductor layer, a source and a drain respectively on the first and second third semiconductor layer, and a gate electrode on a second surface of the first semiconductor layer.
    Type: Grant
    Filed: September 13, 2010
    Date of Patent: September 20, 2016
    Assignee: Samsung Electronics Co., Ltd.
    Inventors: Ki-ha Hong, Jong-seob Kim, Jae-joon Oh, Jai-kwang Shin, Hyuk-soon Choi, In-jun Hwang, Ho-jung Kim
  • Patent number: 9443968
    Abstract: High electron mobility transistors (HEMTs) including lightly doped drain (LDD) regions and methods of manufacturing the same. A HEMT includes a source, a drain, a gate, a channel supplying layer for forming at least a 2-dimensional electron gas (2DEG) channel, and a channel formation layer in which at least the 2DEG channel is formed. The channel supplying layer includes a plurality of semiconductor layers having different polarizabilities. A portion of the channel supplying layer is recessed. One of the plurality of semiconductor layers, which is positioned below an uppermost layer is an etching buffer layer, as well as a channel supplying layer.
    Type: Grant
    Filed: April 28, 2011
    Date of Patent: September 13, 2016
    Assignee: Samsung Electronics Co., Ltd.
    Inventors: In-jun Hwang, Jai-kwang Shin, Jae-joon Oh, Jong-seob Kim, Hyuk-soon Choi, Ki-ha Hong
  • Patent number: 9379102
    Abstract: A nitride-based semiconductor diode includes a substrate, a first semiconductor layer disposed on the substrate, and a second semiconductor layer disposed on the first semiconductor layer. The first and second semiconductor layers include a nitride-based semiconductor. A first portion of the second semiconductor layer may have a thickness thinner than a second portion of the second semiconductor layer. The diode may further include an insulating layer disposed on the second semiconductor layer, a first electrode covering the first portion of the second semiconductor layer and forming an ohmic contact with the first semiconductor layer and the second semiconductor layer, and a second electrode separated from the first electrode, the second electrode forming an ohmic contact with the first semiconductor layer and the second semiconductor layer.
    Type: Grant
    Filed: June 25, 2013
    Date of Patent: June 28, 2016
    Assignee: Samsung Electronics Co., Ltd.
    Inventors: Woo-chul Jeon, Ki-yeol Park, Young-hwan Park, Jai-kwang Shin, Jae-joon Oh
  • Publication number: 20160151858
    Abstract: A charging device of a welding fixture of spacer grid comprises a base frame; a conveyor for conveying a welding fixture horizontally over the base frame; and a gripper located over the base frame for gripping a welding fixture conveyed along the conveyor to charge a welding fixture into a welding chamber, wherein the gripper comprises a gripper body; and a gripping part installed horizontal to the end of the gripper body for gripping a welding fixture and capable of tilting in vertical direction to the gripper body in case more than a predetermined load is applied as a vertical load.
    Type: Application
    Filed: June 12, 2015
    Publication date: June 2, 2016
    Applicant: KEPCO NUCLEAR FUEL CO., LTD.
    Inventors: Byeong Eun OH, Kwang Ho YUN, Dong Kwang SHIN, Heui Seob YANG, Sang Jae HAN, Jong Sung HONG