Patents by Inventor Kwang-Sub Yoon

Kwang-Sub Yoon has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Photosensitive monomer, photosensitive polymer and chemically amplified resist composition comprising lactone group having acid-labile protecting group
    Patent number: 6696217
    Abstract: A photosensitive monomer including a methylene butyrolactone derivative represented by the following formula: wherein R1 is a hydrogen atom or alkyl group, R2 is an acid-labile group, X is a hydrogen atom, or substituted or unsubstituted alkyl group having 1 to 10 carbon atoms, and Y is a substituted or unsubstitued alkyl group or alicyclic hydrocarbon group having 1 to 20 carbon atoms.
    Type: Grant
    Filed: February 20, 2002
    Date of Patent: February 24, 2004
    Assignee: Samsung Electronics Co., Ltd.
    Inventors: Kwang-sub Yoon, Sang-gyun Woo
  • Resist composition comprising photosensitive polymer having lactone in its backbone
    Publication number: 20040018442
    Abstract: A resist composition includes a photosensitive polymer having a lactone in its backbone.
    Type: Application
    Filed: January 24, 2003
    Publication date: January 29, 2004
    Inventors: Kwang-Sub Yoon, Dong-Won Jung, Si-Hyeung Lee, Hyun-Woo Kim, Sook Lee, Sang-Gyun Woo, Sang-Jun Choi
  • Photosensitive polymer including fluorine and resist composition containing the same
    Publication number: 20030228537
    Abstract: Disclosed is a photosensitive polymer comprising pentafluoromethylvinyl ether derivative monomer having the formula: 1
    Type: Application
    Filed: April 28, 2003
    Publication date: December 11, 2003
    Inventors: Kwang-Sub Yoon, Sang-Gyun Woo, Ki-Yong Song, Sang-Jun Choi
  • Photosensitive polymer
    Patent number: 6642336
    Abstract: A photosensitive polymer which maintains transparency even when exposed to a short-wavelength light source of 193 nm or below, exhibits improved adhesiveness to a substrate, improved contrast and improved resistance to dry etching. The photosensitive polymer includes a first monomer which is alicyclic hydrocarbon carboxylate having an acid-labile C6 to C20 tertiary alicyclic hydrocarbon group as a substituent, and a second monomer which is capable of free radical polymerization.
    Type: Grant
    Filed: August 23, 2000
    Date of Patent: November 4, 2003
    Assignee: Samsung Electronics Co., Ltd.
    Inventors: Sook Lee, Ki-young Kwon, Si-hyeung Lee, Kwang-sub Yoon, Hyun-woo Kim, Dong-won Jung, Sang-jun Choi, Sang-gyun Woo
  • Fluorine-containing photosensitive polymer having hydrate structure and resist composition comprising the same
    Publication number: 20030157430
    Abstract: Provided are a fluorine-containing photosensitive polymer having a hydrate structure and a resist composition including the photosensitive polymer.
    Type: Application
    Filed: October 4, 2002
    Publication date: August 21, 2003
    Applicant: Samsung Electronics Co., Ltd.
    Inventors: Kwang-Sub Yoon, Ki-Yong Song, Sang-Jun Choi, Sang-Gyun Woo
  • Photosensitive polymer and resist composition containing the same
    Patent number: 6596459
    Abstract: There are provided a photosensitive polymer and a photoresist compositing containing the same. The photosensitive polymer is represented by the following formula: wherein R1 is an acid-labile tertiary alkyl ester group, R2 is hydrogen atom, methyl, ethyl, carboxyl, &ggr;-butyrolactone-2-yl ester, &ggr;-butyrolactone-3-yl ester, pantolactone-2-yl ester, mevalonic lactone ester, 3-tetrahydrofuranyl ester, 2,3-propylenecarbonate-1-yl ester, 3-methyl-&ggr;-butyrolactone-3-yl ester or C3 to C20 alicyclic hydrocarbon, a/(a+b+c) is 0.1˜0.7, b/(a+b+c) is 0.1˜0.8, c/(a+b+c) is 0.0˜0.8, and n is an integer in the range of 0 to 2.
    Type: Grant
    Filed: November 21, 2000
    Date of Patent: July 22, 2003
    Assignee: Samsung Electronics Co., Ltd.
    Inventors: Hyun-woo Kim, Ki-young Kwon, Si-hyeung Lee, Dong-won Jung, Sook Lee, Kwang-sub Yoon, Sang-jun Choi, Sang-gyun Woo
  • Photosenseitive polymer having fluorinated ethylene glycol group and chemically amplified resist compositon comprising the same
    Publication number: 20030125511
    Abstract: A photosensitive polymer comprises a fluorinated ethylene glycol group and a chemically amplified resist composition including the photosensitive polymer.
    Type: Application
    Filed: November 5, 2002
    Publication date: July 3, 2003
    Applicant: Sumsung Electronics Co., Ltd.
    Inventors: Sang-Jun Choi, Joo-Tae Moon, Sang-Gyun Woo, Kwang-Sub Yoon, Ki-Yong Song
  • Resist composition comprising photosensitive polymer having loctone in its backbone
    Patent number: 6537727
    Abstract: A resist composition includes a photosensitive polymer having a lactone in its backbone. The photosensitive polymer of the resist composition includes at least one of the monomers having the formulae: where R1 and R2 are independently a hydrogen atom, alkyl, hydroxyalkyl, alkyloxy, carbonyl or ester, and x, y, v and w are independently integers from 1 to 6.
    Type: Grant
    Filed: July 11, 2001
    Date of Patent: March 25, 2003
    Assignee: Samsung Electronics Co., Ltd.
    Inventors: Kwang-sub Yoon, Dong-won Jung, Si-hyeung Lee, Hyun-woo Kim, Sook Lee, Sang-gyun Woo, Sang-jun Choi
  • Photosensitive monomer, photosensitive polymer and chemically amplified resist composition comprising lactone group having acid-labile protecting group
    Publication number: 20020155379
    Abstract: A photosensitive monomer including a methylene butyrolactone derivative represented by the following formula: 1
    Type: Application
    Filed: February 20, 2002
    Publication date: October 24, 2002
    Inventors: Kwang-sub Yoon, Sang-gyun Woo
  • Resist composition comprising photosensitive polymer having loctone in its backbone
    Publication number: 20020042016
    Abstract: A resist composition includes a photosensitive polymer having a lactone in its backbone.
    Type: Application
    Filed: July 11, 2001
    Publication date: April 11, 2002
    Inventors: Kwang-sub Yoon, Dong-won Jung, Si-hyeung Lee, Hyun-woo Kim, Sook Lee, Sang-gyun Woo, Sang-jun Choi