Patents by Inventor Kyle Fondurulia
Kyle Fondurulia has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 11926894Abstract: Herein disclosed are systems and methods related to solid source chemical vaporizer vessels and multiple chamber deposition modules. In some embodiments, a solid source chemical vaporizer includes a housing base and a housing lid. Some embodiments also include a first and second tray configured to be housed within the housing base, wherein each tray defines a first serpentine path adapted to hold solid source chemical and allow gas flow thereover. In some embodiments, a multiple chamber deposition module includes first and second vapor phase reaction chambers and a solid source chemical vaporizer vessel to supply each of the first and second vapor phase reaction chambers.Type: GrantFiled: May 3, 2017Date of Patent: March 12, 2024Assignee: ASM IP Holding B.V.Inventors: Mohith Verghese, Eric James Shero, Carl Louis White, Kyle Fondurulia, Herbert Terhorst
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Publication number: 20230383402Abstract: Herein disclosed are systems and methods related to solid source chemical sublimator vessels and corresponding deposition modules. The solid source chemical sublimator can include a housing configured to hold solid chemical reactant therein. A lid may be disposed on a proximal portion of the housing. The lid can include a fluid inlet and a fluid outlet and define a serpentine flow path within a distal portion of the lid. The lid can be adapted to allow gas flow within the flow path. The solid source chemical sublimator can include a filter that is disposed between the serpentine flow path and the distal portion of the housing. The filter can have a porosity configured to restrict a passage of a solid chemical reactant therethrough.Type: ApplicationFiled: August 11, 2023Publication date: November 30, 2023Inventors: Eric James Shero, Carl Louis White, Mohith E. Verghese, Kyle Fondurulia, Timothy James Sullivan
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Publication number: 20230313367Abstract: A reactor system for use in semiconductor processing, such as for chemical vapor deposition (CVD), atomic layer deposition (ALD), and other deposition steps, that makes use of a reactor module with two or more reaction chambers. The reactor system includes components of a cooling system to provide enhanced temperature uniformity across a chamber lid enclosing the housing or vessel containing the reaction chambers. In part, the cooling system is adapted to utilize convective heat transfer and includes a finned heat sink positioned at the center of the chamber lid in the center space between the external portions of the showerheads of the reaction chambers. Further, the cooling system includes a fan positioned to have its outlet at the center space and over the finned heat sink so that air is directed into the center space and onto the heat sink.Type: ApplicationFiled: March 29, 2023Publication date: October 5, 2023Inventors: Ankit Kimtee, Akshay Phadnis, Kyle Fondurulia, Thomas Fitzgerald
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Publication number: 20230313370Abstract: Herein disclosed are systems and methods related to solid source chemical sublimator vessels and corresponding deposition modules. The solid source chemical sublimator can include a housing configured to hold solid chemical reactant therein. A lid may be disposed on a proximal portion of the housing. The lid can include a fluid inlet and a fluid outlet and define a serpentine flow path within a distal portion of the lid. The lid can be adapted to allow gas flow within the flow path. The solid source chemical sublimator can include a filter that is disposed between the serpentine flow path and the distal portion of the housing. The filter can have a porosity configured to restrict a passage of a solid chemical reactant therethrough.Type: ApplicationFiled: June 9, 2023Publication date: October 5, 2023Inventors: Eric James Shero, Carl Louis White, Mohith E. Verghese, Kyle Fondurulia, Timothy James Sullivan
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Patent number: 11773486Abstract: Herein disclosed are systems and methods related to solid source chemical sublimator vessels and corresponding deposition modules. The solid source chemical sublimator can include a housing configured to hold solid chemical reactant therein. A lid may be disposed on a proximal portion of the housing. The lid can include a fluid inlet and a fluid outlet and define a serpentine flow path within a distal portion of the lid. The lid can be adapted to allow gas flow within the flow path. The solid source chemical sublimator can include a filter that is disposed between the serpentine flow path and the distal portion of the housing. The filter can have a porosity configured to restrict a passage of a solid chemical reactant therethrough.Type: GrantFiled: February 1, 2023Date of Patent: October 3, 2023Assignee: ASM IP Holding B.V.Inventors: Eric James Shero, Carl Louis White, Mohith E. Verghese, Kyle Fondurulia, Timothy James Sullivan
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Publication number: 20230235454Abstract: Systems and methods related to temperature zone control systems can include a reactant source cabinet that is configured to be at least partially evacuated, a vessel base that is configured to hold solid source chemical reactant therein, and a lid that is coupled to a distal portion of the vessel base. The lid may include one or more lid valves. The system may further include a plurality of gas panel valves that are configured to deliver gas from a gas source to the vessel. The system may include a heating element that is configured to heat the one or more lid valves. The system may include a heat shield, a first portion of which is disposed between the one or more lid valves and the vessel base. A second portion of the heat shield may be disposed between the first heating element and the plurality of gas panel valves.Type: ApplicationFiled: April 5, 2023Publication date: July 27, 2023Inventors: Carl Louis White, Eric James Shero, Kyle Fondurulia
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Publication number: 20230183861Abstract: Herein disclosed are systems and methods related to solid source chemical sublimator vessels and corresponding deposition modules. The solid source chemical sublimator can include a housing configured to hold solid chemical reactant therein. A lid may be disposed on a proximal portion of the housing. The lid can include a fluid inlet and a fluid outlet and define a serpentine flow path within a distal portion of the lid. The lid can be adapted to allow gas flow within the flow path. The solid source chemical sublimator can include a filter that is disposed between the serpentine flow path and the distal portion of the housing. The filter can have a porosity configured to restrict a passage of a solid chemical reactant therethrough.Type: ApplicationFiled: February 1, 2023Publication date: June 15, 2023Inventors: Eric James Shero, Carl Louis White, Mohith E. Verghese, Kyle Fondurulia, Timothy James Sullivan
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Publication number: 20230183863Abstract: The present disclosure pertains to embodiments of a semiconductor deposition reactor manifold which can be used to deposit semiconductor layers using processes such as atomic layer deposition (ALD). The semiconductor deposition reactor manifold comprising heater blocks with heater elements mounted on a manifold body. Advantageously, the heater blocks are detachably mounted for easy replacement.Type: ApplicationFiled: December 12, 2022Publication date: June 15, 2023Inventors: Shreyans Kedia, Dinkar Nandwana, Kyle Fondurulia, Todd Robert Dunn, Jereld Lee Winkler
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Patent number: 11634812Abstract: Herein disclosed are systems and methods related to solid source chemical sublimator vessels and corresponding deposition modules. The solid source chemical sublimator can include a housing configured to hold solid chemical reactant therein. A lid may be disposed on a proximal portion of the housing. The lid can include a fluid inlet and a fluid outlet and define a serpentine flow path within a distal portion of the lid. The lid can be adapted to allow gas flow within the flow path. The solid source chemical sublimator can include a filter that is disposed between the serpentine flow path and the distal portion of the housing. The filter can have a porosity configured to restrict a passage of a solid chemical reactant therethrough.Type: GrantFiled: August 13, 2019Date of Patent: April 25, 2023Assignee: ASM IP HOLDING B.V.Inventors: Eric James Shero, Carl Louis White, Mohith E. Verghese, Kyle Fondurulia, Timothy James Sullivan
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Patent number: 11626313Abstract: The present disclosure relates to a semiconductor processing apparatus having a reaction chamber which can include a baseplate having an opening; a moveable substrate support configured to support a substrate; a movement element configured to move a substrate held on the substrate support towards the opening of the baseplate; a plurality of gas inlets positioned above and configured to direct gas downwardly towards the substrate support; and a sealing element configured to form a seal between the baseplate and the substrate support, the seal positioned at a greater radial distance from a center of the substrate support than an outer edge of the substrate support. In some embodiments, the sealing element can also include a plurality of apertures extend through the sealing element, the apertures configured to provide a flow path between a position below the sealing element to a position above the sealing element.Type: GrantFiled: December 18, 2020Date of Patent: April 11, 2023Assignee: ASM IP HOLDING B.V.Inventors: Carl Louis White, Kyle Fondurulia, John Kevin Shugrue
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Patent number: 11624113Abstract: Systems and methods related to temperature zone control systems can include a reactant source cabinet that is configured to be at least partially evacuated, a vessel base that is configured to hold solid source chemical reactant therein, and a lid that is coupled to a distal portion of the vessel base. The lid may include one or more lid valves. The system may further include a plurality of gas panel valves that are configured to deliver gas from a gas source to the vessel. The system may include a heating element that is configured to heat the one or more lid valves. The system may include a heat shield, a first portion of which is disposed between the one or more lid valves and the vessel base. A second portion of the heat shield may be disposed between the first heating element and the plurality of gas panel valves.Type: GrantFiled: September 3, 2020Date of Patent: April 11, 2023Assignee: ASM IP HOLDING B.V.Inventors: Carl Louis White, Eric James Shero, Kyle Fondurulia
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Patent number: 11501956Abstract: A showerhead including a body having an opening, a first plate positioned within the opening and having a plurality of slots, a second plate positioned within the opening and having a plurality of slots, and wherein each of the first plate plurality of slots are concentrically aligned with the second plate plurality of slots.Type: GrantFiled: May 19, 2020Date of Patent: November 15, 2022Assignee: ASM IP Holding B.V.Inventors: Carl White, Todd Dunn, Eric Shero, Kyle Fondurulia
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Patent number: 11377732Abstract: Herein disclosed are systems and methods related to solid source chemical vaporizer vessels and multiple chamber deposition modules. In some embodiments, a solid source chemical vaporizer includes a housing base and a housing lid. Some embodiments also include a first and second tray configured to be housed within the housing base, wherein each tray defines a first serpentine path adapted to hold solid source chemical and allow gas flow thereover. In some embodiments, a multiple chamber deposition module includes first and second vapor phase reaction chambers and a solid source chemical vaporizer vessel to supply each of the first and second vapor phase reaction chambers.Type: GrantFiled: July 10, 2020Date of Patent: July 5, 2022Assignee: ASM IP HOLDING B.V.Inventors: Mohith Verghese, Eric James Shero, Carl Louis White, Kyle Fondurulia
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Publication number: 20210214846Abstract: The present disclosure pertains to embodiments of a showerhead assembly which can be used to deposit semiconductor layers using processes such as atomic layer deposition (ALD). The showerhead assembly has a showerhead which has an increased thickness which advantageously decreases reactor chamber size and decreases cycling time. Decreased cycling time can improve throughput and decrease costs.Type: ApplicationFiled: January 14, 2021Publication date: July 15, 2021Inventors: Dinkar Nandwana, Carl Louis White, Eric James Shero, William George Petro, Herbert Terhorst, Gnyanesh Trivedi, Mark Olstad, Ankit Kimtee, Kyle Fondurulia, Michael Schmotzer, Jereld Lee Winkler
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Publication number: 20210207269Abstract: Gas supply assemblies and reactors systems including the gas supply assemblies are disclosed. An exemplary gas supply assembly includes a vessel, a valve plate, a housing encasing the vessel and the valve plate, a gas feedthrough having a first end interior of the housing and a second end exterior of the housing, and one or more valves attached to the valve plate, wherein at least one valve is fluidly coupled to an interior of the vessel. The assemblies can further include a removable gas line having a first end coupled to the at least one valve and a second end coupled to the gas feedthrough. Additionally or alternatively, a gas supply assembly can include one or more valve plate leveling devices coupled to the valve plate.Type: ApplicationFiled: December 29, 2020Publication date: July 8, 2021Inventors: Jianqiu Huang, Gejian Zhao, Kyle Fondurulia
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Publication number: 20210143048Abstract: The present disclosure relates to a semiconductor processing apparatus having a reaction chamber which can include a baseplate having an opening; a moveable substrate support configured to support a substrate; a movement element configured to move a substrate held on the substrate support towards the opening of the baseplate; a plurality of gas inlets positioned above and configured to direct gas downwardly towards the substrate support; and a sealing element configured to form a seal between the baseplate and the substrate support, the seal positioned at a greater radial distance from a center of the substrate support than an outer edge of the substrate support. In some embodiments, the sealing element can also include a plurality of apertures extend through the sealing element, the apertures configured to provide a flow path between a position below the sealing element to a position above the sealing element.Type: ApplicationFiled: December 18, 2020Publication date: May 13, 2021Inventors: Carl Louis White, Kyle Fondurulia, John Kevin Shugrue
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Publication number: 20210104427Abstract: The present disclosure relates to a semiconductor processing apparatus having a reaction chamber which can include a baseplate having an opening; a moveable substrate support configured to support a substrate; a movement element configured to move a substrate held on the substrate support towards the opening of the baseplate; a plurality of gas inlets positioned above and configured to direct gas downwardly towards the substrate support; and a sealing element configured to form a seal between the baseplate and the substrate support, the seal positioned at a greater radial distance from a center of the substrate support than an outer edge of the substrate support. In some embodiments, the sealing element can also include a plurality of apertures extend through the sealing element, the apertures configured to provide a flow path between a position below the sealing element to a position above the sealing element. Some embodiments include two or more stacked sealing elements.Type: ApplicationFiled: December 18, 2020Publication date: April 8, 2021Inventors: Carl Louis White, Kyle Fondurulia, John Kevin Shugrue, David Marquardt
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Publication number: 20210079527Abstract: Systems and methods related to temperature zone control systems can include a reactant source cabinet that is configured to be at least partially evacuated, a vessel base that is configured to hold solid source chemical reactant therein, and a lid that is coupled to a distal portion of the vessel base. The lid may include one or more lid valves. The system may further include a plurality of gas panel valves that are configured to deliver gas from a gas source to the vessel. The system may include a heating element that is configured to heat the one or more lid valves. The system may include a heat shield, a first portion of which is disposed between the one or more lid valves and the vessel base. A second portion of the heat shield may be disposed between the first heating element and the plurality of gas panel valves.Type: ApplicationFiled: September 3, 2020Publication date: March 18, 2021Inventors: Carl Louis White, Eric James Shero, Kyle Fondurulia
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Publication number: 20210040613Abstract: A cooling apparatus and methods for maintaining a precursor source vessel heater at a desired temperature are disclosed. The apparatus and methods can be used to maintain a desired temperature gradient within the precursor source vessel for improved integrity of the precursor source before delivery of the precursor to a reaction chamber. The apparatus and methods can also be used for rapid cooling of a source vessel for maintenance.Type: ApplicationFiled: August 3, 2020Publication date: February 11, 2021Inventors: Carl Louis White, Eric James Shero, Kyle Fondurulia, Timothy James Sullivan
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Publication number: 20210040615Abstract: A temperature control system for a chemical delivery system (e.g., comprised in a reactor system) may comprise a temperature control shell coupled to and/or enclosing at least a portion of at least one component of the chemical delivery system. A chemical delivery system may comprise a filter, an accumulator, and/or a chemical application line fluidly coupled to one another in any suitable arrangement and/or configuration. A temperature control system for such a chemical delivery system may comprise a filter temperature control shell coupled to and/or enclosing at least a portion of the filter, an accumulator temperature control shell coupled to and/or enclosing at least a portion of the accumulator, and/or an application line temperature control shell coupled to and/or enclosing at least a portion of the chemical application line.Type: ApplicationFiled: July 31, 2020Publication date: February 11, 2021Inventors: Carl Louis White, Kyle Fondurulia, Timothy James Sullivan