Abstract: An imaging optical instrument 12 includes: an imaging optical system 1; an imaging element 2; an image shift unit 3 for working on at least one of the imaging optical system 1 and the imaging element 2 so as to shift a position of a subject image with respect to the imaging element 2; an image storage unit 4 for storing a plurality of sets of image data; a harmful luminance image detection unit 5; and an image correction unit 6. The harmful luminance image detection unit 5 includes: an image shift arithmetic unit 8 for making the positions of the subject image of the plurality of sets of image data coincide with one another; and a differential image arithmetic unit 9 for carrying out differential arithmetic processing with respect to the sets of image data with the positions of the subject image having been made to coincide with one another, so as to detect a set of harmful luminance image data from sets of harmful luminance image data obtained in relation to the plurality of sets of image data.

Abstract: A zoom lens system comprising a first lens unit having negative power, a second lens unit having positive power and a third lens unit having positive power, wherein in zooming from a wide-angle limit to a telephoto limit, the lens units move respectively along an optical axis in such a manner that an interval between the first lens unit and the second lens unit decreases while an interval between the second lens unit and the third lens unit changes so that variable magnification is achieved, the first lens unit comprises one object side negative lens element and one image side positive lens element with a convex surface facing the object side, which have an aspheric surface, and the conditions: n12>1.88 and ?12<26 (n12 and ?12 are refractive index and Abbe number, respectively, of the image side positive lens element of the first lens unit) are satisfied.

Abstract: An exposure apparatus that exposes a pattern of an original onto a substrate, including an illumination optical system configured to illuminate an illumination light that illuminates the original; a projection optical system configured to project the pattern illuminated by the illumination light onto the substrate; and a vacuum chamber configured to house at least either one of the illumination optical system and the projection optical system; wherein in order to suppress temperature changes of at least either one of the illumination optical system and the projection optical system, the exposure apparatus is provided with a heat absorber configured to absorb heat that is generated within the vacuum chamber and heat entering the vacuum chamber from outside.

Abstract: The object is to obtain an imaging lens system having an entire lens system downsized, being excellent in portability, and being compatible with a large number of pixels by which a favorable image quality is provided. Provided is an imaging lens system for forming an optical image of an object on a light receiving surface of a solid-state image sensor, comprising, in order from an object side, an aperture diaphragm (100), a first lens element (101) having a positive optical power and a convex surface on an image side, a second lens element (102) having a negative optical power and being a meniscus lens whose object side has a concave shape, and a third lens element (103) having a positive optical power and being a meniscus lens whose object side has a convex shape, in which the following conditional expressions are satisfied: 1.9<|fd/f2d|<3.5 0.9<|fd/f3d|<2.0 ?2.5<(r201+r202)/(r201?r202)<?1.4 ?1.7<(r301+r302)/(r301?r302)<?1.

Abstract: The object is to obtain an imaging lens system having an entire lens system downsized, being excellent in portability, and being compatible with a large number of pixels by which a favorable image quality is provided. Provided is an imaging lens system for forming an optical image of an object on a light receiving surface of a solid-state image sensor, comprising, in order from an object side, an aperture diaphragm, and three lens elements, i.e., a first lens element which is a bi-aspherical lens having a positive optical power and a convex surface on an image side, a second lens element having a negative optical power and being a bi-aspherical meniscus lens whose object side has a concave shape, and a third lens element having a positive optical power and being a bi-aspherical meniscus lens whose object side has a convex shape, in which the following conditional expressions are satisfied: 1.5<|fd/f2d|<2.3 0.5<|fd/f3d|<1.1 ?2.2<(r21+r22)/(r21?r22)<?1.3 ?2.1<(r31+r32)/(r31?r32)<?1.

Abstract: An imging lens device has a zoom lens system and an imaging sensor. The zoom lens system has a plurality of lens units and changes gaps between the lens units to thereby generate an optical image of an object which can be optically and successively zoomed in and out. The imaging sensor which converts an optical image generated by the zoom lens system into an electric signal. The zoom lens system comprises, from the object side, a first unit having a negative power, a second unit having a positive power, the second unit having a cemented lens element joining three lens elements, and a lens element having a positive power, a third unit having a positive power, and an aperture stop disposed between the first unit and the second unit. Among the three lens elements which form the cemented lens element, a lens element disposed on the object side directs a convex surface toward the object side while a lens elements disposed on the image side directs a concave surface toward the image side.

Abstract: An imging lens device has a zoom lens system and an imaging sensor. The zoom lens system has a plurality of lens units and changes gaps between the lens units to thereby generate an optical image of an object which can be optically and successively zoomed in and out. The imaging sensor which converts an optical image generated by the zoom lens system into an electric signal. The zoom lens system comprises, from the object side, a first unit having a negative power, a second unit having a positive power, the second unit having a cemented lens element joining three lens elements, and a lens element having a positive power, a third unit having a positive power, and an aperture stop disposed between the first unit and the second unit. Among the three lens elements which form the cemented lens element, a lens element disposed on the object side directs a convex surface toward the object side while a lens elements disposed on the image side directs a concave surface toward the image side.

Abstract: A polishing apparatus and a polishing method can effectively prevent large diameter particles from being fed with slurry to an object to be polished. A large-diameter particle screener blocks or disperses large diameter particles from entering the slurry. Then, slurry free from large diameter particles is taken up from a slurry container by an intake pipe and fed to the object to be polished.

Abstract: A chemical mechanical polishing apparatus and method can polish a surface of an object very precisely at a high speed irrespective of the presence of a local defect on the surface to be polished. By using a multiplex ring-shaped polishing pad, an effective surface to be polished is increased, and very precise and uniform polishing can be performed at a high speed. By using a plurality of polishing pads, having different diameters smaller than the diameter of the surface to be polished, provided with an interval on the same revolution radius on a revolution table, or by using a plurality of polishing pads, having the same diameter smaller than the diameter of the surface to be polished, provided at positions having different revolution radii on a revolution table, very precise and uniform polishing can be performed.

Abstract: A camera including a first and second luminance detector, a distance detector and a calculator. The first luminance detector, having a first spectral sensitivity and receiving light from a larger region of a photographing view, generates a first luminance information. The distance detector, having a second spectral sensitivity and receiving light from a smaller region of the photographing view, generates a distance information concerning a distance to an object. The second luminance detector generates a second luminance information based on the received light of the distance detector. The calculator calculates a control luminance value for exposure control based on the first luminance information and the second luminance information when the first luminance information is above a predetermined threshold value. In addition, the calculator calculates a control luminance value based on the first luminance information when the first luminance information is below the predetermined threshold value.

Abstract: A chemical mechanical polishing apparatus and method can polish a surface of an object very precisely at a high speed irrespective of the presence of a local defect on the surface to be polished. By using a multiplex ring-shaped polishing pad, an effective surface to be polished is increased, and very precise and uniform polishing can be performed at a high speed. By using a plurality of polishing pads, having different diameters smaller than the diameter of the surface to be polished, provided with an interval on the same revolution radius on a revolution table, or by using a plurality of polishing pads, having the same diameter smaller than the diameter of the surface to be polished, provided at positions having different revolution radii on a revolution table, very precise and uniform polishing can be performed.

Abstract: A chemical-mechanical polishing apparatus for polishing a workpiece. The apparatus includes a rotatable table having a surface for holding a workpiece to be polished, a table drive mechanism for rotating the rotating table, a polishing tool rotatable around a rotation axis and being rectilinearly movable in an axial direction along the rotation axis, a polishing tool drive mechanism for rotating and rectilinearly moving the polishing tool, the polishing tool drive mechanism pressing the polishing tool against the workpiece to be polished at a predetermined pressure, a supply for supplying an abrasive material between the polishing tool and the workpiece to be polished, and a foreign substance removing device for removing a foreign substance on the surface of the table. The removing device is located rotationally downstream of the table relative to the polishing tool.

Abstract: A position detecting apparatus for detecting the position of a substrate in an interval direction in which the substrate is spaced by an interval form a pattern-printing projection optical system for printing pattern on the substrate includes first and second luminous flux projecting and receiving systems and a detector. The first luminous flux projecting system projects a first luminous flux to the substrate form a direction oblique to the interval direction. The first luminous flux receiving system receives a first luminous flux after the first luminous flux is reflected form the substrate. The second luminous flux projecting system projects a second luminous flux to a reflection member secured to the bottom end of the pattern-printing projection optical system. The second luminous flux receiving system receives the second luminous flux after the second luminous flux is reflected by the reflection member.

Abstract: A surface position detecting system for detecting a position of a surface of an object disposed opposed to an exposure system, with respect to a direction of an optical system of the exposure system, includes an irradiation device for projecting light to the surface of the object, obliquely with respect to the optical axis of the exposure system, a detecting device for detecting light from the surface of the object irradiated with light from the irradiation device, the detecting device detecting a position of the surface of the object with respect to the optical axis direction of the exposure system, and a light quantity adjusting device provided in at least least one of the irradiation device and the detecting device, for controlling the quantity of light passage.

Abstract: A light source portion having an acousto-optic element produces a laser beam of two light components having a frequency difference .DELTA.w and having registered polarization directions. The laser beam is subsequently divided by a half mirror. One of the divided laser beams is detected by a photoelectric detector as reference light, and a corresponding signal is applied to a synchronism detector. The other laser beam is projected by a scanning optical system to the surface of, e.g., an original to be examined to scan the same. At the position on the surface irradiated by the scanning light spot, the laser beam is modulated at a beat frequency .DELTA.w on the basis of optical heterodyne interference. A synchronism detector detects a signal corresponding to the scattered light from a particle or defect on the surface being examined, in synchronism with the frequency of the reference light, whereby the particle or defect can be detected with a good signal-to-noise ratio.

Abstract: A detecting system for detecting a surface position of an object, includes a light source, a first grating having a light collecting function, wherein the first grating is illuminated with light from the light source, a second grating having a light collecting function, a first optical system for imaging the first grating onto the object in a direction oblique to the surface of the object, a second optical system for re-imaging the image of the first grating, on the surface of the object, onto the second grating, wherein a moire fringe is produced by the second grating and the re-imaged image of the first grating, and a photodetector for detecting a position of a converged point of convergent light as produced by the moire fringe, wherein the surface position information of the object is determined on the basis of information related to the converged point position as detected by the photodetector.

Abstract: A state-of-formation detecting system for detecting a state of formation of a periodic pattern formed, through exposure light, upon an object with a photosensitive material applied thereto, includes a light projecting device for projecting input light onto the periodic pattern, and a determining device for receiving signal light from the periodic pattern and for detecting a change in the input light, to determine the state of formation of the periodic pattern on the basis of the change in the input light.

Abstract: A finder has a finder field frame switching mechanism for switching and indicating two field frames relative to a reference field frame. The finder field frame switching mechanism performs switching of one field frame by a mechanical type switching mechanism, and switching of another field frame by liquid crystal. As a result, an inexpensive finder field frame switching mechanism of a simple structure can be provided.

Abstract: An inspection system includes a light source, a scanning device for scanning a surface to be inspected, with light from the light source, wherein the scanning device includes an optical member disposed with inclination with respect to a primary scan direction, the optical member being adapted to provide a convergent light being converged to form a spot at a distance changeable with the position of a scan, and a light receiving device for receiving scattered light from the surface.

Abstract: An apparatus for detecting foreign matter on a substrate includes an optical system for projecting a light beam onto a pellicle and a pattern surface, a first detector for detecting scattered light from foreign matter on the pattern surface, a second detector for detecting information relating to the reflectivity or the transmittance of the pellicle by detecting a light beam reflected by the pellicle, and a correction unit for correcting an output signal from the first detector using an output signal from the second detector.