Patents by Inventor Kyoichi Mori
Kyoichi Mori has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 8770965Abstract: A microstructure transferring device is characterized in that the device comprises a stamper made from a first photo-curable resin composition cured with light with a first wavelength, and a light source emitting light with a second wavelength longer than the first wavelength. The microstructure is transferred to an impression receptor supplied with a second photo-curable resin composition, which is curable with light with the second wavelength emitted by the light source.Type: GrantFiled: February 10, 2012Date of Patent: July 8, 2014Assignee: Hitachi High-Technologies CorporationInventors: Ryuta Washiya, Masahiko Ogino, Noritake Shizawa, Kyoichi Mori, Akihiro Miyauchi
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Patent number: 8690559Abstract: The present invention provides a nano-imprinting resin stamper including a micro structure layer on a transmissive support basal material, the micro structure layer being formed of a polymer of a resin composition that contains a silsesquioxane derivative as a major constituent having a plurality of polymerizable functional groups, another polymerizable resin component having a plurality of polymerizable functional groups and different from the silsesquioxane derivative, and a photopolymerizable initiator, in which the content percentage of the photopolymerizable initiator is equal to or more than 0.3 mass % and equal to or less than 3 mass % relative to a total mass of the silsesquioxane derivative and the polymerizable resin component, and the micro structure layer permits equal to or more than 80% of light to pass therethrough at a wavelength of 365 nm.Type: GrantFiled: July 29, 2011Date of Patent: April 8, 2014Assignee: Hitachi High-Technologies CorporationInventors: Satoshi Ishii, Masahiko Ogino, Noritake Shizawa, Kyoichi Mori, Akihiro Miyauchi
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Patent number: 8668487Abstract: A micro-pattern transferring stamper includes a supporting base material and a microstructure layer formed on the supporting base material, the microstructure layer is a polymer of a resin composition that mainly contains a silsesquioxane derivative containing a plurality of polymerizable functional groups, and one or plural kinds of monomer elements containing a plurality of polymerizable functional groups.Type: GrantFiled: February 16, 2011Date of Patent: March 11, 2014Assignee: Hitachi High-Technologies CorporationInventors: Satoshi Ishii, Masahiko Ogino, Noritake Shizawa, Kyoichi Mori, Akihiro Miyauchi
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Patent number: 8603380Abstract: An object of the present invention is to provide a stamper for transferring fine pattern and a method for manufacturing the stamper, the stamper has a fine structure layer to improve a continuous transferring property of the resinous stamper, and to allow accurate and continuous transferring. In order to achieve the above object, the present invention provides a stamper for transferring fine pattern, including: a fine structure layer on a supporting substrate, in which the fine structure layer is a polymer of a resinous compound whose principal component is silsesquioxane derivative having a plurality of polymerizable functional groups.Type: GrantFiled: September 5, 2012Date of Patent: December 10, 2013Assignee: Hitachi High-Technologies CorporationInventors: Satoshi Ishii, Masahiko Ogino, Noritake Shizawa, Kyoichi Mori, Akihiro Miyauchi
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Patent number: 8562896Abstract: An object of the present invention is to provide a micropattern transfer method and a micropattern transfer device in which the small amount of resin is applied to a substrate, and the nonuniformity in thickness is prevented to arise on the obtained pattern forming layer. In order to achieve the above object, the present invention provides a micropattern transfer method in which a micropattern is transferred to a resin by pressing a stamper having the micropattern onto the resin applied to a substrate, including the steps of: applying the resin to a surface of the substrate discretely in order to obtain a plurality of resin islands so that a center portion of each of the resin islands forms a planar thin-film, and a peripheral portion of the resin island rises higher than the center portion.Type: GrantFiled: April 22, 2010Date of Patent: October 22, 2013Assignee: Hitachi High-Technologies CorporationInventors: Satoshi Ishii, Masahiko Ogino, Noritake Shizawa, Kyoichi Mori, Akihiro Miyauchi
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Patent number: 8542453Abstract: An inspection method and inspection apparatus of a magnetic disk are provided. A gliding test and a certification test are performed at the same time by simultaneously moving a head for the certification test and a head for the gliding test with a heat distortion utilization mechanism (a micro thermal actuator) along a recording surface of the magnetic disk during rotation at a predetermined revolving speed. A flying height of the head for the gliding test is determined according to a revolving speed of the disk. When the flying height of the head for gliding test is determined according to the revolving speed at the certification test, the head for the gliding test is adjusted to a desired height by adjusting a variation of the heat distortion utilization mechanism disposed on the head for the gliding test. The gliding and certification inspections can be performed at the same time.Type: GrantFiled: January 9, 2012Date of Patent: September 24, 2013Assignee: Hitachi High-Technologies CorporationInventors: Kyoichi Mori, Masanori Fukawa
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Patent number: 8535035Abstract: A fine-structure transfer apparatus has a base plate, a first post and a second post erected on the upper surface of the base plate, an elongated stamper that is fixed at one end to the upper end face of the first post. The stamper is supported at the other end in a vertically movable manner by means of an ascending/descending unit provided on the second post. A transfer element holding stage is provided on the upper surface of the base plate between the first and second posts in a position that corresponds to the position of the lower surface of the elongated stamper where a fine pattern is formed. A pressure-applying unit is provided to reciprocate on the upper surface of the elongated stamper along a longitudinal direction thereof. The transfer apparatus is characterized by the ease with which the stamper can be detached from the transfer element.Type: GrantFiled: May 26, 2010Date of Patent: September 17, 2013Assignee: Hitachi High-Technologies CorporationInventors: Kyoichi Mori, Noritake Shizawa, Naoaki Yamashita, Koji Tsushima, Toshimitsu Shiraishi
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Publication number: 20130082029Abstract: The object of the present invention is to provide a stamper or an imprint device which can reduce a variation of a base film thickness, a product processed and having a precise fine pattern, and a device for manufacturing a product processed or a method for manufacturing a product processed which can form a precise fine pattern. According to the present invention, in a stamper, an imprint device performing an imprint using the stamper, a device for manufacturing a product processed by the imprint device, a method for manufacturing a product processed by the imprint, and a product processed and manufactured, the stamper has a dummy pattern which is unnecessary for fulfilling a function of the product processed which is formed of a substrate for the product.Type: ApplicationFiled: August 2, 2012Publication date: April 4, 2013Applicant: HITACHI HIGH-TECHNOLOGIES CORPORATIONInventors: Tetsuhiro HATOGAI, Kyoichi MORI, Makoto MARUYAMA, Akihiro MIYAUCHI, Masahiko OGINO
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Publication number: 20130011632Abstract: Provided is a method for producing a microfine structure comprising the steps of: forming a resin film by applying a liquid polymerizable resin composition containing a high molecular weight component, a low molecular weight component and a reactive dilution component to an adhesion promoting layer formed on a substrate; imprinting a mold with an extremely fine convex concave pattern onto the resin film; and transferring the convex concave pattern to the resin film. Herein, components of the adhesion promoting layer, the high molecular weight component, the low molecular weight component and the reactive dilution component respectively have cross-linking reactive functional groups which react with each other.Type: ApplicationFiled: December 22, 2010Publication date: January 10, 2013Inventors: Masahiko Ogino, Susumu Komoriya, Akihiro Miyauchi, Ryuta Washiya, Kyoichi Mori, Noritake Shizawa
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Publication number: 20130001835Abstract: An object of the present invention is to provide a stamper for transferring fine pattern and a method for manufacturing the stamper, the stamper has a fine structure layer to improve a continuous transferring property of the resinous stamper, and to allow accurate and continuous transferring. In order to achieve the above object, the present invention provides a stamper for transferring fine pattern, including: a fine structure layer on a supporting substrate, in which the fine structure layer is a polymer of a resinous compound whose principal component is silsesquioxane derivative having a plurality of polymerizable functional groups.Type: ApplicationFiled: September 5, 2012Publication date: January 3, 2013Inventors: Satoshi ISHII, Masahiko OGINO, Noritake SHIZAWA, Kyoichi MORI, Akihiro MIYAUCHI
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Publication number: 20120319326Abstract: The fine structure transfer apparatus is provided with a pattern transfer mechanism having a resin applying mechanism, a substrate handling mechanism, an aligning mechanism, a pressurizing mechanism, and a peeling mechanism, and the pressurizing mechanism is configured of an upper head section and a lower stage section, the molding die having the fine pattern formed thereon is fixed on the lower surface of the upper head section, and after pressurization and transfer, the lower stage section retracts from a position below the substrate in the state wherein the substrate is adhered to the molding die, then, after the peeling mechanism is moved to a position below the substrate, the substrate adhered to the molding die is peeled.Type: ApplicationFiled: March 10, 2011Publication date: December 20, 2012Applicant: HITACHI HIGH-TECHNOLOGIES CORPORATIONInventors: Toshimitsu Shiraishi, Kyoichi Mori, Noritake Shizawa, Naoaki Yamashita, Masahiko Ogino, Akihiro Miyauchi
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Publication number: 20120321738Abstract: A micro-pattern transferring stamper includes a supporting base material and a microstructure layer formed on the supporting base material, the microstructure layer is a polymer of a resin composition that mainly contains a silsesquioxane derivative containing a plurality of polymerizable functional groups, and one or plural kinds of monomer elements containing a plurality of polymerizable functional groups.Type: ApplicationFiled: February 16, 2011Publication date: December 20, 2012Applicant: HITACHI HIGH-TECHNOLOGIES CORPORATIONInventors: Satoshi Ishii, Masahiko Ogino, Noritake Shizawa, Kyoichi Mori, Akihiro Miyauchi
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Patent number: 8333915Abstract: A fine-structure transfer method in which a fine-featured pattern formed on one of the two surfaces of a stamper is pressed against a coating of a resist on one of the two surfaces of a transfer element so as to transfer the fine-featured pattern to the resist coating, wherein the atmosphere in the space between the stamper and the transfer element is replaced by the vapor of the resist before the stamper is pressed against the transfer element.Type: GrantFiled: September 21, 2011Date of Patent: December 18, 2012Assignee: Hitachi High-Technologies CorporationInventors: Kyoichi Mori, Naoaki Yamashita, Noritake Shizawa, Koji Tsushima
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Publication number: 20120205838Abstract: A microstructure transferring device is characterized in that the device comprises a stamper made from a first photo-curable resin composition cured with light with a first wavelength, and a light source emitting light with a second wavelength longer than the first wavelength. The microstructure is transferred to an impression receptor supplied with a second photo-curable resin composition, which is curable with light with the second wavelength emitted by the light source.Type: ApplicationFiled: February 10, 2012Publication date: August 16, 2012Inventors: Ryuta WASHIYA, Masahiko Ogino, Noritake Shizawa, Kyoichi Mori, Akihiro Miyauchi
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Publication number: 20120176877Abstract: An inspection method and inspection apparatus of a magnetic disk are provided. A gliding test and a certification test are performed at the same time by simultaneously moving a head for the certification test and a head for the gliding test with a heat distortion utilization mechanism (a micro thermal actuator) along a recording surface of the magnetic disk during rotation at a predetermined revolving speed. A flying height of the head for the gliding test is determined according to a revolving speed of the disk. When the flying height of the head for gliding test is determined according to the revolving speed at the certification test, the head for the gliding test is adjusted to a desired height by adjusting a variation of the heat distortion utilization mechanism disposed on the head for the gliding test. The gliding and certification inspections can be performed at the same time.Type: ApplicationFiled: January 9, 2012Publication date: July 12, 2012Applicant: HITACHI HIGH-TECHNOLOGIES CORPORATIONInventors: KYOICHI MORI, MASANORI FUKAWA
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Patent number: 8186992Abstract: In a micropattern transfer device, a stamper on which a fine indented pattern is formed is brought into contact with a material to be transferred, and the fine indented pattern on the stamper is transferred onto a surface of the material to be transferred. The micropattern transfer device includes a holding mechanism which holds an entire outer circumferential portion of the material to be transferred. The holding mechanism holds the material to be transferred such that a distance between the material to be transferred and the stamper is substantially equal to or shorter than a distance between the holding mechanism and the stamper.Type: GrantFiled: January 22, 2010Date of Patent: May 29, 2012Assignee: Hitachi High-Technologies CorporationInventors: Ryuta Washiya, Masahiko Ogino, Noritake Shizawa, Kyoichi Mori, Akihiro Miyauchi
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Publication number: 20120128811Abstract: A double-sided imprinting device includes a top-side stamper device supported by a going up and down mechanism, and a bottom-side stamper device and a transferred body detachment device firmly provided on a moving table placed on a guide rail, in which the moving table can be moved back and forth on the guide rail by a movement driving mechanism, with a position of the top-side stamper device as a center, the bottom-side stamper device and the transferred body detachment device can move alternately to a position opposing the top-side stamper device. A bottom-side stamper provided at the bottom-side stamper device has a rectangular shape and a top-side stamper provided at the top-side stamper device has a rectangular shape so that the rectangular-shaped bottom-side stamper and the rectangular-shaped top-side stamper are provided so as to oppose in a cross shape.Type: ApplicationFiled: November 10, 2011Publication date: May 24, 2012Inventors: Noritake SHIZAWA, Kyoichi Mori, Toshimitsu Shiraishi, Naoaki Yamashita
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Publication number: 20120029110Abstract: A photopolymerizable resin composition for transferring a microstructure, which allows a thinner and uniform thin film to be formed, a transfer accuracy of extremely smaller microfine pattern to be excellent, and a curing time of the thin film to be shortened, is provided. The photopolymerizable resin composition for transferring a microstructure comprises the following component (A), component (B), component (C), component (D) and component (E) at the rate described below: (A) a 6 to 15-functional acrylate; in 0.5 to 10 mass % (B) an acrylate with a weight-average molecular weight (Mw) of 1000 to 10000; in 0.5 to 10 mass % (C) an acrylate having a benzene ring; in 0.5 to 10 mass % (D) a reactive diluent; in 80 to 98 mass % (E) a photopolymerization initiator; in 0.1 to 5 mass %.Type: ApplicationFiled: July 29, 2011Publication date: February 2, 2012Inventors: Ryuta WASHIYA, Masahiko Ogino, Noritake Shizawa, Kyoichi Mori, Akihiro Miyauchi
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Publication number: 20120027884Abstract: The present invention provides a nano-imprinting resin stamper including a micro structure layer on a transmissive support basal material, the micro structure layer being formed of a polymer of a resin composition that contains a silsesquioxane derivative as a major constituent having a plurality of polymerizable functional groups, another polymerizable resin component having a plurality of polymerizable functional groups and different from the silsesquioxane derivative, and a photopolymerizable initiator, in which the content percentage of the photopolymerizable initiator is equal to or more than 0.3 mass % and equal to or less than 3 mass % relative to a total mass of the silsesquioxane derivative and the polymerizable resin component, and the micro structure layer permits equal to or more than 80% of light to pass therethrough at a wavelength of 365 nm.Type: ApplicationFiled: July 29, 2011Publication date: February 2, 2012Inventors: Satoshi ISHII, Masahiko Ogino, Noritake Shizawa, Kyoichi Mori, Akihiro Miyauchi
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Patent number: 8096802Abstract: A nanoimprint stamper can simultaneously conform to two types of anomaly in the shape of a transfer substrate, for example warpage and surface protrusions (including foreign objects) that differ greatly in the wavelength of variation. The nanoimprint stamper is capable of performing transfer with a smaller number of defects and in a uniform way. The nanoimprint stamper includes a light-transmitting rigid substrate, a light-transmitting resilient plate, a light-trarsmitting and flexible rigid stamper base, a light-transmitting stamper buffer layer, and a light-transmitting patterned stamp layer. The stamper buffer layer has a lower Young's modulus than the patterned stamp layer.Type: GrantFiled: August 3, 2009Date of Patent: January 17, 2012Assignee: Hitachi High-Technologies CorporationInventors: Kyoichi Mori, Noritake Shizawa, Susumu Komoriya, Akihiro Miyauchi, Takashi Ando, Tetsuhiro Hatogai