Patents by Inventor Laura L. Kosbar
Laura L. Kosbar has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 7855133Abstract: The invention is directed to a method of forming carbon nanomaterials or semiconductor nanomaterials. The method comprises providing a substrate and attaching a molecular precursor to the substrate. The molecular precursor includes a surface binding group for attachment to the substrate and a binding group for attachment of metal-containing species. The metal-containing species is selected from a metal cation, metal compound, or metal or metal-oxide nanoparticle to form a metallized molecular precursor. The metallized molecular precursor is then subjected to a heat treatment to provide a catalytic site from which the carbon nanomaterials or semiconductor nanomaterials form. The heating of the metallized molecular precursor is conducted under conditions suitable for chemical vapor deposition of the carbon nanomaterials or semiconductor nanomaterials.Type: GrantFiled: August 27, 2008Date of Patent: December 21, 2010Assignee: International Business Machines CorporationInventors: Ali Afzali-Ardakani, Cherie R. Kagan, Laura L. Kosbar
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Patent number: 7544546Abstract: The invention is directed to a method of forming carbon nanomaterials or semiconductor nanomaterials. The method comprises providing a substrate and attaching a molecular precursor to the substrate. The molecular precursor includes a surface binding group for attachment to the substrate and a binding group for attachment of metal-containing species. The metal-containing species is selected from a metal cation, metal compound, or metal or metal-oxide nanoparticle to form a metallized molecular precursor. The metallized molecular precursor is then subjected to a heat treatment to provide a catalytic site from which the carbon nanomaterials or semiconductor nanomaterials form. The heating of the metallized molecular precursor is conducted under conditions suitable for chemical vapor deposition of the carbon nanomaterials or semiconductor nanomaterials.Type: GrantFiled: May 15, 2006Date of Patent: June 9, 2009Assignee: International Business Machines CorporationInventors: Ali Afzali-Ardakani, Cherie R. Kagan, Laura L. Kosbar
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Patent number: 7531293Abstract: The invention is directed to a radiation sensitive compound comprising a surface binding group proximate to one end of the compound for attachment to a substrate, and a metal binding group proximate to an opposite end of the compound. The metal binding group is not radiation sensitive. The radiation sensitive compound also includes a body portion disposed between the surface binding group and the metal binding group, and a radiation sensitive group positioned in the body portion or adjacent to the metal binding group. The surface binding group is capable of attaching to a substrate selected from a metal, a metal oxide, or a semiconductor material.Type: GrantFiled: June 2, 2006Date of Patent: May 12, 2009Assignee: International Business Machines CorporationInventors: Ali Afzali-Ardakani, Cherie R. Kagan, Laura L. Kosbar, Sally A. Swanson, Charan Srinivasan
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Publication number: 20090087972Abstract: The invention is directed to a method of forming carbon nanomaterials or semiconductor nanomaterials. The method comprises providing a substrate and attaching a molecular precursor to the substrate. The molecular precursor includes a surface binding group for attachment to the substrate and a binding group for attachment of metal-containing species. The metal-containing, species is selected from a metal cation, metal compound, or metal or metal-oxide nanoparticle to form a metallized molecular precursor. The metallized molecular precursor is then subjected to a heat treatment to provide a catalytic site from which the carbon nanomaterials or semiconductor nanomaterials form. The heating of the metallized molecular precursor is conducted under conditions suitable for chemical vapor deposition of the carbon nanomaterials or semiconductor nanomaterials.Type: ApplicationFiled: August 27, 2008Publication date: April 2, 2009Applicant: International Business Machines CorporationInventors: Ali Afzali-Ardakani, Cherie R. Kagan, Laura L. Kosbar
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Publication number: 20080318157Abstract: The invention is directed to a radiation sensitive compound comprising a surface binding group proximate to one end of the compound for attachment to a substrate, and a metal binding group proximate to an opposite end of the compound. The metal binding group is not radiation sensitive. The radiation sensitive compound also includes a body portion disposed between the surface binding group and the metal binding group, and a radiation sensitive group positioned in the body portion or adjacent to the metal binding group. The surface binding group is capable of attaching to a substrate selected from a metal, a metal oxide, or a semiconductor material.Type: ApplicationFiled: August 27, 2008Publication date: December 25, 2008Applicant: International Business Machines CorporationInventors: Ali Afzali-Ardankani, Cherie R. Kagan, Laura L. Kosbar, Sally A. Swanson, Charan Srinivasan
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Publication number: 20070278179Abstract: The invention is directed to a radiation sensitive compound comprising a surface binding group proximate to one end of the compound for attachment to a substrate, and a metal binding group proximate to an opposite end of the compound. The metal binding group is not radiation sensitive. The radiation sensitive compound also includes a body portion disposed between the surface binding group and the metal binding group, and a radiation sensitive group positioned in the body portion or adjacent to the metal binding group. The surface binding group is capable of attaching to a substrate selected from a metal, a metal oxide, or a semiconductor material.Type: ApplicationFiled: June 2, 2006Publication date: December 6, 2007Applicant: International Business Machines CorporationInventors: Ali Afzali-Ardakani, Cherie R. Kagan, Laura L. Kosbar, Sally A. Swanson, Charan Srinivasan
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Publication number: 20040163758Abstract: The present invention provides a method of forming a patterned thin film on a surface of a substrate having thereon a patterned underlayer of a self-assembled monolayer. The method comprises depositing a thin film material on the self-assembled monolayer to produce a patterned thin film on the surface of the substrate. The present invention further provides processes for preparing the self-assembled monolayer. The present invention still further provides solution-based deposition processes, such as spin-coating and immersion-coating, to deposit a thin film material on the self-assembled monolayer to produce a patterned thin film on the surface of the substrate.Type: ApplicationFiled: January 21, 2004Publication date: August 26, 2004Applicant: International Business Machines CorporationInventors: Cherie R. Kagan, Tricia B. Carmichael, Laura L. Kosbar
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Patent number: 6673287Abstract: A method of exposing a composite organic/inorganic master to alkylchlorosilanes in the vapor phase. Chlorosilanes participate in facile reactions with hydroxyl groups existing on the surface of inorganic oxides (such as glass or the native oxides on silicon, aluminum, tin, etc.); or those in organics-containing phenolic or alcoholic groups, such as photoresists. The alkyl group on the silane can be chosen from a large selection of aliphatic or aromatic organic groups that have substituents with varying polarity and reactivity.Type: GrantFiled: May 16, 2001Date of Patent: January 6, 2004Assignee: International Business Machines CorporationInventors: Tricia L. Breen, Laura L. Kosbar, Michael P. Mastro, Ronald W. Nunes
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Publication number: 20020172895Abstract: A method of exposing a composite organic/inorganic master to alkylchlorosilanes in the vapor phase. Chlorosilanes participate in facile reactions with hydroxyl groups existing on the surface of inorganic oxides (such as glass or the native oxides on silicon, aluminum, tin, etc.); or those in organics-containing phenolic or alcoholic groups, such as photoresists. The alkyl group on the silane can be chosen from a large selection of aliphatic or aromatic organic groups that have substituents with varying polarity and reactivity.Type: ApplicationFiled: May 16, 2001Publication date: November 21, 2002Inventors: Tricial L. Breen, Laura L. Kosbar, Michael P. Mastro, Ronald W. Nunes
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Patent number: 6377233Abstract: A display device, in accordance with the present invention includes a transparent substrate and an array of pixels formed on the substrate, each pixel comprises a transparent electrode and a deformable member electrically actuated between a first state and a second state, wherein in the first state a liquid including a dye is disposed in a gap between the transparent electrode and the deformable member and wherein in the second state the deformable member reduces the gap between the transparent electrode and the deformable member such that the liquid is substantially removed between the deformable layer and the transparent electrode in the area of contact.Type: GrantFiled: July 30, 2001Date of Patent: April 23, 2002Assignee: International Business Machines CorporationInventors: Evan G. Colgan, Laura L. Kosbar, Alan E. Rosenbluth
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Publication number: 20020000959Abstract: A display device, in accordance with the present invention includes a transparent substrate and an array of pixels formed on the substrate, each pixel comprises a transparent electrode and a deformable member electrically actuated between a first state and a second state, wherein in the first state a liquid including a dye is disposed in a gap between the transparent electrode and the deformable member and wherein in the second state the deformable member reduces the gap between the transparent electrode and the deformable member such that the liquid is substantially removed between the deformable layer and the transparent electrode in the area of contact.Type: ApplicationFiled: July 30, 2001Publication date: January 3, 2002Applicant: International Business Machines CorporationInventors: Evan G. Colgan, Laura L. Kosbar, Alan E. Rosenbluth
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Patent number: 6323834Abstract: A display device, in accordance with the present invention includes a transparent substrate and an array of pixels formed on the substrate, each pixel comprises a transparent electrode and a deformable member electrically actuated between a first state and a second state, wherein in the first state a liquid including a dye is disposed in a gap between the transparent electrode and the deformable member and wherein in the second state the deformable member reduces the gap between the transparent electrode and the deformable member such that the liquid is substantially removed between the deformable layer and the transparent electrode in the area of contact.Type: GrantFiled: October 8, 1998Date of Patent: November 27, 2001Assignee: International Business Machines CorporationInventors: Evan G. Colgan, Laura L. Kosbar, Alan E. Rosenbluth
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Patent number: 5560934Abstract: A cleavable epoxy resin composition suitable for encapsulating electronic chips comprising the cured reaction product of a diepoxide containing a cyclic anhydride curing agent and an amine promoter.Type: GrantFiled: June 7, 1995Date of Patent: October 1, 1996Assignee: International Business Machines CorporationInventors: Ali Afzali-Ardakani, Stephen L. Buchwalter, Jeffrey D. Gelorme, Laura L. Kosbar, Bert H. Newman, Frank L. Pompeo
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Patent number: 5512613Abstract: A cleavable epoxy resin composition suitable for encapsulating electronic chips comprising the cured reaction product of a diepoxide containing a cyclic anhydride curing agent and an amine promoter.Type: GrantFiled: March 18, 1994Date of Patent: April 30, 1996Assignee: International Business Machines CorporationInventors: Ali Afzali-Ardakani, Stephen L. Buchwalter, Jeffrey D. Gelorme, Laura L. Kosbar, Bert H. Newman, Frank L. Pompeo