Patents by Inventor Laurent Roux
Laurent Roux has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 11951608Abstract: A three-dimensional measuring device, comprising an arm having a free end provided with an interface body and a handle enabling an operator to point the measuring member at a zone of the object that is to be measured. The handle is secured to a fastener base having an end portion that includes a slideway extending transversely relative to the longitudinal direction of the handle in order to co-operate with a slideway of the interface body, the interface body and the end portion of the fastener support having both complementary abutment means so as to define a mutual engagement position of the slideways and also complementary locking means that oppose disengagement of the slideways, the complementary locking means including a control lever that is hinged to the end portion of the fastener base between an activation position for activating the locking means and an inactivation position for inactivating the locking means.Type: GrantFiled: January 5, 2021Date of Patent: April 9, 2024Assignee: HEXAGON METROLOGY SASInventors: Laurent Desforges, Thibault Duportal, Denis Roux, Jean-Luc Famechon, Wes Inglis
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Publication number: 20240102861Abstract: Disclosed is a multispectral imager designed for analyzing a spectral domain of interest, comprising an image sensor (100) formed of an array of macropixels and comprising a first and a second photosensitive pixel (115) respectively dedicated to a first and a second spectral band, and a filtering structure (150) comprising a first and second interference filter (160) which are superimposed respectively on the first and second photosensitive pixel (115) and which are arranged to respectively transmit a first and second electromagnetic radiation belonging respectively to the first and second spectral bands, the multispectral imager in which a wavelength half of that of the second electromagnetic radiation is located in the spectral domain of interest, and a filtering layer (170) is superimposed on the second photosensitive pixel (160) and configured to block the passage of a third electromagnetic radiation of wavelength half that of the second electromagnetic radiation.Type: ApplicationFiled: November 18, 2021Publication date: March 28, 2024Inventors: Stéphane TISSERAND, Laurent ROUX
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Patent number: 11862658Abstract: A hybrid multispectral imaging sensor, characterized in that it comprises a photosensitive backside-illumination detector (DET) that is made on a substrate (100) made of InP, and that is formed of a matrix of pixels (105, P1, P2, P3) that are themselves made in a structure based on InGaAs (103), and a filter module (MF) that is formed of a matrix of elementary filters (?1, ?2, ?3) reproducing said matrix of pixels, and that is mounted into contact with said substrate (100), said substrate (100) made of InP having a thickness less than 50 ?m, and preferably less than 30 ?m.Type: GrantFiled: July 29, 2019Date of Patent: January 2, 2024Assignee: SILIOS TECHNOLOGIESInventors: Stephane Tisserand, Laurent Roux, Marc Hubert, Vincent Sauget
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Patent number: 11199446Abstract: A method of limiting cross-talk in an imaging sensor, the sensor being in the form of a matrix of macropixels defining an image, each macropixel being formed by a matrix of individual pixels, each of which is dedicated to a distinct spectral band, all of the individual pixels dedicated to the same spectral band forming a sub-image, the image being topologically subdivided into at least one parcel, and the method including the following steps: measuring the spectral response of each individual pixel ?1, ?2, ?3, . . . , ?9; calculating the mean spectral response of each sub-image in a parcel; targeting to define the ideal response of each sub-image in the parcel; estimating a series of coefficients for minimizing cross-talk in the parcel; and applying the coefficients to the macropixels in order to correct the sub-images in the parcel. The method is remarkable in that the ideal response is a Gaussian function.Type: GrantFiled: May 30, 2017Date of Patent: December 14, 2021Assignee: SILIOS TECHNOLOGIESInventors: Stéphane Tisserand, Laurent Roux, Marc Hubert, Vincent Sauget, Aurélien Faiola
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Patent number: 11143554Abstract: The invention relates to a multispectral imaging device including: a photosensitive detector DET made up of a matrix of pixels; an array of microlenses ML1, ML2, ML3 reproducing the matrix of pixels; and a filter module MF formed by a matrix of individual filters ?1, ?2, ?3 reproducing the matrix of pixels. The device is remarkable in that the array of microlenses is arranged directly in contact with the detector DET, and the filter module MF is made on a substrate SS that is put into contact with the array of microlenses.Type: GrantFiled: April 27, 2017Date of Patent: October 12, 2021Assignee: SILIOS TECHNOLOGIESInventors: Stephane Tisserand, Laurent Roux, Marc Hubert, Vincent Sauget, Aurelien Faiola
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Publication number: 20210288087Abstract: A hybrid multispectral imaging sensor, characterized in that it comprises a photosensitive backside-illumination detector (DET) that is made on a substrate (100) made of InP, and that is formed of a matrix of pixels (105, P1, P2, P3) that are themselves made in a structure based on InGaAs (103), and a filter module (MF) that is formed of a matrix of elementary filters (?1, ?2, ?3) reproducing said matrix of pixels, and that is mounted into contact with said substrate (100), said substrate (100) made of InP having a thickness less than 50 ?m, and preferably less than 30 ?m.Type: ApplicationFiled: July 29, 2019Publication date: September 16, 2021Applicant: SILIOS TECHNOLOGIESInventors: Stephane TISSERAND, Laurent ROUX, Marc HUBERT, Vincent SAUGET
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Publication number: 20210273056Abstract: A MOSFET device arranged on a substrate 10 having first and second heavily-doped strips 11 and 14 respectively covered by first and second contacts 13 and 15, these two strips being spaced apart by a channel 18 that also appears on the substrate 10, the channel being covered by a dielectric layer 20, itself surmounted by a third contact 21. The channel 18 incorporates a thin film 19 lightly doped with dopant atoms of a same type as the channel, at the interface with the dielectric layer 20, the dopant atoms being distributed on both sides of the interface.Type: ApplicationFiled: September 6, 2019Publication date: September 2, 2021Applicants: ION BEAM SERVICES, CNM - CSICInventors: Frank TORREGROSA, Laurent ROUX, Philippe GODIGNON
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Patent number: 11053582Abstract: The present invention provides a support that comprises: an electrically conductive biased table; an insulating electrostatic substrate carrier 20 in the form of a cylinder having a shoulder 21, the bottom face of the substrate carrier 20 facing the biased table and its top face 22 presenting a bearing plane designed to receive a substrate; and an electrically conductive clamping collar for clamping the shoulder 21 against the biased table. The support also has at least one electrically conductive element 201-202-203 for connecting the bearing plane to the shoulder 211.Type: GrantFiled: December 19, 2012Date of Patent: July 6, 2021Assignee: ION BEAM SERVICESInventors: Frank Torregrosa, Laurent Roux
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Patent number: 10923325Abstract: A method of controlling an implanter operating in plasma immersion, the method including the steps of: an implantation stage (1) during which the plasma AP is ignited and the substrate is negatively biased S; a neutralization stage (2) during which the plasma AP is ignited and the substrate has a positive or zero bias S applied thereto; a suppression stage (3) during which the plasma AP is extinguished; and an expulsion stage (4) for expelling negatively charged particles from the substrate and during which the plasma AP is extinguished. The method is remarkable in that the duration of the expulsion stage is longer than 5 ?s. The invention also provides a power supply for biasing an implanter.Type: GrantFiled: December 5, 2016Date of Patent: February 16, 2021Assignee: ION BEAM SERVICESInventors: Frank Gilbert Torregrosa, Laurent Roux
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Publication number: 20200326235Abstract: A method of limiting cross-talk in an imaging sensor, the sensor being in the form of a matrix of macropixels defining an image, each macropixel being formed by a matrix of individual pixels, each of which is dedicated to a distinct spectral band, all of the individual pixels dedicated to the same spectral band forming a sub-image, the image being topologically subdivided into at least one parcel, and the method including the following steps: measuring the spectral response of each individual pixel ?1, ?2, ?3, . . . , ?9; calculating the mean spectral response of each sub-image in a parcel; targeting to define the ideal response of each sub-image in the parcel; estimating a series of coefficients for minimizing cross-talk in the parcel; and applying the coefficients to the macropixels in order to correct the sub-images in the parcel. The method is remarkable in that the ideal response is a Gaussian function.Type: ApplicationFiled: May 30, 2017Publication date: October 15, 2020Applicant: SILIOS TECHNOLOGIESInventors: Stephane TISSERAND, Laurent ROUX, Marc HUBERT, Vincent SAUGET, Aurelien FAIOLA
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Patent number: 10567073Abstract: A communication device for transmitting a plurality of wanted signals to a satellite from a transmitter, each of the wanted signals transmitted by the device being for being addressed to a given transmitting spot, the device including a set of reference values of powers and phases of at least a first reference signal received at different points of at least one transmitting spot, a first wanted signal generating an interfering signal in a neighbouring spot, the transmitter generating at least one wanted neighbouring signal in a neighbouring spot of the first spot, the transmitter generating a first correcting signal from the first signal transmitted and at least a first phase value and a first power value of a set of reference values, the transmitter transmitting a combination of the correcting signal and of the neighbouring signal in order to generate a corrected neighbouring signal.Type: GrantFiled: June 27, 2018Date of Patent: February 18, 2020Assignee: EUTELSAT S AInventors: Alessandro Le Pera, Jean-Paul Courson, Laurent Roux
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Publication number: 20190145823Abstract: The invention relates to a multispectral imaging device including: a photosensitive detector DET made up of a matrix of pixels; an array of microlenses ML1, ML2, ML3 reproducing the matrix of pixels; and a filter module MF formed by a matrix of individual filters ?1, ?2, ?3 reproducing the matrix of pixels. The device is remarkable in that the array of microlenses is arranged directly in contact with the detector DET, and the filter module MF is made on a substrate SS that is put into contact with the array of microlenses.Type: ApplicationFiled: April 27, 2017Publication date: May 16, 2019Applicant: SILIOS TechnologiesInventors: Stephane TISSERAND, Laurent ROUX, Marc HUBERT, Vincent SAUGET, Aurélien FAIOLA
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Publication number: 20190013861Abstract: A communication device for transmitting a plurality of wanted signals to a satellite from a transmitter, each of the wanted signals transmitted by the device being for being addressed to a given transmitting spot, the device including a set of reference values of powers and phases of at least a first reference signal received at different points of at least one transmitting spot, a first wanted signal generating an interfering signal in a neighbouring spot, the transmitter generating at least one wanted neighbouring signal in a neighbouring spot of the first spot, the transmitter generating a first correcting signal from the first signal transmitted and at least a first phase value and a first power value of a set of reference values, the transmitter transmitting a combination of the correcting signal and of the neighbouring signal in order to generate a corrected neighbouring signal.Type: ApplicationFiled: June 27, 2018Publication date: January 10, 2019Inventors: Alessandro LE PERA, Jean-Paul COURSON, Laurent ROUX
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Publication number: 20180358207Abstract: A method of controlling an implanter operating in plasma immersion, the method including the steps of: an implantation stage (1) during which the plasma AP is ignited and the substrate is negatively biased S; a neutralization stage (2) during which the plasma AP is ignited and the substrate has a positive or zero bias S applied thereto; a suppression stage (3) during which the plasma AP is extinguished; and an expulsion stage (4) for expelling negatively charged particles from the substrate and during which the plasma AP is extinguished. The method is remarkable in that the duration of the expulsion stage is longer than 5 ?s. The invention also provides a power supply for biasing an implanter.Type: ApplicationFiled: December 5, 2016Publication date: December 13, 2018Applicant: ION BEAM SERVICESInventors: Frank TORREGROSA, Laurent ROUX
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Patent number: 9922856Abstract: The present invention relates to a support comprising: an electrically conductive biased table (10) connected to a high voltage power supply (12) and supported on an electrically insulating stand (40); an electrically insulating substrate carrier (20) in the form of a cylinder, its top face presenting a bearing plane designed to receive a substrate (50); legs (15) standing on the biased table (10) in order to support the bottom face of the substrate carrier (20); and at least one electrically conductive connection (201, 202, 203, 31, 30) for connecting the bearing plane to the biased table (10). The support is remarkable in that the substrate carrier (20) incorporates a heating resistance (26).Type: GrantFiled: February 4, 2015Date of Patent: March 20, 2018Assignee: ION BEAM SERVICESInventors: Frank Torregrosa, Laurent Roux
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Publication number: 20180031319Abstract: A method of treating a substrate 23 includes a doping step followed immediately by a stabilization step. The method is remarkable in that the stabilization step involves immersing the substrate in a gas forming part of the set consisting of: oxygen; water vapor; wet air; hydrogen peroxide vapor; ozone; and ammonia. Also disclosed is a machine for treating a substrate in accordance with the above method and including a gas introduction orifice.Type: ApplicationFiled: February 17, 2016Publication date: February 1, 2018Applicant: ION BEAM SERVICESInventors: Frank TORREGROSA, Laurent ROUX, Yohann SPIEGEL
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Publication number: 20170178943Abstract: The present invention relates to a support comprising: an electrically conductive biased table (10) connected to a high voltage power supply (12) and supported on an electrically insulating stand (40); an electrically insulating substrate carrier (20) in the form of a cylinder, its top face presenting a bearing plane designed to receive a substrate (50); legs (15) standing on the biased table (10) in order to support the bottom face of the substrate carrier (20); and at least one electrically conductive connection (201, 202, 203, 31, 30) for connecting the bearing plane to the biased table (10). The support is remarkable in that the substrate carrier (20) incorporates a heating resistance (26).Type: ApplicationFiled: February 4, 2015Publication date: June 22, 2017Applicant: ION BEAM SERVICESInventors: Frank TORREGROSA, Laurent ROUX
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Publication number: 20170051401Abstract: The present invention relates to a method of implanting impurities in a part. The method is remarkable in that the part is a gas diffusion device of the showerhead type in the form of a hollow body 1 having a gas admission orifice 2 and an ejection surface 3 provided with a plurality of holes, and the implanting takes place in the ejection surface.Type: ApplicationFiled: April 29, 2015Publication date: February 23, 2017Applicant: ION BEAM SERVICESInventors: Frank TORREGROSA, Laurent ROUX
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Patent number: 9552962Abstract: The present invention relates to a method of controlling an ion implanter having a plasma power supply AP and a substrate power supply, the substrate power supply comprising: an electricity generator; a first switch SW1 connected between the generator and the output terminal of the substrate power supply; and a second switch SW2 connected between the output terminal and a neutralization terminal; the method including an implantation stage A-D and a neutralization stage E-H. The method also includes a relaxation stage C-F overlapping the implantation stage and the neutralization stage, during which relaxation stage the plasma power supply is inactivated. Furthermore, the neutralization stage includes a preliminary step E-F for closing the second switch, this preliminary step being followed by a cancellation step F-G for activating the plasma power supply AP.Type: GrantFiled: October 4, 2012Date of Patent: January 24, 2017Assignee: ION BEAM SERVICESInventors: Frank Torregrosa, Laurent Roux
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Patent number: 9534287Abstract: An ion implantation machine includes an enclosure that is connected to a pump device, a negatively polarized substrate-carrier that is arranged inside the enclosure, and a plasma feed device in the form of a generally cylindrical body extending between an initial section and a terminal section, the device having a main chamber provided with an ionization cell, the main chamber being provided with a gas delivery orifice, and the final section of the main chamber being provided with a head-loss component for creating a pressure drop relative to the body. Furthermore, the plasma feed device also includes an auxiliary chamber arranged beyond the final section, the auxiliary chamber opening out into the enclosure at the terminal section.Type: GrantFiled: June 7, 2012Date of Patent: January 3, 2017Assignee: ION BEAM SERVICESInventors: Frank Torregrosa, Laurent Roux