Patents by Inventor Laxman Murugesh
Laxman Murugesh has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Publication number: 20210245322Abstract: A method of fabricating a polishing pad includes determining a desired distribution of voids to be introduced within a polymer matrix of a polishing layer of the polishing pad. Electronic control signals configured to be read by a 3D printer are generated which specify the locations where a polymer matrix precursor is to be deposited, and specify the locations of the desired distribution of voids where no material is to be deposited. A plurality of layers of the polymer matrix corresponding to the plurality of the first locations is successfully deposited with the 3D printer. Each layer of the plurality of layers of polymer matrix is deposited by ejecting a polymer matrix precursor from a nozzle. The polymer matrix precursor is solidified to form a solidified polymer matrix having the desired distribution of voids.Type: ApplicationFiled: April 26, 2021Publication date: August 12, 2021Inventors: Laxman Murugesh, Kadthala Ramaya Narendrnath
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Patent number: 11007618Abstract: A method of fabricating a polishing pad includes determining a desired distribution of voids to be introduced within a polymer matrix of a polishing layer of the polishing pad. Electronic control signals configured to be read by a 3D printer are generated which specify the locations where a polymer matrix precursor is to be deposited, and specify the locations of the desired distribution of voids where no material is to be deposited. A plurality of layers of the polymer matrix corresponding to the plurality of the first locations is successfully deposited with the 3D printer. Each layer of the plurality of layers of polymer matrix is deposited by ejecting a polymer matrix precursor from a nozzle. The polymer matrix precursor is solidified to form a solidified polymer matrix having the desired distribution of voids.Type: GrantFiled: April 19, 2018Date of Patent: May 18, 2021Assignee: Applied Materials, Inc.Inventors: Laxman Murugesh, Kadthala Ramaya Narendmath
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Publication number: 20180236632Abstract: A method of fabricating a polishing pad includes determining a desired distribution of voids to be introduced within a polymer matrix of a polishing layer of the polishing pad. Electronic control signals configured to be read by a 3D printer are generated which specify the locations where a polymer matrix precursor is to be deposited, and specify the locations of the desired distribution of voids where no material is to be deposited. A plurality of layers of the polymer matrix corresponding to the plurality of the first locations is successfully deposited with the 3D printer. Each layer of the plurality of layers of polymer matrix is deposited by ejecting a polymer matrix precursor from a nozzle. The polymer matrix precursor is solidified to form a solidified polymer matrix having the desired distribution of voids.Type: ApplicationFiled: April 19, 2018Publication date: August 23, 2018Inventors: Laxman Murugesh, Kadthala Ramaya Narendrnath
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Patent number: 9993907Abstract: A method of fabricating a polishing pad includes determining a desired distribution of voids to be introduced within a polymer matrix of a polishing layer of the polishing pad. Electronic control signals configured to be read by a 3D printer are generated which specify the locations where a polymer matrix precursor is to be deposited, and specify the locations of the desired distribution of voids where no material is to be deposited. A plurality of layers of the polymer matrix corresponding to the plurality of the first locations is successfully deposited with the 3D printer. Each layer of the plurality of layers of polymer matrix is deposited by ejecting a polymer matrix precursor from a nozzle. The polymer matrix precursor is solidified to form a solidified polymer matrix having the desired distribution of voids.Type: GrantFiled: November 20, 2014Date of Patent: June 12, 2018Assignee: Applied Materials, Inc.Inventors: Laxman Murugesh, Kadthala Ramaya Narendrnath
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Patent number: 9481608Abstract: A method of fabricating a processing chamber component comprises forming a processing chamber component having a structural body with surface regions having microcracks, and directing a laser beam onto the microcracks of the surface regions of the structural body for a sufficient time to heal and close off the microcracks by themselves.Type: GrantFiled: November 22, 2013Date of Patent: November 1, 2016Assignee: Applied Materials, Inc.Inventors: Ashish Bhatnagar, Laxman Murugesh, Padma Gopalakrishnan
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Publication number: 20150174826Abstract: A method of fabricating a polishing pad includes determining a desired distribution of voids to be introduced within a polymer matrix of a polishing layer of the polishing pad. Electronic control signals configured to be read by a 3D printer are generated which specify the locations where a polymer matrix precursor is to be deposited, and specify the locations of the desired distribution of voids where no material is to be deposited. A plurality of layers of the polymer matrix corresponding to the plurality of the first locations is successfully deposited with the 3D printer. Each layer of the plurality of layers of polymer matrix is deposited by ejecting a polymer matrix precursor from a nozzle. The polymer matrix precursor is solidified to form a solidified polymer matrix having the desired distribution of voids.Type: ApplicationFiled: November 20, 2014Publication date: June 25, 2015Inventors: Laxman Murugesh, Kadthala Ramaya Narendrnath
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Publication number: 20140167327Abstract: A method of fabricating a processing chamber component comprises forming a processing chamber component having a structural body with surface regions having microcracks, and directing a laser beam onto the microcracks of the surface regions of the structural body for a sufficient time to heal and close off the microcracks by themselves.Type: ApplicationFiled: November 22, 2013Publication date: June 19, 2014Applicant: Applied Materials, Inc.Inventors: Ashish BHATNAGAR, Laxman MURUGESH, Padma GOPALAKRISHNAN
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Patent number: 8617672Abstract: A substrate processing chamber component has a structural body with localized surface regions having annealed microcracks. The annealed microcracks reduce crack propagation and increase fracture resistance. In one method of manufacture, the structural body of the component is formed, and a laser beam is directed onto localized surface regions of the body for a sufficient time to anneal the surface microcracks.Type: GrantFiled: July 13, 2005Date of Patent: December 31, 2013Assignee: Applied Materials, Inc.Inventors: Ashish Bhatnagar, Laxman Murugesh, Padma Gopalakrishnan
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Publication number: 20130035022Abstract: A retaining ring includes a generally annular lower portion and a generally annular upper portion. The lower portion has a bottom surface for contacting a polishing pad during polishing and a top surface. The upper portion has a bottom surface secured to the top surface of the lower portion and a top surface configured to be mechanically affixed to and abut a rigid base of a carrier head. The lower portion is a first plastic, and the upper portion is a different second plastic that is about the same or more rigid than the first plastic.Type: ApplicationFiled: July 27, 2012Publication date: February 7, 2013Inventors: Young J. Paik, James Klingler, Stacy Meyer, Christopher R. Mahon, Laxman Murugesh, Ashish Bhatnagar, Padma Gopalakrishnan
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Patent number: 7732056Abstract: A method of providing a corrosion-resistant coating on a surface of an aluminum component comprises anodizing the surface of the aluminum component to form an anodized aluminum oxide layer and sputter coating a sputtered layer on the anodized aluminum oxide layer. A coated aluminum component can be used in a substrate processing chamber and comprises an aluminum body, an anodized aluminum oxide layer formed on the aluminum body, and a sputtered layer comprising aluminum oxide on the anodized aluminum oxide layer.Type: GrantFiled: January 18, 2005Date of Patent: June 8, 2010Assignee: Applied Materials, Inc.Inventors: Ashish Bhatnagar, Laxman Murugesh
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Patent number: 7431772Abstract: A gas distributor distributes a gas across a surface of a substrate processing chamber. The gas distributor has a hub, a baffle extending radially outward from the hub, a first set of vanes and a second set of vanes. In one version, the hub has a gas inlet and a gas outlet. The baffle has an opposing first and second surfaces. First vanes are on the first surface of the baffle and direct gas across chamber surfaces. In one version, the first vanes comprise arcuate plates that curve and taper outward from the hub. Second vanes are on the second surface of the baffle and direct gas across the second surface of the baffle. In one version, a gas feed-through tube in the hub can allow a gas to bypass the first and second set of vanes.Type: GrantFiled: March 9, 2004Date of Patent: October 7, 2008Assignee: Applied Materials, Inc.Inventors: Laxman Murugesh, Padmanabhan Krishnaraj, Carl Dunham
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Publication number: 20070108161Abstract: A process chamber component comprises a first surface, which in use is exposed to an energized gas in the chamber, the first surface comprising a parylene coating, and second surface, which in use is not exposed to the energized gas. The interior surfaces of a process chamber can be coated, in situ, with the polymer coating. A portable fixture can be used to form the polymer coating in the process chamber. A previously coated chamber component can also be refurbished by stripping the polymer with ozone and/or oxygen and recoating with a polymer.Type: ApplicationFiled: November 17, 2005Publication date: May 17, 2007Inventors: Laxman Murugesh, Trung Doan
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Publication number: 20070014949Abstract: A substrate processing chamber component has a structural body with localized surface regions having annealed microcracks. The annealed microcracks reduce crack propagation and increase fracture resistance. In one method of manufacture, the structural body of the component is formed by conventional means, and a laser beam is directed onto localized surface regions of the body for a sufficient time to anneal the surface microcracks.Type: ApplicationFiled: July 13, 2005Publication date: January 18, 2007Inventors: Ashish Bhatnagar, Laxman Murugesh, Padma Gopalakrishnan
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Patent number: 7135426Abstract: A substrate processing chamber component demonstrates reduced erosion in an energized gas. The component has a ceramic structure composed of aluminum oxide with a surface exposed to the energized gas in the chamber. The erosion of the surface by the energized gas is substantially reduced by erosion resistant properties of the ceramic structure, which arise from a ratio of the total area of the grains GSA to the total area of the grain boundary regions GBSA in the ceramic structure of from about 0.25 to about 2.5. Also, at least about 80% of the grains in the ceramic structure have a grain size in the range of from about 1 micron to about 20 microns. The ceramic structure also has a purity of at least about 99.8% by weight to further reduce erosion of the surface.Type: GrantFiled: May 25, 2004Date of Patent: November 14, 2006Assignee: Applied Materials, Inc.Inventors: Laxman Murugesh, Stan Detmar, Ho Fang
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Publication number: 20060159940Abstract: A method of providing a corrosion-resistant coating on a surface of an aluminum component comprises anodizing the surface of the aluminum component to form an anodized aluminum oxide layer and sputter coating a sputtered layer on the anodized aluminum oxide layer. A coated aluminum component can be used in a substrate processing chamber and comprises an aluminum body, an anodized aluminum oxide layer formed on the aluminum body, and a sputtered layer comprising aluminum oxide on the anodized aluminum oxide layer.Type: ApplicationFiled: January 18, 2005Publication date: July 20, 2006Inventors: Ashish Bhatnagar, Laxman Murugesh
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Publication number: 20050284372Abstract: A substrate processing chamber component is capable of being exposed to an energized gas in a process chamber. The component has an underlying component structure and a surface on the underlying structure. The surface has a plurality of concentric grooves that are radially spaced apart across the surface, and electron beam textured depressions formed between adjacent grooves on the surface. The process residues adhere to the surface to reduce the contamination of processed substrates.Type: ApplicationFiled: November 16, 2004Publication date: December 29, 2005Inventors: Laxman Murugesh, Abhijit Desai
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Publication number: 20050274320Abstract: A substrate processing chamber component demonstrates reduced erosion in an energized gas. The component has a ceramic structure composed of aluminum oxide with a surface exposed to the energized gas in the chamber. The erosion of the surface by the energized gas is substantially reduced by erosion resistant properties of the ceramic structure, which arise from a ratio of the total area of the grains GSA to the total area of the grain boundary regions GBSA in the ceramic structure of from about 0.25 to about 2.5. Also, at least about 80% of the grains in the ceramic structure have a grain size in the range of from about 1 micron to about 20 microns. The ceramic structure also has a purity of at least about 99.8% by weight to further reduce erosion of the surface.Type: ApplicationFiled: May 25, 2004Publication date: December 15, 2005Inventors: Laxman Murugesh, Stan Detmar, Ho Fang
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Publication number: 20050199184Abstract: A gas distributor distributes a gas across a surface of a substrate processing chamber. The gas distributor has a hub, a baffle extending radially outward from the hub, a first set of vanes and a second set of vanes. In one version, the hub has a gas inlet and a gas outlet. The baffle has an opposing first and second surfaces. First vanes are on the first surface of the baffle and direct gas across chamber surfaces. In one version, the first vanes comprise arcuate plates that curve and taper outward from the hub. Second vanes are on the second surface of the baffle and direct gas across the second surface of the baffle. In one version, a gas feed-through tube in the hub can allow a gas to bypass the first and second set of vanes.Type: ApplicationFiled: March 9, 2004Publication date: September 15, 2005Inventors: Laxman Murugesh, Padmanabhan Krishnaraj, Carl Dunham
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Patent number: 6878214Abstract: Method and apparatus for determining an endpoint of a cleaning process running in a chamber. In particular, one embodiment of the present invention is a method that includes steps of: (a) directing radiation absorbed by a byproduct of the cleaning process into an exhaust line of the chamber; (b) detecting a measure of absorbance of the radiation by the byproduct; and (c) determining the endpoint when the measure of absorbance falls within a predetermined window.Type: GrantFiled: January 24, 2002Date of Patent: April 12, 2005Assignee: Applied Materials, Inc.Inventors: Laxman Murugesh, Gary R. Ahr
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Publication number: 20040129210Abstract: A gas delivery nozzle for a substrate fabrication apparatus has a gas delivery tube. The gas delivery tube encloses a gas channel having an asymmetrically tapered aperture. The asymmetrically tapered aperture is defined by (i) a lower lip that projects upwardly into the gas channel to partially block the gas channel and (ii) a upper brim that projects downwardly into the gas channel and overhangs the lower lip.Type: ApplicationFiled: January 3, 2003Publication date: July 8, 2004Applicant: Applied Materials, Inc.Inventor: Laxman Murugesh