Patents by Inventor Laxman Murugesh

Laxman Murugesh has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20180236632
    Abstract: A method of fabricating a polishing pad includes determining a desired distribution of voids to be introduced within a polymer matrix of a polishing layer of the polishing pad. Electronic control signals configured to be read by a 3D printer are generated which specify the locations where a polymer matrix precursor is to be deposited, and specify the locations of the desired distribution of voids where no material is to be deposited. A plurality of layers of the polymer matrix corresponding to the plurality of the first locations is successfully deposited with the 3D printer. Each layer of the plurality of layers of polymer matrix is deposited by ejecting a polymer matrix precursor from a nozzle. The polymer matrix precursor is solidified to form a solidified polymer matrix having the desired distribution of voids.
    Type: Application
    Filed: April 19, 2018
    Publication date: August 23, 2018
    Inventors: Laxman Murugesh, Kadthala Ramaya Narendrnath
  • Patent number: 9993907
    Abstract: A method of fabricating a polishing pad includes determining a desired distribution of voids to be introduced within a polymer matrix of a polishing layer of the polishing pad. Electronic control signals configured to be read by a 3D printer are generated which specify the locations where a polymer matrix precursor is to be deposited, and specify the locations of the desired distribution of voids where no material is to be deposited. A plurality of layers of the polymer matrix corresponding to the plurality of the first locations is successfully deposited with the 3D printer. Each layer of the plurality of layers of polymer matrix is deposited by ejecting a polymer matrix precursor from a nozzle. The polymer matrix precursor is solidified to form a solidified polymer matrix having the desired distribution of voids.
    Type: Grant
    Filed: November 20, 2014
    Date of Patent: June 12, 2018
    Assignee: Applied Materials, Inc.
    Inventors: Laxman Murugesh, Kadthala Ramaya Narendrnath
  • Patent number: 9481608
    Abstract: A method of fabricating a processing chamber component comprises forming a processing chamber component having a structural body with surface regions having microcracks, and directing a laser beam onto the microcracks of the surface regions of the structural body for a sufficient time to heal and close off the microcracks by themselves.
    Type: Grant
    Filed: November 22, 2013
    Date of Patent: November 1, 2016
    Assignee: Applied Materials, Inc.
    Inventors: Ashish Bhatnagar, Laxman Murugesh, Padma Gopalakrishnan
  • Publication number: 20150174826
    Abstract: A method of fabricating a polishing pad includes determining a desired distribution of voids to be introduced within a polymer matrix of a polishing layer of the polishing pad. Electronic control signals configured to be read by a 3D printer are generated which specify the locations where a polymer matrix precursor is to be deposited, and specify the locations of the desired distribution of voids where no material is to be deposited. A plurality of layers of the polymer matrix corresponding to the plurality of the first locations is successfully deposited with the 3D printer. Each layer of the plurality of layers of polymer matrix is deposited by ejecting a polymer matrix precursor from a nozzle. The polymer matrix precursor is solidified to form a solidified polymer matrix having the desired distribution of voids.
    Type: Application
    Filed: November 20, 2014
    Publication date: June 25, 2015
    Inventors: Laxman Murugesh, Kadthala Ramaya Narendrnath
  • Publication number: 20140167327
    Abstract: A method of fabricating a processing chamber component comprises forming a processing chamber component having a structural body with surface regions having microcracks, and directing a laser beam onto the microcracks of the surface regions of the structural body for a sufficient time to heal and close off the microcracks by themselves.
    Type: Application
    Filed: November 22, 2013
    Publication date: June 19, 2014
    Applicant: Applied Materials, Inc.
    Inventors: Ashish BHATNAGAR, Laxman MURUGESH, Padma GOPALAKRISHNAN
  • Patent number: 8617672
    Abstract: A substrate processing chamber component has a structural body with localized surface regions having annealed microcracks. The annealed microcracks reduce crack propagation and increase fracture resistance. In one method of manufacture, the structural body of the component is formed, and a laser beam is directed onto localized surface regions of the body for a sufficient time to anneal the surface microcracks.
    Type: Grant
    Filed: July 13, 2005
    Date of Patent: December 31, 2013
    Assignee: Applied Materials, Inc.
    Inventors: Ashish Bhatnagar, Laxman Murugesh, Padma Gopalakrishnan
  • Publication number: 20130035022
    Abstract: A retaining ring includes a generally annular lower portion and a generally annular upper portion. The lower portion has a bottom surface for contacting a polishing pad during polishing and a top surface. The upper portion has a bottom surface secured to the top surface of the lower portion and a top surface configured to be mechanically affixed to and abut a rigid base of a carrier head. The lower portion is a first plastic, and the upper portion is a different second plastic that is about the same or more rigid than the first plastic.
    Type: Application
    Filed: July 27, 2012
    Publication date: February 7, 2013
    Inventors: Young J. Paik, James Klingler, Stacy Meyer, Christopher R. Mahon, Laxman Murugesh, Ashish Bhatnagar, Padma Gopalakrishnan
  • Patent number: 7732056
    Abstract: A method of providing a corrosion-resistant coating on a surface of an aluminum component comprises anodizing the surface of the aluminum component to form an anodized aluminum oxide layer and sputter coating a sputtered layer on the anodized aluminum oxide layer. A coated aluminum component can be used in a substrate processing chamber and comprises an aluminum body, an anodized aluminum oxide layer formed on the aluminum body, and a sputtered layer comprising aluminum oxide on the anodized aluminum oxide layer.
    Type: Grant
    Filed: January 18, 2005
    Date of Patent: June 8, 2010
    Assignee: Applied Materials, Inc.
    Inventors: Ashish Bhatnagar, Laxman Murugesh
  • Patent number: 7431772
    Abstract: A gas distributor distributes a gas across a surface of a substrate processing chamber. The gas distributor has a hub, a baffle extending radially outward from the hub, a first set of vanes and a second set of vanes. In one version, the hub has a gas inlet and a gas outlet. The baffle has an opposing first and second surfaces. First vanes are on the first surface of the baffle and direct gas across chamber surfaces. In one version, the first vanes comprise arcuate plates that curve and taper outward from the hub. Second vanes are on the second surface of the baffle and direct gas across the second surface of the baffle. In one version, a gas feed-through tube in the hub can allow a gas to bypass the first and second set of vanes.
    Type: Grant
    Filed: March 9, 2004
    Date of Patent: October 7, 2008
    Assignee: Applied Materials, Inc.
    Inventors: Laxman Murugesh, Padmanabhan Krishnaraj, Carl Dunham
  • Publication number: 20070108161
    Abstract: A process chamber component comprises a first surface, which in use is exposed to an energized gas in the chamber, the first surface comprising a parylene coating, and second surface, which in use is not exposed to the energized gas. The interior surfaces of a process chamber can be coated, in situ, with the polymer coating. A portable fixture can be used to form the polymer coating in the process chamber. A previously coated chamber component can also be refurbished by stripping the polymer with ozone and/or oxygen and recoating with a polymer.
    Type: Application
    Filed: November 17, 2005
    Publication date: May 17, 2007
    Inventors: Laxman Murugesh, Trung Doan
  • Publication number: 20070014949
    Abstract: A substrate processing chamber component has a structural body with localized surface regions having annealed microcracks. The annealed microcracks reduce crack propagation and increase fracture resistance. In one method of manufacture, the structural body of the component is formed by conventional means, and a laser beam is directed onto localized surface regions of the body for a sufficient time to anneal the surface microcracks.
    Type: Application
    Filed: July 13, 2005
    Publication date: January 18, 2007
    Inventors: Ashish Bhatnagar, Laxman Murugesh, Padma Gopalakrishnan
  • Patent number: 7135426
    Abstract: A substrate processing chamber component demonstrates reduced erosion in an energized gas. The component has a ceramic structure composed of aluminum oxide with a surface exposed to the energized gas in the chamber. The erosion of the surface by the energized gas is substantially reduced by erosion resistant properties of the ceramic structure, which arise from a ratio of the total area of the grains GSA to the total area of the grain boundary regions GBSA in the ceramic structure of from about 0.25 to about 2.5. Also, at least about 80% of the grains in the ceramic structure have a grain size in the range of from about 1 micron to about 20 microns. The ceramic structure also has a purity of at least about 99.8% by weight to further reduce erosion of the surface.
    Type: Grant
    Filed: May 25, 2004
    Date of Patent: November 14, 2006
    Assignee: Applied Materials, Inc.
    Inventors: Laxman Murugesh, Stan Detmar, Ho Fang
  • Publication number: 20060159940
    Abstract: A method of providing a corrosion-resistant coating on a surface of an aluminum component comprises anodizing the surface of the aluminum component to form an anodized aluminum oxide layer and sputter coating a sputtered layer on the anodized aluminum oxide layer. A coated aluminum component can be used in a substrate processing chamber and comprises an aluminum body, an anodized aluminum oxide layer formed on the aluminum body, and a sputtered layer comprising aluminum oxide on the anodized aluminum oxide layer.
    Type: Application
    Filed: January 18, 2005
    Publication date: July 20, 2006
    Inventors: Ashish Bhatnagar, Laxman Murugesh
  • Publication number: 20050284372
    Abstract: A substrate processing chamber component is capable of being exposed to an energized gas in a process chamber. The component has an underlying component structure and a surface on the underlying structure. The surface has a plurality of concentric grooves that are radially spaced apart across the surface, and electron beam textured depressions formed between adjacent grooves on the surface. The process residues adhere to the surface to reduce the contamination of processed substrates.
    Type: Application
    Filed: November 16, 2004
    Publication date: December 29, 2005
    Inventors: Laxman Murugesh, Abhijit Desai
  • Publication number: 20050274320
    Abstract: A substrate processing chamber component demonstrates reduced erosion in an energized gas. The component has a ceramic structure composed of aluminum oxide with a surface exposed to the energized gas in the chamber. The erosion of the surface by the energized gas is substantially reduced by erosion resistant properties of the ceramic structure, which arise from a ratio of the total area of the grains GSA to the total area of the grain boundary regions GBSA in the ceramic structure of from about 0.25 to about 2.5. Also, at least about 80% of the grains in the ceramic structure have a grain size in the range of from about 1 micron to about 20 microns. The ceramic structure also has a purity of at least about 99.8% by weight to further reduce erosion of the surface.
    Type: Application
    Filed: May 25, 2004
    Publication date: December 15, 2005
    Inventors: Laxman Murugesh, Stan Detmar, Ho Fang
  • Publication number: 20050199184
    Abstract: A gas distributor distributes a gas across a surface of a substrate processing chamber. The gas distributor has a hub, a baffle extending radially outward from the hub, a first set of vanes and a second set of vanes. In one version, the hub has a gas inlet and a gas outlet. The baffle has an opposing first and second surfaces. First vanes are on the first surface of the baffle and direct gas across chamber surfaces. In one version, the first vanes comprise arcuate plates that curve and taper outward from the hub. Second vanes are on the second surface of the baffle and direct gas across the second surface of the baffle. In one version, a gas feed-through tube in the hub can allow a gas to bypass the first and second set of vanes.
    Type: Application
    Filed: March 9, 2004
    Publication date: September 15, 2005
    Inventors: Laxman Murugesh, Padmanabhan Krishnaraj, Carl Dunham
  • Patent number: 6878214
    Abstract: Method and apparatus for determining an endpoint of a cleaning process running in a chamber. In particular, one embodiment of the present invention is a method that includes steps of: (a) directing radiation absorbed by a byproduct of the cleaning process into an exhaust line of the chamber; (b) detecting a measure of absorbance of the radiation by the byproduct; and (c) determining the endpoint when the measure of absorbance falls within a predetermined window.
    Type: Grant
    Filed: January 24, 2002
    Date of Patent: April 12, 2005
    Assignee: Applied Materials, Inc.
    Inventors: Laxman Murugesh, Gary R. Ahr
  • Publication number: 20040129210
    Abstract: A gas delivery nozzle for a substrate fabrication apparatus has a gas delivery tube. The gas delivery tube encloses a gas channel having an asymmetrically tapered aperture. The asymmetrically tapered aperture is defined by (i) a lower lip that projects upwardly into the gas channel to partially block the gas channel and (ii) a upper brim that projects downwardly into the gas channel and overhangs the lower lip.
    Type: Application
    Filed: January 3, 2003
    Publication date: July 8, 2004
    Applicant: Applied Materials, Inc.
    Inventor: Laxman Murugesh
  • Publication number: 20030157812
    Abstract: A method and apparatus for modifying the profile of narrow, high-aspect-ratio gaps on a semiconductor substrate are used to fill the gaps in a void-free manner. Differential heating characteristics of a substrate in a high-density plasma chemical vapor deposition (HDP-CVD) system helps to prevent the gaps from being pinched off before they are filled. The power distribution between coils forming the plasma varies the angular dependence of the sputter etch component of the plasma, and thus may be used to modify the gap profile, independently or in conjunction with differential heating. A heat source may be applied to the backside of a substrate during the concurrent deposition/etch process to further enhance the profile modification characteristics of differential heating.
    Type: Application
    Filed: February 25, 2003
    Publication date: August 21, 2003
    Applicant: Applied Materials, Inc.
    Inventors: Pravin Narwankar, Sameer Desai, Walter Zygmunt, Turgut Sahin, Laxman Murugesh
  • Publication number: 20030136425
    Abstract: Method and apparatus for determining an endpoint of a cleaning process running in a chamber. In particular, one embodiment of the present invention is a method that includes steps of: (a) directing radiation absorbed by a byproduct of the cleaning process into an exhaust line of the chamber; (b) detecting a measure of absorbance of the radiation by the byproduct; and (c) determining the endpoint when the measure of absorbance falls within a predetermined window.
    Type: Application
    Filed: January 24, 2002
    Publication date: July 24, 2003
    Applicant: Applied Materials, Inc.
    Inventors: Laxman Murugesh, Gary R. Ahr