Patents by Inventor Lee Chen

Lee Chen has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20160293388
    Abstract: A plasma processing system for performing a plasma processing application includes a plasma processing chamber, first and second electrodes residing in the plasma processing chamber, and a pneumatic counterbalance system operatively connected to the first electrode. The pneumatic counterbalance system is configured to support and maintain a position of the first electrode during a plasma processing application for gap control. A drive assembly separate from the pneumatic counterbalance system is configured to move the first electrode with respect to the second electrode in the plasma processing chamber for gap adjustment.
    Type: Application
    Filed: April 1, 2016
    Publication date: October 6, 2016
    Inventors: Lee Chen, Colin Campbell, Merritt Funk
  • Publication number: 20160293386
    Abstract: A processing method and system are provided for processing a substrate with a plasma in the presence of an electro-negative gas. A processing gas is injected into a processing chamber. The gas includes a high electron affinity gas species. A surface is provided in the plasma chamber onto which the gas species has a tendency to chemisorb. The gas species is exposed to the surface, chemisorbed onto it, and the surface is exposed to energy that causes negative ions of the chemisorbed gas species, that interact in the plasma to release secondary electrons. A neutralizer grid may be provided to separate from the chamber a second chamber in which forms a low energy secondary plasma for processing the substrate that is dense in electrons and contains high energy neutrals of the gas species and high energy positive ions of processing gas. Pulsed energy may be used to excite plasma or bias the substrate. A hollow cathode source is also provided.
    Type: Application
    Filed: April 1, 2016
    Publication date: October 6, 2016
    Inventors: Lee Chen, Merritt Funk
  • Publication number: 20160293389
    Abstract: A method and apparatus is provided for obtaining a low average electron energy flux onto a substrate in a processing chamber. A processing chamber includes a substrate support therein for chemical processing. An energy source induced plasma, and ion propelling means, directs energetic plasma electrons toward the substrate support. A dipole ring magnet field is applied perpendicular to the direction of ion travel, to effectively prevent electrons above an acceptable maximum energy level from reaching the substrate holder. Rotation of the dipole magnetic field reduces electron non-uniformities.
    Type: Application
    Filed: April 1, 2016
    Publication date: October 6, 2016
    Inventors: Lee Chen, Demetre J. Economou, Jianping Zhao, Merritt Funk
  • Patent number: 9455133
    Abstract: A chamber component configured to be coupled to a processing chamber is described. The chamber component comprises one or more adjustable gas passages through which a process gas is introduced to the process chamber. The adjustable gas passage may be configured to form a hollow cathode that creates a hollow cathode plasma in a hollow cathode region having one or more plasma surfaces in contact with the hollow cathode plasma. Therein, at least one of the one or more plasma surfaces is movable in order to vary the size of the hollow cathode region and adjust the properties of the hollow cathode plasma. Furthermore, one or more adjustable hollow cathodes may be utilized to adjust a plasma process for treating a substrate.
    Type: Grant
    Filed: April 1, 2013
    Date of Patent: September 27, 2016
    Assignee: Tokyo Electron Limited
    Inventors: Kazuki Denpoh, Peter L G Ventzek, Lin Xu, Lee Chen
  • Publication number: 20160268136
    Abstract: This disclosure relates to a plasma processing system for controlling plasma density near the edge or perimeter of a substrate that is being processed. The plasma processing system may include a plasma chamber that can receive and process the substrate using plasma for etching the substrate, doping the substrate, or depositing a film on the substrate. This disclosure relates to a plasma processing system that may be configured to enable non-ambipolar diffusion to counter ion loss to the chamber wall. The plasma processing system may include a ring cavity coupled to the plasma processing system that is in fluid communication with plasma generated in the plasma processing system. The ring cavity may be coupled to a power source to form plasma that may diffuse ions into the plasma processing system to minimize the impact of ion loss to the chamber wall.
    Type: Application
    Filed: May 25, 2016
    Publication date: September 15, 2016
    Applicant: TOKYO ELECTRON LIMITED
    Inventors: Lee Chen, Zhiying Chen, Jianping Zhao, Merritt Funk
  • Publication number: 20160261642
    Abstract: Embodiments of the present technology relate to a method for applying a security policy to an application session, comprising: determining, by a security gateway, a first user identity and a second user identity from a data packet for an application session; obtaining, by the security gateway, a security policy for the application session; and applying the security policy to the application session by the security gateway. The user identity may be a network user identity or an application user identity recognized from packets of the application session. The security policy may comprise a network traffic policy mapped and/or a document access policy mapped to the user identity, where the network traffic policy is applied to the application session. The security gateway may further generate a security report concerning the application of the security policy to the application session.
    Type: Application
    Filed: May 17, 2016
    Publication date: September 8, 2016
    Inventors: Lee Chen, Dennis Oshiba, John Chiong
  • Patent number: 9431218
    Abstract: A method of treating a substrate with plasma is described. In particular, the method includes disposing a substrate in a plasma processing system, disposing a hollow cathode plasma source including at least one hollow cathode within the plasma processing system, and disposing a grid between the cathode outlet of the plurality of hollow cathodes and the substrate. The method further includes electrically coupling the grid to electrical ground, coupling a voltage to the at least one hollow cathode relative to electrical ground, and generating plasma in hollow cathode by ion-induced secondary electron emission of energetic electrons that move along a first trajectory, and diffusing lower energy electrons along a second trajectory across a first region of the interior space between the cathode outlet and the grid, through the grid, and into a second region of the interior space in fluid contact with the substrate.
    Type: Grant
    Filed: March 13, 2014
    Date of Patent: August 30, 2016
    Assignee: TOKYO ELECTRON LIMITED
    Inventors: Jianping Zhao, Lee Chen, Radha Sundararajan, Merritt Funk
  • Publication number: 20160212833
    Abstract: A surface wave plasma (SWP) source couples microwave (MW) energy into a processing chamber through, for example, a radial line slot antenna, to result in a low mean electron energy (Te). An ICP source, is provided between the SWP source and the substrate and is energized at a low power, less than 100 watts for 300 mm wafers, for example, at about 25 watts. The ICP source couples energy through a peripheral electric dipole coil to reduce capacitive coupling.
    Type: Application
    Filed: March 28, 2016
    Publication date: July 21, 2016
    Inventors: Jianping Zhao, Lee Chen, Merritt Funk, Radha Sundararajan
  • Patent number: 9396955
    Abstract: A plasma tuning rod system is provided with one or more microwave cavities configured to couple electromagnetic (EM) energy in a desired EM wave mode to a plasma by generating resonant microwave energy in one or more plasma tuning rods within and/or adjacent to the plasma. One or more microwave cavity assemblies can be coupled to a process chamber, and can comprise one or more tuning spaces/cavities. Each tuning space/cavity can have one or more plasma tuning rods coupled thereto. The plasma tuning rods can be configured to couple the EM energy from the resonant cavities to the process space within the process chamber and thereby create uniform plasma within the process space.
    Type: Grant
    Filed: March 15, 2013
    Date of Patent: July 19, 2016
    Assignee: Tokyo Electron Limited
    Inventors: Jianping Zhao, Lee Chen, Merritt Funk, Iwao Toshihiko, Peter L. G. Ventzek
  • Patent number: 9393229
    Abstract: A method for treating an abnormal polyglutamine-mediated disease is disclosed, wherein indole and an indole-based compound contained in a pharmaceutical composition used in the method of the present invention can reduce the polyglutamine aggregation through decreasing reactive oxygen species production and increasing the activity of chaperone and autophagy.
    Type: Grant
    Filed: May 20, 2014
    Date of Patent: July 19, 2016
    Assignee: NATIONAL TAIWAN NORMAL UNIVERSITY
    Inventors: Guey-Jen Lee-Chen, Hsiu-Mei Hsieh, Ching-Fa Yao
  • Patent number: 9396900
    Abstract: A radio frequency (RF) power coupling system is provided. The system has an RF electrode configured to couple RF power to plasma in a plasma processing system, multiple power coupling elements configured to electrically couple RF power at multiple power coupling locations on the RF electrode, and an RF power system coupled to the multiple power coupling elements, and configured to couple an RF power signal to each of the multiple power coupling elements. The multiple power coupling elements include a center element located at the center of the RF electrode and peripheral elements located off-center from the center of the RF electrode. A first peripheral RF power signal differs from a second peripheral RF power signal in phase.
    Type: Grant
    Filed: November 14, 2012
    Date of Patent: July 19, 2016
    Assignee: Tokyo Electron Limited
    Inventors: Barton Lane, Lee Chen, Peter L. G. Ventzek, Merritt Funk, Jianping Zhao, Radha Sundararajan
  • Publication number: 20160198559
    Abstract: Embodiments include a chemical processing apparatus and method of using the chemical processing apparatus to treat a substrate with a mono-energetic space-charge neutralized neutral beam-activated chemical process which is comprised of a substantially anisotropic beam of neutral particles. The chemical processing apparatus comprises a first plasma chamber for forming a first plasma at a first plasma potential, and a second plasma chamber for forming a second plasma at a second plasma potential greater than the first plasma potential, wherein the second plasma is formed using electron flux from the first plasma. Further, the chemical processing apparatus comprises an ungrounded dielectric (insulator) neutralizer grid configured to expose a substrate in the second plasma chamber to the substantially anisotropic beam of neutral particles traveling from the neutralizer grid.
    Type: Application
    Filed: March 14, 2016
    Publication date: July 7, 2016
    Applicant: Tokyo Electron Limited
    Inventors: Lee Chen, Merritt FUNK, Zhiying CHEN
  • Publication number: 20160182456
    Abstract: The inventive system includes a host, a network including a security gateway, and a public application. Established are an access session between the network and the host and an application session between the public application and the network. An application session record is created for the application session, and includes the user's public user identity used to access the public application, the user's private user identity used to access the network, a host identity, and an application session time. To determine the private user identity for the application session, the security gateway sends a query with the host identity and the application session time. These are compared with the host identity and access session time in an access session record, if they match, then the private user identity in the access session record is returned, and it is stored as the private user identity in the application session record.
    Type: Application
    Filed: February 26, 2016
    Publication date: June 23, 2016
    Inventors: Xin Wang, Lee Chen, John Chiong
  • Patent number: 9356910
    Abstract: A security gateway includes packet routing policies, each including a host network address, an application network address, and a forwarding interface. In routing data packets of an application session, the security gateway: recognizes the application session between a network and an application; determines a user identity from an application session record for the application session; determines packet routing policies applicable to the application session based on the user identity; receives a data packet for the application session, including a source network address and a destination network address; compares the source network address with the host network address, and the destination network address with the application network address; and in response to finding a match between the source network address and the host network address, and between the destination network address and the application network address, processes the data packet using the forwarding interface of the packet routing policy.
    Type: Grant
    Filed: December 17, 2015
    Date of Patent: May 31, 2016
    Assignee: A10 Networks, Inc.
    Inventors: Lee Chen, Dennis Oshiba, John Chiong
  • Publication number: 20160143899
    Abstract: A method for treating abnormal ?-amyloid mediated diseases is disclosed, comprising administering a pharmaceutical composition to a subject in need, wherein the pharmaceutical composition comprises an indolylquinoline derivative represented by the following formula 1:
    Type: Application
    Filed: May 12, 2015
    Publication date: May 26, 2016
    Inventors: Guey-Jen LEE-CHEN, Hsiu-Mei HSIEH, Ching-Fa YAO
  • Patent number: 9350744
    Abstract: A method for applying a security policy to an application session, includes recognizing the application session between a network and an application via a security gateway; determining by the security gateway a user identity of the application session using information about the application session; obtaining by the security gateway the security policy comprising network parameters mapped to the user identity; and applying the security policy to the application session by the security gateway. The user identity may be a network user identity or an application user identity recognized from packets of the application session. The security policy may comprise a network traffic policy mapped and/or a document access policy mapped to the user identity, where the network traffic policy is applied to the application session. The security gateway may further generate a security report concerning the application of the security policy to the application session.
    Type: Grant
    Filed: December 17, 2015
    Date of Patent: May 24, 2016
    Assignee: A10 Networks, Inc.
    Inventors: Lee Chen, John Chiong, Dennis Oshiba
  • Patent number: 9344421
    Abstract: Systems and methods of authenticating user access based on an access point to a secure data network include a secure data network having a plurality of a network access points serving as entry points for a user to access the secure data network using a user device. The user is associated with a user identity, each network access point with a network access point identity. The user uses a user device to send an access request, requesting access to the secure data network, to the network access point, which then sends an authentication request to an identity server. The identity server processes the authentication request, by validating the combination of the user identity and the network access point identity, and responds with an authentication response, granting or denying access, as communicated to the user device via an access response.
    Type: Grant
    Filed: May 29, 2014
    Date of Patent: May 17, 2016
    Assignee: A10 Networks, Inc.
    Inventors: Lee Chen, John Chiong, Yang Yu
  • Patent number: 9344456
    Abstract: A system and method for a distributed multi-processing security gateway establishes a host side session, selects a proxy network address for a server, uses the proxy network address to establish a server side session, receives a data packet, assigns a central processing unit core from a plurality of central processing unit cores in a multi-core processor of the security gateway to process the data packet, processes the data packet according to security policies, and sends the processed data packet. The proxy network address is selected such that a same central processing unit core is assigned to process data packets from the server side session and the host side session. By assigning central processing unit cores in this manner, higher capable security gateways are provided.
    Type: Grant
    Filed: December 15, 2014
    Date of Patent: May 17, 2016
    Assignee: A10 Networks, Inc.
    Inventors: Lee Chen, Ronald Wai Lun Szeto
  • Publication number: 20160119382
    Abstract: Applying a security policy to an application session, includes: recognizing the application session between a network and an application via a security gateway; determining by the security gateway a user identity of the application session using information about the application session; obtaining by the security gateway the security policy comprising network parameters mapped to the user identity; and applying the security policy to the application session by the security gateway. The user identity may be a network user identity or an application user identity recognized from packets of the application session. The security policy may comprise a network traffic policy mapped and/or a document access policy mapped to the user identity, where the network traffic policy is applied to the application session. The security gateway may further generate a security report concerning the application of the security policy to the application session.
    Type: Application
    Filed: January 4, 2016
    Publication date: April 28, 2016
    Inventors: Lee Chen, Dennis Oshiba, John Chiong
  • Publication number: 20160105761
    Abstract: A method and system detect directionality between two objects by measuring angles of signals incident on antenna arrays on at least one side to determine angle of incidence. The methods utilize Bluetooth Low Energy communications as the means for both the control protocol and for providing updated information for deriving directionality. Directionality information is broadcast on selected BLE advertising or data channels, or broadcast using a hopping pattern over the BLE data channels, both at a specific interval duty cycle. If a hopping pattern is selected to transmit directionality information, then anchor information is simultaneously broadcast on the BLE advertising or data channels at a different, asynchronous duty cycle. In additional embodiments, signals incident on antenna arrays located on both target and tracking sides are used to determine angle of incidence, separate antennas are combined to form new antennas and antenna models are used to anticipate known antenna structure responses.
    Type: Application
    Filed: October 13, 2015
    Publication date: April 14, 2016
    Applicant: BROADCOM CORPORATION
    Inventors: Angel Arturo Polo, Thomas Francis Baker, Michael David Herndon, Arthur H Jin, Fredrick Lee Chen