Patents by Inventor Leonid Aizikovitch Sjmaenok
Leonid Aizikovitch Sjmaenok has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 9897930Abstract: A lithographic apparatus includes an optical element that includes an oriented carbon nanotube sheet. The optical element has an element thickness in the range of about 20-500 nm and has a transmission for EUV radiation having a wavelength in the range of about 1-20 nm of at least about 20% under perpendicular irradiation with the EUV radiation.Type: GrantFiled: July 22, 2009Date of Patent: February 20, 2018Assignee: ASML NETHERLANDS B.V.Inventors: Leonid Aizikovitch Sjmaenok, Vadim Yevgenyevich Banine, Johannes Hubertus Josephina Moors, Denis Alexandrovich Glushkov, Andrei Mikhailovich Yakunin
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Patent number: 9529283Abstract: A spectral purity filter is configured to transmit extreme ultraviolet (EUV) radiation and deflect or absorb non-EUV secondary radiation. In an embodiment, the spectral purity filter includes a body of material highly transmissive of EUV radiation and a layer of material highly reflective of non-EUV secondary radiation located on a radiation incident side of the body. In an embodiment, the spectral purity filter includes a body of material highly transmissive of EUV radiation and a layer of high emissivity material on an end of the body.Type: GrantFiled: July 29, 2009Date of Patent: December 27, 2016Assignee: ASML NETHERLANDS B.V.Inventors: Andrei Mikhailovich Yakunin, Vadim Yevgenyevich Banine, Johannes Hubertus Josephina Moors, Leonid Aizikovitch Sjmaenok
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Patent number: 9448492Abstract: A multilayer mirror for use in device lithography is configured to reflect and/or pattern radiation having a wavelength in the range of about 6.4 nm to about 7.2 nm. The multilayer mirror has a plurality of alternating layers of materials. The plurality of alternating layers of materials include first layers of materials and second layers of materials. The second layers have a higher refractive index for the radiation than the first layers. The materials of the first layers and the materials of the second layers are mutually chemically unreactive at an interface therebetween at temperatures less than 300° C. This may allow the mirrors to have a narrow boundary region of intermingled materials from alternating layers between the layers, for example of 0.5 nm or less in width, which may improve sharpness of the boundary region and improve reflectivity.Type: GrantFiled: March 26, 2012Date of Patent: September 20, 2016Assignee: ASML NETHERLANDS B.V.Inventors: Andrei Mikhailovich Yakunin, Denis Alexandrovich Glushkov, Vladimir Nikolaevich Polkovnikov, Nikolay Nikolaevitch Salashchenko, Leonid Aizikovitch Sjmaenok
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Patent number: 9285690Abstract: Embodiments of the invention relate to a mirror (30). The mirror includes a mirroring surface and a profiled coating layer (32a) having an outer surface, wherein one or more wedged elements are formed by the outer surface with respect to the mirroring surface, and wherein the one or more wedged elements having a wedge angle (ø) in a range of approximately 10-200 mrad. The profiled coating layer may have a curved outer surface. The profiled coating layer may be formed from at least one of the following materials: Be, B, C, P, K, Ca, Sc, Br, Rb, Sr, Y, Zr, Ru, Nb, Mo, Ba, La, Ce, Pr, Pa and U.Type: GrantFiled: July 16, 2009Date of Patent: March 15, 2016Assignee: ASML Netherlands B.V.Inventors: Vadim Yevgenyevich Banine, Leonid Aizikovitch Sjmaenok, Andrei Mikhailovich Yakunin
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Patent number: 9082521Abstract: A multilayer mirror to reflect radiation having a wavelength in the range of 2-8 nm has alternating layers. The alternating layers include a first layer and a second layer. The first and second layers are selected from the group consisting of: U and B4C layers, Th and B4C layers, La and B9C layers, La and B4C layers, U and B9C layers, Th and B9C layers, La and B layers, U and B layers, C and B layers, Th and B layers, U compound and B4C layers, Th compound and B4C layers, La compound and B9C layers, La compound and B4C layers, U compound and a B9C layers, Th compound and a B9C layers, La compound and a B layers, U compound and B layers, and Th compound and a B layers. An interlayer is disposed between at least one of the first layers and the second layer.Type: GrantFiled: January 11, 2010Date of Patent: July 14, 2015Assignee: ASML NETHERLANDS B.V.Inventors: Denis Alexandrovich Glushkov, Vadim Yevgenyevich Banine, Leonid Aizikovitch Sjmaenok, Nikolay Nikolaevitch Salashchenko, Nikolay Ivanovich Chkhalo
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Publication number: 20140198306Abstract: A multilayer mirror for use in device lithography is configured to reflect and/or pattern radiation having a wavelength in the range of about 6.4 nm to about 7.2 nm. The multilayer mirror has a plurality of alternating layers of materials. The plurality of alternating layers of materials include first layers of materials and second layers of materials. The second layers have a higher refractive index for the radiation than the first layers. The materials of the first layers and the materials of the second layers are mutually chemically unreactive at an interface therebetween at temperatures less than 300° C. This may allow the mirrors to have a narrow boundary region of intermingled materials from alternating layers between the layers, for example of 0.5 nm or less in width, which may improve sharpness of the boundary region and improve reflectivity.Type: ApplicationFiled: March 26, 2012Publication date: July 17, 2014Applicant: ASML Netherlands B.V.Inventors: Andrei Mikhailovich Yakunin, Denis Alexandrovich Glushkov, Vladimir Nikolaevich Polkovnikov, Nikolay Nikolaevitch Salashchenko, Leonid Aizikovitch Sjmaenok
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Publication number: 20110292366Abstract: A multilayer mirror to reflect radiation having a wavelength in the range of 2-8 nm has alternating layers. The alternating layers include a first layer and a second layer. The first and second layers are selected from the group consisting of: U and B4C layers, Th and B4C layers, La and B9C layers, La and B4C layers, U and B9C layers, Th and B9C layers, La and B layers, U and B layers, C and B layers, Th and B layers, U compound and B4C layers, Th compound and B4C layers, La compound and B9C layers, La compound and B4C layers, U compound and a B9C layers, Th compound and a B9C layers, La compound and a B layers, U compound and B layers, and Th compound and a B layers. An interlayer is disposed between at least one of the first layers and the second layer.Type: ApplicationFiled: January 11, 2010Publication date: December 1, 2011Inventors: Denis Alexandrovich Glushkov, Vadim Yevgenyevich Banine, Leonid Aizikovitch Sjmaenok, Nikolay Nikolaevitch Salashchenko, Nikolay Ivanovich Chkhalo
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Publication number: 20110249243Abstract: A lithographic apparatus includes an optical element that includes an oriented carbon nanotube sheet. The optical element has an element thickness in the range of about 20-500 nm and has a transmission for EUV radiation having a wavelength in the range of about 1-20 nm of at least about 20% under perpendicular irradiation with the EUV radiation.Type: ApplicationFiled: July 22, 2009Publication date: October 13, 2011Applicant: ASML Netherlands B.V.Inventors: Leonid Aizikovitch Sjmaenok, Vadim Yevgenyevich Banine, Johannes Hubertus josephine Moors, Debis Alexandrovich Glushkov, Andrei Mikhailovich Yakunin
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Publication number: 20110228243Abstract: Embodiments of the invention relate to a mirror (30). The mirror includes a mirroring surface and a profiled coating layer (32a) having an outer surface, wherein one or more wedged elements are formed by the outer surface with respect to the mirroring surface, and wherein the one or more wedged elements having a wedge angle (ø) in a range of approximately 10-200 mrad. The profiled coating layer may have a curved outer surface. The profiled coating layer may be formed from at least one of the following materials: Be, B, C, P, K, Ca, Sc, Br, Rb, Sr, Y, Zr, Ru, Nb, Mo, Ba, La, Ce, Pr, Pa and U.Type: ApplicationFiled: July 16, 2009Publication date: September 22, 2011Inventors: Vadim Yevgenyevich Banine, Leonid Aizikovitch Sjmaenok, Andrei Mikhailovich Yakunin
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Publication number: 20110143269Abstract: A spectral purity filter is configured to transmit extreme ultraviolet (EUV) radiation and deflect or absorb non-EUV secondary radiation. In an embodiment, the spectral purity filter includes a body of material highly transmissive of EUV radiation and a layer of material highly reflective of non-EUV secondary radiation located on a radiation incident side of the body. In an embodiment, the spectral purity filter includes a body of material highly transmissive of EUV radiation and a layer of high emissivity material on an end of the body.Type: ApplicationFiled: July 29, 2009Publication date: June 16, 2011Applicant: ASML Netherlands B.V.Inventors: Andrei Mikhailovich Yakunin, Vadim Yevgenyevich Banine, Johannes Hubertus Josephina Moors, Leonid Aizikovitch Sjmaenok
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Publication number: 20110080573Abstract: A multilayer mirror is constructed and arranged to reflect radiation haying a wavelength in the range of 2-8 nm. The multilayer mirror has alternating layers selected from the group consisting of: Cr and Sc layers, Cr and C layers, C and B4C layers, U and B4C layers, Th and B4C layers, C and B9C layers, La and B9C layers, U and B9C layers, Th and B9C layers, La and B layers, C and B layers. U and B layers, and Th and B layers.Type: ApplicationFiled: May 20, 2009Publication date: April 7, 2011Applicant: ASML Netherlands B.V.Inventors: Denis Alexandrovich Glushkov, Vadim Yevgenyevich Banine, Johannes Hubertus Josephina Moors, Leonid Aizikovitch Sjmaenok, Nikolai Nikolaevich Salaschenko
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Patent number: 7612353Abstract: A lithographic apparatus includes a radiation system including a radiation source for the production of a radiation beam, and a contaminant trap arranged in a path of the radiation beam. The contaminant trap includes a plurality of foils or plates defining channels that are arranged substantially parallel to the direction of propagation of said radiation beam. The foils or plates can be oriented substantially radially with respect to an optical axis of the radiation beam. The contaminant trap can be provided with a gas injector which is configured to inject gas at least at two different positions directly into at least one of the channels of the contaminant trap.Type: GrantFiled: July 6, 2006Date of Patent: November 3, 2009Assignee: ASML Netherlands B.V.Inventors: Leonid Aizikovitch Sjmaenok, Vadim Yevgenyevich Banine, Josephus Jacobus Smits, Lambertus Adrianus Van Den Wildenberg, Alexander Alexandrovitch Schmidt, Arnoud Cornelis Wassink, Eric Louis Willem Verpalen, Antonius Johannes Van De Pas, Paul Peter Anna Antonius Brom
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Patent number: 7397056Abstract: A lithographic apparatus includes a radiation system including a radiation source for the production of a radiation beam, and a contaminant trap arranged in a path of the radiation beam. The contaminant trap includes a plurality of foils or plates defining channels which are arranged substantially parallel to the direction of propagation of said radiation beam. The foils or plates are oriented substantially radially with respect to an optical axis of the radiation beam. The contaminant trap is provided with a gas injector which is configured to inject gas at least at two different positions directly into at least one of the channels of the contaminant trap.Type: GrantFiled: July 6, 2005Date of Patent: July 8, 2008Assignee: ASML Netherlands B.V.Inventors: Leonid Aizikovitch Sjmaenok, Vadim Yevgenyevich Banine, Josephus Jacobus Smits, Lambertus Adrianus Van De Wildenberg, Alexander Alexandrovitch Schmidt, Arnoud Cornelis Wassink, Eric Louis Willem Verpalen, Antonius Johannes Van De Pas
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Patent number: RE43036Abstract: An apparatus, suited, for example, for extreme ultraviolet lithography, includes a radiation source and a processing organ for processing the radiation from the radiation source. Between the radiation source and the processing organ a filter is placed which, in the radial direction from the radiation source, comprises a plurality of foils or plates.Type: GrantFiled: March 18, 2004Date of Patent: December 20, 2011Assignee: ASML Netherlands B.V.Inventor: Leonid Aizikovitch Sjmaenok