Patents by Inventor Leslie G. Jerde

Leslie G. Jerde has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Anisotropic plasma etching
    Patent number: 4253907
    Abstract: Method of anisotropically etching a semiconductor substrate (32). The substrate (32) is placed in an evacuated reaction chamber (50) and exposed to a gas plasma (63) which has been excited with an AC source having a frequency greater than 0 Hz but less than 300 KHz. The pressure in the chamber, and chamber geometry, are such that the volume power density of the plasma is less than 0.01 W/cm.sup.3.
    Type: Grant
    Filed: March 28, 1979
    Date of Patent: March 3, 1981
    Assignee: Western Electric Company, Inc.
    Inventors: Peter D. Parry, Leslie G. Jerde