Abstract: A radiation system includes a contamination barrier configured to permit radiation from a radiation source to pass through and to capture debris coming from the radiation source. The contamination barrier includes a plurality of lamellas. The surface of the lamellas includes a material. The radiation system also includes a collector configured to collect radiation from the contamination barrier. An optical surface of the collector includes a material that is the same as the material of the surface of the lamellas.

Abstract: The invention relates to a device (1) for detection of excitation (110) using a multiple spot arrangement (60), in which a multiple spot generator (50) is matched to the multiple spot arrangement (60) in such a way that light (100) entering the multiple spot generator (50) will be guided to defined areas on the multiple spot arrangement (60).

Abstract: A lithographic apparatus includes an illumination system configured to condition a radiation beam; a support configured to support a patterning device, the patterning device being configured to impart the radiation beam with a pattern in its cross-section to form a patterned radiation beam; a substrate table configured to hold a substrate; and a projection system configured to project the patterned radiation beam onto a target portion of the substrate, wherein the radiation beam is reflected from at least one grazing incidence mirror that enhances the spectral purity of the radiation beam.

Abstract: A lithographic apparatus comprising a support configured to support a patterning device; a substrate table configured to hold a substrate; a projection system configured to project a pattern imparted to a radiation beam by the patterning device onto a target portion of the substrate; and a first multi-layer mirror and a second multi-layer mirror, the first multi-layer mirror and the second multi-layer minor being arranged along a path of the radiation beam, the first multi-layer minor and the second multi-layer mirror each having a reflectivity of at least about 50% in extreme ultra violet wavelength range, and the first multi-layer mirror configured to reduce radiation having wavelengths in a first wavelength range and the second multi-layer minor configured to reduce radiation having wavelengths in a second wavelength range different from the first wavelength range, wherein the first wavelength range and the second wavelength range are outside extreme ultra violet wavelength range.

Abstract: To solve or mitigate the problem of lacking the “last mile” connection to a power grid, the invention provides a power supply apparatus for supplying electric energy to a plurality of devices. The apparatus comprises a power dock (130) configured to electrically couple to a power pack (110), wherein the power pack is configured to store electric energy; and a plurality of connectors each being configured to supply electric energy from the power dock to one of the plurality of devices (132, 134, 136). By utilizing the power pack, particularly a removable super capacitor (112), accessing power becomes easier for those people living away from power grids or suffering from an unstable power supply.

Abstract: A system for detecting at least one contamination species in an interior space of a lithographic apparatus, including: at least one monitoring surface configured to be in contact with the interior space, a thermal controller configured to control the temperature of the monitoring surface to at least one detection temperature, and at least one detector configured to detect condensation of the at least one contamination species onto the monitoring surface.

Abstract: A system for detecting at least one contamination species in an interior space of a lithographic apparatus, including: at least one monitoring surface configured to be in contact with the interior space, a thermal controller configured to control the temperature of the monitoring surface to at least one detection temperature, and at least one detector configured to detect condensation of the at least one contamination species onto the monitoring surface.

Abstract: A method for removal of deposition on a radiation collector of a lithographic apparatus includes providing a gas barrier to an end of a radiation collector, thereby providing a radiation collector enclosure volume; providing a gas to the enclosure volume, the gas selected from a halogen containing gas and a hydrogen containing gas; and removing at least part of the deposition from the radiation collector. A lithographic apparatus includes a radiation collector; a circumferential hull enclosing the radiation collector; a gas barrier at an end of the radiation collector, thereby providing a radiation collector enclosure volume. The radiation collector is enclosed by the circumferential hull and the gas barrier. An inlet provides a gas to the radiation collector enclosure volume and an outlet removes a gas from the radiation collector enclosure volume.

Abstract: A lithographic projection apparatus includes a reflector assembly, the reflector assembly includes a first and a second reflector extending in a direction of an optical axis, the first and second reflector each having a reflective surface, a backing surface and an entry section at respectively a first and a second distance from the optical axis, the first distance being larger than the second distance, rays deriving from a point on the optical axis being cut off by the entry sections of the first and second reflectors and being reflected on the reflective surface of the first reflector and defining a high radiation intensity zone and a low radiation intensity zone between the reflectors; a radial support member configured to support the reflectors extending in the low radiation intensity zone, wherein the radial support member creates a shade in a downstream direction of the optical axis and a virtual shade in an upstream direction of the optical axis; and a structure placed in the virtual shade.

Abstract: A method for assessing measurement quality in acquisition of an image of the interior of a medium (1) is provided. The method comprises the steps: subsequently irradiating the medium (1) with light from a plurality of different source positions (s) and, for each source position, detecting light emanating from the medium in a plurality of different detection positions (d) for acquisition of an image of the interior of the medium (1). The method further comprises the step: providing information about whether the measurement quality is deteriorated by exploiting signal symmetry under reversal of the light path.

Abstract: The invention relates to a method and a device (30, 125) for imaging an interior of an optically turbid medium (40). Light from a light source (35) is coupled into the turbid medium (40). Detection light emanating from the turbid medium (40) as a result of coupling (5) light from the light source (35) into the turbid medium (40) is collected. A first characteristic and a second characteristic of collected detection light are measured simultaneously. Next, the ratio of a first linear combination of the measured characteristics and a second linear combination of the measured characteristics is taken based on the recognition that the noise in both linear combinations is correlated.

Abstract: A method of controlling a device for imaging the interior of turbid media is provided. The device comprises: a receiving portion (2) for receiving a turbid medium (1) to be examined; at least one light source (6) optically connected to the receiving portion (2) for irradiating the interior of the receiving portion (2); and at least one detector (7) optically connected to the receiving portion (2) for detecting light emanating from the interior of the receiving portion (2). The at least one light source (6) and the at least one detector (7) areoptically connected to the receiving portion (2) such that a plurality of different source-detector position combinations are formed over a complete measurement. The different source-detector position combinations define different light paths through the receiving portion (2).

Abstract: A device (1) for imaging the interior of an optically turbid medium is provided. The device comprises a receptacle (3; 103) structured to accommodate an optically turbid medium for examination and an optically matching medium filling a space between an inner surface (6; 106) of the receptacle (3; 103) and the optically turbid medium. The device comprises at least one light source generating light to be coupled into the receptacle (3; 103) and at least one detector for detecting light emanating from the receptacle (3; 103). A coupling surface (10; 110) optically coupled to the inner surface (6; 106) of the receptacle and a coupling member (11; 111) optically coupled to the light source and the detector are provided.

Abstract: An imaging device for forming an image of a sample object includes an optical device and a processing unit. The optical device captures a Fourier spectrum of an object. The processing unit is arranged for processing the Fourier spectrum from the optical device and is adapted for determining the image of the sample object from the intensity of the Fourier spectrum of the sample object and the intensity of the Fourier spectrum of a combination of the sample object and a reference object.

Abstract: An assembly for detection of at least one of radiation flux and contamination on an optical component includes a detector configured to receive at least one of the radiation flux and contamination, and when the assembly is in use, to generate a detector signal correlated to at least one of the radiation flux and contamination on the component. A meter is configured to measure the detector signal. The detector includes at least one wire.

Abstract: A filter window manufacturing method includes fabricating a structure of wires on a substrate, depositing a lacquer over the wires and the substrate, depositing a first layer that includes a material selected from the group consisting of AlN, Ru, Ir, Au, SiN, Rh, C and combinations thereof, removing the lacquer, removing the substrate, and baking the first layer.

Abstract: A radiation system includes a contamination barrier configured to permit radiation from a radiation source to pass through and to capture debris coming from the radiation source. The contamination barrier includes a plurality of lamellas. The surface of the lamellas includes a material. The radiation system also includes a collector configured to collect radiation from the contamination barrier. An optical surface of the collector includes a material that is the same as the material of the surface of the lamellas.

Abstract: The invention relates to a method and device (1) for imaging an interior of a turbid medium (55). A turbid medium (55) inside a measurement volume (15) is irradiated from a plurality of source positions (25a) with light from a light source (5), and light emanating from the measurement volume (15) is detected from a plurality of detection positions (25b). An image of the interior of the turbid medium (55) is reconstructed from the detected light. In both the method and the device (1), detector signals can be amplified for each source position-detection position pair by a multi-gain amplification unit comprising an amplifier circuit (60). The amplification factor is selected from a number of possible amplification factors based on detected signal strength in the prior art. According to the invention, however, the method and device are adapted such that the amplification factor is selected for at least one source position-detection position pair on the basis of an estimate of expected electrical signal strength.

Abstract: A multi-layer mirror includes a multi-layer stack. The multi-layer stack includes a plurality of alternating layers with a multi-layer stack top layer and a spectral filter top layer arranged on the multi-layer stack. The spectral filter top layer includes a first spectral purity enhancement layer that includes a first material m1 and has a first layer thickness d1, an intermediate layer that includes a second material m2 and has a second layer thickness d2. The intermediate layer is arranged on the multi-layer stack top layer. The first material is selected from SiN, Si3N4, SiO2, ZnS, Te, diamond, CsI, Se, SiC, amorphous carbon, MgF2, CaF2, TiO2, Ge, PbF2, ZrO2, BaTiO3, LiF or NaF. The second material includes a material different from the first material, and d1+d2 has a thickness between 1.5 and 40 nm.

Abstract: A contamination barrier configured to permit radiation from a radiation source to pass through and to capture debris from the radiation source. The contamination barrier includes a support structure, a plurality of plate members arranged on the support structure and extending in a radial direction from an axis of the support structure, and a shield configured to block at least part of the support structure from being hit by radiation or debris from the radiation source.