Patents by Inventor Li Ou

Li Ou has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20040236057
    Abstract: A polysiloxane having a refractive index of about 1.
    Type: Application
    Filed: January 17, 2004
    Publication date: November 25, 2004
    Inventors: Pierre Chevalier, Duan Li Ou
  • Publication number: 20040138399
    Abstract: In a process for the preparation of a solution of a stable silicone resin comprising SiO4/2 units and units selected from RSiO3/2, RR′SiO2/2, and RR′2SiO1/2 units, where R is an alkyl, alkenyl, substituted alkyl, cycloalkyl, aryl or aralkyl group imparting desired physical or chemical properties to the resin, for example a thermally labile group, and each R′ is a different alkyl, substituted alkyl, cycloalkyl, aryl or aralkyl group, or a hydrogen atom, a hydrosiloxane resin comprising HSiO3/2 units and the said units selected from RSiO3/2, RR′SiO2/2, and RR′2SiO1/2 units is treated with a base to condense at least some of the HSiO3/2 units to form SiO4/2 units. The base is preferably a solution of an alkali metal salt of a weak acid, such as sodium acetate.
    Type: Application
    Filed: December 16, 2003
    Publication date: July 15, 2004
    Inventors: Iain Alasdair MacKinnon, Pierre Maurice Chevalier, Duan Li Ou
  • Patent number: 6596404
    Abstract: This invention pertains to a siloxane resin composition comprising R1SiO3/2 siloxane units, R2SiO3/2 siloxane units and (R3O)bSiO(4-b)/2 siloxane units wherein R1 is an alkyl group having 1 to 5 carbons, hydrogen, or mixtures thereof; R2 is a monovalent organic group having 6 to 30 carbons; R3 is a branched alkyl group having 3 to 30 carbons, b is from 1 to 3; and the siloxane resin contains from 2.5 to 85 mole percent R1SiO3/2 units, 2.5 to 50 mole percent R2SiO3/2 units and 5 to 95 mole percent (R3O)bSiO(4-b)/2 units. The siloxane resin is useful to make insoluble porous resin and insoluble porous coatings. Heating a substrate coated with the siloxane resin at a sufficient temperature effects removal of the R2 and R3O groups to form an insoluble insoluble porous coating having a porosity of 1 to 60 volume percent and a dielectric constant in the range of 1.5 to 3.0.
    Type: Grant
    Filed: April 15, 2002
    Date of Patent: July 22, 2003
    Assignee: Dow Corning Corporation
    Inventors: John Dean Albaugh, Ronald Paul Boisvert, Duane Raymond Bujalski, Pierre Maurice Chevalier, Russell Keith King, Duan Li Ou, Kai Su, Katsuya Eguchi
  • Publication number: 20030064254
    Abstract: This invention pertains to a siloxane resin composition comprising HSiO3/2 siloxane units, and (R2O)bSiO(4-b)/2 siloxane units wherein R2 is independently selected from the group consisting of branched alkyl groups having 3 to 30 carbon atoms and substituted branched alkyl groups having 3 to 30 carbon atoms, b is from 1 to 3. The siloxane resin contains a molar ratio of HSiO3/2 units to (R2O)bSiO(4-b)/2 units of 0.5:99.5 to 99.5. The siloxane resin is useful to make insoluble porous resins and insoluble porous coatings. Heating a substrate with the siloxane resin at a sufficient temperature effects removal of the R2O groups to form an insoluble porous coating having a porosity in a range of 1 to 40 volume percent and a modulus in the range of 4 to 80 GPa.
    Type: Application
    Filed: July 26, 2001
    Publication date: April 3, 2003
    Inventors: Katsuya Eguchi, Ronald Paul Boisvert, Duane Raymond Bujalski, Pierre Maurice Chevalier, Duan-Li Ou, Kai Su