Patents by Inventor Lin Ai

Lin Ai has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 11965101
    Abstract: A three-dimensional dye, a manufacturing method of the three-dimensional dye, and a photoresist mixture are disclosed. A non-planar three-dimensional dye molecular structure is constructed by adding a three-dimensional structure group into a dye molecule, thereby breaking the strong attraction force between the planar conjugation of the dye molecule. Aggregation of dye molecules are prevented, influence of dye molecules on optical paths is eliminated, and thus optical properties and color rendering properties of color filters made by a photoresist liquid are improved.
    Type: Grant
    Filed: September 3, 2020
    Date of Patent: April 23, 2024
    Assignee: TCL China Star Optoelectronics Technology Co., Ltd.
    Inventors: Lin Ai, Hong Meng
  • Patent number: 11937438
    Abstract: An organic field-effect transistor and a fabrication method therefor, including: providing a gate; depositing polymer material onto the gate to form a dielectric layer; performing supercritical fluids treatment on the gate having the dielectric layer deposited; depositing organic semiconductor layer material on the dielectric layer having been processed, to form an organic semiconductor layer; depositing electrode layer material on the organic semiconductor layer and forming an electrode layer. The dielectric properties of the dielectric layer after adopting the supercritical fluids treatment have been significantly improved. While the hysteresis effect of the dielectric layers in the OFET devices has been basically eliminated, the sub-threshold slope of the OFET is also significantly reduced, the carrier mobility is effectively improved. Additionally, an OFET switching rate after being processed is improved, and, by connecting the LEDs in series, the switching rate of the LED is increased.
    Type: Grant
    Filed: April 17, 2020
    Date of Patent: March 19, 2024
    Assignee: PEKING UNIVERSITY SHENZHEN GRADUATE SCHOOL
    Inventors: Hong Meng, Yuhao Shi, Xinwei Wang, Lin Ai
  • Publication number: 20230093494
    Abstract: An organic field-effect transistor and a fabrication method therefor, including: providing a gate; depositing polymer material onto the gate to form a dielectric layer; performing supercritical fluids treatment on the gate having the dielectric layer deposited; depositing organic semiconductor layer material on the dielectric layer having been processed, to form an organic semiconductor layer; depositing electrode layer material on the organic semiconductor layer and forming an electrode layer. The dielectric properties of the dielectric layer after adopting the supercritical fluids treatment have been significantly improved. While the hysteresis effect of the dielectric layers in the OFET devices has been basically eliminated, the sub-threshold slope of the OFET is also significantly reduced, the carrier mobility is effectively improved. Additionally, an OFET switching rate after being processed is improved, and, by connecting the LEDs in series, the switching rate of the LED is increased.
    Type: Application
    Filed: April 17, 2020
    Publication date: March 23, 2023
    Applicant: PEKING UNIVERSITY SHENZHEN GRADUATE SCHOOL
    Inventors: Hong MENG, Yuhao SHI, Xinwei WANG, Lin AI
  • Patent number: 11506975
    Abstract: A photoresist material, a method of fabricating the same, and a color filter substrate are described. The photoresist material has an oligomer segment having a chemical structural formula of: wherein a value of n is 1 to 2.
    Type: Grant
    Filed: January 10, 2020
    Date of Patent: November 22, 2022
    Assignee: TCL China Star Optoelectronics Technology Co., Ltd.
    Inventor: Lin Ai
  • Patent number: 11453781
    Abstract: The present disclosure provides a nano dye molecule, a color filter, and a display panel. The nano dye molecule comprises a gold nanocluster and a plurality of dye groups which are connected to the gold nanocluster by gold-sulfur bonds and cover an outer periphery of the gold nanocluster.
    Type: Grant
    Filed: December 27, 2019
    Date of Patent: September 27, 2022
    Assignee: TCL CHINA STAR OPTOELECTRONICS TECHNOLOGY CO., LTD.
    Inventor: Lin Ai
  • Publication number: 20220275212
    Abstract: A three-dimensional dye, a manufacturing method of the three-dimensional dye, and a photoresist mixture are disclosed. A non-planar three-dimensional dye molecular structure is constructed by adding a three-dimensional structure group into a dye molecule, thereby breaking the strong attraction force between the planar conjugation of the dye molecule. Aggregation of dye molecules are prevented, influence of dye molecules on optical paths is eliminated, and thus optical properties and color rendering properties of color filters made by a photoresist liquid are improved.
    Type: Application
    Filed: September 3, 2020
    Publication date: September 1, 2022
    Applicant: TCL China Star Optoelectronics Technology Co., Ltd.
    Inventors: Lin AI, Hong MENG
  • Patent number: 11352364
    Abstract: A method for preparing phthalocyanine nanospheres is provided, including: synthesizing an ionic phthalocyanine molecule of formula I according to a following chemical scheme: wherein M is Cu or Zn, X is Br or Cl, R1, R2, R3, and R4 are aromatic substituent groups; dissolving at least one ionic phthalocyanine molecule selected from the formula I in a solvent to form a solution; preparing a two-dimensional layer crystalline material with an opposite charge to the ionic phthalocyanine molecule; adding the two-dimensional layer crystalline material to the solution; heating the solution to evaporate a portion of the solvent to aggregate the ionic phthalocyanine molecule into phthalocyanine nanospheres between a film layer of the two-dimensional layer crystalline material; and separating the phthalocyanine nanospheres from the film layer of the two-dimensional layer crystalline material.
    Type: Grant
    Filed: December 13, 2019
    Date of Patent: June 7, 2022
    Assignee: TCL China Star Optoelectronics Technology Co. Ltd.
    Inventor: Lin Ai
  • Publication number: 20220119643
    Abstract: The present application discloses a color resist material, a filter, and a preparation method thereof. The color resist material is a trimer structure formed by polymerizing phthalocyanine dyes, wherein groups with double bonds are introduced on the phthalocyanine dyes to construct a three-molecule complex by a complexing agent, and the phthalocyanine dyes are connected by the double bonds to form a trimer structure. The color resist material with the trimer structure is stably stored in a photoresist liquid and has excellent solvent resistance, while maintains good solubility. Accordingly, a filter made of the color resist material has high transmittance and good optical performance.
    Type: Application
    Filed: April 8, 2020
    Publication date: April 21, 2022
    Applicant: TCL CHINA STAR OPTOELECTRONICS TECHNOLOGY CO., LTD.
    Inventors: Lin AI, Hsiaohsien Chen
  • Publication number: 20210325724
    Abstract: A color photoresist comprises a curable resin, a polyfunctional monomer, an initiator, a solvent, a colorant, and an additive, wherein the additive is a non-metal catalyst catalyzing a cross-coupling photoreaction to be performed among compounds having a carbon-carbon single bond, compounds having a carbon-oxygen single bond, and compounds having a carbon-nitrogen single bond under ultraviolet light. The present disclosure further provides a color filter manufactured by the above color photoresist and a manufacturing method thereof.
    Type: Application
    Filed: December 20, 2019
    Publication date: October 21, 2021
    Applicant: TCL China Star Optoelectronics Technology Co., Ltd.
    Inventor: Lin AI
  • Publication number: 20210216011
    Abstract: A photoresist material, a method of fabricating the same, and a color filter substrate are described. The photoresist material has an oligomer segment having a chemical structural formula of: wherein a value of n is 1 to 2.
    Type: Application
    Filed: January 10, 2020
    Publication date: July 15, 2021
    Applicant: TCL China Star Optoelectronics Technology Co., Ltd.
    Inventor: Lin AI
  • Publication number: 20210179854
    Abstract: The present disclosure provides a nano dye molecule, a color filter, and a display panel. The nano dye molecule comprises a gold nanocluster and a plurality of dye groups which are connected to the gold nanocluster by gold-sulfur bonds and cover an outer periphery of the gold nanocluster.
    Type: Application
    Filed: December 27, 2019
    Publication date: June 17, 2021
    Inventor: Lin AI
  • Publication number: 20210163492
    Abstract: A method for preparing phthalocyanine nanospheres is provided, including: synthesizing an ionic phthalocyanine molecule of formula I according to a following chemical scheme: wherein M is Cu or Zn, X is Br or Cl, R1, R2, R3, and R4 are aromatic substituent groups; dissolving at least one ionic phthalocyanine molecule selected from the formula I in a solvent to form a solution; preparing a two-dimensional layer crystalline material with an opposite charge to the ionic phthalocyanine molecule; adding the two-dimensional layer crystalline material to the solution; heating the solution to evaporate a portion of the solvent to aggregate the ionic phthalocyanine molecule into phthalocyanine nanospheres between a film layer of the two-dimensional layer crystalline material; and separating the phthalocyanine nanospheres from the film layer of the two-dimensional layer crystalline material.
    Type: Application
    Filed: December 13, 2019
    Publication date: June 3, 2021
    Inventor: Lin AI
  • Patent number: 8222454
    Abstract: The present invention discloses a process for preparing optically pure milnacipran and their pharmaceutically acceptable salts, which adopts racemic milnacipran as starting material, tartaric acid derivatives and their compositions as resolving agents to resolve.
    Type: Grant
    Filed: November 28, 2007
    Date of Patent: July 17, 2012
    Assignee: Zhejiang Haisen Pharmaceutical Co., Ltd.
    Inventors: Lin Ai, Xiao Liu
  • Publication number: 20100016636
    Abstract: The present invention discloses a process for preparing optically pure milnacipran and their pharmaceutically acceptable salts, which adopts racemic milnacipran as starting material, tartaric acid derivatives and their compositions as resolving agents to resolve.
    Type: Application
    Filed: November 28, 2007
    Publication date: January 21, 2010
    Inventors: Lin Ai, Xiao Liu
  • Patent number: 6245813
    Abstract: The present invention relates to the use of Ubenimex or salts thereof and the pharmaceutical composition containing them for the treatment of virus hepatitis, espcially chronic hepatitis B.
    Type: Grant
    Filed: March 19, 1998
    Date of Patent: June 12, 2001
    Assignee: Sichuan Industrial Institute of Antibiotics
    Inventors: Shanxue Zhou, Lin Ai, Ping Wang, Chuanhua Ye, Mingxiu Peng