Patents by Inventor Lin Zhang

Lin Zhang has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Small form-factor pluggable bail latch
    Patent number: 6929403
    Abstract: An optical module having a latching mechanism to allow the module to be latched to a cage of a host system is disclosed. The latching mechanism includes a latch boss that can be engaged by a latch attached to the host cage to capture the module. The latching mechanism also includes a latch key that slides towards the latch boss to disengage the latch from the latch boss. The latch key is moved by a bail that rotates and exerts a force on the latch key by a cam surface.
    Type: Grant
    Filed: February 10, 2003
    Date of Patent: August 16, 2005
    Assignee: Opnext, Inc.
    Inventors: German Arciniegas, Lin Zhang
  • Process for preparing 17-allyl amino geldanamycin (17-aag) and other ansamycins
    Publication number: 20050176695
    Abstract: Efficient chemical processes for preparing high yields, purities, and different polymorphic forms of 17-allyl amino geldanamycin (17-AAG) and other ansamycins are described and claimed.
    Type: Application
    Filed: September 18, 2002
    Publication date: August 11, 2005
    Applicant: Conforma Therapeutics Corporation
    Inventors: Lin Zhang, Marcus Boehm, Siead Zegar
  • HDP-CVD dep/etch/dep process for improved deposition into high aspect ratio features
    Patent number: 6908862
    Abstract: A method of depositing a film on a substrate disposed in a substrate processing chamber. The method includes depositing a first portion of the film by forming a high density plasma from a first gaseous mixture flown into the process chamber. The deposition processes is then stopped and part of the deposited first portion of the film is etched by flowing a halogen etchant into the processing chamber. Next, the surface of the etched film is passivated by flowing a passivation gas into the processing chamber, and then a second portion of the film is deposited over the first portion by forming a high density plasma from a second gaseous mixture flown into the process chamber. In one embodiment the passivation gas consists of an oxygen source with our without an inert gas.
    Type: Grant
    Filed: May 3, 2002
    Date of Patent: June 21, 2005
    Assignee: Applied Materials, Inc.
    Inventors: Dongqing Li, Xiaolin C. Chen, Lin Zhang
  • Methods of fabricating a regenerated optical waveguide grating
    Patent number: 6907165
    Abstract: A regenerated optical waveguide is fabricated by hydrogenating an optical waveguide (12) and exposing a grating section (28) to a UV laser beam interference fringe pattern (14) to form a Type I grating. The grating section (28) is exposed for a second period to erase the Type I grating, and then a third period to cause a regenerated optical waveguide grating to form. The resonant wavelength increases during the third period from being substantially the same as the final wavelength of the Type I grating.
    Type: Grant
    Filed: August 9, 2002
    Date of Patent: June 14, 2005
    Assignee: Aston Photonic Technologies Ltd.
    Inventors: Yu Liu, John A R Williams, Lin Zhang, Ian Bennion
  • 2-Aminopurine analogs having HSP90-inhibiting activity
    Publication number: 20050113340
    Abstract: 2-Aminopurine analogs are described and demonstrated or predicted to have utility as Heat Shock Protein 90 (HSP90) inhibiting agents in the treatment and prevention of various HSP90 mediated disorders, e.g., proliferative disorders. Method of synthesis and use of such compounds are also described and claimed.
    Type: Application
    Filed: September 20, 2004
    Publication date: May 26, 2005
    Inventors: Srinivas Kasibhatla, Kevin Hong, Marcus Boehm, Marco Biamonte, Lin Zhang
  • HDP-CVD uniformity control
    Patent number: 6890597
    Abstract: A combination of deposition and polishing steps are used to permit improved uniformity of a film after the combination of steps. Both the deposition and polishing are performed with processes that vary across the substrate. The combination of the varying deposition and etching rates results in a film that is substantially planar after the film has been polished. In some instances, it may be easier to control the variation of one of the two processes than the other so that the more controllable process is tailored to accommodate nonuniformities introduced by the less controllable process.
    Type: Grant
    Filed: May 9, 2003
    Date of Patent: May 10, 2005
    Assignee: Applied Materials, Inc.
    Inventors: Padmanabhan Krishnaraj, Bruno Geoffrion, Michael S. Cox, Lin Zhang, Bikram Kapoor, Anchuan Wang, Zhenjiang Cui
  • Assays and implements for determining and modulating hsp90 binding activity
    Publication number: 20050074457
    Abstract: Ligand binding assays as applied to HSP90s as receptors or ligands, and reagents useful therefore, are described and claimed, as are methods of assaying for HSP90 modulators and methods of using the resulting products identified thereby.
    Type: Application
    Filed: December 12, 2002
    Publication date: April 7, 2005
    Inventors: Adeela Kamal, Francis Burrows, Lin Zhang, Marcus Boehm
  • Purine analogs having hsp90-inhibiting activity
    Publication number: 20050049263
    Abstract: Novel purine compounds and tautomers and pharmaceutically acceptable salts thereof are described, as are pharmaceutical compositions comprising the same, complexes comprising the same, e.g., HSP90 complexes, and methods of using the same.
    Type: Application
    Filed: October 30, 2002
    Publication date: March 3, 2005
    Inventors: Srinivas Kasibhatla, Kevin Hong, Lin Zhang, Marco Biamonte, Marcus Boehm, Jiandong Shi, Junhua Fan
  • Saquinavir mesylate oral dosage form
    Publication number: 20050009811
    Abstract: A solid unit oral pharmaceutical dosage form of saquinavir mesylate is provided comprising micronized saquinavir mesylate in an amount of from 250 mg to 800 mg calculated as free base, and a pharmaceutically acceptable binder, disintegrant, and water soluble carrier. A solid unit dosage form of saquinavir mesylate is provided comprising from 60% to 80% micronized saquinavir mesylate based on the mesylate salt, 4% to 8% water soluble binder, a disintegrant and a carrier, wherein each percentage is of the kernel weight.
    Type: Application
    Filed: July 8, 2004
    Publication date: January 13, 2005
    Inventors: Antonio Albano, Martin Infeld, Wantanee Phuapradit, Navnit Shah, Lin Zhang
  • Dual-parameter optical waveguide grating sensing device and sensor
    Patent number: 6833541
    Abstract: In the present invention an optical waveguide grating sensing device for a dual-parameter optical waveguide grating sensor includes a first optical waveguide grating of a first resonant wavelength provided in a first section of an optical waveguide and a second optical waveguide grating of a second resonant wavelength provided in a second of an optical waveguide. The first and second gratings have different coefficients of rate of change of wavelength as a function of temperature and have substantially the same coefficient of rate of change of wavelength as a function of stain.
    Type: Grant
    Filed: September 17, 2002
    Date of Patent: December 21, 2004
    Assignee: Aston Photonic Technologies Ltd.
    Inventors: Xuewen Shu, Yu Liu, Donghui Zhao, Lin Zhang, Ian Bennion, Bashir Aliyu Labbo Gwandu, Filip Floreani
  • [DEPOSITION-SELECTIVE ETCH-DEPOSITION PROCESS FOR DIELECTRIC FILM GAPFILL]
    Publication number: 20040251236
    Abstract: A deposition / etching /deposition process is provided for filling a gap in a surface of a substrate. A liner is formed over the substrate so that distinctive reaction products are formed when it is exposed to a chemical etchant. The detection of such reaction products thus indicates that the portion of the film deposited during the first etching has been removed to an extent that further exposure to the etchant may remove the liner and expose underlying structures. Accordingly, the etching is stopped upon detection of distinctive reaction products and the next deposition in the deposition /etching /deposition process is begun.
    Type: Application
    Filed: May 23, 2003
    Publication date: December 16, 2004
    Applicant: Applied Materials, Inc.
    Inventors: Lin Zhang, Xiaolin Chen, DongQing Li, Thanh N. Pham, Farhad K. Moghadam, Shuang Li, Padmanabhan Krishnaraj
  • Method and apparatus for initiating welding arc with aid of vaporized chemical
    Publication number: 20040238511
    Abstract: Methods and apparatus for initiating an arc (e.g., a welding arc) by directing a beam of electromagnetic radiation at an ionizable chemical placed on the surface of a workpiece, on the torch or some other location in proximity to the gap between the torch and the workpiece. This is done while a potential difference is applied between an electrode of the torch and the workpiece. The radiation vaporizes the chemical to form ionized gas that renders the gap between the electrode and the workpiece more conductive, thereby reducing the voltage threshold needed to initiate an arc between the electrode and the workpiece. When the voltage threshold reaches the level of the applied potential difference, the arc will be initiated.
    Type: Application
    Filed: May 27, 2003
    Publication date: December 2, 2004
    Inventors: Tim A. Matus, Lin Zhang
  • Method and apparatus for initiating welding arc using chemical spray
    Publication number: 20040238512
    Abstract: Methods and apparatus for initiating an arc (e.g., a welding arc) by placing liquid droplets containing ions in the gap between an electrode and a workpiece. This is done while a potential difference is applied between the electrode and the workpiece. The presence of the ions renders the gap between the electrode and the workpiece more conductive, thereby reducing the voltage threshold needed to initiate an arc between the electrode and the workpiece. When the voltage threshold reaches the level of the applied potential difference, the arc will be initiated.
    Type: Application
    Filed: May 27, 2003
    Publication date: December 2, 2004
    Inventors: Tim A. Matus, Lin Zhang
  • HDP-CVD uniformity control
    Publication number: 20040224090
    Abstract: A combination of deposition and polishing steps are used to permit improved uniformity of a film after the combination of steps. Both the deposition and polishing are performed with processes that vary across the substrate. The combination of the varying deposition and etching rates results in a film that is substantially planar after the film has been polished. In some instances, it may be easier to control the variation of one of the two processes than the other so that the more controllable process is tailored to accommodate nonuniformities introduced by the less controllable process.
    Type: Application
    Filed: May 9, 2003
    Publication date: November 11, 2004
    Applicant: Applied Materials, Inc.
    Inventors: Padmanabhan Krishnaraj, Bruno Geoffrion, Michael S. Cox, Lin Zhang, Bikram Kapoor, Anchuan Wang, Zhenjiang Cui
  • Strain sensing
    Patent number: 6816638
    Abstract: A strain sensor comprises an optical waveguide having a plurality of reflecting structure (Bragg grating) along its length. Each structure reflects light at a different characteristic wavelength (&lgr;1 to &lgr;n+1) which changes in dependence on a change of physical length of at least part of the reflecting structure. The reflectivity of reflecting structures which reflect at characteristic wavelengths which are adjacent to each other (&lgr;1 and &lgr;2 or &lgr;n and &lgr;n+1) are configured to be different such that the intensity of light reflected from adjacent structures can be used to discriminate between them.
    Type: Grant
    Filed: December 28, 2001
    Date of Patent: November 9, 2004
    Assignee: Bookham Technology, PLC.
    Inventors: Ian Bennion, John Williams, Christopher Groves-Kirkby, Lin Zhang
  • Method and apparatus for welding
    Publication number: 20040200820
    Abstract: A method and apparatus for MIG welding is disclosed. When in an ac mode the output is unbalanced, or the balance may be controlled. The balance may be controlled to provide a desired deposition rate and/or to obtain a desired dilution. The frequency may be any frequency, for example 30 Hz, 60 Hz, 90 Hz, or more. The weld path may have groove with angle of less than 50 degrees. A consumable, cored, wire may be used, and provide at rates of 30 or 35 pounds per hour using a single arc. In various embodiments the balance may have a negative portion of at least 1.5 times the positive portion. The process may be started using an extended negative portion, for example 0.5 or 0.75 seconds.
    Type: Application
    Filed: February 27, 2004
    Publication date: October 14, 2004
    Applicant: Illinois Tool Works Inc.
    Inventors: Todd Holverson, Anthony Nikodym, Lin Zhang, Steven Barhorst, Jon Reynolds
  • METHOD FOR TRANSMITTING COPYRIGHTED ELECTRONIC DOCUMENTS IN A WIRELESS COMMUNICATION SYSTEM
    Publication number: 20040179687
    Abstract: A method for transmitting a copyrighted electronic document in a wireless communication system is disclosed. The wireless communication system has an electronic document management server and at least a base station, where the wireless communication system can utilize the base station to wirelessly transmit data to at least a mobile phone. The method includes a registration procedure for providing certification information to the mobile phone and a downloading procedure for transmitting an encrypted document to the mobile phone so that the mobile phone can use the certification information to decrypt the encrypted document into the electronic document.
    Type: Application
    Filed: March 14, 2003
    Publication date: September 16, 2004
    Inventors: Cheng-Shing Lai, Lin Zhang, Shuang-Jun Xu
  • Plasma mig welding
    Publication number: 20040159644
    Abstract: Methods and apparatuses for plasma MIG welding or TIG MIG welding are disclosed. They include a plasma or TIG torch for following along a weld path by a MIG torch (or the order may be reversed). A constant distance may be maintained between the torches, and the angle of the torches, relative to the workpiece, may vary. The MIG process is performed EP or EN in various embodiments.
    Type: Application
    Filed: February 13, 2004
    Publication date: August 19, 2004
    Applicant: Illinois Tool Works Inc.
    Inventors: Lin Zhang, Timm Matus
  • Rear projection television
    Patent number: D505665
    Type: Grant
    Filed: April 9, 2004
    Date of Patent: May 31, 2005
    Assignee: Coretronic Corporation
    Inventors: Jing-Lin Zhang, Kuan-Chou Ko
  • Rear projection television
    Patent number: D507547
    Type: Grant
    Filed: May 5, 2004
    Date of Patent: July 19, 2005
    Assignee: Coretronic Corporation
    Inventors: Kuan-Chou Ko, Jing-Lin Zhang