Patents by Inventor Linda K. Sundberg

Linda K. Sundberg has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Graded topcoat materials for immersion lithography
    Patent number: 8440387
    Abstract: A topcoat material for immersion lithography and a method of performing immersion lithography using the topcoat material. The topcoat material includes a mixture of a first polymer and a second polymer. The first and second polymers of the topcoat material, when the topcoat material is formed into a topcoat layer between an immersion fluid and a photoresist layer, disperse non-homogenously throughout the topcoat layer.
    Type: Grant
    Filed: January 14, 2010
    Date of Patent: May 14, 2013
    Assignee: International Business Machines Corporation
    Inventors: Robert D. Allen, Phillip Brock, Daniel P. Sanders, Linda K. Sundberg
  • Fluoroalcohol Containing Molecular Photoresist Materials and Processes of Use
    Publication number: 20120156611
    Abstract: Phenolic molecular glasses such as calixarenes include at least one fluoroalcohol containing unit. The fluoroalcohol containing molecular glasses can be used in photoresist compositions. Also disclosed are processes for generating a resist image on a substrate using the photoresist composition.
    Type: Application
    Filed: December 17, 2010
    Publication date: June 21, 2012
    Applicant: INTERNATIONAL BUSINESS MACHINES CORPORATION
    Inventors: Luisa D. Bozano, Gregory Breyta, Ekmini A. DeSilva, William D. Hinsberg, Ratnam Sooriyakumaran, Linda K. Sundberg
  • Calixarene blended molecular glass photoresists and processes of use
    Patent number: 7993812
    Abstract: Photoresist compositions include a blend of at least one fully protected calix[4]resorcinarene and at least one unprotected calix[4]resorcinarene, wherein the fully protected calix[4]resorcinarene has phenolic groups protected with acid labile protective groups; a photoacid generator; and a solvent, and wherein the blend and the photoacid generator are soluble in the solvent. Also disclosed are processes for generating a resist image on a substrate using the photoresist composition.
    Type: Grant
    Filed: July 23, 2009
    Date of Patent: August 9, 2011
    Assignee: International Business Machines Corporation
    Inventors: Luisa D. Bozano, Hiroshi Ito, Atsuko Ito, legal representative, Linda K. Sundberg
  • Self-topcoating photoresist for photolithography
    Patent number: 7951524
    Abstract: Photoresist additive polymers and photoresist formulations that can be used in immersion lithography without the use of an additional topcoat. The resist compositions include a photoresist polymer, at least one photoacid generator, a solvent; and a photoresist additive polymer. Also a method of forming using photoresist formulations including photoresist additive polymers.
    Type: Grant
    Filed: January 31, 2008
    Date of Patent: May 31, 2011
    Assignees: International Business Machines Corporation, JSR Micro Inc.
    Inventors: Robert Allen, Phillip Brock, Shiro Kusumoto, Yukio Nishimura, Daniel P. Sanders, Mark Steven Slezak, Ratnam Sooriyakumaran, Linda K. Sundberg, Hoa Trung, Gregory M. Wallraff
  • Calixarene Blended Molecular Glass Photoresists and Processes of Use
    Publication number: 20110020756
    Abstract: Photoresist compositions include a blend of at least one fully protected calix[4]resorcinarene and at least one unprotected calix[4]resorcinarene, wherein the fully protected calix[4]resorcinarene has phenolic groups protected with acid labile protective groups; a photoacid generator; and a solvent, and wherein the blend and the photoacid generator are soluble in the solvent. Also disclosed are processes for generating a resist image on a substrate using the photoresist composition.
    Type: Application
    Filed: July 23, 2009
    Publication date: January 27, 2011
    Applicant: International Business Machines Corporation
    Inventors: Luisa D. Bozano, Hiroshi Ito, Atsuko Ito, Linda K. Sundberg
  • GRADED TOPCOAT MATERIALS FOR IMMERSION LITHOGRAPHY
    Publication number: 20100168337
    Abstract: A topcoat material for immersion lithography and a method of performing immersion lithography using the topcoat material. The topcoat material includes a mixture of a first polymer and a second polymer. The first and second polymers of the topcoat material, when the topcoat material is formed into a topcoat layer between an immersion fluid and a photoresist layer, disperse non-homogenously throughout the topcoat layer.
    Type: Application
    Filed: January 14, 2010
    Publication date: July 1, 2010
    Applicant: INTERNATIONAL BUSINESS MACHINES CORPORATION
    Inventors: Robert D. Allen, Phillip Brock, Daniel P. Sanders, Linda K. Sundberg
  • Graded topcoat materials for immersion lithography
    Patent number: 7678537
    Abstract: A topcoat material for immersion lithography and a method of performing immersion lithography using the topcoat material. The topcoat material includes a mixture of a first polymer and a second polymer. The first and second polymers of the topcoat material, when the topcoat material is formed into a topcoat layer between an immersion fluid and a photoresist layer, disperse non-homogenously throughout the topcoat layer.
    Type: Grant
    Filed: March 31, 2008
    Date of Patent: March 16, 2010
    Assignee: International Business Machines Corporation
    Inventors: Robert D. Allen, Phillip Brock, Daniel P. Sanders, Linda K. Sundberg
  • GRADED TOPCOAT MATERIALS FOR IMMERSION LITHOGRAPHY
    Publication number: 20080311506
    Abstract: A topcoat material for immersion lithography and a method of performing immersion lithography using the topcoat material. The topcoat material includes a mixture of a first polymer and a second polymer. The first and second polymers of the topcoat material, when the topcoat material is formed into a topcoat layer between an immersion fluid and a photoresist layer, disperse non-homogenously throughout the topcoat layer.
    Type: Application
    Filed: March 31, 2008
    Publication date: December 18, 2008
    Inventors: Robert D. Allen, Phillip Brock, Daniel P. Sanders, Linda K. Sundberg
  • GRADED TOPCOAT MATERIALS FOR IMMERSION LITHOGRAPHY
    Publication number: 20080311530
    Abstract: A topcoat material for immersion lithography and a method of performing immersion lithography using the topcoat material. The topcoat material includes a mixture of a first polymer and a second polymer. The first and second polymers of the topcoat material, when the topcoat material is formed into a topcoat layer between an immersion fluid and a photoresist layer, disperse non-homogenously throughout the topcoat layer.
    Type: Application
    Filed: June 15, 2007
    Publication date: December 18, 2008
    Inventors: Robert D. Allen, Phillip Brock, Daniel P. Sanders, Linda K. Sundberg
  • SELF-TOPCOATING PHOTORESIST FOR PHOTOLITHOGRAPHY
    Publication number: 20080193879
    Abstract: Photoresist additive polymers and photoresist formulations that can be used in immersion lithography without the use of an additional topcoat. The resist compositions include a photoresist polymer, at least one photoacid generator, a solvent; and a photoresist additive polymer. Also a method of forming using photoresist formulations including photoresist additive polymers.
    Type: Application
    Filed: January 31, 2008
    Publication date: August 14, 2008
    Inventors: Robert Allen, Phillip Brock, Shiro Kusumoto, Yukio Nishimura, Daniel P. Sanders, Mark Steven Slezak, Ratnam Sooriyakumaran, Linda K. Sundberg, Hoa Truong, Gregory M. Wallraff