Abstract: A package may include a die proximate to a structure having a substrate with interconnects and a first component coupled to the interconnects. The die may be face up or face down. The package may include a first redistribution layer coupling the die to the interconnects of the structure and a mold compound covering the die and maybe the structure.

Abstract: Some implementations provide a semiconductor device that includes a substrate, several metal and dielectric layers coupled to the substrate, and a pad coupled to one of the several metal layers. The semiconductor device also includes a first metal layer coupled to the pad and an under bump metallization layer coupled to the first metal redistribution layer. The semiconductor device further includes a mold layer covering a first surface of the semiconductor device and at least a side portion of the semiconductor device. In some implementations, the mold layer is an epoxy layer. In some implementations, the first surface of the semiconductor device is the top side of the semiconductor device. In some implementations, the mold layer covers the at least side portion of the semiconductor device such that a side portion of at least one of the several metal layers and dielectric layers is covered with the mold layer.

Abstract: An integrated package may be manufactured in a die face up orientation with a component proximate to the attached die by creating a cavity in the mold compound during fabrication. The cavity is created with an adhesive layer on the bottom to hold a component such that the top surface of the component is co-planar with the top surface of the attached die. This may allow backside grinding to take place that will not damage the component because the top surface alignment between the attached die and the component prevents the depth of the cavity from extending into the portion of the package that is ground away.

Abstract: Disclosed is a fan-out wafer level packaging (FOWLP) apparatus includes a semiconductor die having at least one input/output (I/O) connection, a first plurality of package balls having a first package ball layout, a first conductive layer forming a first redistribution layer (RDL) and configured to electrically couple to the first plurality of package balls, and a second conductive layer forming a second RDL and including at least one conductive pillar configured to electrically couple the at least one I/O connection of the semiconductor die to the first conductive layer, wherein the second conductive layer enables the semiconductor die to be electrically coupled to a second plurality of package balls having a second package ball layout without a change in position of the at least one I/O connection of the semiconductor die.

Abstract: A semiconductor package interconnect system may include a conductive pillar having a core, a first layer surrounding the core, and a second layer surrounding the first layer. The core may be composed of a drawn copper wire, the first layer may be composed of nickel, and the second layer may be composed of a solder. A method for manufacturing a semiconductor package with such a conductive pillar may include placing a plurality of conductive pillars on a substrate using a stencil process.

Abstract: A proposed device may reduce or eliminate a step between a die and a mold compound. Bottom and top surfaces of the die may respectively be the active and non-active sides of the die. The mold compound maybe above the top surface of the die in a fan-in area corresponding to a lateral width of the die and may also be in a fan-out area corresponding to an area that extends laterally away from a side surface of the die. The mold compound in the fan-in area need not be coplanar with the mold compound in at least a portion of the fan-out area. The device may also include a redistribution layer below the bottom surface of the die and below the mold compound, and may further include an interconnect below the redistribution layer and electrically coupled to the die through the redistribution layer. A portion of the redistribution layer may be in the fan-out area.

Abstract: A proposed device may reduce or eliminate a step between a die and a mold compound. Bottom and top surfaces of the die may respectively be the active and non-active sides of the die. The mold compound maybe above the top surface of the die in a fan-in area corresponding to a lateral width of the die and may also be in a fan-out area corresponding to an area that extends laterally away from a side surface of the die. The mold compound in the fan-in area need not be coplanar with the mold compound in at least a portion of the fan-out area. The device may also include a redistribution layer below the bottom surface of the die and below the mold compound, and may further include an interconnect below the redistribution layer and electrically coupled to the die through the redistribution layer. A portion of the redistribution layer may be in the fan-out area.

Abstract: An integrated circuit (IC) package that includes a first die, a wire bond coupled to the first die, a first encapsulation layer that at least partially encapsulates the first die and the wire bond, a second die, a redistribution portion coupled to the second die, and a second encapsulation layer that at least partially encapsulates the second die. In some implementations, the wire bond is coupled to the redistribution portion. In some implementations, the integrated circuit (IC) package further includes a package interconnect that is at least partially encapsulated by the second encapsulation layer. In some implementations, the integrated circuit (IC) package further includes a via that is at least partially encapsulated by the second encapsulation layer. In some implementations, the integrated circuit (IC) package has a height of about 500 microns (?m) or less.

Abstract: Some features pertain to a package on package (PoP) device that includes a first package, a first solder interconnect coupled to the first integrated circuit package, and a second package coupled to the first package through the first solder interconnect. The second package includes a first die, a package interconnect comprising a first pad, where the first solder interconnect is coupled to the first pad of the package interconnect. The second package also includes a redistribution portion coupled to the first die and the package interconnect, an encapsulation layer at least partially encapsulating the first die and the package interconnect. The first pad may include a surface that has low roughness. The encapsulation layer may encapsulate the package interconnect such that the encapsulation layer encapsulates at least a portion of the first solder interconnect.

Abstract: A semiconductor package interconnect system may include a conductive pillar having a core, a first layer surrounding the core, and a second layer surrounding the first layer. The core may be composed of a drawn copper wire, the first layer may be composed of nickel, and the second layer may be composed of a solder. A method for manufacturing a semiconductor package with such a conductive pillar may include placing a plurality of conductive pillars on a substrate using a stencil process.

Abstract: An integrated circuit (IC) package that includes a first die, a wire bond coupled to the first die, a first encapsulation layer that at least partially encapsulates the first die and the wire bond, a second die, a redistribution portion coupled to the second die, and a second encapsulation layer that at least partially encapsulates the second die. In some implementations, the wire bond is coupled to the redistribution portion. In some implementations, the integrated circuit (IC) package further includes a package interconnect that is at least partially encapsulated by the second encapsulation layer. In some implementations, the integrated circuit (IC) package further includes a via that is at least partially encapsulated by the second encapsulation layer. In some implementations, the integrated circuit (IC) package has a height of about 500 microns (?m) or less.

Abstract: An integrated package may be manufactured in a die face up orientation with a component proximate to the attached die by creating a cavity in the mold compound during fabrication. The cavity is created with an adhesive layer on the bottom to hold a component such that the top surface of the component is co-planar with the top surface of the attached die. This may allow backside grinding to take place that will not damage the component because the top surface alignment between the attached die and the component prevents the depth of the cavity from extending into the portion of the package that is ground away.

Abstract: A package (e.g., wafer level package) that includes a die, a redistribution portion coupled to the die, a first high aspect ratio (HAR) interconnect coupled to the redistribution portion of the package, where the first high aspect ratio (HAR) interconnect comprises a width to height ratio of about at least 1:2, and a first solder interconnect coupled to the first high aspect ratio (HAR) interconnect and the redistribution portion. In some implementations, the first high aspect ratio (HAR) interconnect is a composite interconnect that includes a first conductive core and a first conductive layer that at least partially encapsulates the first conductive core. In some implementations, the first conductive layer is a diffusion barrier.

Abstract: A package may include a die proximate to a structure having a substrate with interconnects and a first component coupled to the interconnects. The die may be face up or face down. The package may include a first redistribution layer coupling the die to the interconnects of the structure and a mold compound covering the die and maybe the structure.

Abstract: Some features pertain to a package on package (PoP) device that includes a first package, a first solder interconnect coupled to the first integrated circuit package, and a second package coupled to the first package through the first solder interconnect. The second package includes a first die, a package interconnect comprising a first pad, where the first solder interconnect is coupled to the first pad of the package interconnect. The second package also includes a redistribution portion coupled to the first die and the package interconnect, an encapsulation layer at least partially encapsulating the first die and the package interconnect. The first pad may include a surface that has low roughness. The encapsulation layer may encapsulate the package interconnect such that the encapsulation layer encapsulates at least a portion of the first solder interconnect.

Abstract: Some implementations provide a semiconductor device (e.g., die, wafer) that includes a substrate, metal layers and dielectric layers coupled to the substrate, a pad coupled to one of the several metal layers, a first metal redistribution layer coupled to the pad, an under bump metallization (UBM) layer coupled to the first metal redistribution layer. The semiconductor device includes several crack stopping structures configured to surround a bump area of the semiconductor device and a pad area of the semiconductor device. The bump area includes the UBM layer. The pad area includes the pad. In some implementations, at least one crack stopping structure includes a first metal layer and a first via. In some implementations, at least one crack stopping structure further includes a second metal layer, a second via, and a third metal layer. In some implementations, at least one crack stopping structure is an inverted pyramid crack stopping structure.

Abstract: A wafer level package device may include a molding compound that encapsulates a substrate, a back end of line and front end of line layer on the substrate and a passivation layer of a redistribution layer without encapsulating a metal layer on the passivation layer. The molding compound may eliminate sidewall chipping and cracking as well as reduce the need for back side lamination.

Abstract: Some novel features pertain to an integrated device that includes a substrate, a first die coupled to the substrate, a first encapsulation layer coupled to the substrate and the first die, and a second encapsulation layer in the first encapsulation layer. The second encapsulation layer includes a set of wires configured to operate as vias. In some implementations, the integrated device includes a set of vias in the first encapsulation layer. In some implementations, the integrated device further includes a second die coupled to the substrate. In some implementations, the second encapsulation layer is positioned between the first die and the second die. In some implementations, the integrated device further includes a cavity in the first encapsulation layer, where the second encapsulation layer is positioned in the cavity. In some implementations, the cavity has a wall that is non-vertical. In some implementations, at least one of the wires is non-vertical.

Abstract: Some novel features pertain to an integrated device that includes a substrate, a first die coupled to the substrate, a first encapsulation layer coupled to the substrate and the first die, and a second encapsulation layer in the first encapsulation layer. The second encapsulation layer includes a set of wires configured to operate as vias. In some implementations, the integrated device includes a set of vias in the first encapsulation layer. In some implementations, the integrated device further includes a second die coupled to the substrate. In some implementations, the second encapsulation layer is positioned between the first die and the second die. In some implementations, the integrated device further includes a cavity in the first encapsulation layer, where the second encapsulation layer is positioned in the cavity. In some implementations, the cavity has a wall that is non-vertical. In some implementations, at least one of the wires is non-vertical.

Abstract: A wafer level package device may include a molding compound that encapsulates a substrate, a back end of line and front end of line layer on the substrate and a passivation layer of a redistribution layer without encapsulating a metal layer on the passivation layer.