Patents by Inventor Luc Albarede
Luc Albarede has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Publication number: 20230230805Abstract: Systems and methods for synchronization of radio frequency (RF) pulsing schemes and of sensor data collection are described. One of the methods includes receiving, by an RF generator, a first set of one or more variable levels and one or more duty cycles of an RF signal. The method further includes receiving, by the RF generator from a pulse controller, a synchronization signal having a plurality of pulses. The method also includes generating, during a clock cycle of a clock signal, multiple instances of a first plurality of states of the RF signal in synchronization with the plurality of pulses of the synchronization signal. Each of the first plurality of states of the RF signal has a corresponding one of the one or more variable levels of the first set and a corresponding one of the one or more duty cycles of the first set.Type: ApplicationFiled: October 15, 2021Publication date: July 20, 2023Inventors: John Stephen Drewery, Ying Wu, Alexander Miller Paterson, Luc Albarede
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Patent number: 11056322Abstract: A method for dry processing a substrate in a processing chamber is provided. The substrate is placed in the processing chamber. The substrate is dry processed, wherein the dry processing creates at least one gas byproduct. A concentration of the at least one gas byproduct is measured. The concentration of the at least one gas byproduct is used to determine processing rate of the substrate.Type: GrantFiled: August 3, 2017Date of Patent: July 6, 2021Assignee: Lam Research CorporationInventors: Yassine Kabouzi, Luc Albarede, Andrew D. Bailey, III, Jorge Luque, Seonkyung Lee, Thorsten Lill
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Publication number: 20210142991Abstract: A parameter measurement system is provided. A cavity ring down device is provided comprising a first cavity ring down mirror and a second cavity ring down mirror spaced apart from the first cavity ring down mirror. At least one laser light source is optically coupled to the first cavity ring down mirror. A light detector is optically coupled to either the first cavity ring down mirror or the second cavity ring down mirror. A controller is configured to use a sample received from the processing chamber and the light from the at least one laser light source and reflected between the first and second cavity ring down mirrors to measure one or more process parameters and adjust the process based on the one or more process parameters.Type: ApplicationFiled: January 20, 2021Publication date: May 13, 2021Inventors: Jagadeeshwari MANNE, Yassine KABOUZI, Luc ALBAREDE
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Patent number: 10930478Abstract: An apparatus for processing a substrate is provided. A processing chamber is provided. A substrate support is within the processing chamber. A gas inlet provides a process gas into the processing chamber. A gas source provides the process gas to the gas inlet. An exhaust pump pumps gas from the processing chamber. A parameter measurement system comprises a cavity ring down device in fluid communication with the processing chamber, comprising a first cavity ring down mirror on a first side of the cavity ring down device and a second cavity ring down mirror on a second side of the cavity ring down device spaced apart from the first cavity ring down mirror. At least one laser light source is optically coupled to the first cavity ring down mirror. A light detector is optically coupled to either the first cavity ring down mirror or the second cavity ring down mirror.Type: GrantFiled: May 24, 2018Date of Patent: February 23, 2021Assignee: Lam Research CorporationInventors: Jagadeeshwari Manne, Yassine Kabouzi, Luc Albarede
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Patent number: 10903050Abstract: A substrate processing system includes model generation and setpoint modules. The model generation module receives a first time trace based on an output of an endpoint sensor and obtains a target setpoint. A portion of the first time trace is indicative of an endpoint at which a feature has been created in a first substrate. The target setpoint is generated based on a metrology process and is used to compensate for erosion of a first edge ring. The model generation module generates a conversion model based on the portion and the target setpoint. The setpoint module: based on the output, receives a second time trace that is generated subsequent to generation of the first time trace; and based on the conversion model, converts the second time trace to a predicted erosion compensation setpoint, which is set while processing a second substrate using the first or a second edge ring.Type: GrantFiled: December 10, 2018Date of Patent: January 26, 2021Assignee: Lam Research CorporationInventors: Luc Albarede, Yassine Kabouzi
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Patent number: 10784174Abstract: A method for processing a substrate in a processing chamber using at least one time trace based prediction model is provided. A substrate is dry processed, where the dry processing creates at least one gas by-product. A concentration of the at least one gas by-product is measured. A time trace of the concentration of the at least one gas by-product is determined. The determined time trace of the concentration is provided as input for the at least one time trace based prediction model to obtain at least one process output. The at least one process output is used to adjust at least one process parameter.Type: GrantFiled: October 13, 2017Date of Patent: September 22, 2020Assignee: Lam Research CorporationInventors: Yassine Kabouzi, Luc Albarede
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Publication number: 20200185194Abstract: A substrate processing system includes model generation and setpoint modules. The model generation module receives a first time trace based on an output of an endpoint sensor and obtains a target setpoint. A portion of the first time trace is indicative of an endpoint at which a feature has been created in a first substrate. The target setpoint is generated based on a metrology process and is used to compensate for erosion of a first edge ring. The model generation module generates a conversion model based on the portion and the target setpoint. The setpoint module: based on the output, receives a second time trace that is generated subsequent to generation of the first time trace; and based on the conversion model, converts the second time trace to a predicted erosion compensation setpoint, which is set while processing a second substrate using the first or a second edge ring.Type: ApplicationFiled: December 10, 2018Publication date: June 11, 2020Inventors: Luc ALBAREDE, Yassine Kabouzi
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Patent number: 10504704Abstract: A substrate etching system includes an etching control module, a filtering module, and an endpoint module. The etching control module selectively begins plasma etching of a substrate within an etching chamber. The filtering module, during the plasma etching of the substrate: receives a signal including endpoint information; decomposes the signal using empirical mode decomposition (EMD); and generates a filtered signal based on results of the EMD. The endpoint module indicates when an endpoint of the plasma etching of the substrate has been reached based on the filtered signal. The etching control module ends the plasma etching of the substrate in response to the indication that the endpoint of the plasma etching of the substrate has been reached.Type: GrantFiled: November 30, 2016Date of Patent: December 10, 2019Assignee: LAM RESEARCH CORPORATIONInventors: Luc Albarede, Yassine Kabouzi, Jorge Luque, Andrew D. Bailey, III
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Publication number: 20190362950Abstract: An apparatus for processing a substrate is provided. A processing chamber is provided. A substrate support is within the processing chamber. A gas inlet provides a process gas into the processing chamber. A gas source provides the process gas to the gas inlet. An exhaust pump pumps gas from the processing chamber. A parameter measurement system comprises a cavity ring down device in fluid communication with the processing chamber, comprising a first cavity ring down mirror on a first side of the cavity ring down device and a second cavity ring down mirror on a second side of the cavity ring down device spaced apart from the first cavity ring down mirror. At least one laser light source is optically coupled to the first cavity ring down mirror. A light detector is optically coupled to either the first cavity ring down mirror or the second cavity ring down mirror.Type: ApplicationFiled: May 24, 2018Publication date: November 28, 2019Inventors: Jagadeeshwari MANNE, Yassine KABOUZI, Luc ALBAREDE
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Patent number: 10302553Abstract: A gas exhaust by-product measurement system is provided. A gas chamber is configured to receive exhaust from the exhaust output. A light source, light detector, and at least one optical element are positioned so that a light beam from the light source is directed to the at least one optical element a plurality of times before reaching the light detector. At least one heater provides heat to the at least one optical element. A plurality of purge gas nozzles are in fluid connection with the optical cavity. A high flow line is in fluid connection between a purge gas source and the plurality of purge gas nozzles. A low flow line is in fluid connection between the purge gas source and the plurality of purge gas nozzles. At least one flow controller manages a plurality of flow rates including a high flow and a low flow.Type: GrantFiled: August 30, 2017Date of Patent: May 28, 2019Assignee: Lam Research CorporationInventors: Cristian Siladie, Luc Albarede, Yassine Kabouzi, Edward J. McInerney, Sassan Roham
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Publication number: 20190115267Abstract: A method for processing a substrate in a processing chamber using at least one time trace based prediction model is provided. A substrate is dry processed, where the dry processing creates at least one gas by-product. A concentration of the at least one gas by-product is measured. A time trace of the concentration of the at least one gas by-product is determined. The determined time trace of the concentration is provided as input for the at least one time trace based prediction model to obtain at least one process output. The at least one process output is used to adjust at least one process parameter.Type: ApplicationFiled: October 13, 2017Publication date: April 18, 2019Inventors: Yassine KABOUZI, Luc ALBAREDE
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Patent number: 10249476Abstract: A system for controlling an impedance of a radio frequency (RF) return path includes a matchbox further including a match circuitry. The system further includes an RF generator coupled to the matchbox to supply an RF supply signal to the matchbox via a first portion of an RF supply path. The RF generator is coupled to the matchbox to receive an RF return signal via a first portion of an RF return path. The system also includes a switch circuit and a plasma reactor coupled to the switch circuit via a second portion of the RF return path. The plasma reactor is coupled to the match circuitry via a second portion of the RF supply path. The system includes a controller coupled to the switch circuit, the controller configured to control the switch circuit based on a tune recipe to change an impedance of the RF return path.Type: GrantFiled: April 19, 2016Date of Patent: April 2, 2019Assignee: Lam Research CorporationInventors: Alexei Marakhtanov, Rajinder Dhindsa, Ken Lucchesi, Luc Albarede
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Publication number: 20190064057Abstract: A gas exhaust by-product measurement system is provided. A gas chamber is configured to receive exhaust from the exhaust output. A light source, light detector, and at least one optical element are positioned so that a light beam from the light source is directed to the at least one optical element a plurality of times before reaching the light detector. At least one heater provides heat to the at least one optical element. A plurality of purge gas nozzles are in fluid connection with the optical cavity. A high flow line is in fluid connection between a purge gas source and the plurality of purge gas nozzles. A low flow line is in fluid connection between the purge gas source and the plurality of purge gas nozzles. At least one flow controller manages a plurality of flow rates including a high flow and a low flow.Type: ApplicationFiled: August 30, 2017Publication date: February 28, 2019Inventors: Cristian SILADIE, Luc ALBAREDE, Yassine KABOUZI, Edward J. MCINERNEY, Sassan ROHAM
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Patent number: 10157730Abstract: A plasma system includes an RF generator and a matchbox including an impedance matching circuit, which is coupled to the RF generator via an RF cable. The plasma system includes a chuck and a plasma reactor coupled to the matchbox via an RF line. The RF line forms a portion of an RF supply path, which extends between the RF generator through the matchbox, and to the chuck. The plasma system further includes a phase adjusting circuit coupled to the RF supply path between the impedance matching circuit and the chuck. The phase adjusting circuit has an end coupled to the RF supply path and another end that is grounded. The plasma system includes a controller coupled to the phase adjusting circuit. The controller is used for changing a parameter of the phase adjusting circuit to control an impedance of the RF supply path based on a tune recipe.Type: GrantFiled: June 27, 2016Date of Patent: December 18, 2018Assignee: Lam Research CorporationInventors: Alexei Marakhtanov, Rajinder Dhindsa, Ken Lucchesi, Luc Albarede
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Patent number: 10134569Abstract: A substrate processing system includes a processing chamber. A pedestal and a showerhead are arranged in the processing chamber. A surface plasmon resonance (SPR) fiber has a central portion disposed in the processing chamber, and opposing ends disposed outside the processing chamber. A light source provides input light at one end of the SPR fiber, and a detector receives output light from the other end of the SPR fiber. Surface plasmon waves and evanescent waves constitute the output light, which is processed and analyzed to determine a condition of the processing chamber.Type: GrantFiled: November 28, 2017Date of Patent: November 20, 2018Assignee: LAM RESEARCH CORPORATIONInventors: Luc Albarede, Yassine Kabouzi, Jorge Luque
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Publication number: 20170338160Abstract: A method for dry processing a substrate in a processing chamber is provided. The substrate is placed in the processing chamber. The substrate is dry processed, wherein the dry processing creates at least one gas byproduct. A concentration of the at least one gas byproduct is measured. The concentration of the at least one gas byproduct is used to determine processing rate of the substrate.Type: ApplicationFiled: August 3, 2017Publication date: November 23, 2017Inventors: Yassine Kabouzi, Luc Albarede, Andrew D. Bailey, III, Jorge Luque, Seonkyung Lee, Thorsten Lill
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Patent number: 9735069Abstract: A method for dry processing a substrate in a processing chamber is provided. The substrate is placed in the processing chamber. The substrate is dry processed, wherein the dry processing creates at least one gas byproduct. A concentration of the at least one gas byproduct is measured. The concentration of the at least one gas byproduct is used to determine processing rate of the substrate.Type: GrantFiled: September 23, 2015Date of Patent: August 15, 2017Assignee: Lam Research CorporationInventors: Yassine Kabouzi, Luc Albarede, Andrew D. Bailey, III, Jorge Luque, Seonkyung Lee, Thorsten Lill
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Publication number: 20170084503Abstract: A method for dry processing a substrate in a processing chamber is provided. The substrate is placed in the processing chamber. The substrate is dry processed, wherein the dry processing creates at least one gas byproduct. A concentration of the at least one gas byproduct is measured. The concentration of the at least one gas byproduct is used to determine processing rate of the substrate.Type: ApplicationFiled: September 23, 2015Publication date: March 23, 2017Inventors: Yassine Kabouzi, Luc Albarede, Andrew D. Bailey, III, Jorge Luque, Seonkyung Lee, Thorsten Lill
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Publication number: 20170084426Abstract: An apparatus for processing a substrate is provided. A substrate support is located within a processing chamber. A gas inlet provides a process gas into the processing chamber. An exhaust pump pumps gas from the processing chamber. A gas byproduct measurement system comprises an IR light source and an IR detector. A controller comprises at least one processor and computer readable media. The computer readable media comprises computer readable code for flowing the process gas into the etch chamber, for processing data from the IR detector, for using the processed data from the IR detector for determining concentration of the gas byproduct, and for using the determined concentration of the gas byproduct for adjusting the flow of the process gas into the processing chamber.Type: ApplicationFiled: September 23, 2015Publication date: March 23, 2017Inventors: Luc Albarede, Yassine Kabouzi
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Publication number: 20170084433Abstract: A substrate etching system includes an etching control module, a filtering module, and an endpoint module. The etching control module selectively begins plasma etching of a substrate within an etching chamber. The filtering module, during the plasma etching of the substrate: receives a signal including endpoint information; decomposes the signal using empirical mode decomposition (EMD); and generates a filtered signal based on results of the EMD. The endpoint module indicates when an endpoint of the plasma etching of the substrate has been reached based on the filtered signal. The etching control module ends the plasma etching of the substrate in response to the indication that the endpoint of the plasma etching of the substrate has been reached.Type: ApplicationFiled: November 30, 2016Publication date: March 23, 2017Inventors: LUC ALBAREDE, YASSINE KABOUZI, JORGE LUQUE, ANDREW D. BAILEY