Abstract: A temporary stoma bag for receiving waste from a patient's stoma. The temporary stoma bag includes a bag and a sealing ring for temporary sealing against a stoma to facilitate changing of an ostomy bag or a stoma port for attaching an ostomy bag.

Abstract: A method and system for performing gas cluster ion beam (GCIB) etch processing of various materials are described. In particular, the GCIB etch processing includes setting one or more GCIB properties of a GCIB process condition for the GCIB to achieve one or more target etch process metrics. Furthermore, the GCIB is formed from a pressurized gas mixture containing at least one etch compound and at least one additional gas, wherein the concentration of the at least one etch compound in the GCIB exceeds 5 at % of the pressurized gas mixture.

Abstract: An ostomy bag for receiving waste from a patient's stoma. The ostomy bag may include a finger probe for allowing a user to manually manipulate the stoma to clear blockages of the stoma. The ostomy bag may also include a stoma port for attachment to the patient's skin surrounding the stoma. A mating collar on the ostomy bag sealingly attaches the ostomy bag to the stoma port using a convenient quarter turn connection.

Abstract: The invention relates to a process for manufacturing flat glass rich in lead oxide, comprising the continuous floating, in a float plant with a neutral gaseous atmosphere, of a glass comprising at least 30% lead oxide by weight on a bath of molten metal having a higher density than that of the glass. The invention allows flat glass rich in lead, useful for protection against X-rays, to be produced.

Abstract: A gas cluster ion beam (GCIB) etching method for adjusting a fin height in finFET devices is described. The method includes providing a substrate having a fin structure and a gap-fill material layer completely overlying the fin structure and filling the regions between each fin of the fin structure, wherein each fin includes a cap layer formed on a top surface thereof, and planarizing the gap-fill material layer until the cap layer is exposed on at least one fin of the fin structure. Additionally, the method includes setting a target fin height for the fin structure, wherein the fin height measured from an interface between the cap layer and the fin structure, and exposing the substrate to a GCIB and recessing the gap-fill material layer relative to the cap layer until the target fin height is substantially achieved.

Abstract: A method of rapidly evaluating the susceptibility of a strain of bacteria to a cell wall synthesis inhibiting antibiotic based on an assessment of cell enlargement in response to doses of the cell wall synthesis inhibiting antibiotic which are correlated to breakpoints of bacterial susceptibility.

Abstract: A positioning device for positioning the saddle of a bicycle that includes a measuring pole and an adaptor positioned at an end of the measuring pole for coupling the end to the pedal crankshaft of the bicycle. The positioning device also includes a positioning assembly with a base that is configured to be supported on the saddle. An articulation assembly couples the base with the measuring pole. The base is slideable along the measuring pole and has a main plate that is capable of being supported on the saddle. The base includes a front stop adapted for abutting a front end of the saddle. The positioning device being adapted for incorporating an angle of inclination measuring device for measuring the angle of inclination of the measuring pole.

Abstract: Described herein is a framework for analyzing data in high-dimensional space. In accordance with one implementation, observed data and at least one input model parameter set is received. The input model parameter set serves as a solution candidate of a predefined problem (e.g., inverse or optimization problem) and is related to the observed data via a model. To provide enhanced computational efficiency, a reduced base with lower dimensionality is determined based on the input model parameter set. The reduced base is associated with a set of coefficients, which represents the coordinates of any model parameter set in the reduced base. Sampling is performed within the reduced base to generate an output model parameter set in the reduced base. The output model parameter set is compatible with the input model parameter set and fits the observed data, via the model, within a predetermined threshold.

Abstract: A method for opening a conformal layer at the bottom of a contact via on a substrate is described. The method includes providing a substrate having a first layer with a via pattern formed therein and a second layer conformally deposited on the first layer and within the via pattern to establish a contact via pattern characterized by an initial mid-critical dimension (CD). The method further includes etching through the second layer at the bottom of the contact via pattern to extend the contact via pattern through the second layer and form a contact via while retaining at least part of the second layer on the top surface of the first layer, the corner at the entrance to the via pattern, and the sidewalls of the via pattern, wherein the etching is performed by irradiating the substrate with a gas cluster ion beam (GCIB) according to a GCIB etching process.

Abstract: A method for patterning a layer at a bottom of a high aspect ratio feature of a substrate is described. The method includes providing the substrate having a first layer with a feature pattern overlying a second layer. The feature pattern is characterized with an initial critical dimension (CD), an initial corner profile, and an aspect ratio of 5:1 or greater. The method further includes etching through at least a portion of the second layer at the bottom of the feature pattern to extend the feature pattern at least partially into the second layer while retaining a final CD within a threshold of the initial CD and a final corner profile within a threshold of the initial corner profile using a gas cluster ion beam (GCIB) etching process.

Abstract: Described herein is a framework for analyzing data in high-dimensional space. In accordance with one implementation, observed data and at least one input model parameter set is received. The input model parameter set serves as a solution candidate of a predefined problem (e.g., inverse or optimization problem) and is related to the observed data via a model. To provide enhanced computational efficiency, a reduced base with lower dimensionality is determined based on the input model parameter set. The reduced base is associated with a set of coefficients, which represents the coordinates of any model parameter set in the reduced base. Sampling is performed within the reduced base to generate an output model parameter set in the reduced base. The output model parameter set is compatible with the input model parameter set and fits the observed data, via the model, within a predetermined threshold.

Abstract: The present invention relates to a process for determining the DNA integrity in microorganisms and a kit for evaluating the DNA integrity therein. Due to the fact that cell death means DNA fragmentation, with the present process the DNA fragmentation levels in microorganisms can be clearly discriminated in a simple, quick and accurate manner.

Abstract: A method for patterning a layer at a bottom of a high aspect ratio feature of a substrate is described. The method includes providing the substrate having a first layer with a feature pattern overlying a second layer. The feature pattern is characterized with an initial critical dimension (CD), an initial corner profile, and an aspect ratio of 5:1 or greater. The method further includes etching through at least a portion of the second layer at the bottom of the feature pattern to extend the feature pattern at least partially into the second layer while retaining a final CD within a threshold of the initial CD and a final corner profile within a threshold of the initial corner profile using a gas cluster ion beam (GCIB) etching process.

Abstract: A method for opening a conformal layer at the bottom of a contact via on a substrate is described. The method includes providing a substrate having a first layer with a via pattern formed therein and a second layer conformally deposited on the first layer and within the via pattern to establish a contact via pattern characterized by an initial mid-critical dimension (CD). The method further includes etching through the second layer at the bottom of the contact via pattern to extend the contact via pattern through the second layer and form a contact via while retaining at least part of the second layer on the top surface of the first layer, the corner at the entrance to the via pattern, and the sidewalls of the via pattern, wherein the etching is performed by irradiating the substrate with a gas cluster ion beam (GCIB) according to a GCIB etching process.

Abstract: The invention relates to a method for determining DNA integrity in microorganisms and to a kit for evaluating DNA integrity in same. Since cell death results in DNA fragmentation, the inventive method can be used to determine DNA fragmentation levels in microorganisms clearly, simply, quickly and precisely.

Abstract: A method for uncertainty estimation for nonlinear inverse problems includes obtaining an inverse model of spatial distribution of a physical property of subsurface formations. A set of possible models of spatial distribution is obtained based on the measurements. A set of model parameters is obtained. The number of model parameters is reduced by covariance free compression transform. Upper and lower limits of a value of the physical property are mapped to orthogonalspace. A model polytope including a geometric region of feasible models is defined. At least one of random and geometric sampling of the model polytope is performed in a reduced-dimensional space to generate an equi-feasible ensemble of models. The reduced-dimensional space includes an approximated hypercube. Probable model samples are evaluated based on data misfits from among an equi-feasible model ensemble determined by forward numerical simulation.

Abstract: The invention relates to a method for marking a digital document, especially a digital image, with a digital watermark for the purpose of manipulation recognition while inserting an integrity information and at least one multibit message.

Abstract: The present invention describes a method for the determination of DNA fragmentation in animal sperm. It particularly refers to a procedure to evaluate the integrity of the chromatin/DNA of the sperm by means of a treatment of the sample with a denaturing solution followed, optionally by a stain; a subsequent treatment with a lysis solution that does not contain a protein denaturing detergent, followed, optionally, by a stain; and an evaluation of the integrity of the chromatin/DNA. The present invention also refers to a Kit to evaluate the quality of the sperm of animals which includes a DNA denaturing solution and a lysis solution that does not contain a protein denaturing detergent.

Abstract: A flow cytometry system suitable for characterizing multicellular aggregates during culture and before implantation combines a low shear flow channel with a multiphoton laser scanning microscope, the latter permitting the characterization of interior and exterior cells in optical isolation from other cells for a representative sampling of fluorescent activity. Imaging capabilities permit sophisticated statistical measurements reflecting individual cell characteristics.

Abstract: The invention concerns a building façade having an inner wall, an insulation layer, an outer cladding layer and profiles for securing the outer cladding to the inner wall. Air gab for ventilation is provided between the insulation layer and the outer cladding. The insulation layer comprises insulation panels having two major large surfaces and four minor edge surfaces and the insulation panels have layers of insulation of different densities extending parallel to the two major surfaces, where a layer with a density above an average density of the panel is facing the outer cladding.