Patents by Inventor M. Dalil Rahman

M. Dalil Rahman has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20200356006
    Abstract: The present invention relates to a composition comprising; components a. c. and d; and optional component b. wherein, component a. is a metal compound having the structure (I), optional component b., is a polyol additive, having structure (VI), component c. is a high performance polymer additive, and component d. is a solvent. The present invention further relates to using this compositions in methods for manufacturing electronic devices through either the formation of a patterned films of high K material comprised of a metal oxide on a semiconductor substrate, or through the formation of patterned metal oxide comprised layer overlaying a semiconductor substrate which may be used to selectively etch the semiconductor substrate with a fluorine plasma.
    Type: Application
    Filed: September 4, 2018
    Publication date: November 12, 2020
    Inventors: Huirong YAO, JoonYeon CHO, M. Dalil Rahman
  • Publication number: 20200087534
    Abstract: The present invention relates a coating composition comprising a solvent, metal oxide nanoparticles dispersed in this solvent, a high carbon polymer dissolved in this solvent, where the high carbon polymer comprises a repeat unit of structure (1), a hydroxybiphenyl repeat unit of structure (2) and an moiety containing a fused aromatic containing moiety of structure (3) wherein R1 and R2 are independently selected from the group consisting of hydrogen, an alkyl and a substituted alkyl, Ar is an unsubstituted or substituted fused aromatic ring and X1 is an alkylene spacer, or a direct valence bound. The invention also relates to a processes where this composition is used in lithographic applications as a patterned hard mask either through and inverse tone hard mask pattern transfer process or a conventional mask pattern process using a photoresist, to pattern the hard mask and a hard mask to pattern a semiconductor substrate with a plasma.
    Type: Application
    Filed: December 19, 2017
    Publication date: March 19, 2020
    Inventors: M. Dalil RAHMAN, Huirong YAO, JoonYeon CHO, Munirathna PADMANABAN, Elizabeth WOLFER
  • Publication number: 20200002568
    Abstract: Masking compositions for preventing metal contamination at substrate edges during the manufacture of electronic devices. The masking compositions have a unit of structure (I): Also provided are methods of using the masking compositions for manufacturing electronic devices.
    Type: Application
    Filed: March 14, 2018
    Publication date: January 2, 2020
    Inventors: Huirong YAO, Elizabeth WOLFER, JoonYeon CHO, Orest POLISHCHUCK, M. Dalil RAHMAN, Douglas S. Mackenzie
  • Patent number: 10241409
    Abstract: Compositions having a high metal content comprising a metal salt solution, a stabilizer and one or more optional additives, wherein the metal salt solution comprises a metal ion, a counter ion and a solvent. The compositions are useful for forming films on substrates in the manufacture of solid state and integrated circuit devices.
    Type: Grant
    Filed: December 22, 2015
    Date of Patent: March 26, 2019
    Assignee: AZ Electronic Materials (Luxembourg) S.à.r.l.
    Inventors: Huirong Yao, M. Dalil Rahman, Douglas McKenzie, JoonYeon Cho
  • Publication number: 20170176860
    Abstract: Compositions having a high metal content comprising a metal salt solution, a stabilizer and one or more optional additives, wherein the metal salt solution comprises a metal ion, a counter ion and a solvent. The compositions are useful for forming films on substrates in the manufacture of solid state and integrated circuit devices.
    Type: Application
    Filed: December 22, 2015
    Publication date: June 22, 2017
    Applicant: AZ ELECTRONIC MATERIALS (LUXEMBOURG) S.A.R.L.
    Inventors: Huirong Yao, M. Dalil Rahman, Douglas McKenzie, JoonYeon Cho
  • Patent number: 9315636
    Abstract: The present disclosure relates to soluble, multi-ligand-substituted metal compounds with improved stability as well as compositions made from them and methods of their use.
    Type: Grant
    Filed: December 7, 2012
    Date of Patent: April 19, 2016
    Assignee: AZ ELECTRONIC MATERIALS (LUXEMBOURG) S.A.R.L.
    Inventors: Huirong Yao, M. Dalil Rahman, Salem K. Mullen, JoonYeon Cho, Clement Anyadiegwu, Munirathna Padmanaban
  • Patent number: 9274426
    Abstract: The present invention relates to a novel absorbing antireflective coating composition comprising a novel crosslinkable polymer comprising at least one repeat unit (A) having structure (1), at least one repeat unit (B) having a structure (2), and at least one repeat unit (C) having structure (3) where D is a direct valence bound or C(R1)(R2) methylene moiety where R1 and R2 are independently H, C1-C8 alkyl, C3-C24 cycloalkyl or C6-C24 aryl; Ari, Arii, Ariii and Ariv are independently phenylenic and naphthalenic moiety, R3 and R4 are independently hydrogen or C1-C8 alkyl; and R5 and R6 are independently hydrogen or C1-C8 alkyl; and a solvent. The invention also relates to a process for forming an image using the novel antireflective coating composition.
    Type: Grant
    Filed: June 4, 2014
    Date of Patent: March 1, 2016
    Assignee: AZ ELECTRONIC MATERIALS (LUXEMBOURG) S.A.R.L.
    Inventors: M. Dalil Rahman, Takanori Kudo, Alberto D. Dioses, Douglas McKenzie, Clement Anyadiegwu, Munirathna Padmanaban, Salem K. Mullen
  • Patent number: 9201305
    Abstract: The present disclosure relates to spin-on compositions containing at least one metal oxide dicarboxylate and an organic solvent into which the metal oxide dicarboxylate is soluble or colloidally stable. The dicarboxylate is capable of decomposing during heat treatment to give a cured metal oxide film. The present disclosure also relates to method of using the spin-on compositions.
    Type: Grant
    Filed: June 28, 2013
    Date of Patent: December 1, 2015
    Assignee: AZ ELECTRONIC MATERIALS (LUXEMBOURG) S.A.R.L.
    Inventors: M. Dalil Rahman, Venkata Gopal Reddy Chada, Huirong Yao, Clement Anyadiegwu, Douglas McKenzie
  • Publication number: 20150309410
    Abstract: The present invention relates to a novel absorbing antireflective coating composition comprising a novel crosslinkable polymer comprising at least one repeat unit (A) having structure (1), at least one repeat unit (B) having a structure (2), and at least one repeat unit (C) having structure (3) where D is a direct valence bound or C(R1)(R2) methylene moiety where R1 and R2 are independently H, C1-C5 alkyl, C3-C24 cycloalkyl or C6-C24 aryl; Ari, Arii, Ariii and Ariv are independently phenylenic and naphthalenic moiety, R3 and R4 are independently hydrogen or C1-C8 alkyl; and R5 and R6 are independently hydrogen or C1-C8 alkyl; and a solvent. The invention also relates to a process for forming an image using the novel antireflective coating composition.
    Type: Application
    Filed: June 4, 2014
    Publication date: October 29, 2015
    Inventors: M. Dalil RAHMAN, Takanori KUDO, Alberto D. DIOSES, Douglas MCKENZIE, Clement ANYADIEGWU, Munirathna PADMANABAN, Salem K. MULLEN
  • Publication number: 20150309403
    Abstract: The present invention relates to a novel absorbing antireflective coating composition comprising a novel crosslinkable polymer comprising at least one repeat unit (A) having structure (1), at least repeat (B) unit having a structure (2), and at least one repeat unit (C) having structure (3) where D is a direct valence bound or C(R1)(R2) methylene moiety where R1 and R2 are independently H, C1-C8 alkyl, C3-C24 cycloalkyl or C6-C24 aryl; Ari, Arii, Ariii and Ariv are independently phenylenic and naphthalenic moiety, R3 and R4 are independently hydrogen or C1-C8 alkyl; and R5 and R6 are independently hydrogen or C1-C8 alkyl; and a solvent. The invention also relates to a process for forming an image using the novel antireflective coating composition.
    Type: Application
    Filed: April 29, 2014
    Publication date: October 29, 2015
    Applicant: AZ ELECTRONIC MATERIALS (LUXEMBOURG) S.A.R.L.
    Inventors: M. Dalil RAHMAN, Takanori KUDO, Alberto D. DIOSES, Douglas MCKENZIE, Clement ANYADIEGWU, Munirathna PADMANABAN, Salem K. Mullen
  • Patent number: 9152051
    Abstract: The present invention relates to an absorbing hard mask antireflective coating composition comprising a novel polymer, where the novel polymer comprises in the backbone of the polymer four repeat units -A-, -B-, -C- and -D-, where A is repeat unit which comprises a fused aromatic ring in its backbone, B has the structure (1), C is a hydroxylbiphenyl of structure (2) and D is a derivatized fluorene of structure (3), where R1 is C1-C4alkyl, R2 is C1-C4alkyl, R3 and R4 are independently hydrogen or C1-C4 alkyl, and Ar? and Ar? are independently phenylenic, or naphthalenic derived moieties, R5 and R6 are independently —OH or —(CH2)nOH where n=2-4, and R7 and R8 are independently hydrogen or C1-C4 alkyl. This invention also relates to a process for forming an image using the novel antireflective coating composition.
    Type: Grant
    Filed: June 13, 2013
    Date of Patent: October 6, 2015
    Assignee: AZ ELECTRONICS MATERIALS (LUXEMBOURG) S.A.R.L.
    Inventors: M. Dalil Rahman, Clement Anyadiegwu, Douglas McKenzie, Takanori Kudo, Elizabeth Wolfer, Salem K. Mullen
  • Publication number: 20150004801
    Abstract: The present disclosure relates to spin-on compositions containing at least one metal oxide dicarboxylate and an organic solvent into which the metal oxide dicarboxylate is soluble or colloidally stable. The dicarboxylate is capable of decomposing during heat treatment to give a cured metal oxide film. The present disclosure also relates to method of using the spin-on compositions.
    Type: Application
    Filed: June 28, 2013
    Publication date: January 1, 2015
    Applicant: AZ ELECTRONIC MATERIALS (LUXEMBOURG) S.A.R.L.
    Inventors: M. Dalil RAHMAN, Venkata Gopal Reddy CHADA, Huirong YAO, Clement ANYADIEGWU, Douglas MCKENZIE
  • Publication number: 20140370444
    Abstract: The present invention relates to an absorbing hard mask antireflective coating composition comprising a novel polymer, where the novel polymer comprises in the backbone of the polymer four repeat units -A-, -B-, -C- and -D-, where A is repeat unit which comprises a fused aromatic ring in its backbone, B has the structure (1), C is a hydroxylbiphenyl of structure (2) and D is a derivatized fluorene of structure (3), where R1 is C1-C4alkyl, R2 is C1-C4alkyl, R3 and R4 are independently hydrogen or C1-C4 alkyl, and Ar? and Ar? are independently phenylenic, or naphthalenic derived moieties, R5 and R6 are independently —OH or —CH2)nOH where n=2-4, and R7 and R8 are independently hydrogen or C1-C4 alkyl. This invention also relates to a process for forming an image using the novel antireflective coating composition.
    Type: Application
    Filed: June 13, 2013
    Publication date: December 18, 2014
    Applicant: AZ ELECTRONIC MATERIALS (LUXEMBOURG) S.A.R.L.
    Inventors: M. Dalil RAHMAN, Clement ANYADIEGWU, Douglas MCKENZIE, Takanori KUDO, Elizabeth WOLFER, Salem K. MULLEN
  • Patent number: 8906592
    Abstract: The invention relates to an antireflective coating composition comprising a crosslinkable polymer, where the crosslinkable polymer comprises at least one unit of fused aromatic moiety, at least one unit with a phenylene moiety in the backbone of the polymer, and at least one hydroxybiphenyl unit, furthermore where the polymer comprises a crosslinking moiety of structure (4), where R?3, R?3 and R??3 are independently hydrogen or a C1-C4alkyl. The invention further relates to a process for forming an image using the composition.
    Type: Grant
    Filed: August 1, 2012
    Date of Patent: December 9, 2014
    Assignee: AZ Electronic Materials (Luxembourg) S.A.R.L.
    Inventors: M. Dalil Rahman, Clement Anyadiegwu, Douglas McKenzie, JoonYeon Cho
  • Publication number: 20140159278
    Abstract: The present disclosure relates to soluble, multi-ligand-substituted metal compounds with improved stability as well as compositions made from them and methods of their use.
    Type: Application
    Filed: December 7, 2012
    Publication date: June 12, 2014
    Applicant: AZ ELECTRONIC MATERIALS (LUXEMBOURG) S.A.R.L.
    Inventors: Huirong YAO, M. Dalil RAHMAN, Salem K. MULLEN, JoonYeon CHO, Clement ANYADIEGWU, Munirathna PADMANABAN
  • Publication number: 20140038109
    Abstract: The invention relates to an antireflective coating composition comprising a crosslinkable polymer, where the crosslinkable polymer comprises at least one unit of fused aromatic moiety, at least one unit with a phenylene moiety in the backbone of the polymer, and at least one hydroxybiphenyl unit, furthermore where the polymer comprises a crosslinking moiety of structure (4), where R3, R?3 and R??3 are independently hydrogen or a C1-C4alkyl. The invention further relates to a process for forming an image using the composition.
    Type: Application
    Filed: August 1, 2012
    Publication date: February 6, 2014
    Applicant: AZ ELECTRONIC MATERIALS (LUXEMBOURG) S.A.R.L.
    Inventors: M. Dalil RAHMAN, Clement ANYADIEGWU, Douglas MCKENZIE, JoonYeon CHO
  • Patent number: 8486609
    Abstract: The invention relates to an antireflective coating composition comprising a crosslinker and a crosslinkable polymer capable of being crosslinked by the crosslinker, where the crosslinkable polymer comprises a unit represented by structure (1): A-Bn??(1) where A is a fused aromatic ring and B has a structure (2), where R1 is C1-C4alkyl and R2 is C1-C4alkyl. The invention further relates to a process for forming an image using the composition.
    Type: Grant
    Filed: December 23, 2009
    Date of Patent: July 16, 2013
    Assignee: AZ Electronic Materials USA Corp.
    Inventors: M. Dalil Rahman, Douglas McKenzie, Huirong Yao, JoonYeon Cho, Yi Yl, Guanyang Lin
  • Publication number: 20120251956
    Abstract: The invention relates to an antireflective coating composition comprising a crosslinker and a crosslinkable polymer capable of being crosslinked by the crosslinker, where the crosslinkable polymer comprises a unit represented by structure (1): [-A-B-C-]??(1) where A is a fused aromatic ring, B has a structure (2), and C is a hydroxybiphenyl of structure (3) where R1 is C1-C4alkyl and R2 is C1-C4alkyl. The invention further relates to a process for forming an image using the composition.
    Type: Application
    Filed: January 17, 2012
    Publication date: October 4, 2012
    Applicant: AZ ELECTRONIC MATERIALS USA CORP.
    Inventors: M. Dalil RAHMAN, Douglas MCKENZIE, Jianhui SHAN, JoonYeon CHO, Salem K. MULLEN, Clement ANYADIEGWU
  • Publication number: 20120251943
    Abstract: The invention relates to an antireflective coating composition comprising a crosslinker and a crosslinkable polymer capable of being crosslinked by the crosslinker, where the crosslinkable polymer comprises a unit represented by structure (1): ?A-B—C???(1) where A is a fused aromatic ring, B has a structure (2), and C is a hydroxybiphenyl of structure (3) where R1 is C1-C4alkyl and R2 is C1-C4alkyl. The invention further relates to a process for forming an image using the composition.
    Type: Application
    Filed: March 30, 2011
    Publication date: October 4, 2012
    Inventors: M. Dalil Rahman, Douglas McKenzie, Jianhui Shan, Joon Yeon Cho, Salem K. Mullen
  • Patent number: 8017296
    Abstract: The present invention relates to an organic spin coatable antireflective coating composition comprising a polymer comprising at least one unit with 3 or more fused aromatic rings in the backbone of the polymer and at least one unit with an aliphatic moeity in the backbone of the polymer. The invention further relates to a process for imaging the present composition.
    Type: Grant
    Filed: October 16, 2007
    Date of Patent: September 13, 2011
    Assignee: AZ Electronic Materials USA Corp.
    Inventors: Francis Houlihan, David Abdallah, M. Dalil Rahman, Douglas McKenzie, Ruzhi Zhang, Allen G. Timko, WooKyu Kim, Ping-Hung Lu