Patents by Inventor Maarten Kuijper
Maarten Kuijper has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 11587762Abstract: The invention relates to a device and method for determining a property of a sample that is to be used in a charged particle microscope. The sample comprises a specimen embedded within a matrix layer. The device comprises a light source arranged for directing a beam of light towards said sample, and a detector arranged for detecting light emitted from said sample in response to said beam of light being incident on said sample. Finally, the device comprises a controller that is connected to said detector and arranged for determining a property of said matrix layer based on signals received by said detector.Type: GrantFiled: February 5, 2021Date of Patent: February 21, 2023Assignee: FEI CompanyInventors: Maarten Kuijper, Matthijn Robert-Jan Vos, Ondrej Ludmil Shànël, Peet Goedendorp
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Publication number: 20220410615Abstract: The present invention describes a blotting material comprising a profiled region that has a portion configured to protrude at least partially into a space created within a boundary formed by the rim of a holder for a sample grid. Also described are methods for making such profiles and components used to make said profiles. There are also provided methods for removing excess liquid from a sample grid by bringing the profiled blotting material into association with the sample grid past the sample grid holder. Systems comprises means to hold a sample grid holder, means to hold the blotting paper, and means to bring the two together are also described.Type: ApplicationFiled: June 27, 2022Publication date: December 29, 2022Applicant: FEI CompanyInventors: Ivanka Spee, Jeroen Bresser, Adrian Koh, Maarten Kuijper, Mathijs Petrus Wilhelmus van den Boogaard
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Publication number: 20220316784Abstract: The invention relates to a method and an apparatus for preparing a cryogenic sample, whereby the sample is subjected to rapid cooling using a cryogen. A pair of conduits for transporting cryogenic fluid are provided, each of which conduits opens out into a mouthpiece, which mouthpieces are arranged to face each other across an intervening gap, wherein in said gap a sample that is provided on a substantially planar sample carrier can be received. Cryogenic fluid can be pumped through said conduits so as to concurrently flush from said mouthpieces and suddenly immerse the sample in cryogenic fluid from two opposite sides. As defined herein, at least one of said mouthpieces comprises at least two nozzle openings for evenly cooling said substantially planar sample carrier during said flushing.Type: ApplicationFiled: March 30, 2022Publication date: October 6, 2022Applicant: FEI CompanyInventors: Maarten KUIJPER, Hervé REMIGY, Mathijs Petrus Wilhelmus VAN DEN BOOGAARD, Adrian KOH, Ivanka SPEE, John HAZENBERG, Marius VAN DER DOES
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Patent number: 11430633Abstract: Apertures having references edges are situated to define a sample irradiation zone and a shielded zone. The sample irradiation zone includes a portion proximate the shielded zone that is conjugate to a detector. A sample is scanned into the sample irradiation zone from the shielded zone so that the sample can remain unexposed until situated properly with respect to the detector for imaging. Irradiation exposure of the sample is reduced, permitting superior imaging.Type: GrantFiled: December 29, 2020Date of Patent: August 30, 2022Assignee: FEI CompanyInventors: Ondrej L. Shanel, Trond Karsten Varslot, Martin Schneider, Maarten Kuijper, Ondrej R. Baco, Václav Batelka
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Publication number: 20220208511Abstract: Apertures having references edges are situated to define a sample irradiation zone and a shielded zone. The sample irradiation zone includes a portion proximate the shielded zone that is conjugate to a detector. A sample is scanned into the sample irradiation zone from the shielded zone so that the sample can remain unexposed until situated properly with respect to the detector for imaging. Irradiation exposure of the sample is reduced, permitting superior imaging.Type: ApplicationFiled: December 29, 2020Publication date: June 30, 2022Applicant: FEI CompanyInventors: Ondrej L. Shanel, Trond Karsten Varslot, Martin Schneider, Maarten Kuijper, Ondrej R. Baco, Václav Batelka
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Patent number: 11101104Abstract: Cryo compatible sample grids having multi-modal cryo-EM compatible GUIDs, according to the present disclosure include an outer support structure that defines a region of the grid for holding one or more samples, and a plurality of inner support structures that define a plurality of apertures that are each configured to hold a sample. Cryo compatible sample grids further include a first identifier located on the outer support structure, and a second identifier located within the region of the grid for holding the one or more samples. The first identifier is readable with an optical detector, while the second identifier is readable with an electron detector (e.g., within an electron microscope). Specifically, the second identifier is readable with an electron detector when one or more teeth and/or holes that comprise the second identifier are filled with ice from a vitrification process.Type: GrantFiled: August 30, 2019Date of Patent: August 24, 2021Assignee: FEI CompanyInventors: Maarten Kuijper, Ondrej Ludmil Shanel, Mathijs Petrus van den Boogaard, Pleun Dona
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Publication number: 20210257183Abstract: The invention relates to a device and method for determining a property of a sample that is to be used in a charged particle microscope. The sample comprises a specimen embedded within a matrix layer. The device comprises a light source arranged for directing a beam of light towards said sample, and a detector arranged for detecting light emitted from said sample in response to said beam of light being incident on said sample. Finally, the device comprises a controller that is connected to said detector and arranged for determining a property of said matrix layer based on signals received by said detector.Type: ApplicationFiled: February 5, 2021Publication date: August 19, 2021Applicant: FEI CompanyInventors: Maarten Kuijper, Matthijn Robert-Jan Vos, Ondrej Ludmil Shánel, Peet Goedendorp
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Patent number: 11004655Abstract: Techniques of using a Transmission Charged Particle Microscope for diffraction pattern detection are disclosed. An example method including irradiating at least a portion of a specimen with a charged particle beam, using an imaging system to collect charged particles that traverse the specimen during said irradiation, and to direct them onto a detector configured to operate in a particle counting mode, using said detector to record a diffraction pattern of said irradiated portion of the specimen, recording said diffraction pattern iteratively in a series of successive detection frames, and during recording of each frame, using a scanning assembly for causing relative motion of said diffraction pattern and said detector, so as to cause each local intensity maximum in said pattern to trace out a locus on said detector.Type: GrantFiled: January 9, 2020Date of Patent: May 11, 2021Assignee: FEI CompanyInventors: Bart Buijsse, Maarten Kuijper
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Publication number: 20210072170Abstract: Various methods and devices are provided for searching the optimum sample condition of a sample for cryogenic electron microscopy. Multiple samples with different sample conditions may be screened using a sample inspection device. The sample inspection device includes at least a chamber formed between a top electron transparent layer and a bottom electron transparent layer for holding the sample. Multiple pillars are arranged within the chamber. The sample inspection device includes a window covering at least one of the multiple pillars.Type: ApplicationFiled: September 9, 2019Publication date: March 11, 2021Applicant: FEI CompanyInventors: Bas HENDRIKSEN, Maarten KUIJPER, Luigi MELE, Pleun DONA, Erum RAJA, Atieh AMINIAN
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Publication number: 20210066032Abstract: Cryo compatible sample grids having multi-modal cryo-EM compatible GUIDs, according to the present disclosure include an outer support structure that defines a region of the grid for holding one or more samples, and a plurality of inner support structures that define a plurality of apertures that are each configured to hold a sample. Cryo compatible sample grids further include a first identifier located on the outer support structure, and a second identifier located within the region of the grid for holding the one or more samples. The first identifier is readable with an optical detector, while the second identifier is readable with an electron detector (e.g., within an electron microscope). Specifically, the second identifier is readable with an electron detector when one or more teeth and/or holes that comprise the second identifier are filled with ice from a vitrification process.Type: ApplicationFiled: August 30, 2019Publication date: March 4, 2021Applicant: FEI CompanyInventors: Maarten Kuijper, Ondrej Ludmil Shanel, Mathijs Petrus van den Boogaard, Pleun Dona
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Patent number: 10921268Abstract: Various methods and devices are provided for searching the optimum sample condition of a sample for cryogenic electron microscopy. Multiple samples with different sample conditions may be screened using a sample inspection device. The sample inspection device includes at least a chamber formed between a top electron transparent layer and a bottom electron transparent layer for holding the sample. Multiple pillars are arranged within the chamber. The sample inspection device includes a window covering at least one of the multiple pillars.Type: GrantFiled: September 9, 2019Date of Patent: February 16, 2021Assignee: FEI CompanyInventors: Bas Hendriksen, Maarten Kuijper, Luigi Mele, Pleun Dona, Erum Raja, Atieh Aminian
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Patent number: 10832901Abstract: A method of performing Electron Energy-Loss Spectroscopy (EELS) in an electron microscope, comprising: Producing a beam of electrons from a source; Using an illuminator to direct said beam so as to irradiate the specimen; Using an imaging system to receive a flux of electrons transmitted through the specimen and direct it onto a spectroscopic apparatus comprising: A dispersion device, for dispersing said flux in a dispersion direction so as to form an EELS spectrum; and A detector, comprising a detection surface that is sub-divided into a plurality of detection zones, specifically comprising: Using at least a first detection zone, a second detection zone and a third detection zone to register a plurality of EELS spectral entities; and Reading out said first and said second detection zones whilst said third detection zone is registering one of said plurality of EELS spectral entities.Type: GrantFiled: May 28, 2019Date of Patent: November 10, 2020Assignee: FEI CompanyInventors: Bert Henning Freitag, Sorin Lazar, Stephan Kujawa, Maarten Kuijper, Gerard Nicolaas Anne van Veen, Peter Christiaan Tiemeijer, Jamie McCormack
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Patent number: 10651008Abstract: Techniques of using a Transmission Charged Particle Microscope for diffraction pattern detection are disclosed. An example method including irradiating at least a portion of a specimen with a charged particle beam, using an imaging system to collect charged particles that traverse the specimen during said irradiation, and to direct them onto a detector configured to operate in a particle counting mode, using said detector to record a diffraction pattern of said irradiated portion of the specimen, recording said diffraction pattern iteratively in a series of successive detection frames, and during recording of each frame, using a scanning assembly for causing relative motion of said diffraction pattern and said detector, so as to cause each local intensity maximum in said pattern to trace out a locus on said detector.Type: GrantFiled: August 16, 2018Date of Patent: May 12, 2020Assignee: FEI CompanyInventors: Bart Buijsse, Maarten Kuijper
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Publication number: 20200144022Abstract: Techniques of using a Transmission Charged Particle Microscope for diffraction pattern detection are disclosed. An example method including irradiating at least a portion of a specimen with a charged particle beam, using an imaging system to collect charged particles that traverse the specimen during said irradiation, and to direct them onto a detector configured to operate in a particle counting mode, using said detector to record a diffraction pattern of said irradiated portion of the specimen, recording said diffraction pattern iteratively in a series of successive detection frames, and during recording of each frame, using a scanning assembly for causing relative motion of said diffraction pattern and said detector, so as to cause each local intensity maximum in said pattern to trace out a locus on said detector.Type: ApplicationFiled: January 9, 2020Publication date: May 7, 2020Applicant: FEI CompanyInventors: Bart BUIJSSE, Maarten KUIJPER
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Publication number: 20190341243Abstract: A method of performing Electron Energy-Loss Spectroscopy (EELS) in an electron microscope, comprising: Producing a beam of electrons from a source; Using an illuminator to direct said beam so as to irradiate the specimen; Using an imaging system to receive a flux of electrons transmitted through the specimen and direct it onto a spectroscopic apparatus comprising: A dispersion device, for dispersing said flux in a dispersion direction so as to form an EELS spectrum; and A detector, comprising a detection surface that is sub-divided into a plurality of detection zones, specifically comprising: Using at least a first detection zone, a second detection zone and a third detection zone to register a plurality of EELS spectral entities; and Reading out said first and said second detection zones whilst said third detection zone is registering one of said plurality of EELS spectral entities.Type: ApplicationFiled: May 28, 2019Publication date: November 7, 2019Applicant: FEI CompanyInventors: Bert Henning Freitag, Sorin Lazar, Stephan Kujawa, Maarten Kuijper, Gerard Nicolaas Anne van Veen, Peter Christiaan Tiemeijer, Jamie McCormack
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Patent number: 10389955Abstract: When detecting particulate radiation, such as electrons, with a pixelated detector, a cloud of electron/hole pairs is formed in the detector. Using the signal caused by this cloud of electron/hole pairs, a position of the impact is estimated. When the size of the cloud is comparable to the pixel size, or much smaller, the estimated position shows a strong bias to the center of the pixel and the corners, as well to the middle of the borders. This hinders forming an image with super-resolution. By shifting the position or by attributing the electron to several sub-pixels this bias can be countered, resulting in a more truthful representation.Type: GrantFiled: November 5, 2018Date of Patent: August 20, 2019Assignee: FEI CompanyInventors: Bart Jozef Janssen, Erik Michiel Franken, Maarten Kuijper, Lingbo Yu
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Publication number: 20190075258Abstract: When detecting particulate radiation, such as electrons, with a pixelated detector, a cloud of electron/hole pairs is formed in the detector. Using the signal caused by this cloud of electron/hole pairs, a position of the impact is estimated. When the size of the cloud is comparable to the pixel size, or much smaller, the estimated position shows a strong bias to the center of the pixel and the corners, as well to the middle of the borders. This hinders forming an image with super-resolution. By shifting the position or by attributing the electron to several sub-pixels this bias can be countered, resulting in a more truthful representation.Type: ApplicationFiled: November 5, 2018Publication date: March 7, 2019Applicant: FEI CompanyInventors: Bart Josef Janssen, Erik Michiel Franken, Maarten Kuijper, Lingbo Yu
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Patent number: 10122946Abstract: When detecting particulate radiation, such as electrons, with a pixelated detector, a cloud of electron/hole pairs is formed in the detector. Using the signal caused by this cloud of electron/hole pairs, a position of the impact is estimated. When the size of the cloud is comparable to the pixel size, or much smaller, the estimated position shows a strong bias to the center of the pixel and the corners, as well to the middle of the borders. This hinders forming an image with super-resolution. By shifting the position or by attributing the electron to several sub-pixels this bias can be countered, resulting in a more truthful representation.Type: GrantFiled: July 25, 2016Date of Patent: November 6, 2018Assignee: FEI CompanyInventors: Bart Jozef Janssen, Erik Michiel Franken, Maarten Kuijper, Lingbo Yu
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Patent number: 10023890Abstract: The present invention relates to the field of biotransformation of furanic compounds. More particular the present invention relates to novel genetically modified cells with improved characteristics for biocatalytic transformation of furanic compounds and a vector suitable for the genetic modification of a host cell. Further aspects of the invention are aimed at processes for biotransformation of 5-(hydroxymethyl)furan-2-carboxylic acid (HMF-acid) and its precursors with the use of the cell according to the invention.Type: GrantFiled: August 25, 2017Date of Patent: July 17, 2018Assignee: Purac Biochem B.V.Inventors: Nick Johannes Petrus Wierckx, Tom Daniel Elink Schuurman, Sipko Maarten Kuijper, Harald Johan Ruijssenaars
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Publication number: 20180023105Abstract: The present invention relates to the field of biotransformation of furanic compounds. More particular the present invention relates to novel genetically modified cells with improved characteristics for biocatalytic transformation of furanic compounds and a vector suitable for the genetic modification of a host cell. Further aspects of the invention are aimed at processes for biotransformation of 5-(hydroxymethyl)furan-2-carboxylic acid (HMF-acid) and its precursors with the use of the cell according to the invention.Type: ApplicationFiled: August 25, 2017Publication date: January 25, 2018Inventors: Nick Johannes Petrus Wierckx, Tom Daniel Elink Schuurman, Sipko Maarten Kuijper, Harald Johan Ruijssenaars