Patents by Inventor Makoto Arai
Makoto Arai has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Publication number: 20150054569Abstract: According to one embodiment, a switch circuit includes a transmission unit configured to transmit a signal through a transistor, in which a back gate and a source are connected by way of a resistor; and a back gate control unit configured to connect the back gate of the transistor to a fixed potential when the transistor is turned OFF, and to separate the back gate of the transistor from the fixed potential when the transistor is turned ON.Type: ApplicationFiled: February 27, 2014Publication date: February 26, 2015Applicant: KABUSHIKI KAISHA TOSHIBAInventor: Makoto Arai
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Publication number: 20140335517Abstract: The present invention provides a method for diagnosing schizophrenia, and a schizophrenia diagnostic reagent or device for use in the method. The present invention further provides a therapeutic or ameliorating agent for schizophrenia, which is effective for the treatment or amelioration of schizophrenia. The therapeutic or ameliorating agent for schizophrenia contains a carbonyl scavenger or a carbonyl-modified protein formation inhibitor as an active ingredient. The method for diagnosing schizophrenia according to the present invention includes measuring at least one parameter in a subject, the parameter being selected from the group consisting of: (1) a genetic abnormality of glyoxalase I gene; (2) the expression level or activity of glyoxalase I in a biological sample; (3) the amount of a carbonyl compound or a carbonyl-modified protein that is a protein modified with the carbonyl compound; and (4) the amount of pyridoxal in a biological sample.Type: ApplicationFiled: July 8, 2014Publication date: November 13, 2014Inventors: Masanari ITOKAWA, Toshio MIYATA, Makoto ARAI
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Patent number: 8848155Abstract: An object of the present invention is to provide a liquid crystal panel wherein provisions are made to effectively prevent the infiltration of gas from an end portion of a liquid crystal cell or from areas near cut portions of the liquid crystal cell, and a method for fabricating such a liquid crystal panel. More particularly, the present invention provides a liquid crystal panel includes a liquid crystal cell which includes a first substrate, a second substrate, a sealing member, and a liquid crystal layer provided between the first and second transparent substrates and sealed by the sealing member, a planarizing layer formed so as to cover an end portion of the liquid crystal cell, and a gas barrier layer formed on the planarizing layer. The invention also provides a method for producing such a liquid crystal panel.Type: GrantFiled: August 29, 2008Date of Patent: September 30, 2014Assignee: Citizen Holdings Co., Ltd.Inventors: Seigo Togashi, Makoto Arai
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Patent number: 8809329Abstract: The present invention provides a method for diagnosing schizophrenia, and a schizophrenia diagnostic reagent or device for use in the method. The present invention further provides a therapeutic or ameliorating agent for schizophrenia, which is effective for the treatment or amelioration of schizophrenia. The therapeutic or ameliorating agent for schizophrenia contains a carbonyl scavenger or a carbonyl-modified protein formation inhibitor as an active ingredient. The method for diagnosing schizophrenia according to the present invention includes measuring at least one parameter in a subject, the parameter being selected from the group consisting of: (1) a genetic abnormality of glyoxalase I gene; (2) the expression level or activity of glyoxalase I in a biological sample; (3) the amount of a carbonyl compound or a carbonyl-modified protein that is a protein modified with the carbonyl compound; and (4) the amount of pyridoxal in a biological sample.Type: GrantFiled: July 31, 2008Date of Patent: August 19, 2014Assignees: Tokyo Metropolitan Institute of Medical Science, Renascience Co., Ltd.Inventors: Masanari Itokawa, Toshio Miyata, Makoto Arai
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Patent number: 8460522Abstract: A plurality of targets are disposed in parallel with, and at a given distance to, one another. In case a predetermined thin film is formed by sputtering, the occurrence of non-uniformity in the film thickness distribution and the film quality distribution can be restricted. During the time when electric power is charged to a plurality of targets (31a to 31h) which are disposed inside a sputtering chamber (11a) so as to lie opposite to the process substrate (S), and are disposed at a predetermined distance from, and in parallel with, one another, thereby forming a predetermined thin film by sputtering, each of the targets is reciprocated at a constant speed in parallel with the process substrate. Also, magnet assemblies that form tunnel-shaped magnetic flux (M) in front of each target are reciprocated at a constant speed in parallel with each of the targets.Type: GrantFiled: October 12, 2007Date of Patent: June 11, 2013Assignee: ULVAC, Inc.Inventors: Yuichi Oishi, Takashi Komatsu, Junya Kiyota, Makoto Arai
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Patent number: 8221594Abstract: The present invention is to provide a magnetron sputtering technique for forming a film having an even film thickness distribution for a long period of time. A magnetron sputtering apparatus of the present invention includes a vacuum chamber, a cathode part provided in the vacuum chamber, the cathode part holding a target on the front side thereof and having a backing plate to hold a plurality of magnets on the backside thereof, and a direct-current power source that supplies direct-current power to the cathode part. A plurality of control electrodes, which independently controls potentials, is provided in a discharge space on the side of the target with respect to the backing plate.Type: GrantFiled: September 16, 2010Date of Patent: July 17, 2012Assignee: Ulvac, Inc.Inventors: Yasuhiko Akamatsu, Kyuzo Nakamura, Motoshi Kobayashi, Junya Kiyota, Tomiyuki Yukawa, Masaki Takei, Yuuichi Oishi, Makoto Arai, Satoru Ishibashi
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Patent number: 8172993Abstract: In a magnetron sputtering apparatus an arrangement is made such that the peripheral portion of a target is uniformly eroded to attain a high efficiency in target utilization and, in addition, that an abnormal discharging hardly occurs to thereby enable satisfactory thin film forming. A magnet assembly is provided behind a target that is disposed opposite to the process substrate. This magnet assembly has a central magnet that is disposed linearly along the longitudinal direction, and a peripheral magnet that is disposed so as to enclose the periphery of the central magnet, while changing the polarity on the side of the target. At this time, among the respective magnetic fluxes generated between the central magnet and the peripheral magnet at the longitudinally end portions of the magnet assembly, the position at which the vertical component of the magnetic field becomes zero is locally shifted to the central magnet within a certain range.Type: GrantFiled: November 13, 2007Date of Patent: May 8, 2012Assignee: Ulvac, Inc.Inventors: Yasuhiko Akamatsu, Tatsunori Isobe, Makoto Arai, Junya Kiyota, Takashi Komatsu
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Publication number: 20120065198Abstract: The present invention provides a method for diagnosing schizophrenia, and a schizophrenia diagnostic reagent or device for use in the method. The present invention further provides a therapeutic or ameliorating agent for schizophrenia, which is effective for the treatment or amelioration of schizophrenia. The therapeutic or ameliorating agent for schizophrenia contains a carbonyl scavenger or a carbonyl-modified protein formation inhibitor as an active ingredient. The method for diagnosing schizophrenia according to the present invention includes measuring at least one parameter in a subject, the parameter being selected from the group consisting of: (1) a genetic abnormality of glyoxalase I gene; (2) the expression level or activity of glyoxalase I in a biological sample; (3) the amount of a carbonyl compound or a carbonyl-modified protein that is a protein modified with the carbonyl compound; and (4) the amount of pyridoxal in a biological sample.Type: ApplicationFiled: July 31, 2008Publication date: March 15, 2012Applicants: Tokai University Educational System, Tokyo Metropolitan Institute of Medical Science, Renascience Co., Ltd., Medical & Biological Laboratories Co., Ltd.Inventors: Masanari ITOKAWA, Toshio MIYATA, Makoto ARAI
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Publication number: 20110198213Abstract: [Object] To provide a sputtering apparatus, a thin-film forming method, and a manufacturing method for a field effect transistor, which are capable of reducing damage of a base layer. [Solving Means] The sputtering apparatus according to the present invention sputters target portions Tc1 to Tc5, which are arranged in an inside of a vacuum chamber, along the arrangement direction thereof in sequence, to thereby form a thin-film on a surface of a substrate 10. With this, rate at which sputtered particles enter the surface of the substrate in a direction oblique to the surface of the substrate is increased, and hence it is possible to achieve a reduction of the damage of the base layer.Type: ApplicationFiled: October 9, 2009Publication date: August 18, 2011Applicant: ULVAC, INC.Inventors: Takaomi Kurata, Junya Kiyota, Makoto Arai, Yasuhiko Akamatsu, Satoru Ishibashi, Kazuya Saito
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Publication number: 20110201150Abstract: [Object] To provide a sputtering apparatus, a thin-film forming method, and a manufacturing method for a field effect transistor, which are capable of reducing damage of a base layer. [Solving Means] The sputtering apparatus 100 includes a conveying mechanism, a first target Tc1, a second target (Tc2 to Tc5), and a sputtering means. The conveying mechanism conveys a supporting portion, which is arranged in an inside of a vacuum chamber and supports a substrate, linearly along a conveying surface parallel to the surface to be processed of the substrate. The first target Tc1 is opposed to the conveying surface with a first space therebetween. The second target (Tc2 to Tc5) is arranged on a downstream side in a conveying direction of the substrate with respect to the first target Tc1, and is opposed to the conveying surface with a second space smaller than the first space therebetween. The sputtering means sputters each target.Type: ApplicationFiled: October 9, 2009Publication date: August 18, 2011Applicant: ULVAC, INC.Inventors: Takaomi Kurata, Junya Kiyota, Makoto Arai, Yasuhiko Akamatsu, Satoru Ishibashi, Kazuya Saito
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Publication number: 20110195562Abstract: [Object] To provide a sputtering apparatus, a thin-film forming method, and a manufacturing method for a field effect transistor, which are capable of reducing damage of a base layer. [Solving Means] A sputtering apparatus according to an embodiment of the present invention is a sputtering apparatus for forming a thin-film on a surface to be processed of a substrate 10, and includes a vacuum chamber 61, a supporting portion 93, a target 80, and a magnet 83. The magnet 83 generates plasma forming a region to be sputtered 80a, and moves the region to be sputtered 80abetween a first position in which the region to be sputtered 80a is not opposed to the surface to be processed and a second position in which the region to be sputtered is opposed to the surface to be processed. With this, it is possible to weaken incident energy of sputtered particles incident on the surface to be processed of the substrate 10 from the region to be sputtered 80a, and to protect the base layer.Type: ApplicationFiled: October 14, 2009Publication date: August 11, 2011Applicant: ULVAC, INC.Inventors: Takaomi Kurata, Junya Kiyota, Makoto Arai, Yasuhiko Akamatsu, Satoru Ishibashi, Kazuya Saito
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Publication number: 20110180402Abstract: To provide a vacuum processing apparatus capable of supporting and conveying a substrate by a method suitable for a processing content in each processing step and capable of suppressing various mechanisms provided within a processing chamber from being adversely affected. More particularly, the CVD chamber of the apparatus is configured to be horizontal, and hence the above-mentioned problem can be solved. Further, by configuring a sputtering apparatus as the vertical type processing apparatus, problems with abnormal electrical discharge can be solved.Type: ApplicationFiled: October 7, 2009Publication date: July 28, 2011Applicant: ULVAC, INC.Inventors: Takaomi Kurata, Junya Kiyota, Makoto Arai, Yasuhiko Akamatsu, Satoru Ishibashi, Shin Asari, Kazuya Saito, Shigemitsu Sato, Masashi Kikuchi
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Patent number: 7921790Abstract: A tank (10) of a ship (1) is provided with an inflow port (6) and an outflow port (7) opening through a bottom of the ship (13). The inflow and outflow ports are spaced apart from each other in a headway direction of the hull. The ports are equipped with closure means (9), which closes the ports so as to ensure hull buoyancy by means of air in the tank. The ports allow seawater outside the ship to flow into the tank through the inflow port and the seawater in the tank to flow out of the ship through the outflow port, with use of headway motion of the ship. A partition (2) provides a weir extending in a widthwise direction of the hull in the tank, and divides a region in the tank into an inflow area (3) and an outflow area (4). The tank, partition, inflow port, outflow port and closure means constitute a ship buoyancy control system.Type: GrantFiled: December 10, 2007Date of Patent: April 12, 2011Assignee: National University Corporation Yokohama National UniversityInventors: Makoto Arai, Kazuo Suzuki, Koki Kora
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Publication number: 20110048926Abstract: The present invention is to provide a magnetron sputtering technique for forming a film having an even film thickness distribution for a long period of time. A magnetron sputtering apparatus of the present invention includes a vacuum chamber, a cathode part provided in the vacuum chamber, the cathode part holding a target on the front side thereof and having a backing plate to hold a plurality of magnets on the backside thereof, and a direct-current power source that supplies direct-current power to the cathode part. A plurality of control electrodes, which independently controls potentials, is provided in a discharge space on the side of the target with respect to the backing plate.Type: ApplicationFiled: September 16, 2010Publication date: March 3, 2011Applicant: ULVAC, INC.Inventors: Yasuhiko AKAMATSU, Kyuzo NAKAMURA, Motoshi KOBAYASHI, Junya KIYOTA, Tomiyuki YUKAWA, Masaki TAKEI, Yuuichi OISHI, Makoto ARAI, Satoru ISHIBASHI
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Publication number: 20110028470Abstract: The present invention provides a method for diagnosing schizophrenia, and a schizophrenia diagnostic reagent or device for use in the method. The present invention further provides a therapeutic or ameliorating agent for schizophrenia, which is effective for the treatment or amelioration of schizophrenia. The therapeutic or ameliorating agent for schizophrenia contains a carbonyl scavenger or a carbonyl-modified protein formation inhibitor as an active ingredient. The method for diagnosing schizophrenia according to the present invention includes measuring at least one parameter in a subject, the parameter being selected from the group consisting of: (1) a genetic abnormality of glyoxalase I gene; (2) the expression level or activity of glyoxalase I in a biological sample; (3) the amount of a carbonyl compound or a carbonyl-modified protein that is a protein modified with the carbonyl compound; and (4) the amount of pyridoxal in a biological sample.Type: ApplicationFiled: July 31, 2008Publication date: February 3, 2011Applicants: TOKAI UNIVERSITY EDUCATIONAL SYSTEM, RENASCIENCE CO., LTD., MEDICAL & BIOLOGICAL LABORATORIES CO., LTD.Inventors: Masanari Itokawa, Toshio Miyata, Makoto Arai
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Publication number: 20100325295Abstract: In a general connection service using the PPPoE protocol, since user determination cannot be performed before a PPP authentication phase, even when a connection request is received from an invalid user, an access server and an authentication server operate under loaded conditions. Accordingly, an invalid user list is held in the access server, and user information is added to a PADI packet. In this arrangement, an invalid user can be determined at early stages and the packet can be deleted, thereby the load can be reduced. Further, regarding the invalid user, pseudo-connection completion is made and an occurrence of retry is prevented, thereby the load can be reduced.Type: ApplicationFiled: June 14, 2010Publication date: December 23, 2010Inventors: Takatoshi KAJIWARA, Yuuji Koogo, Makoto Arai, Norihiro Kambe
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Publication number: 20100214521Abstract: An object of the present invention is to provide a liquid crystal panel wherein provisions are made to effectively prevent the infiltration of gas from an end portion of a liquid crystal cell or from areas near cut portions of the liquid crystal cell, and a method for fabricating such a liquid crystal panel. More particularly, the present invention provides a liquid crystal panel includes a liquid crystal cell which includes a first substrate, a second substrate, a sealing member, and a liquid crystal layer provided between the first and second transparent substrates and sealed by the sealing member, a planarizing layer formed so as to cover an end portion of the liquid crystal cell, and a gas barrier layer formed on the planarizing layer. The invention also provides a method for producing such a liquid crystal panel.Type: ApplicationFiled: August 29, 2008Publication date: August 26, 2010Applicant: CITIZEN HOLDINGS CO., LTD.Inventors: Seigo Togashi, Makoto Arai
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Publication number: 20100155225Abstract: A plurality of targets are disposed in parallel with, and at a given distance to, one another. In case a predetermined thin film is formed by sputtering, the occurrence of non-uniformity in the film thickness distribution and the film quality distribution can be restricted. During the time when electric power is charged to a plurality of targets which are disposed inside a sputtering chamber so as to lie opposite to the process substrate, and are disposed at a predetermined distance from, and in parallel with, one another, thereby forming a predetermined thin film by sputtering, each of the targets is reciprocated at a constant speed in parallel with the process substrate. Also, magnet assemblies that form tunnel-shaped magnetic flux in front of each target are reciprocated at a constant speed in parallel with each of the targets.Type: ApplicationFiled: October 12, 2007Publication date: June 24, 2010Inventors: Yuichi Oishi, Takashi Komatsu, Junya Kiyota, Makoto Arai
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Patent number: 7725707Abstract: When forming an L2VPN, each VPN server is required to decrypt data received from a VPN client using the source VPN client key and encrypt the data using the destination VPN client key. The loads of the encrypting and decrypting processings are high, thereby the VPN server through-put is lowered. In order to solve the above problem, according to the present invention, the destination address of an IP packet sent from the VPN client is used as a multicast address, then data is encrypted according to the security association of the multicast address distributed from the VPN server. The encrypted IP packet is encapsulated with the IP address of the VPN server and sent to the VPN server. Receiving this IP packet, the VPN server determines the destination VPN client according to the multicast address of the encapsulated IP packet, then encapsulated with the IP address of the destination VPN client and sent to the VPN client.Type: GrantFiled: February 2, 2005Date of Patent: May 25, 2010Assignee: Hitachi, Ltd.Inventors: Mariko Yamada, Masashi Yano, Makoto Arai
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MAGNETRON SPUTTERING ELECTRODE, AND SPUTTERING APPARATUS PROIDED WITH MAGNETRON SPUTTERING ELECTRODE
Publication number: 20100051454Abstract: In a magnetron sputtering apparatus an arrangement is made such that the peripheral portion of a target is uniformly eroded to attain a high efficiency in target utilization and, in addition, that an abnormal discharging hardly occurs to thereby enable satisfactory thin film forming. A magnet assembly is provided behind a target that is disposed opposite to the process substrate. This magnet assembly has a central magnet that is disposed linearly along the longitudinal direction, and a peripheral magnet that is disposed so as to enclose the periphery of the central magnet, while changing the polarity on the side of the target. At this time, among the respective magnetic fluxes generated between the central magnet and the peripheral magnet at the longitudinally end portions of the magnet assembly, the position at which the vertical component of the magnetic field becomes zero is locally shifted to the central magnet within a certain range.Type: ApplicationFiled: November 13, 2007Publication date: March 4, 2010Inventors: Yasuhiko Akamatsu, Tatsunori Isobe, Makoto Arai, Junya Kiyota, Takashi Komatsu