Abstract: An exposure apparatus includes a stage on which a substrate is placed, a plurality of light irradiation units configured to emit light independently of each other to different positions in a right and left direction on a surface of the substrate, so as to form a strip-like irradiation area extending from one end of the surface of the substrate to the other end of the substrate, a stage moving mechanism configured to move the stage in a back and forth direction relative to the irradiation area, such that the whole surface of the substrate is exposed, and a light receiving unit configured move in the irradiation area between one end and the other end of the irradiation area in order to detect an illuminance distribution of the irradiation area in a longitudinal direction of the irradiation area.

Abstract: A method of inspecting a substrate to be repeatedly treated along a predetermined transfer way in a plurality of kinds of different treatment apparatuses, includes: imaging a substrate that has been treated in one of the treatment apparatuses, to acquire a first substrate image; imaging a substrate that has been an object for imaging the first substrate image and further treated in another treatment apparatus different from the one treatment apparatus after treated in the one treatment apparatus, to acquire a second substrate image; then performing defect inspection, based on the first substrate image and the second substrate image; and identifying, depending on whether or not a defect detected from the second substrate image is not detected from the first substrate image, whether or not the defect is caused by a treatment after the first substrate image is acquired and a treatment before the second substrate image is acquired.

Abstract: The method includes a step of executing a rotation treatment in a rotation treatment apparatus; a step of imaging a substrate on which the rotation treatment has been executed, in an inspection apparatus; a step of acquiring change amount information stored in advance, being information on an amount of change in orientation of the substrate while the substrate is moved from the rotation treatment apparatus to the inspection apparatus; a step of acquiring, as an execution result information, information on an execution result of the rotation treatment along a circumferential direction of the substrate, based on an imaging result in the inspection apparatus; and a step of correcting a position of the substrate at a time of the rotation treatment, based on the change amount information and the execution result information.

Abstract: A substrate inspection method in a substrate treatment system including a plurality of treatment apparatuses each performing a predetermined treatment on a substrate, includes: imaging a surface of a substrate before being treated in the treatment apparatuses to acquire a first substrate image; extracting a predetermined feature amount from the first substrate image; selecting an inspection recipe corresponding to the feature amount extracted from the first substrate image, from a storage unit in which a plurality of inspection recipes each set corresponding to the feature amount in a different range are stored; imaging the surface of the substrate after being treated in the treatment apparatuses to acquire a second substrate image; and determining presence or absence of a defect of the substrate, based on the selected inspection recipe and the second substrate image.

Abstract: Provided is a mounting structure that can bond a first heat dissipation element to a second substrate through a hole in a first substrate without using a binder such as solder, an adhesive, or the like. A mounting structure of the present disclosure includes a first substrate (10) in which a penetrating hole (11) is formed, a second substrate (20) and a first heat dissipation element (30) overlapped with both surfaces of the first substrate (10), respectively, so as to cover the penetrating hole (11), and a second heat dissipation element (40) sandwiched and attached between the second substrate (20) and the first heat dissipation element (30) inside the penetrating hole (11).

Abstract: A lens apparatus includes a rotator configured to rotate around the optical axis direction when contacting the vibrator, a biasing member configured to bias the vibrator from a first side to a second side in the optical axis direction so as to compressively bring the vibrator into contact with the rotator, and a driving ring configured to receive a rotation of the rotator, to rotate around the optical axis direction relative to the fixed lens barrel, and to move the lens unit in the optical axis direction. The fixed lens barrel includes a receiver configured to receive the biasing force of the biasing member transmitted to the driving ring via the rotator. The receiver is provided inside the vibrator and the rotator in the radial direction and on the first side of the end of the driving ring on the second side.

Abstract: A forklift includes a vehicle body 30, a fork 22 mounted on the vehicle body, a controller configured to adjust a position and an orientation of the vehicle body, a laser sensor 20 configured to measure distance data from the laser sensor to an object existing in a space set forward of the fork, and a control commander configured to, when the distance data measured by the laser sensor includes a load or a pallet 100 to be lifted, generate track data for moving the vehicle body to a loading position of the load or the pallet based on the distance data, and provide a command to the controller using the generated track data.

Abstract: A light amount adjustment apparatus includes an aperture unit including a plurality of blade members and a movable member, the movable member for changing a size of an aperture formed by the plurality of blade members, a driving unit including a driving shaft and configured to drive the movable member, and a detection unit including a detection target member and a detection sensor, and configured to detect a driving amount of the driving unit by detecting a driving amount of the detection target member with use of the detection sensor, wherein the aperture unit, the driving unit, and the detection unit overlap one another, as viewed in a direction along a central axis of the aperture, wherein the detection target member is engaged with the driving shaft, and wherein an outer diameter of the detection unit is smaller than an outer diameter of the driving unit.

Abstract: The optical apparatus includes a lens barrel, a lens held by the lens barrel, and a light emitter and an accessory attachment portion that are provided in an object-side end portion of the lens barrel so as to be located outside further than the lens in a radial direction of the lens barrel, the light emitter emitting an illumination light, the accessory attachment portion allowing detachable attachment of an accessory. The accessory attachment portion is located inside further than the light emitter in the radial direction. The lens barrel is provided with a slope surface formed so as to decrease an outer diameter of the lens barrel toward an object side end of the lens barrel.

Abstract: An optical apparatus includes an optical unit driven by an actuator, a holder configured to hold the optical unit, and an elastic member that contacts the holder via a first contacting portion and a second contacting portion, and contacts the optical unit via a connecting portion provided between the first contacting portion and the second contacting portion. The elastic member is spaced from the holder between the first contacting portion and the second contacting portion, and spaced from the optical unit between the first contacting portion and the connecting portion and between the connecting portion and the second contacting portion. Part of the elastic member opposite to the connecting portion that contacts the optical unit is spaced from the holder.

Abstract: The method includes a step of executing a rotation treatment in a rotation treatment apparatus; a step of imaging a substrate on which the rotation treatment has been executed, in an inspection apparatus; a step of acquiring change amount information stored in advance, being information on an amount of change in orientation of the substrate while the substrate is moved from the rotation treatment apparatus to the inspection apparatus; a step of acquiring, as an execution result information, information on an execution result of the rotation treatment along a circumferential direction of the substrate, based on an imaging result in the inspection apparatus; and a step of correcting a position of the substrate at a time of the rotation treatment, based on the change amount information and the execution result information.

Abstract: A light amount adjustment apparatus includes an aperture unit including a plurality of blade members and a movable member, the movable member for changing a size of an aperture formed by the plurality of blade members, a driving unit including a driving shaft and configured to drive the movable member, and a detection unit including a detection target member and a detection sensor, and configured to detect a driving amount of the driving unit by detecting a driving amount of the detection target member with use of the detection sensor, wherein the aperture unit, the driving unit, and the detection unit overlap one another, as viewed in a direction along a central axis of the aperture, wherein the detection target member is engaged with the driving shaft, and wherein an outer diameter of the detection unit is smaller than an outer diameter of the driving unit.

Abstract: Provided is a mounting structure that can bond a first heat dissipation element to a second substrate through a hole in a first substrate without using a binder such as solder, an adhesive, or the like. A mounting structure of the present disclosure includes a first substrate (10) in which a penetrating hole (11) is formed, a second substrate (20) and a first heat dissipation element (30) overlapped with both surfaces of the first substrate (10), respectively, so as to cover the penetrating hole (11), and a second heat dissipation element (40) sandwiched and attached between the second substrate (20) and the first heat dissipation element (30) inside the penetrating hole (11).

Abstract: An image shake correction unit includes a base member, a yoke, a lens holding member, a driving unit, a rotation suppression unit configured to restrict rotation of the lens holding member around an optical axis of the lens unit, and a biasing member configured to bias the lens holding member toward the base member in a direction of the optical axis. The driving unit and the rotation suppression unit are disposed to satisfy a predetermined condition in a case where the image shake correction unit is viewed from the direction of the optical axis. Further, the biasing member has one end provided on the rotation suppression unit and the other end provided on the base member.

Abstract: An optical processing apparatus includes: a housing; a stage; and a light irradiation unit configured to cause a light source unit to emit light so as to form a strip-like irradiation area extending over an area wider than a width of a substrate in a right and left direction. The stage and the light irradiation unit are moved by a moving mechanism relatively to each other in a back and forth direction. Light emitted from the light irradiation unit is deviated by a light-path changing unit from a relative movement area of a substrate. When a substrate is relatively moved below the light irradiation unit without the intension of being subjected to a light irradiation process, a control unit outputs a control signal such that an irradiation area is not formed on a surface of the substrate by the light-path changing unit, while the light source unit emitting light.

Abstract: A method of inspecting a substrate to be repeatedly treated along a predetermined transfer way in a plurality of kinds of different treatment apparatuses, includes: imaging a substrate that has been treated in one of the treatment apparatuses, to acquire a first substrate image; imaging a substrate that has been an object for imaging the first substrate image and further treated in another treatment apparatus different from the one treatment apparatus after treated in the one treatment apparatus, to acquire a second substrate image; then performing defect inspection, based on the first substrate image and the second substrate image; and identifying, depending on whether or not a defect detected from the second substrate image is not detected from the first substrate image, whether or not the defect is caused by a treatment after the first substrate image is acquired and a treatment before the second substrate image is acquired.

Abstract: A forklift includes: a fork 22, a moving mechanism configured to move the fork in a first direction; a laser sensor 20 mounted on the fork, configured to scan laser light in a second direction intersecting the first direction, and measure a distance from the laser sensor to a surrounding object based on reflection of the scanned laser light; and a processor configured to generate a three-dimensional range image within an emission range to which the laser light is emitted based on distance data acquired when the laser sensor scans the laser light in the second direction while the moving mechanism moves the fork in the first direction.

Abstract: A substrate inspection method in a substrate treatment system including a plurality of treatment apparatuses each performing a predetermined treatment on a substrate, includes: imaging a surface of a substrate before being treated in the treatment apparatuses to acquire a first substrate image; extracting a predetermined feature amount from the first substrate image; selecting an inspection recipe corresponding to the feature amount extracted from the first substrate image, from a storage unit in which a plurality of inspection recipes each set corresponding to the feature amount in a different range are stored; imaging the surface of the substrate after being treated in the treatment apparatuses to acquire a second substrate image; and determining presence or absence of a defect of the substrate, based on the selected inspection recipe and the second substrate image.

Abstract: A forklift includes a vehicle body 30, a fork 22 mounted on the vehicle body, a controller configured to adjust a position and an orientation of the vehicle body, a laser sensor 20 configured to measure distance data from the laser sensor to an object existing in a space set forward of the fork, and a control commander configured to, when the distance data measured by the laser sensor includes a load or a pallet 100 to be lifted, generate track data for moving the vehicle body to a loading position of the load or the pallet based on the distance data, and provide a command to the controller using the generated track data.

Abstract: An exposure apparatus includes a stage on which a substrate is placed, a plurality of light irradiation units configured to emit light independently of each other to different positions in a right and left direction on a surface of the substrate, so as to form a strip-like irradiation area extending from one end of the surface of the substrate to the other end of the substrate, a stage moving mechanism configured to move the stage in a back and forth direction relative to the irradiation area, such that the whole surface of the substrate is exposed, and a light receiving unit configured move in the irradiation area between one end and the other end of the irradiation area in order to detect an illuminance distribution of the irradiation area in a longitudinal direction of the irradiation area.