Patents by Inventor Makoto Inagawa
Makoto Inagawa has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 6897411Abstract: A heated substrate support and method for making the same is generally provided. In one embodiment, a heated support includes a first and second plates having a heating element disposed therebetween. The heating element is biased against the first plate to provide good heat transfer therewith. In another embodiment, a heated support includes a first metallic plate coupled to a second metallic plate and sandwiching at least one guide therebetween. A resistive heating element is laterally retained by the guide relative to the first plate. In another aspect of the invention, a heating chamber for heating a substrate is provided. In one embodiment, the heating chamber includes walls defining an interior volume and a plurality of heated support plates coupled to the walls. The support plates are generally stacked parallel to each other within the interior volume. A heating element is urged against each first support plate.Type: GrantFiled: February 11, 2002Date of Patent: May 24, 2005Assignee: Applied Materials, Inc.Inventors: Emanuel Beer, Makoto Inagawa
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Publication number: 20040226513Abstract: Embodiments of the present invention generally provide an apparatus for providing a uniform thermal profile to a plurality of large area substrates during thermal processing. In one embodiment, an apparatus for thermal processing large area substrates includes a chamber having a plurality of processing zones disposed therein that are coupled to a lift mechanism. The lift mechanism is adapted to vertically position the plurality of processing zones within the chamber. Each processing zone further includes an upper heated plate, a lower heated plate adapted to support a first substrate thereon and an unheated plate adapted to support a second substrate thereon, wherein the unheated plate is disposed between the upper and lower heated plates.Type: ApplicationFiled: June 25, 2003Publication date: November 18, 2004Applicant: Applied Materials, Inc.Inventors: Makoto Inagawa, Akihiro Hosokawa
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Patent number: 6773562Abstract: A vacuum processing chamber with walls defining a cavity for processing a substrate. The processing chamber includes a substrate support for supporting a substrate being processed in the cavity, a shadow frame for preventing processing of a perimeter portion of the substrate, and a shadow frame support supporting the shadow frame within the cavity. The shadow frame is positionable with a gap between an underside of the shadow frame and an upper surface of the substrate. At least one conductive element insulated from the walls and establishes a conductive path from the shadow frame to outside the cavity. The conductive path may be used to discharge charge from the shadow frame at a rate sufficient to prevent a voltage differential from accumulating between the shadow frame and the substrate which would cause arcing therebetween, or to apply a bias voltage to the shadow frame sufficient to attract particles to reduce contamination of the substrate.Type: GrantFiled: February 20, 1998Date of Patent: August 10, 2004Assignee: Applied Materials, Inc.Inventors: Makoto Inagawa, Akihiro Hosokawa, Richard E. Demaray
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Publication number: 20040149716Abstract: In a first aspect, a first apparatus is provided for heating substrates. The first apparatus includes (1) a chamber having a bottom portion and a top portion; (2) a plurality of heated supports disposed within the chamber to support at least two substrates thereon; and (3) a heater disposed within the chamber between a sidewall of the chamber and the plurality of substrate supports and having an edge region and a center region. The heater is adapted to produce more heat within the edge region than within the center region of the heater. Numerous other aspects are provided.Type: ApplicationFiled: December 15, 2003Publication date: August 5, 2004Applicant: APPLIED MATERIALS, INC.Inventors: Makoto Inagawa, Akihiro Hosokawa
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Publication number: 20040065656Abstract: Embodiments of the invention generally provide a substrate support for supporting a substrate. In one embodiment, a substrate support is provided that includes a plate assembly having at least a first heating element disposed therein or coupled thereto. A plurality of thermal isolators are disposed through plate assembly, defining a plurality of temperature controllable zones across the plane of the plate assembly.Type: ApplicationFiled: October 4, 2002Publication date: April 8, 2004Inventors: Makoto Inagawa, Akihiro Hosokawa
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Publication number: 20030150849Abstract: A heated substrate support and method for making the same is generally provided. In one embodiment, a heated support includes a first and second plates having a heating element disposed therebetween. The heating element is biased against the first plate to provide good heat transfer therewith. In another embodiment, a heated support includes a first metallic plate coupled to a second metallic plate and sandwiching at least one guide therebetween. A resistive heating element is laterally retained by the guide relative to the first plate. In another aspect of the invention, a heating chamber for heating a substrate is provided. In one embodiment, the heating chamber includes walls defining an interior volume and a plurality of heated support plates coupled to the walls. The support plates are generally stacked parallel to each other within the interior volume. A heating element is urged against each first support plate.Type: ApplicationFiled: February 11, 2002Publication date: August 14, 2003Applicant: Applied Materials, Inc.Inventors: Emanuel Beer, Makoto Inagawa
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Publication number: 20030079762Abstract: An inventive vertical spin-dryer is provided. The inventive spin-dryer may have a shield system positioned to receive fluid displaced from a substrate vertically positioned within the spin-dryer. The shield system may have one or more shields positioned to at least partially reflect fluid therefrom as the fluid impacts the shield. The one or more shields are angled to encourage the flow of fluid therealong, and are preferably hydrophilic to prevent droplets from forming. Preferably the shield system has three shields positioned in a horizontally and vertically staggered manner so that fluid is transferred from a substrate facing surface of a first shield to the top or non-substrate-facing surface of an adjacent shield, etc. A pressure gradient may be applied across the interior of the spin-dryer to create an air flow which encourages fluid to travel along the shield system in a desired direction.Type: ApplicationFiled: December 4, 2002Publication date: May 1, 2003Inventors: Anwar Husain, Brian J. Brown, David G. Andeen, Svetlana Sherman, John M. White, Michael Sugarman, Makoto Inagawa, Manoocher Birang
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Patent number: 6516816Abstract: An inventive vertical spin-dryer is provided. The inventive spin-dryer may have a shield system positioned to receive fluid displaced from a substrate vertically positioned within the spin-dryer. The shield system may have one or more shields positioned to at least partially reflect fluid therefrom as the fluid impacts the shield. The one or more shields are angled to encourage the flow of fluid therealong, and are preferably hydrophilic to prevent droplets from forming. Preferably the shield system has three shields positioned in a horizontally and vertically staggered manner so that fluid is transferred from a substrate facing surface of a first shield to the top or non-substrate-facing surface of an adjacent shield, etc. A pressure gradient may be applied across the interior of the spin-dryer to create an air flow which encourages fluid to travel along the shield system in a desired direction.Type: GrantFiled: April 6, 2000Date of Patent: February 11, 2003Assignee: Applied Materials, Inc.Inventors: Anwar Husain, Brian J. Brown, David G. Andeen, Svetlana Sherman, John M. White, Michael Sugarman, Makoto Inagawa, Manoocher Birang
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Patent number: 6257045Abstract: Automated systems and methods for processing substrates are described. An automated processing system includes: a vacuum chamber; a substrate support located inside the vacuum chamber and constructed and arranged to support a substrate during processing; and a substrate alignment detector constructed and arranged to detect if the substrate is misaligned as the substrate is transferred into the vacuum chamber based upon a change in a physical condition inside the system. The substrate alignment detector may include a vibration detector coupled to the substrate support. A substrate may be transferred into the vacuum chamber. The position of the substrate may be recorded as it is being transferred into the vacuum chamber. Misalignment of the substrate with respect to the substrate support may be detected. The substrate may be processed. The processed substrate may be unloaded from the vacuum chamber. The position of the processed substrate may be recorded as it is being unloaded from the vacuum chamber.Type: GrantFiled: September 8, 1999Date of Patent: July 10, 2001Assignee: Applied Komatsu Technology, Inc.Inventors: Akihiro Hosokawa, Richard Ernest Demaray, Makoto Inagawa, Ravi Mullapudi, Harlan L. Halsey, Michael T. Starr
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Patent number: 6205870Abstract: Automated systems and methods for processing substrates are described. An automated processing system includes: a vacuum chamber; a substrate support located inside the vacuum chamber and constructed and arranged to support a substrate during processing; and a substrate alignment detector constructed and arranged to detect if the substrate is misaligned as the substrate is transferred into the vacuum chamber based upon a change in a physical condition inside the system. The substrate alignment detector may include a vibration detector coupled to the substrate support. A substrate may be transferred into the vacuum chamber. The position of the substrate may be recorded as it is being transferred into the vacuum chamber. Misalignment of the substrate with respect to the substrate support may be detected. The substrate may be processed. The processed substrate may be unloaded from the vacuum chamber. The position of the processed substrate may be recorded as it is being unloaded from the vacuum chamber.Type: GrantFiled: October 10, 1997Date of Patent: March 27, 2001Assignee: Applied Komatsu Technology, Inc.Inventors: Akihiro Hosokawa, Richard Ernest Demaray, Makoto Inagawa, Ravi Mullapudi, Harlan L. Halsey, Michael T. Starr
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Patent number: 5320419Abstract: A parking brake circuit for a hydraulically driven vehicle which prevents the occurrence of an erroneous operation at the time when the vehicle travels on a downward slope. The parking brake circuit comprises first and second main circuits (2, 3) for supplying hydraulic operating fluid into a hydaulically driven motor (1) for traveling the vehicle. A counterbalance valve (4) provided between these main circuits for feeding hydraulic operating fluid on the side of high hydraulic pressure into a pressure receiving chamber (6a) of a parking brake actuating actuator (6). A conduit (5) for connecting an outlet port of the counterbalance valve to the pressure receiving chamber, and a slow return valve (12) are provided in the conduit so as to control a flow of hydraulic operating fluid directed from the pressure receiving chamber to the counterbalance valve.Type: GrantFiled: March 16, 1991Date of Patent: June 14, 1994Inventor: Makoto Inagawa
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Patent number: 5107718Abstract: A combined hydraulic motor and speed reducer intended to improve the service life of sealing members and bearings by cooling lubricating oil within a speed reducer case. The hydraulic motor includes a motor case (1) having a peripheral surface in which a pair of supply/discharge ports (18, 17) are formed in a diametrically opposite relationship and extend axially from one end of the motor case (1) so as to open to a speed reducer case (6). Cool lubricating oil is supplied to the interior of the speed reducer case, and at the same time, high temperature lubricating oil is discharged out of the motor. In this way, the lubricating oil within the speed reducer case is maintained at low temperature.Type: GrantFiled: December 7, 1990Date of Patent: April 28, 1992Assignee: Kabushiki Kaisha Komatsu SeisakushoInventor: Makoto Inagawa