Abstract: A charging control device (1A) according to the present invention includes a determination part that determines whether or not an abnormality in input power occurs on the basis of input power information on the input power and a predetermined determination threshold value. The determination part makes the determination on the basis of the input power information when a predetermined time has passed after an input of the input power.

Abstract: An estimation method for estimating a parameter related to skin function is provided. The estimation method includes an image acquisition step for acquiring a skin image in which unevenness of a skin surface is captured; an extraction step for extracting a feature vector based on topological information on the skin image from the skin image acquired in the image acquisition step; an estimation step for estimating the parameter related to skin function based on the feature vector extracted in the extraction step, using an estimation model constructed based on past actual measurement data in which feature vectors are associated with the parameter related to skin function; and a presentation step for presenting the parameter related to skin function estimated in the estimation step.

Abstract: An estimation method according to the disclosure for estimating a parameter related to skin function, the estimation method includes an image acquisition step for acquiring a skin image in which unevenness of a skin surface is captured; an extraction step for extracting a feature vector based on topological information on the skin image from the skin image acquired in the image acquisition step; an estimation step for estimating the parameter related to skin function based on the feature vector extracted in the extraction step, using an estimation model constructed based on past actual measurement data in which feature vectors are associated with the parameter related to skin function; and a presentation step for presenting the parameter related to skin function estimated in the estimation step.

Abstract: Methods, systems, and apparatus for adjusting a relative position of templates including determining a first plurality of position points of a surface of a region adjacent to an active region of a first template, the surface of the adjacent region and a surface of the active region forming a continuous surface of the first template; identifying a plane of the surface of the adjacent region of the first template based on the first plurality of position points; determining a second plurality of position points of a surface of an active region of a second template, the active region of the second template protruding from a surface of the second template; identifying a plane of the surface of the active region of the second template based on the second plurality of position points; and adjusting a relative position of the first template and the second template based on the identified planes.

Abstract: A forming apparatus forming a composition on a substrate by using a mold, includes a supplier configured to supply a composition on the substrate, a plurality of processors including a first processor and a second processor, each of the plurality of processors being configured to bring the mold into contact with the composition supplied onto the substrate by the supplier, and a substrate conveyer configured to convey the substrate onto which the composition is supplied by the supplier to the first processor and then convey other substrate onto which the composition is supplied following the substrate to the second processor.

Abstract: The present invention provides an imprint apparatus which performs an imprint process of molding an imprint material on a substrate using a mold and forming a pattern on the substrate, the apparatus including a substrate chuck configured to hold the substrate, a protective plate configured to surround the substrate chuck, and a suction mechanism configured to suction at least a part of a gap between the substrate chuck and the protective plate, wherein while the suction mechanism suctions at least the part of the gap, the substrate chuck holds a plate which is different from the substrate on which the pattern is to be formed.

Abstract: A pharmaceutical for the prophylaxis or treatment of hypertension or a disease derived from hypertension. The pharmaceutical is characterized by comprising (i) a specific mineralocorticoid receptor antagonist and (ii) one or more components selected from the following components (A) to (C), for administration simultaneously or separately at a time interval: (A) an angiotensin II receptor antagonist, (B) a calcium antagonist, and (C) a diuretic.

Abstract: Methods, systems, and apparatus for adjusting a relative position of templates including determining a first plurality of position points of a surface of a region adjacent to an active region of a first template, the surface of the adjacent region and a surface of the active region forming a continuous surface of the first template; identifying a plane of the surface of the adjacent region of the first template based on the first plurality of position points; determining a second plurality of position points of a surface of an active region of a second template, the active region of the second template protruding from a surface of the second template; identifying a plane of the surface of the active region of the second template based on the second plurality of position points; and adjusting a relative position of the first template and the second template based on the identified planes.

Abstract: A pharmaceutical for the prophylaxis or treatment of hypertension or a disease derived from hypertension. The pharmaceutical is characterized by comprising (i) a specific mineralocorticoid receptor antagonist and (ii) one or more components selected from the following components (A) to (C), for administration simultaneously or separately at a time interval: (A) an angiotensin II receptor antagonist, (B) a calcium antagonist, and (C) a diuretic.

Abstract: A method of performing an imprint process on each of a plurality of shot regions of a substrate, wherein each shot region includes at least one of at least one valid chip area and at least one invalid chip area, the invalid chip area including an inhibited area in which resin coating is inhibited, the imprint process for a shot region including both the invalid chip area and the valid chip area includes coating the valid chip area of the shot region with the resin, bringing a pattern surface of a mold into contact with the resin, and curing the resin, and in the step of coating, at least the inhibited area of the invalid chip area is not coated with the resin.

Abstract: Provided is an imprint apparatus that imprints a pattern formed on a mold onto a substrate. The imprint apparatus includes a substrate holder that holds the substrate and can move in a direction along the surface of the substrate; a gas supply unit for supplying a gas into a space between a pattern part of the mold and the substrate; and a wall part that is disposed so as to enclose the space that is supplied with gas, wherein at a position opposed to the substrate and the mold, the wall part faces the substrate holder or the substrate with a gap therebetween.

Abstract: A pharmaceutical for the prophylaxis or treatment of hypertension or a disease derived from hypertension. The pharmaceutical is characterized by comprising (i) a specific mineralocorticoid receptor antagonist and (ii) one or more components selected from the following components (A) to (C), for administration simultaneously or separately at a time interval: (A) an angiotensin II receptor antagonist, (B) a calcium antagonist, and (C) a diuretic.

Abstract: The present invention provides an imprint apparatus which performs an imprint process of molding an imprint material on a substrate using a mold and forming a pattern on the substrate, the apparatus including a substrate chuck configured to hold the substrate, a protective plate configured to surround the substrate chuck, and a suction mechanism configured to suction at least a part of a gap between the substrate chuck and the protective plate, wherein while the suction mechanism suctions at least the part of the gap, the substrate chuck holds a plate which is different from the substrate on which the pattern is to be formed.

Abstract: Provided is an imprint apparatus that imprints a pattern formed on a mold onto a substrate. The imprint apparatus includes a substrate holder that holds the substrate and can move in a direction along the surface of the substrate; a gas supply unit for supplying a gas into a space between a pattern part of the mold and the substrate; and a wall part that is disposed so as to enclose the space that is supplied with gas, wherein at a position opposed to the substrate and the mold, the wall part faces the substrate holder or the substrate with a gap therebetween.

Abstract: The degree of integration and the number of rewriting of a semiconductor device having a nonvolatile memory element are improved. A first MONOS nonvolatile-memory-element and a second MONOS nonvolatile-memory-element having a large gate width compared with the first MONOS nonvolatile-memory-element are mounted together on the same substrate, and the first MONOS nonvolatile-memory-element is used for storing program data which is scarcely rewritten, and the second MONOS nonvolatile-memory-element is used for storing processed data which is frequently rewritten.

Abstract: Vertical MISFETs are formed over drive MISFETs and transfer MISFETs. The vertical MISFETs comprise rectangular pillar laminated bodies each formed by laminating a lower semiconductor layer (drain), an intermediate semiconductor layer, and an upper semiconductor layer (source), and gate electrodes formed on corresponding side walls of the laminated bodies with gate insulating films interposed therebetween. In each vertical MISFET, the lower semiconductor layer constitutes a drain, the intermediate semiconductor layer constitutes a substrate (channel region), and the upper semiconductor layer constitutes a source. The lower semiconductor layer, the intermediate semiconductor layer and the upper semiconductor layer are each comprised of a silicon film. The lower semiconductor layer and the upper semiconductor layer are doped with a p type and constituted of a p type silicon film.

Abstract: A method of performing an imprint process on each of a plurality of shot regions of a substrate, wherein each shot region includes at least one of at least one valid chip area and at least one invalid chip area, the invalid chip area including an inhibited area in which resin coating is inhibited, the imprint process for a shot region including both the invalid chip area and the valid chip area includes coating the valid chip area of the shot region with the resin, bringing a pattern surface of a mold into contact with the resin, and curing the resin, and in the step of coating, at least the inhibited area of the invalid chip area is not coated with the resin.

Abstract: An optical element positioning apparatus of the present invention includes a moving unit including an optical element 2, a drive mechanism 100 configured to drive the moving unit, a position measuring sensor 130 configured to measure a position of the optical element 2, and an optical element controller 10 configured to control the drive mechanism 100 based on a measurement result by the position measuring sensor 130. An incident position (p point) at which a principal ray of a central field enters the optical element 2 is displaced from an optical axis of an optical system including the optical element 2, and the position measuring sensor 130 measures the incident position in an optical axis direction.

Abstract: This invention is to reduce the number of memory gate drivers, while lessening the number of times of disturb occurrence in a memory array configuration that implements writing in small byte units. A memory array comprises a plurality of sub-arrays, MG transfers, SL drivers, and CG drivers. Each sub-array includes a plurality of memory gate lines, control gate lines, source lines, and bit lines. Memory cells are arranged in positions of intersections of these lines. The control gate lines, CG drivers, source lines, and SL drivers are common to the sub-arrays, whereas the memory gate lines and MG buffer circuits are provided for each sub-array. Thereby, the units in which data is written are decreased and adverse effects of disturb are reduced without increasing the circuit size of the memory array.

Abstract: The semiconductor device includes a nonvolatile memory, having a memory array containing 1-bit twin cells, each composed of electrically rewritable first and second storage devices, the first and second storage devices holding binary data according to difference of their threshold voltages, and having different retention characteristics depending on difference of the binary data thereof; a read circuit for differentially amplifying complementary data output from the first and second storage devices of the twin cell selected for read, and judging information stored in the twin cell; and a control circuit. Two memory cells constituting a twin cell are arranged to hold different data. Therefore, even when the retention performance of one memory cell deteriorates, the difference between data held by the two memory cells can be maintained. Hence, differential amplification of such difference enables acquisition of proper stored information.