Patents by Inventor Makoto Nomura

Makoto Nomura has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20140046470
    Abstract: Only a wafer for QC check may be transferred and a production wafer may prevent from being transferred into an assigned process chamber whose QC check is not completed after a maintenance task, and the production wafer may be processed the assigned process chamber after the completion of the QC check. The wafer for QC check is transferred while inhibiting a transfer of the production wafer into the assigned process chamber, and the production wafer is transferred into each of the process chambers of the plurality except the assigned process chamber.
    Type: Application
    Filed: October 17, 2013
    Publication date: February 13, 2014
    Applicant: Hitachi Kokusai Electric Inc.
    Inventor: Makoto NOMURA
  • Publication number: 20130340554
    Abstract: A rack bar includes a shaft: portion, a rack toothed portion provided on the shaft portion, and a dummy toothed portion. The rack toothed portion includes a plurality of rack teeth provided side by side in an axial direction of the shaft portion, each of the rack teeth including a contact face arranged obliquely relative to the axial direction to contact the pinion gear. The dummy toothed portion includes at least one dummy tooth provided on at least one side of the rack toothed portion in the axial direction such that the dummy tooth is arranged parallel to and next to the rack. teeth. The dummy tooth is designed such that a whole height of the dummy tooth is smaller than a whole height of each of the rack teeth.
    Type: Application
    Filed: June 20, 2013
    Publication date: December 26, 2013
    Inventors: Makoto NOMURA, Takashi YAMAWAKI, Ryosuke SUZUKI
  • Patent number: 8588950
    Abstract: Only a wafer for QC check may be transferred and a production wafer may prevent from being transferred into an assigned process chamber whose QC check is not completed after a maintenance task, and the production wafer may be processed the assigned process chamber after the completion of the QC check. The wafer for QC check is transferred while inhibiting a transfer of the production wafer into the assigned process chamber, and the production wafer is transferred into each of the process chambers of the plurality except the assigned process chamber.
    Type: Grant
    Filed: February 28, 2011
    Date of Patent: November 19, 2013
    Assignee: Hitachi Kokusai Electric Inc.
    Inventor: Makoto Nomura
  • Patent number: 8277640
    Abstract: The present invention relates to a process for thermal cracking of heavy petroleum oil, in which when a thermal cracking facility having a cracking furnace, two or more of trains each comprising two reaction vessels and one distillation tower is operated, each train is operated by repeating a cycle comprising drawing the heavy petroleum oil from the cracking furnace, feeding the drawn heavy petroleum oil into the first reaction vessel and then feeding the drawn heavy petroleum oil into the second reaction vessel, steam is directly brought in contact with the heavy petroleum oil to be thermally cracked, and gaseous cracked substances produced and steam are introduced into the distillation tower to be distilled and separated, wherein phase delay is provided for the cycle repeated in each train so that the thermal cracking facility is operated with the different initiation time of feeding to the first reaction vessel in each train.
    Type: Grant
    Filed: August 29, 2007
    Date of Patent: October 2, 2012
    Assignees: Chiyoda Corporation, Fuji Oil Co., Ltd.
    Inventors: Atsushi Tamagawa, Makoto Nomura, Isao Shibutani, Keiji Maehara, Hisao Takeuchi
  • Patent number: 8262903
    Abstract: The suppression of coke adherence in a reaction vessel and cracked gas pipelines at the outlet of the reaction vessel and the prevention of plugging are designed by improving the dispersion of superheated steam inside the reaction vessel to preferable conditions, and pitch having more uniform and higher quality can be produced. A cracking process in which superheated steam is directly contacted with the heavy petroleum oil by blowing the superheated steam into the reaction vessel to be thermally cracked to oil fractions and pitch, wherein the superheated steam is blown into the reaction vessel from the bottom portion thereof so that the superheated steam generates rotational flow around the central axis of the shell of the reaction vessel.
    Type: Grant
    Filed: September 27, 2007
    Date of Patent: September 11, 2012
    Assignees: Chiyoda Corporation, Fuji Oil Co., Ltd.
    Inventors: Makoto Nomura, Kenichi Mimura, Munenori Maekawa, Naoko Suzuki, Katsunori Yagi
  • Publication number: 20110218659
    Abstract: Only a wafer for QC check may be transferred and a production wafer may prevent from being transferred into an assigned process chamber whose QC check is not completed after a maintenance task, and the production wafer may be processed the assigned process chamber after the completion of the QC check. The wafer for QC check is transferred while inhibiting a transfer of the production wafer into the assigned process chamber, and the production wafer is transferred into each of the process chambers of the plurality except the assigned process chamber.
    Type: Application
    Filed: February 28, 2011
    Publication date: September 8, 2011
    Applicant: HITACHI KOKUSAI ELECTRIC INC.
    Inventor: Makoto NOMURA
  • Patent number: 7825103
    Abstract: Provided is a pyrimidine nucleoside compound represented by the following formula (1): or a pharmaceutically acceptable salt thereof, wherein one of X and Y represents a cyano group, and the other represents a hydrogen atom; one of R1 and R2 represents a hydrogen atom, a carbonyl group having a C1-C6 alkyl group which has been mono-substituted by an amino group, or a group represented by (R3)(R4)(R5)Si—, and the other represents a group represented by (R6)(R7)(R8)Si—, or R1 and R2 together form a 6-membered cyclic group represented by —Si(R9)(R10)—; R3, R4, R5, R6, R7, and R8 each represent a C1-C10 linear or branched alkyl group which may have a substituent, a C3-C6 cycloalkyl group which may have a substituent, a C6-C14 aryl group which may have a substituent, or a C1-C6 alkyl group which has been substituted by one or two C6-C14 aryl groups and which may have a substituent; and R9 and R10 each represent a C1-C6 linear or branched alkyl group which may have a substituent.
    Type: Grant
    Filed: January 30, 2006
    Date of Patent: November 2, 2010
    Assignees: Taiho Pharmaceutical Co., Ltd.
    Inventors: Makoto Nomura, Yayoi Ono
  • Publication number: 20100018897
    Abstract: The present invention relates to a process for thermal cracking of heavy petroleum oil, in which when a thermal cracking facility having a cracking furnace, two or more of trains each comprising two reaction vessels and one distillation tower is operated, each train is operated by repeating a cycle comprising drawing the heavy petroleum oil from the cracking furnace, feeding the drawn heavy petroleum oil into the first reaction vessel and then feeding the drawn heavy petroleum oil into the second reaction vessel, steam is directly brought in contact with the heavy petroleum oil to be thermally cracked, and gaseous cracked substances produced and steam are introduced into the distillation tower to be distilled and separated, wherein phase delay is provided for the cycle repeated in each train so that the thermal cracking facility is operated with the different initiation time of feeding to the first reaction vessel in each train.
    Type: Application
    Filed: August 29, 2007
    Publication date: January 28, 2010
    Applicant: Chiyoda Corporation
    Inventors: Atsushi Tamagawa, Makoto Nomura, Isao Shibutani, Keiji Maehara, Hisao Takeuchi
  • Publication number: 20100000909
    Abstract: The suppression of coke adherence in a reaction vessel and cracked gas pipelines at the outlet of the reaction vessel and the prevention of plugging are designed by improving the dispersion of superheated steam inside the reaction vessel to preferable conditions, and pitch having more uniform and higher quality can be produced. A cracking process in which superheated steam is directly contacted with the heavy petroleum oil by blowing the superheated steam into the reaction vessel to be thermally cracked to oil fractions and pitch, wherein the superheated steam is blown into the reaction vessel from the bottom portion thereof so that the superheated steam generates rotational flow around the central axis of the shell of the reaction vessel.
    Type: Application
    Filed: September 27, 2007
    Publication date: January 7, 2010
    Applicants: CHIYODA CORPORATION, FUJI OIL CO., LTD.
    Inventors: Makoto Nomura, Kenichi Mimura, Munenori Maekawa, Naoko Suzuki, Katsunori Yagi
  • Publication number: 20090229634
    Abstract: A substrate processing apparatus comprises a control unit executing a first recipe for substrate processing. After the substrate processing is completed through the execution of the first recipe, if a predetermined time is elapsed in a state that a next substrate to be processed is not carried into the process chamber, a second recipe is executed for maintaining a process chamber where the substrate is processed.
    Type: Application
    Filed: February 20, 2009
    Publication date: September 17, 2009
    Inventors: Makoto Nomura, Yukio Ozaki, Reizo Nunozawa, Satoru Takahata
  • Publication number: 20090118222
    Abstract: A novel pyrimidine nucleoside compound represented by the following formula (1): (wherein one of X and Y represents a cyano group, and the other represents a hydrogen atom; one of R1 and R2 represents a hydrogen atom, a carbonyl group having a C1-C6 alkyl group which has been mono-substituted by an amino group, or a group represented by (R3)(R4)(R5)Si—, and the other represents a silyl group represented by (R6)(R7)(R8)Si—, or R1 and R2 together form a 6-membered cyclic group represented by —Si (R9)(R10)—; R3, R4, R5, R6, R7, and R8 each represent an alkyl group, a cyclic alkyl group, an aryl group, or an alkyl group which has been substituted by one or two aryl groups; and R9 and R10 each represent an alkyl group) or a salt thereof. The novel pyrimidine nucleoside compound exhibits excellent anti-tumor effect as compared with existing pyrimidine nucleoside compounds.
    Type: Application
    Filed: January 30, 2006
    Publication date: May 7, 2009
    Applicants: TAIHO PHARMACEUTICAL CO., LTD., Takuma SASAKI, Akira MATSUDA
    Inventors: Makoto Nomura, Yayoi Ono
  • Patent number: 7195858
    Abstract: Negative type photosensitive resin compositions are provided. Such negative photosensitive resin compositions contain a novolac resin and a phenol-biphenylene resin as well as an epoxy compound. These resin compositions have excellent heat-impact resistance for the hardened resin material.
    Type: Grant
    Filed: January 30, 2004
    Date of Patent: March 27, 2007
    Assignee: Rohm and Haas Electronic Materials LLC
    Inventors: Kei Arao, Makoto Nomura
  • Patent number: 7195855
    Abstract: A negative-type photosensitive resin compositions containing an epoxy compound are provided. These compositions use poly(p-vinylphenol) as the base resin and have good development performance when using an aqueous developer, such as tetramethylammonium hydroxide solution.
    Type: Grant
    Filed: January 30, 2004
    Date of Patent: March 27, 2007
    Assignee: Rohm and Haas Electronic Materials LLC
    Inventors: Kei Arao, Makoto Nomura
  • Publication number: 20060199098
    Abstract: Provided are negative-type photosensitive resin compositions which may be used in forming interlayer insulating layers on a silicon wafer or printed wiring board. The compositions include a vinylphenol resin, a biphenyl-phenol resin and epoxy-containing materials. Also provided are methods of forming patterned dielectric films using such compositions. The resin compositions can be used in the manufacture of wafer-level chip-scale packages and LSIs, for example, as interlayer insulating layers.
    Type: Application
    Filed: March 1, 2006
    Publication date: September 7, 2006
    Applicant: Rohm and Haas Electronic Materials LLC
    Inventors: Kei Arao, Makoto Nomura
  • Publication number: 20060199099
    Abstract: Provided are negative-type photosensitive resin compositions which may be used as interlayer insulating layers on a silicon wafer. The compositions include a urea crosslinking agent together with an epoxy-containing material and vinylphenol resin. Also provided are methods of forming patterned insulating layers using such compositions. The resin compositions can be used in the manufacture of wafer-level chip-scale packages and LSIs, for example, as interlayer insulating layers.
    Type: Application
    Filed: March 1, 2006
    Publication date: September 7, 2006
    Applicant: Rohm and Haas Electronic Materials LLC
    Inventors: Kei Arao, Makoto Nomura
  • Patent number: 6899756
    Abstract: A drier for oxidative polymerization-drying printing ink is provided, which does not contain cobalt capable of exerting an adverse influence on the environment and health and which is environmentally friendly. A printing ink containing the drier is also provided. The drier for oxidative polymerization-drying printing ink contains a cerium salt of a fatty acid and a manganese salt of a fatty acid.
    Type: Grant
    Filed: March 11, 2003
    Date of Patent: May 31, 2005
    Assignee: Dainippon Ink and Chemicals, Inc.
    Inventors: Makoto Nomura, Kosaku Nishiyama, Masanori Kasai, Hideo Ishii
  • Publication number: 20040224253
    Abstract: A negative-type photosensitive resin compositions containing an epoxy compound are provided. These compositions use poly(p-vinylphenol) as the base resin and have good development performance when using an aqueous developer, such as tetramethylammonium hydroxide solution.
    Type: Application
    Filed: January 30, 2004
    Publication date: November 11, 2004
    Applicant: Shipley Company, L.L.C.
    Inventors: Kei Arao, Makoto Nomura
  • Publication number: 20040219451
    Abstract: Negative type photosensitive resin compositions are provided. Such negative photosensitive resin compositions contain a novolac resin and a phenol-biphenylene resin as well as an epoxy compound. These resin compositions have excellent heat-impact resistance for the hardened resin material.
    Type: Application
    Filed: January 30, 2004
    Publication date: November 4, 2004
    Applicant: Rohm and Haas Electronic Materials, L.L.C.
    Inventors: Kei Arao, Makoto Nomura
  • Publication number: 20040040468
    Abstract: A drier for oxidative polymerization-drying printing ink is provided, which does not contain cobalt capable of exerting an adverse influence on the environment and health and which is environmentally friendly. A printing ink containing the drier is also provided. The drier for oxidative polymerization-drying printing ink contains a cerium salt of a fatty acid and a manganese salt of a fatty acid.
    Type: Application
    Filed: March 11, 2003
    Publication date: March 4, 2004
    Applicant: DAINIPPON INK AND CHEMICALS, INC.
    Inventors: Makoto Nomura, Kosaku Nishiyama, Masanori Kasai, Hideo Ishii
  • Patent number: 6675830
    Abstract: A pressure control apparatus which controls a pressure of air supplied from a supply hole of a base having a plurality of holes to a supply port of a valve having a plurality of ports is interposed between the base and the valve. This pressure control apparatus comprises a pressure control section which controls a pressure of the air such that the pressure becomes equal to a set pressure, a booster section which outputs a large amount of air to the valve by controlling an output pressure by air from this pressure control section, and a signal control section which outputs a monitor signal indicative of completion of pressure setting when the pressure of air output from the booster section becomes equal to the set pressure.
    Type: Grant
    Filed: October 17, 2002
    Date of Patent: January 13, 2004
    Assignee: SMC Corporation
    Inventors: Yoshitada Doi, Makoto Nomura