Abstract: A substrate processing apparatus includes a control unit executing a first recipe for substrate processing. After the substrate processing is completed through the execution of the first recipe, if a predetermined time is elapsed in a state that a next substrate to be processed is not carried into the process chamber, a second recipe is executed for maintaining a process chamber where the substrate is processed.

Abstract: A rack bar includes a shaft portion and a rack toothed portion provided on the shaft portion. The rack toothed portion includes a plurality of rack teeth provided side by side in an axial direction of the shaft portion to mesh with a pinion gear. Each of the rack teeth includes a tooth tip portion, a contact face arranged obliquely relative to the axial direction and configured to contact the pinion gear, and a rounded corner portion between the tooth tip portion and the contact face. A first radius defining a central area of the rounded corner portion with respect to a tooth width direction is larger than a second radius defining another area of the rounded corner portion other than the central area.

Abstract: Only a wafer for QC check may be transferred and a production wafer may prevent from being transferred into an assigned process chamber whose QC check is not completed after a maintenance task, and the production wafer may be processed the assigned process chamber after the completion of the QC check. The wafer for QC check is transferred while inhibiting a transfer of the production wafer into the assigned process chamber, and the production wafer is transferred into each of the process chambers of the plurality except the assigned process chamber.

Abstract: A rack bar includes a shaft: portion, a rack toothed portion provided on the shaft portion, and a dummy toothed portion. The rack toothed portion includes a plurality of rack teeth provided side by side in an axial direction of the shaft portion, each of the rack teeth including a contact face arranged obliquely relative to the axial direction to contact the pinion gear. The dummy toothed portion includes at least one dummy tooth provided on at least one side of the rack toothed portion in the axial direction such that the dummy tooth is arranged parallel to and next to the rack. teeth. The dummy tooth is designed such that a whole height of the dummy tooth is smaller than a whole height of each of the rack teeth.

Abstract: Only a wafer for QC check may be transferred and a production wafer may prevent from being transferred into an assigned process chamber whose QC check is not completed after a maintenance task, and the production wafer may be processed the assigned process chamber after the completion of the QC check. The wafer for QC check is transferred while inhibiting a transfer of the production wafer into the assigned process chamber, and the production wafer is transferred into each of the process chambers of the plurality except the assigned process chamber.

Abstract: The present invention relates to a process for thermal cracking of heavy petroleum oil, in which when a thermal cracking facility having a cracking furnace, two or more of trains each comprising two reaction vessels and one distillation tower is operated, each train is operated by repeating a cycle comprising drawing the heavy petroleum oil from the cracking furnace, feeding the drawn heavy petroleum oil into the first reaction vessel and then feeding the drawn heavy petroleum oil into the second reaction vessel, steam is directly brought in contact with the heavy petroleum oil to be thermally cracked, and gaseous cracked substances produced and steam are introduced into the distillation tower to be distilled and separated, wherein phase delay is provided for the cycle repeated in each train so that the thermal cracking facility is operated with the different initiation time of feeding to the first reaction vessel in each train.

Abstract: The suppression of coke adherence in a reaction vessel and cracked gas pipelines at the outlet of the reaction vessel and the prevention of plugging are designed by improving the dispersion of superheated steam inside the reaction vessel to preferable conditions, and pitch having more uniform and higher quality can be produced. A cracking process in which superheated steam is directly contacted with the heavy petroleum oil by blowing the superheated steam into the reaction vessel to be thermally cracked to oil fractions and pitch, wherein the superheated steam is blown into the reaction vessel from the bottom portion thereof so that the superheated steam generates rotational flow around the central axis of the shell of the reaction vessel.

Abstract: Only a wafer for QC check may be transferred and a production wafer may prevent from being transferred into an assigned process chamber whose QC check is not completed after a maintenance task, and the production wafer may be processed the assigned process chamber after the completion of the QC check. The wafer for QC check is transferred while inhibiting a transfer of the production wafer into the assigned process chamber, and the production wafer is transferred into each of the process chambers of the plurality except the assigned process chamber.

Abstract: Provided is a pyrimidine nucleoside compound represented by the following formula (1): or a pharmaceutically acceptable salt thereof, wherein one of X and Y represents a cyano group, and the other represents a hydrogen atom; one of R1 and R2 represents a hydrogen atom, a carbonyl group having a C1-C6 alkyl group which has been mono-substituted by an amino group, or a group represented by (R3)(R4)(R5)Si—, and the other represents a group represented by (R6)(R7)(R8)Si—, or R1 and R2 together form a 6-membered cyclic group represented by —Si(R9)(R10)—; R3, R4, R5, R6, R7, and R8 each represent a C1-C10 linear or branched alkyl group which may have a substituent, a C3-C6 cycloalkyl group which may have a substituent, a C6-C14 aryl group which may have a substituent, or a C1-C6 alkyl group which has been substituted by one or two C6-C14 aryl groups and which may have a substituent; and R9 and R10 each represent a C1-C6 linear or branched alkyl group which may have a substituent.

Abstract: The present invention relates to a process for thermal cracking of heavy petroleum oil, in which when a thermal cracking facility having a cracking furnace, two or more of trains each comprising two reaction vessels and one distillation tower is operated, each train is operated by repeating a cycle comprising drawing the heavy petroleum oil from the cracking furnace, feeding the drawn heavy petroleum oil into the first reaction vessel and then feeding the drawn heavy petroleum oil into the second reaction vessel, steam is directly brought in contact with the heavy petroleum oil to be thermally cracked, and gaseous cracked substances produced and steam are introduced into the distillation tower to be distilled and separated, wherein phase delay is provided for the cycle repeated in each train so that the thermal cracking facility is operated with the different initiation time of feeding to the first reaction vessel in each train.

Abstract: The suppression of coke adherence in a reaction vessel and cracked gas pipelines at the outlet of the reaction vessel and the prevention of plugging are designed by improving the dispersion of superheated steam inside the reaction vessel to preferable conditions, and pitch having more uniform and higher quality can be produced. A cracking process in which superheated steam is directly contacted with the heavy petroleum oil by blowing the superheated steam into the reaction vessel to be thermally cracked to oil fractions and pitch, wherein the superheated steam is blown into the reaction vessel from the bottom portion thereof so that the superheated steam generates rotational flow around the central axis of the shell of the reaction vessel.

Abstract: A substrate processing apparatus comprises a control unit executing a first recipe for substrate processing. After the substrate processing is completed through the execution of the first recipe, if a predetermined time is elapsed in a state that a next substrate to be processed is not carried into the process chamber, a second recipe is executed for maintaining a process chamber where the substrate is processed.

Abstract: A novel pyrimidine nucleoside compound represented by the following formula (1): (wherein one of X and Y represents a cyano group, and the other represents a hydrogen atom; one of R1 and R2 represents a hydrogen atom, a carbonyl group having a C1-C6 alkyl group which has been mono-substituted by an amino group, or a group represented by (R3)(R4)(R5)Si—, and the other represents a silyl group represented by (R6)(R7)(R8)Si—, or R1 and R2 together form a 6-membered cyclic group represented by —Si (R9)(R10)—; R3, R4, R5, R6, R7, and R8 each represent an alkyl group, a cyclic alkyl group, an aryl group, or an alkyl group which has been substituted by one or two aryl groups; and R9 and R10 each represent an alkyl group) or a salt thereof. The novel pyrimidine nucleoside compound exhibits excellent anti-tumor effect as compared with existing pyrimidine nucleoside compounds.

Abstract: Negative type photosensitive resin compositions are provided. Such negative photosensitive resin compositions contain a novolac resin and a phenol-biphenylene resin as well as an epoxy compound. These resin compositions have excellent heat-impact resistance for the hardened resin material.

Abstract: A negative-type photosensitive resin compositions containing an epoxy compound are provided. These compositions use poly(p-vinylphenol) as the base resin and have good development performance when using an aqueous developer, such as tetramethylammonium hydroxide solution.

Abstract: Provided are negative-type photosensitive resin compositions which may be used as interlayer insulating layers on a silicon wafer. The compositions include a urea crosslinking agent together with an epoxy-containing material and vinylphenol resin. Also provided are methods of forming patterned insulating layers using such compositions. The resin compositions can be used in the manufacture of wafer-level chip-scale packages and LSIs, for example, as interlayer insulating layers.

Abstract: Provided are negative-type photosensitive resin compositions which may be used in forming interlayer insulating layers on a silicon wafer or printed wiring board. The compositions include a vinylphenol resin, a biphenyl-phenol resin and epoxy-containing materials. Also provided are methods of forming patterned dielectric films using such compositions. The resin compositions can be used in the manufacture of wafer-level chip-scale packages and LSIs, for example, as interlayer insulating layers.

Abstract: A drier for oxidative polymerization-drying printing ink is provided, which does not contain cobalt capable of exerting an adverse influence on the environment and health and which is environmentally friendly. A printing ink containing the drier is also provided. The drier for oxidative polymerization-drying printing ink contains a cerium salt of a fatty acid and a manganese salt of a fatty acid.

Abstract: A negative-type photosensitive resin compositions containing an epoxy compound are provided. These compositions use poly(p-vinylphenol) as the base resin and have good development performance when using an aqueous developer, such as tetramethylammonium hydroxide solution.