Patents by Inventor Makoto Sakakibara

Makoto Sakakibara has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 11967482
    Abstract: Deflection of a secondary beam, and astigmatism correction of a primary beam or of the secondary beam are carried out using a multi-pole electromagnetic deflector which deflects the path of the secondary beam toward a detector.
    Type: Grant
    Filed: March 8, 2019
    Date of Patent: April 23, 2024
    Assignee: HITACHI HIGH-TECH CORPORATION
    Inventors: Wen Li, Hajime Kawano, Momoyo Enyama, Makoto Sakakibara
  • Patent number: 11791130
    Abstract: The objective of the present invention is to reduce differences between individual electron beam observation devices accurately by means of image correction.
    Type: Grant
    Filed: January 23, 2019
    Date of Patent: October 17, 2023
    Assignee: Hitachi High-Tech Corporation
    Inventors: Koichi Hamada, Megumi Kimura, Momoyo Enyama, Ryou Yumiba, Makoto Sakakibara, Kei Sakai, Satoru Yamaguchi, Katsumi Setoguchi, Masumi Shirai, Yasunori Takasugi
  • Publication number: 20230273253
    Abstract: A semiconductor inspection device 1 having a first measurement mode and a second measurement mode includes: an electron optical system configured to irradiate a sample with an electron beam; an optical system configured to irradiate the sample with light; an electron detector configured to detect a signal electron; a photodetector 29 configured to detect signal light; a control unit 11 configured to control the electron optical system and the optical system such that an electron beam and light are emitted under a first irradiation condition in the first measurement mode, and to control the electron optical system and the optical system such that an electron beam and light are emitted under a second irradiation condition in the second measurement mode; and a computer configured to process a detection signal from the electron detector or the photodetector.
    Type: Application
    Filed: September 29, 2020
    Publication date: August 31, 2023
    Inventors: Yasuhiro SHIRASAKI, Natsuki TSUNO, Minami SHOUJI, Makoto SAKAKIBARA, Satoshi TAKADA
  • Patent number: 11685705
    Abstract: Provided is a method with which an ?-allylated cycloalkanone is obtained from a macroyclic compound used as a starting material. The method is a method for producing an ?-allylated cycloalkanone represented by General Formula (IV), and the method includes a step of reacting a compound represented by General Formula (I) and/or a compound represented by General Formula (II) with a compound represented by General Formula (III) in the presence of an acid catalyst to produce an ?-allylated cycloalkanone represented by General Formula (IV), the acid catalyst including an acid catalyst that includes an ammonium cation and an anion.
    Type: Grant
    Filed: March 17, 2020
    Date of Patent: June 27, 2023
    Assignee: Kao Corporation
    Inventors: Jun Deguchi, Makoto Sakakibara, Daichi Sakoda
  • Publication number: 20230064202
    Abstract: A charged particle beam device includes: a stage 124 on which a sample 108 is to be placed; a charged particle optical system including a charged particle source 113 and an objective lens 121 that focuses a charged particle beam from the charged particle source onto the sample; and a detector 123 disposed between the objective lens and the stage and configured to detect electrons 109 emitted by an interaction between the charged particle beam and the sample. The stage, the charged particle optical system, and the detector are housed in a vacuum housing 112, and the detector includes a scintillator 107, a solid-state photomultiplier tube 104, and a light guide 106 provided between the scintillator and the solid-state photomultiplier tube, and an area of a light receiving surface of the scintillator is larger than an area of a light receiving surface of the solid-state photomultiplier tube.
    Type: Application
    Filed: June 18, 2020
    Publication date: March 2, 2023
    Inventors: Kazuo OOTSUGA, Kazufumi YACHI, Makoto SAKAKIBARA, Heita KIMIZUKA, Yusuke ABE
  • Patent number: 11524929
    Abstract: Provided is a method with which an ?-allylated cycloalkanone is obtained from a cyclic compound cycloalkanone used as a starting material. The method is a method for producing an ?-allylated cycloalkanone represented by General Formula (III), and the method includes: a step 1: reacting a compound represented by General Formula (I) and alcohol having 1 or more and 4 or less of carbon atoms in the presence of a first acid catalyst and optionally a dehydrating agent; and a step 2: reacting a crude product obtained in the step 1 and a compound represented by General Formula (II) in the presence of a second acid catalyst to produce an ?-allylated cycloalkanone represented by General Formula (III). The step 1 and the step 2 are consecutively performed.
    Type: Grant
    Filed: March 17, 2020
    Date of Patent: December 13, 2022
    Assignee: Kao Corporation
    Inventors: Jun Deguchi, Makoto Sakakibara, Daichi Sakoda
  • Patent number: 11518110
    Abstract: There is provided an adhesive application apparatus capable of efficiently applying an adhesive without inhibiting curing of the adhesive. An adhesive application apparatus of the present invention includes a mounting table 10, an adhesive dosing unit 20, and an ultraviolet irradiation unit 30, and it applies a delayed-ultraviolet-curable adhesive 200 to a surface of a panel 100. The panel 100 is mounted on a mounting surface S10 of the mounting table 10. The adhesive dosing unit 20 applies the adhesive 200 to the surface of the panel 100 mounted on the mounting table 10 by discharging the adhesive 200 from an adhesive dosing port H20. The ultraviolet irradiation unit 30 irradiates the adhesive 200 dosed from the adhesive dosing port H20 with ultraviolet light L. Here, the ultraviolet irradiation unit 30 irradiates the adhesive 200 with the ultraviolet light L along the mounting surface S10 before the adhesive 200 dosed from the adhesive dosing port H20 is applied to the surface of the panel 100.
    Type: Grant
    Filed: May 12, 2021
    Date of Patent: December 6, 2022
    Assignee: MOMENTIVE PERFORMANCE MATERIALS JAPAN LLC
    Inventors: Makoto Sakakibara, Hiroyuki Ueno
  • Publication number: 20220359149
    Abstract: To provide a charged particle beam device including a booster electrode and an object lens that generates a magnetic field in a vicinity of a sample, and capable of preventing ion discharge, an insulator is disposed between a magnetic field lens and the booster electrode. A tip of the insulator protrudes to a tip side of an upper magnetic path from a tip of a lower magnetic path of the magnetic field lens. The tip on a lower side of the insulator is above the lower magnetic path, and a non-magnetic metal electrode is embedded between the upper magnetic path and the lower magnetic path.
    Type: Application
    Filed: July 2, 2019
    Publication date: November 10, 2022
    Applicant: Hitachi High-Tech Corporation
    Inventors: Makoto SAKAKIBARA, Momoyo ENYAMA, Hajime KAWANO, Makoto SUZUKI, Kenji TANIMOTO, Yuko SASAKI
  • Publication number: 20220359151
    Abstract: From a reference waveform 112 and a BSE signal waveform 211 that is extracted from a backscattered electron image and indicates a backscattered electron signal intensity from a pattern along a first direction, a difference waveform indicating a relationship between the backscattered electron signal intensity and a difference between a coordinate of the BSE signal waveform and a coordinate of the reference waveform which have the same backscattered electron signal intensity is generated, and presence or absence of a shielded region 203 that is not irradiated with a primary electron beam on a side wall of the pattern is determined based on the difference waveform. The reference waveform indicates a backscattered electron signal intensity from a reference pattern along the first direction in which the side wall is formed perpendicularly to an upper surface and a bottom surface of the pattern when the reference pattern is scanned with the primary electron beam.
    Type: Application
    Filed: January 10, 2020
    Publication date: November 10, 2022
    Applicant: Hitachi High-Tech Corporation
    Inventors: Wei Sun, Yasunori Goto, Takuma Yamamoto, Makoto Sakakibara
  • Publication number: 20220359150
    Abstract: The invention provides a charged particle beam device capable of reducing a positional shift between secondary beams generated in a beam separator. The charged particle beam device includes a charged particle beam source configured to irradiate a sample with a plurality of primary beams, a plurality of detectors configured to detect secondary beams emitted from the sample in correspondence to the primary beams, and a beam separator configured to deflect the secondary beams in a direction different from that of the primary beams. The charged particle beam device further includes a deflector provided between the beam separator and the detector to correct a positional shift between the secondary beams generated in the beam separator.
    Type: Application
    Filed: July 8, 2019
    Publication date: November 10, 2022
    Inventors: Momoyo Enyama, Makoto Sakakibara, Hajime Kawano, Hiroya Ohta
  • Publication number: 20220328279
    Abstract: Provided is a charged particle beam device for which deterioration in throughput in the event of abnormality of multiple beams can be prevented. The charged particle beam device includes: a stage 11 on which a sample is mounted; a charged particle optical system configured to irradiate the sample with multiple beams including multiple primary beams; a detector 15 configured to detect secondary beams generated by interactions between the primary beams and the sample and output detection signals; and a control unit 17 configured to control the stage and the charged particle optical system to generate image data based on the detection signals from the detector obtained by scanning the sample with the multiple beams using a first scanning method.
    Type: Application
    Filed: October 4, 2019
    Publication date: October 13, 2022
    Inventors: Momoyo ENYAMA, Makoto SAKAKIBARA, Hajime KAWANO
  • Publication number: 20220328281
    Abstract: A charged particle beam device includes a plurality of detectors configured to detect one or more signal charged particle beams caused by irradiation on a sample with one or more primary charged particle beams, and a control system. The control system is configured to measure an intensity distribution of the one or more signal charged particle beams detected by the plurality of detectors, and correct the intensity distribution by using a correction function. The control system is configured to generate an image based on the corrected intensity distribution.
    Type: Application
    Filed: September 20, 2019
    Publication date: October 13, 2022
    Inventors: Yasuhiro Shirasaki, Makoto Sakakibara, Momoyo Enyama, Hajime Kawano, Akira Ikegami
  • Publication number: 20220218384
    Abstract: A vibration type removal apparatus 2 includes a housing 10, a holding member 11, a tool 12, a control device 20, a vibration device 21, and a cooling pump 22. The control device 20 drives the cooling pump 22, and cooling water supplied from the cooling pump 22 passes through a flow path 25 in the housing 10, and is sprayed toward the tool 12 from a distal end of the flow path 25. In this state, the tool 12 is inserted between a hard tissue HT and a soft tissue ST, the vibration device 21 is operated, and the tool 12 is vibrated. Due to the vibration of the tool 12, a surface of the hard tissue HT which adheres to the soft tissue ST is cut, and the hard tissue HT is peeled and removed from the soft tissue ST.
    Type: Application
    Filed: April 22, 2020
    Publication date: July 14, 2022
    Inventors: Satoshi KOBAYASHI, Yoshihiro MINAGAWA, Hiroki SUZUKI, Makoto SAKAKIBARA
  • Patent number: 11380518
    Abstract: A measurement system comprising: a measurement apparatus observing a sample based on an observation condition including parameters; and an observation condition database storing data in which a search key related to the sample and the observation condition, a control unit calculating information on an observation condition of a sample is configured to: receive an observation condition search request including a search key related to a target sample; refer the observation condition database to search for the first data matching or similar to the search key related to the target sample included in the observation condition search request, calculate, based on the searched first data, a candidate observation condition of the measurement apparatus for observing the target sample, and output display data for presenting the candidate observation condition.
    Type: Grant
    Filed: August 9, 2019
    Date of Patent: July 5, 2022
    Assignee: Hitachi, Ltd.
    Inventors: Takafumi Miwa, Hirokazu Tamaki, Momoyo Enyama, Makoto Sakakibara, Sayaka Kurata, Atsuko Shintani, Takashi Dobashi, Kotoko Urano, Akiko Kagatsume, Minseok Park, Yasuhiro Shirasaki, Thantip Krasienapibal
  • Publication number: 20220153671
    Abstract: Provided is a method with which an ?-allylated cycloalkanone is obtained from a cyclic compound cycloalkanone used as a starting material. The method is a method for producing an ?-allylated cycloalkanone represented by General Formula (III), and the method includes: a step 1: reacting a compound represented by General Formula (I) and alcohol having 1 or more and 4 or less of carbon atoms in the presence of a first acid catalyst and optionally a dehydrating agent; and a step 2: reacting a crude product obtained in the step 1 and a compound represented by General Formula (II) in the presence of a second acid catalyst to produce an ?-allylated cycloalkanone represented by General Formula (III). The step 1 and the step 2 are consecutively performed.
    Type: Application
    Filed: March 17, 2020
    Publication date: May 19, 2022
    Applicant: Kao Corporation
    Inventors: Jun DEGUCHI, Makoto SAKAKIBARA, Daichi SAKODA
  • Publication number: 20220153672
    Abstract: Provided is a method with which an ?-allylated cycloalkanone is obtained from a macroyclic compound used as a starting material. The method is a method for producing an ?-allylated cycloalkanone represented by General Formula (IV), and the method includes a step of reacting a compound represented by General Formula (I) and/or a compound represented by General Formula (II) with a compound represented by General Formula (III) in the presence of an acid catalyst to produce an ?-allylated cycloalkanone represented by General Formula (IV), the acid catalyst including an acid catalyst that includes an ammonium cation and an anion.
    Type: Application
    Filed: March 17, 2020
    Publication date: May 19, 2022
    Applicant: Kao Corporation
    Inventors: Jun DEGUCHI, Makoto SAKAKIBARA, Daichi SAKODA
  • Publication number: 20220102105
    Abstract: Deflection of a secondary beam, and astigmatism correction of a primary beam or of the secondary beam are carried out using a multi-pole electromagnetic deflector which deflects the path of the secondary beam toward a detector.
    Type: Application
    Filed: March 8, 2019
    Publication date: March 31, 2022
    Applicant: Hitachi High-Tech Corporation
    Inventors: Wen Li, Hajime Kawano, Momoyo Enyama, Makoto Sakakibara
  • Patent number: 11282671
    Abstract: The purpose of the present invention is to provide a charged-particle beam apparatus capable of performing various types of signal discriminations according to the shape and the size of a sample. The present invention proposes a charged-particle beam apparatus for irradiating a sample disposed in a vacuum vessel with a charged particle beam. The charged-particle beam apparatus is provided with: a first light-generating surface for generating light on the basis of the collision of charged particles released from the sample; a light-guiding member for guiding the generated light to the outside of the vacuum vessel while maintaining the generation distribution of the light generated at the first light-generating surface; a photodetector for detecting the light guided by the light-guiding member to the outside of the vacuum vessel; and a light-transmission restricting member for restricting transmission of the light guided by the light-guiding member between the photodetector and the light-guiding member.
    Type: Grant
    Filed: July 28, 2016
    Date of Patent: March 22, 2022
    Assignee: Hitachi High-Tech Corporation
    Inventors: Uki Ikeda, Daisuke Bizen, Makoto Sakakibara, Makoto Suzuki
  • Patent number: 11257658
    Abstract: An object of the invention is to correct an aberration or a defocus of an electron beam for irradiation, and control an influence on a deflector by a fluctuation in an electric field of an electrostatic lens. The invention provides a charged particle beam apparatus including a deflector that deflects a charged particle beam with which a specimen is irradiated, an objective lens that focuses the charged particle beam on the specimen, an electrostatic lens that includes a part of the objective lens and to which a voltage for correcting the aberration or the defocus of the charged particle beam is applied, and an constant electric field applying electrode that is provided between the deflector and the electrostatic lens and to which a constant voltage having a same sign with the voltage applied to the electrostatic lens is applied.
    Type: Grant
    Filed: September 17, 2019
    Date of Patent: February 22, 2022
    Assignee: HITACHI HIGH-TECH CORPORATION
    Inventors: Noritsugu Takahashi, Makoto Sakakibara, Makoto Suzuki, Minoru Yamazaki
  • Publication number: 20220051868
    Abstract: The objective of the present invention is to reduce differences between individual electron beam observation devices accurately by means of image correction.
    Type: Application
    Filed: January 23, 2019
    Publication date: February 17, 2022
    Inventors: Koichi HAMADA, Megumi KIMURA, Momoyo ENYAMA, Ryou YUMIBA, Makoto SAKAKIBARA, Kei SAKAI, Satoru YAMAGUCHI, Katsumi SETOGUCHI, Masumi SHIRAI, Yasunori TAKASUGI