Patents by Inventor Makoto Sakakibara

Makoto Sakakibara has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20130248731
    Abstract: There is provided both an electron beam apparatus and a lens array, capable of correcting a curvature of field aberration under various optical conditions. The electron beam apparatus comprises the lens array having a plurality of electrodes, and multiple openings are formed in the respective electrodes. An opening diameter distribution with respect to the respective opening diameters of the plural openings formed in the respective electrodes are individually set, and voltages applied to the respective electrodes are independently controlled to thereby independently adjust an image forming position of a reference beam, and a curvature of the lens array image surface.
    Type: Application
    Filed: January 4, 2013
    Publication date: September 26, 2013
    Applicant: HITACHI HIGH-TECHNOLOGIES CORPORATION
    Inventors: Sayaka TANIMOTO, Hiroya OHTA, Makoto SAKAKIBARA, Momoyo ENYAMA, Kenji TANIMOTO
  • Patent number: 7939780
    Abstract: An abnormality determination and estimation device for a weld product in a welding process includes a jig device and an AE sensor. The jig device holds the product by a holding face, through which the jig device and the product are in close contact with each other. The AE sensor detects an elastic wave in the jig device. Accordingly, abnormality detection accuracy can be improved, and abnormalities can be discriminated.
    Type: Grant
    Filed: October 4, 2006
    Date of Patent: May 10, 2011
    Assignee: Denso Corporation
    Inventors: Masuaki Murao, Makoto Sakakibara
  • Patent number: 7425714
    Abstract: A technology capable of reducing the influence of the noise overlapped in a long transmission line when accurately measuring weak beam current in an electron beam writing system and capable of accurately and efficiently measuring weak beam current in a beam writing system using multiple beams is provided. With using a switch for connecting and disconnecting an electron beam detecting device and a detected signal line, the electron beam detecting device is disconnected from the detected signal line to accumulate the detected signals in the electron beam detecting device during the beam current measurement. Simultaneously with the finish of the measurement, the electron beam detecting device and the detected signal line are connected to measure the accumulated signals. Also, in order to simultaneously perform the measurement method, a plurality of electron beam detecting devices and switches are used to simultaneously measure a plurality of electron beams with high accuracy.
    Type: Grant
    Filed: August 22, 2005
    Date of Patent: September 16, 2008
    Assignees: Hitachi High-Technologies Corporation, Canon Kabushiki Kaisha
    Inventors: Makoto Sakakibara, Yoshinori Nakayama, Hiroya Ohta, Yasunari Sohda, Noriyuki Tanaka, Yasuhiro Someda
  • Patent number: 7423274
    Abstract: An electron beam writing technology which enables highly accurate deflection correction of a minute field used in an electron beam writing system is provided. In this system, a function to move an electron beam by a deflection means through high-speed deflection scanning so as to repeat formation of a cyclic patterned electron beam and a function to move the patterned electron beam on cyclic correction marks by the deflection means through low-speed deflection scanning in synchronization with one cycle of the repetition are provided, and reflected electrons or secondary electrons emitted from the correction marks and the vicinity thereof or transmitted electrons transmitted through the correction marks in the low-speed deflection scanning are detected so as to correct the position or deflection amount of the electron beam based on the detection result.
    Type: Grant
    Filed: February 17, 2006
    Date of Patent: September 9, 2008
    Assignees: Hitachi High-Technologies Corporation, Canon Kabushiki Kaisha
    Inventors: Yoshinori Nakayama, Hiroya Ohta, Makoto Sakakibara, Yasunari Sohda, Masaki Hosoda
  • Publication number: 20080090085
    Abstract: Provided are a heat curable adhesive composition and an adhesive article suited for dicing of a semiconductor and die-bonding of the diced semiconductor chip, and a semiconductor apparatus and a process for preparing a semiconductor apparatus using the adhesive composition and article. In one embodiment, the present invention provides a heat curable adhesive composition comprising a caprolactone-modified epoxy resin and a tack reducing component. Another embodiment of the present invention provides an adhesive article comprising a heat curable adhesive layer of a heat curable adhesive composition comprising a caprolactone-modified epoxy resin, a tack reducing component, and a backing layer carrying said adhesive layer on at least a portion of the backing layer.
    Type: Application
    Filed: November 1, 2007
    Publication date: April 17, 2008
    Inventors: Kohichiro Kawate, Shoji Takeuchi, Makoto Sakakibara
  • Publication number: 20070144399
    Abstract: The present invention relates to [1] a water dispersion for ink-jet printing containing an organic pigment having a bulk of 3.5 to 20 mL/g; [2] a water dispersion for ink-jet printing including water-insoluble polymer particles containing a pigment having a bulk of 3.5 to 20 mL/g; [3] a water dispersion for ink-jet printing containing an organic pigment obtained by a pulverization/classification treatment wherein the organic pigment has D50 of 2 to 15 ?m and D90 of 60 ?m or less; [4] a water-based ink for ink-jet printing containing the respective water dispersions which is excellent in election reliability, image density, image uniformity and rubbing resistance; and [5] a process for producing the respective water dispersions.
    Type: Application
    Filed: December 21, 2006
    Publication date: June 28, 2007
    Applicant: KAO CORPORATION
    Inventors: Shigeki Nagashima, Makoto Sakakibara, Toshiya Iwasaki
  • Publication number: 20070090098
    Abstract: An abnormality determination and estimation device for a weld product in a welding process includes a jig device and an AE sensor. The jig device holds the product by a holding face, through which the jig device and the product are in close contact with each other. The AE sensor detects an elastic wave in the jig device. Accordingly, abnormality detection accuracy can be improved, and abnormalities can be discriminated.
    Type: Application
    Filed: October 4, 2006
    Publication date: April 26, 2007
    Applicant: DENSO Corporation
    Inventors: Masuaki Murao, Makoto Sakakibara
  • Patent number: 7112619
    Abstract: A water-based ink containing an aqueous dispersion of water-insoluble vinyl polymer particles containing a pigment, wherein the water-insoluble vinyl polymer is prepared by copolymerizing a monomer mixture containing (a) a monomer having a salt-forming group, (b) a monomer having a long-chain alkyl group, (c) a macromer, (d) a monomer having a polyoxyalkylene group, and (e) a monomer copolymerizable with the monomer having a salt-forming group (a), the monomer having a long-chain alkyl group (b), the macromer (c) and the monomer having a polyoxyalkylene group (d). The water-based ink can be suitably used, for instance, as a water-based ink for inkjet recording and the like.
    Type: Grant
    Filed: December 22, 2003
    Date of Patent: September 26, 2006
    Assignee: Kao Corporation
    Inventors: Makoto Sakakibara, Nobushige Tanaka, Ryuma Mizushima, Kenji Kaida, Takehiro Tsutsumi
  • Publication number: 20060197453
    Abstract: An electron beam writing technology which enables highly accurate deflection correction of a minute field used in an electron beam writing system is provided. In this system, a function to move an electron beam by a deflection means through high-speed deflection scanning so as to repeat formation of a cyclic patterned electron beam and a function to move the patterned electron beam on cyclic correction marks by the deflection means through low-speed deflection scanning in synchronization with one cycle of the repetition are provided, and reflected electrons or secondary electrons emitted from the correction marks and the vicinity thereof or transmitted electrons transmitted through the correction marks in the low-speed deflection scanning are detected so as to correct the position or deflection amount of the electron beam based on the detection result.
    Type: Application
    Filed: February 17, 2006
    Publication date: September 7, 2006
    Inventors: Yoshinori Nakayama, Hiroya Ohta, Makoto Sakakibara, Yasunari Sohda, Masaki Hosoda
  • Publication number: 20060060775
    Abstract: A technology capable of reducing the influence of the noise overlapped in a long transmission line when accurately measuring weak beam current in an electron beam writing system and capable of accurately and efficiently measuring weak beam current in a beam writing system using multiple beams is provided. With using a switch for connecting and disconnecting an electron beam detecting device and a detected signal line, the electron beam detecting device is disconnected from the detected signal line to accumulate the detected signals in the electron beam detecting device during the beam current measurement. Simultaneously with the finish of the measurement, the electron beam detecting device and the detected signal line are connected to measure the accumulated signals. Also, in order to simultaneously perform the measurement method, a plurality of electron beam detecting devices and switches are used to simultaneously measure a plurality of electron beams with high accuracy.
    Type: Application
    Filed: August 22, 2005
    Publication date: March 23, 2006
    Inventors: Makoto Sakakibara, Yoshinori Nakayama, Hiroya Ohta, Yasunari Sohda, Noriyuki Tanaka, Yasuhiro Someda
  • Publication number: 20060011869
    Abstract: In an electron-beam lithography system for performing a pattern drawing by causing electron beams to be switched ON/OFF at a high speed in an exposure/non-exposure portion, non-straight line property of beam shot dosage relative to beam ON time worsens dimension accuracy of the drawing pattern formed on a sample. In order to avoid this drawback, the characteristic of the beam shot dosage relative to the beam ON time is measured in advance, thereby creating correction data for the beam ON time beforehand. Then, at the time of performing the pattern drawing, the beam ON time is corrected based on the correction data so that desired beam shot dosage becomes acquirable.
    Type: Application
    Filed: July 14, 2005
    Publication date: January 19, 2006
    Inventors: Noriyuki Tanaka, Ken Iizumi, Yoshinori Nakayama, Hiroya Ohta, Makoto Sakakibara, Yasuhiro Someda
  • Publication number: 20050224978
    Abstract: Provided are a heat curable adhesive composition and an adhesive article suited for dicing of a semiconductor and die bonding of the diced semiconductor chip, and a semiconductor apparatus and a process for preparing a semiconductor apparatus using the adhesive composition and article. In one embodiment, the present invention provides a heat curable adhesive composition comprising a caprolactone-modified epoxy resin and a tack reducing component. Another embodiment of the present invention provides an adhesive article comprising a heat curable adhesive layer of a heat curable adhesive composition comprising a caprolactone-modified epoxy resin, a tack reducing component, and a backing layer carrying said adhesive layer on at least a portion of the backing layer.
    Type: Application
    Filed: June 23, 2003
    Publication date: October 13, 2005
    Inventors: Kohichiro Kawate, Shoji Takeuchi, Makoto Sakakibara
  • Patent number: 6858321
    Abstract: A corrosion resistant member has a chemical conversion treatment film with a two-layer structure formed atop a metal substrate plated with zinc or zinc alloy plating. The two-layer structure comprises a lower layer containing Cr formed on the surface of the plating and an upper layer containing SiO2.
    Type: Grant
    Filed: September 23, 2002
    Date of Patent: February 22, 2005
    Assignee: Yuken Industry Co., Ltd.
    Inventors: Nobuaki Wada, Yasuhiro Nagaya, Mitsuhiro Ito, Naruhisa Kamiya, Makoto Sakakibara
  • Publication number: 20040132942
    Abstract: A water-based ink containing an aqueous dispersion of water-insoluble vinyl polymer particles containing a pigment, wherein the water-insoluble vinyl polymer is prepared by copolymerizing a monomer mixture containing (a) a monomer having a salt-forming group, (b) a monomer having a long-chain alkyl group, (c) a macromer, (d) a monomer having a polyoxyalkylene group, and (e) a monomer copolymerizable with the monomer having a salt-forming group (a), the monomer having a long-chain alkyl group (b), the macromer (c) and the monomer having a polyoxyalkylene group (d). The water-based ink can be suitably used, for instance, as a water-based ink for inkjet recording and the like.
    Type: Application
    Filed: December 22, 2003
    Publication date: July 8, 2004
    Applicant: Kao Corporation
    Inventors: Makoto Sakakibara, Nobushige Tanaka, Ryuma Mizushima, Kenji Kaida, Takehiro Tsutsumi
  • Patent number: 6730780
    Abstract: An oil-soluble dye prepared by subjecting a water-soluble dye having at least one group selected from the group consisting of sulfonate group and carboxyl group in its molecule to amidation: a water-based ink comprising the oil-soluble dye: and a process for preparing an oil-soluble dye, comprising halogenating a water-soluble dye having at least one group selected from the group consisting of sulfonate group and carboxyl group in its molecule, and thereafter subjecting the resulting halogenated water-soluble dye to amidation. The Oil-soluble dye of the present invention can be suitably and favorably used for inks for inkjet recording, inks for ball-points pens, inks for markers, toners, paints such as lacquers, inks for felt pens, and the like.
    Type: Grant
    Filed: October 19, 2001
    Date of Patent: May 4, 2004
    Assignee: Kao Corporation
    Inventors: Shigemi Wakabayashi, Takehiro Tsutsumi, Kenji Kaida, Makoto Sakakibara
  • Publication number: 20030190492
    Abstract: A corrosion resistant member has a chemical conversion treatment film with a two-layer structure formed atop a metal substrate plated with zinc or zinc alloy plating. The two-layer structure comprises a lower layer containing Cr formed on the surface of the plating and an upper layer containing SiO2.
    Type: Application
    Filed: September 23, 2002
    Publication date: October 9, 2003
    Applicant: Yuken Industry Co., Ltd.
    Inventors: Nobuaki Wada, Yasuhiro Nagaya, Mitsuhiro Ito, Naruhisa Kamiya, Makoto Sakakibara
  • Patent number: 5590208
    Abstract: A duct is provided in a cabinet for radiating sound pressure emitted from a speaker unit. The duct comprises a first duct and a second duct. The first duct extends in a direction perpendicular to a radiating direction of the sound pressure radiated from a front side of the speaker unit. The second duct is connected to an end of the first duct. An inner end of of the second duct is communicated with the cabinet. The speaker unit is disposed at a connection of the first and second ducts.
    Type: Grant
    Filed: April 11, 1995
    Date of Patent: December 31, 1996
    Assignee: Pioneer Electronic Corporation
    Inventors: Shinji Koyano, Koushirou Kogure, Takashi Ohyaba, Makoto Sakakibara, Katsutoki Hanayama