Abstract: A radiation-sensitive resin composition includes a resin (A1) that includes a repeating unit shown by the following formula (1-1) and a repeating unit shown by the following formula (1-2), and a radiation-sensitive acid generator (B). The radiation-sensitive resin composition exhibits excellent sensitivity, and can reduce a mask error factor (MEEF). wherein R1, R2, and R3 individually represent a linear or branched alkyl group having 1 to 4 carbon atoms, R4 represents a hydrogen atom, a linear or branched alkyl group having 2 to 4 carbon atoms, a linear or branched fluoroalkyl group having 1 to 4 carbon atoms, or a linear or branched alkoxy group having 1 to 4 carbon atoms, and q represents an integer from 0 to 3.

Abstract: There is provided a frame converter that writes input data included in an input frame to a buffer to accumulate the input data and outputs data read from the buffer as output data included in an output frame, the frame converter includes a setting unit configured to set a time interval from start of resizing of data rate of the input data to start of resizing of data rate of the output data when resizing of an accumulation amount in the buffer is performed in which data rates of the input data and the output data vary, and an adjustment unit configured to adjust to approximate the data rate of the output data to the data rate of the input data after the time interval has elapsed since the start of resizing of data rate of the input data.

Abstract: A compound is shown by a following formula (1), wherein R1 represents a hydrogen atom, a methyl group, or a trifluoromethyl group, R2 represents a methylene group, an ethylene group, a 1-methylethylene group, a 2-methylethylene group, a divalent alicyclic hydrocarbon group having 4 to 20 carbon atoms, or a derivative thereof, each of R3 represents at least one of a monovalent alicyclic hydrocarbon group having 4 to 20 carbon atoms, a derivative thereof, and a linear or branched alkyl group having 1 to 4 carbon atoms, provided that two of R3 may bond to form a divalent alicyclic hydrocarbon group having 4 to 20 carbon atoms or a derivative thereof together with the carbon atom that is bonded thereto, and X represents a linear or branched fluoroalkylene group having 1 to 20 carbon atoms.

Abstract: In an apparatus structure having a sheet discharge mode to store sheets at a stack tray from a sheet discharging path and a sheet discharge mode to store binding-processed sheet bundles with collating and stacking, sheet holding means is arranged above a sheet placement face of the stack tray as a sheet pressurization force being variable in two steps, and then, the pressurization force of the sheet holding means is adjusted in two steps in accordance with the sheet discharge mode for storing sheets at the stack tray.

Abstract: In a sheet storing apparatus of the present invention, a tailing end supporting member which temporarily supports a tailing end of a dropping sheet bundle is arranged between a discharging port of a processing tray to discharge the sheet bundle and the upmost sheet on a stack tray as being movable between an operating position above a sheet placement face and a waiting position outside the stack tray.

Abstract: A relay device for dividing a storage device into a plurality of unit areas, assigning an unused unit area from among the plurality of unit areas to received channel-specified data, and performing at least one of adjustment of a transmission timing of the data and conversion of the data by using the assigned unit area, is disclosed. The relay device includes an error detector configured to detect an error where the unit area from which the data is to be read is not specified; and an error control configured to recognize a channel of data stored in the unit area that is not specified due to the error detected by the error detector as a target channel, and to invalidate an assignment of the unit area to the recognized target channel.

Abstract: A transmission apparatus for transmitting frames accommodating client data over a transmission network, comprising a clock generation unit that generates a clock for timing processing period of signal processing, a deviation detection unit that detects clock deviation between the clock generated by the clock generation unit and the clock used for timing processing period of signal processing by other transmission apparatus that receives the client data from outside the transmission network and adds them to frames, and a timing generation unit that generates timing signal of processing period of signal processing corrected with the clock deviation.

Abstract: A clock conversion apparatus comprising, an elastic store memory in which data are written in synchronization with a first clock and from which data are read out in synchronization with a second clock, a phase comparator for detecting phase difference between a third clock obtained by imparting a first variable phase shift to a divided clock of the first clock and a fourth clock obtained by imparting a second variable phase shift to a divided clock of the second clock, and an oscillator for generating a clock having frequency in accordance with the phase difference as the second clock.

Abstract: A rate monitoring apparatus using a token bucket algorithm for controlling a packet flow, the apparatus includes a packet information storage unit having two storage media for storing packet information extracted from a packet data, a token identifying information storage unit having two storage media for storing identification information used for supplying a created token, and an operation unit for performing a policing operation by using a packet length, an allowable burst size, a token supply capacity and a currently transmittable data capacity, based on an identifying information included in the packet information and a comparison result between identification information included in the packet information and the identification information used for supplying the created token, these compared identification information being read out from the other storage medium different from the storage medium under writing in the packet information storage unit and the token identifying information storage unit.

Abstract: A substrate manufacturing apparatus manufactures a ball-mounted substrate and has a ball mounting apparatus which includes a ball vacuum chucking apparatus including a vacuum chucking head that carries out a vacuum chucking process to chuck balls at edges of inlets formed in a vacuum chucking surface and which mounts the balls vacuum-chucked by the vacuum chucking head on a substrate, the ball vacuum chucking apparatus further including: a holding vessel that holds the balls; and a vacuum chucking/holding unit that vacuum chucks and holds the balls held in the holding vessel on a front end thereof, and carrying out a supplying process that brings the vacuum chucking/holding unit that holds the balls on the front end thereof and the vacuum chucking surface of the vacuum chucking head relatively close to supply the balls to the vacuum chucking head while air is being drawn through the inlets.

Abstract: A person identification device obtains information including biometric information of a person, detects the biometric information of at least one person from the obtained information, collates each detected biometric information with the biometric information of at least one registrant associated with group information and stored in a storage unit to thereby identify the person having the biometric information detected from the obtained information, classifies a plurality of successively identified persons into group candidates based on predetermined conditions, divides the persons of the group candidates into groups based on the group information of each person stored in the storage unit, and outputs a grouping result to an external device.

Abstract: A radiation-sensitive resin composition includes a resin that includes a repeating unit shown by the following formula (1) and a solvent. The radiation-sensitive resin composition has an excellent performance as a radiation-sensitive acid generator, includes a resin that adversely affects the environment and a human body to only a small extent, and can form a resist film that has a high resolution and forms an excellent resist pattern. wherein R1 represents a hydrogen atom or the like, M+ represents a specific cation, and n represents an integer from 1 to 5.

Abstract: A radiation-sensitive resin composition for liquid immersion lithography includes a resin component, a photoacid generator and a solvent. The resin component includes an acid-dissociable group-containing resin in an amount of more than 50% by mass. The acid-dissociable group-containing resin includes a repeating unit that includes a fluorine atom and an acid-dissociable group in a side chain of the repeating unit.

Abstract: A resin that includes a repeating unit shown by the following formula (10) has an excellent performance as a radiation sensitive acid generator, and exhibits only a small adverse effect on the environment and a human body. wherein R1 represents a hydrogen atom or the like, M+ represents a specific cation, and n is an integer from 1 to 5.

Abstract: An optical fiber, which has a zero-material dispersion wavelength equal to or greater than 2 ?m, and a high nonlinear susceptibility ?3 equal to or greater than 1×10?12 esu, and uses tellurite glass having sufficient thermal stability for processing into a low loss fiber, employs a PCF structure or HF structure having strong confinement into a core region. This enables light to propagate at a low loss. The size and geometry of air holes formed in the core region, and the spacing between adjacent air holes make it possible to control the zero dispersion wavelength within an optical telecommunication window (1.2-1.7 ?m), and to achieve large nonlinearity with a nonlinear coefficient ? equal to or greater than 500 W?1 km?1.

Abstract: A compound is shown by a following formula (1), wherein R1 represents a hydrogen atom, a methyl group, or a trifluoromethyl group, R2 represents a methylene group, an ethylene group, a 1-methylethylene group, a 2-methylethylene group, a divalent alicyclic hydrocarbon group having 4 to 20 carbon atoms, or a derivative thereof, each of R3 represents at least one of a monovalent alicyclic hydrocarbon group having 4 to 20 carbon atoms, a derivative thereof, and a linear or branched alkyl group having 1 to 4 carbon atoms, provided that two of R3 may bond to form a divalent alicyclic hydrocarbon group having 4 to 20 carbon atoms or a derivative thereof together with the carbon atom that is bonded thereto, and X represents a linear or branched fluoroalkylene group having 1 to 20 carbon atoms.

Abstract: A compound is shown by the following formula (5) in which at least one of Rf groups represents a fluorine atom or a linear or branched perfluoroalkyl group having 1 to 10 carbon atoms, A? represents a substituted or unsubstituted, linear or branched alkylene group having 1 to 20 carbon atoms, an alkylene group having at least one hetero atom, or a single bond, G represents a divalent organic group having a fluorine atom or a single bond, Mm+ represents an onium cation, m represents a natural number of 1 to 3, and p represents a natural number of 1 to 8.

Abstract: A compound is shown by the following formula (5) in which at least one of Rf groups represents a fluorine atom or a linear or branched perfluoroalkyl group having 1 to 10 carbon atoms, A? represents a substituted or unsubstituted, linear or branched alkylene group having 1 to 20 carbon atoms, an alkylene group having at least one hetero atom, or a single bond, G represents a divalent organic group having a fluorine atom or a single bond, Mm+ represents an onium cation, m represents a natural number of 1 to 3, and p represents a natural number of 1 to 8.

Abstract: A radiation-sensitive resin composition is provided which has high transparency to radiation, excelling in basic properties as a resist such as sensitivity, resolution, and pattern shape, and, in particular, a high resolution radiation-sensitive resin composition providing a wide DOF and excelling in LER. Also provided are a polymer which can be used in the composition and a novel compound useful for synthesizing the polymer. The novel compound is shown by the following formula (2), wherein R4 represents a methyl group, a trifluoromethyl group, or a hydrogen atom, at least one of the Rfs represents a fluorine atom or a linear or branched perfluoroalkyl group having 1 to 10 carbon atoms, A represents a divalent organic group or a single bond, G represents a divalent organic group having a fluorine atom or a single bond, Mm+ represents a metal ion or an onium cation, m represents an integer of 1 to 3, and p is an integer of 1 to 8.

Abstract: A radiation-sensitive resin composition includes a polymer, an acid-labile group-containing resin, a radiation-sensitive acid generator, and a solvent, the polymer including repeating units shown by following general formulas (1) and (2). wherein R1 and R2 represent a hydrogen atom, a methyl group, or a trifluoromethyl group, R3 represents a linear or branched alkyl group having 1 to 6 carbon atoms or an alicyclic hydrocarbon group having 4 to 20 carbon atoms in which at least one hydrogen atom is substituted with a fluorine atom, or a derivative thereof, and Z represents a group that includes a group that generates an acid upon exposure to light. The radiation-sensitive resin composition produces an excellent pattern shape, reduces the amount of elution into an immersion liquid upon contact during liquid immersion lithography, ensures that a high receding contact angle is formed by a resist film and an immersion liquid, and rarely causes development defects.