Abstract: A method for manufacturing a dielectric sheet, includes the steps of extrusion molding a mixture including powder polytetrafluoroethylene and spherical silica at a temperature lower than or equal to a melting point of the polytetrafluoroethylene, and calendering a sheet body obtained by the extrusion molding. A mass ratio of the silica with respect to the polytetrafluoroethylene is 1.3 or greater. An average particle diameter of the silica is 0.1 ?m or greater but 3.0 ?m or less. A reduction ratio of the extrusion molding is 8 or less.

Abstract: A drain mechanism has a drain connector. The drain connector has a connection pipe and a protector. The connecting pipe provides a partial passage. The partial passage provides a passage cross section perpendicular to a central axis of the partial passage. The connecting pipe has a barrier plate projecting into the partial passage. The barrier plate projects from an upper portion of the partial passage. The barrier plate provides a first opening and a second opening in a passage cross section. The barrier plate functions as a barrier plate against condensed water. The barrier plate regulates a flow of condensed water in the partial passage.

Abstract: An inner bag of a cell culture package is enclosed in an outer bag such that a rubber stopper is exposed to the outside. A closed space surrounded by the outer surface of the inner bag and the inner surface of the outer bag is sterile. This allows the outer surface of the inner bag, which is used for containing cell-containing deformable materials, to be maintained in a sterile condition. Since the cell culture package can be sterilized before a cell-containing deformable material is placed therein, the sterilization conditions can be relatively easily determined without considering the influence on the cell-containing deformable material. In addition, a holder allows liquid to pass through the bottom surface and side surface of a recess and the bottom surface and the side surface of a cover.

Abstract: A safety cabinet has a second operation chamber in a first operation chamber and into which clean air is supplied, a second suction opening for sucking in air in the second operation chamber and a portion of the air in the first operation chamber, and a second operation opening part that is provided facing a first operation opening part and communicates the second operation chamber with the first operation chamber. Airflow containment (air barrier) is doubled with respect to the outside of a safety cabinet. In cases where decontamination and disinfection operations are carried out according to the changeover procedures, intensive decontamination and disinfection of the second operation chamber is sufficient, and decontamination and disinfection of the first operation chamber is hardly required. Decontamination and disinfection operations in the changeover procedures and the like can be carried out in a greatly reduced time.

Abstract: A work area is disposed in a conveyance path for cells and has an inlet and an outlet, with a downflow air curtain provided at least at the inlet and the outlet. A conveyor repeatedly performs an operation that moves a placement surface having a culture vessel thereon from the inlet side into the area, moves the placement surface from the outlet side to the outside of the area, and, subsequently, moves back the placement surface to the inlet side. The cleaning device cleans the placement surface during the period from when the conveyor in the work area moves the placement surface to the outside of the area until the conveyor moves back the placement surface to the inlet side of the area.

Abstract: A safety cabinet has a second operation chamber in a first operation chamber and into which clean air is supplied, a second suction opening for sucking in air in the second operation chamber and a portion of the air in the first operation chamber, and a second operation opening part that is provided facing a first operation opening part and communicates the second operation chamber with the first operation chamber. Airflow containment (air barrier) is doubled with respect to the outside of a safety cabinet. In cases where decontamination and disinfection operations are carried out according to the changeover procedures, intensive decontamination and disinfection of the second operation chamber is sufficient, and decontamination and disinfection of the first operation chamber is hardly required. Decontamination and disinfection operations in the changeover procedures and the like can be carried out in a greatly reduced time.

Abstract: The present invention relates to stabilization of a certain benzothia(dia)zepine derivative in a solid formulation containing the same. In the present invention, in a solid formulation containing (A) the benzothia(dia) zepine derivative mentioned above and (B) a specific plasticizer, the aforementioned ingredient (A) is isolated from the aforementioned ingredient (B), or alternatively, in the case of the aforementioned ingredient (A) not being isolated from the aforementioned ingredient (B), an amount of the aforementioned ingredient (B) is controlled to 0.

Abstract: A cell separation container includes a collection chamber and a tissue holding chamber which are partitioned by a filter. The cell separation container includes a first air pressure adjuster configured to adjust the inflow and outflow of gas in the collection chamber and a second air pressure adjuster configured to adjust the inflow and outflow of gas in the tissue holding chamber. Thus, the inflow and outflow of the outside air and the gases in the collection chamber and the tissue holding chamber can be adjusted. In the cell separation container, switching between holding a treatment liquid in the tissue holding chamber and ejecting a treatment liquid to the collection chamber can be performed by adjusting the inflow and outflow of the outside air and the gas in the connection chamber.

Abstract: A work area is disposed in a conveyance path for cells and has an inlet and an outlet, with a downflow air curtain provided at least at the inlet and the outlet. A conveyor repeatedly performs an operation that moves a placement surface having a culture vessel thereon from the inlet side into the area, moves the placement surface from the outlet side to the outside of the area, and, subsequently, moves back the placement surface to the inlet side. The cleaning device cleans the placement surface during the period from when the conveyor in the work area moves the placement surface to the outside of the area until the conveyor moves back the placement surface to the inlet side of the area.

Abstract: An inner bag of a cell culture package is enclosed in an outer bag such that a rubber stopper is exposed to the outside. A closed space surrounded by the outer surface of the inner bag and the inner surface of the outer bag is sterile. This allows the outer surface of the inner bag, which is used for containing cell-containing deformable materials, to be maintained in a sterile condition. Since the cell culture package can be sterilized before a cell-containing deformable material is placed therein, the sterilization conditions can be relatively easily determined without considering the influence on the cell-containing deformable material. In addition, a holder allows liquid to pass through the bottom surface and side surface of a recess and the bottom surface and the side surface of a cover.

Abstract: In a multilayer ceramic capacitor including outer electrodes electrically connected to inner electrodes of a ceramic body, a thickness of each of end portions of extension portions of the inner electrodes in a width direction is larger than a thickness of a corresponding one of middle regions in the width direction, and a distance from a first main surface of the ceramic body to a first auxiliary electrode closest to the first main surface is different from a distance from a second main surface of the ceramic body to a second auxiliary electrode closest to the second main surface in a stacking direction. Each of the first auxiliary electrode and the second auxiliary electrode has a continuity in the width direction of about 60% or more.

Abstract: A package for cell-containing material includes an inner and outer bag. The periphery of the inner bag except an opening is sealed. The periphery of the outer bag except an opening is sealed. The outer bag contains the inner bag so the opening faces outward. A portion of the opening outside the inner bag is sealed and forms an outer bag sealed portion. A portion of the opening that overlaps the inner bag is sealed and forms an inter-bag sealed portion. A sterilized closed space may be surrounded by the outer surface of the inner bag and the inner surface of the outer bag. An adhesive strength of heat sealing of the inner surfaces of the opening of the inner bag may be greater than an adhesive strength of the inter-bag sealed portion and an adhesive strength of the outer bag sealed portion.

Abstract: A resist pattern-insolubilizing resin composition is used in a resist pattern-forming method. The resist pattern-insolubilizing resin composition includes solvent and a resin. The resin includes a first repeating unit that includes a hydroxyl group in its side chain and at least one of a second repeating unit derived from a monomer shown by a following formula (1-1) and a third repeating unit derived from a monomer shown by a following formula (1-2), wherein for example, R1 represents a hydrogen atom, A represents a methylene group, R2 represents a group shown by a following formula (2-1) or a group shown by a following formula (2-2), R3 represents a methylene group, R4 represents a hydrogen atom, and n is 0 or 1, wherein each of R34 represents at least one of a hydrogen atom and a linear or branched alkyl group having 1 to 10 carbon atoms.

Abstract: A resist underlayer film-forming composition includes a polymer including a structural unit shown by a formula (1), and having a polystyrene-reduced weight average molecular weight of from 3000 to 10000, and a solvent. Each of R3 to R8 independently represents a group shown by a formula (2), a hydrogen atom, a hydroxyl group, an alkyl group having 1 to 6 carbon atoms, an alkoxy group having 1 to 6 carbon atoms, an alkoxycarbonyl group having 2 to 10 carbon atoms, an aryl group having 6 to 14 carbon atoms, or a glycidyl ether group having 3 to 6 carbon atoms, wherein at least one of R3 to R8 represents the group shown by the formula (2).

Abstract: A resist pattern-insolubilizing resin composition is used in a resist pattern-forming method. The resist pattern-insolubilizing resin composition includes solvent and a resin. The resin includes a first repeating unit that includes a hydroxyl group in its side chain and at least one of a second repeating unit derived from a monomer shown by a following formula (1-1) and a third repeating unit derived from a monomer shown by a following formula (1-2), wherein for example, R1 represents a hydrogen atom, A represents a methylene group, R2 represents a group shown by a following formula (2-1) or a group shown by a following formula (2-2), R3 represents a methylene group, R4 represents a hydrogen atom, and n is 0 or 1, wherein each of R34 represents at least one of a hydrogen atom and a linear or branched alkyl group having 1 to 10 carbon atoms.

Abstract: A cell separation container includes a collection chamber and a tissue holding chamber which are partitioned by a filter. The cell separation container includes a first air pressure adjuster configured to adjust the inflow and outflow of gas in the collection chamber and a second air pressure adjuster configured to adjust the inflow and outflow of gas in the tissue holding chamber. Thus, the inflow and outflow of the outside air and the gases in the collection chamber and the tissue holding chamber can be adjusted. In the cell separation container, switching between holding a treatment liquid in the tissue holding chamber and ejecting a treatment liquid to the collection chamber can be performed by adjusting the inflow and outflow of the outside air and the gas in the connection chamber.

Abstract: A resist pattern-insolubilizing resin composition is used in a resist pattern-forming method. The resist pattern-insolubilizing resin composition includes solvent and a resin. The resin includes a first repeating unit that includes a hydroxyl group in its side chain and at least one of a second repeating unit derived from a monomer shown by a following formula (1-1) and a third repeating unit derived from a monomer shown by a following formula (1-2), wherein for example, R1 represents a hydrogen atom, A represents a methylene group, R2 represents a group shown by a following formula (2-1) or a group shown by a following formula (2-2), R3 represents a methylene group, R4 represents a hydrogen atom, and n is 0 or 1, wherein each of R34 represents at least one of a hydrogen atom and a linear or branched alkyl group having 1 to 10 carbon atoms.

Abstract: A resist underlayer film-forming composition includes a polymer including a repeating unit shown by a formula (1), and having a polystyrene-reduced weight average molecular weight of 3000 to 10,000, and a solvent. Each of R3 to R8 individually represent a group shown by the following formula (2) or the like. R1 represents a single bond or the like. R2 represents a hydrogen atom or the like.

Abstract: A method for forming a pattern includes providing a first positive-working radiation-sensitive resin composition on a substrate to form a first resist layer. The first positive-working radiation-sensitive resin composition includes a crosslinking agent, a polymer containing an acid-unstable group and not containing a crosslinking group, a radiation-sensitive acid generator, and a solvent. The first resist layer is exposed selectively to radiation, and developed to form a first resist pattern. The first resist pattern is made inactive to radiation, or insolubilized in an alkaline developer or in a second positive-working radiation-sensitive resin composition. The second positive-working radiation-sensitive resin composition is provided on the substrate to form a second resist layer. The second resist layer is exposed selectively to radiation, and developed to form a second resist pattern in the space area of the first resist pattern.

Abstract: A radiation-sensitive resin composition includes (A) an acid labile group-containing resin which becomes alkali-soluble by an action of an acid, (B) a radiation-sensitive acid generator, and (C) a solvent. The resin (A) includes repeating units shown by formulas (1) and (2), wherein R1 and R2 represent a hydrogen atom or a substituted or unsubstituted alkyl group having 1 to 4 carbon atoms, R3 represents a substituted or unsubstituted alkyl group having 1 to 4 carbon atoms, X represents a hydrogen atom, a hydroxyl group, or an acyl group, m represents an integer from 1 to 18, and n represents an integer from 4 to 8.