Patents by Inventor Makoto Wada

Makoto Wada has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 12192425
    Abstract: An image reading device includes a motor 3, a reading section 7 that reads an image on a medium 5, a first transporting roller 9 that transports the medium in a transport direction F by driving force of the motor and that is provided upstream of the reading section in the transport direction, a second transporting roller 11 that transports the medium in the transport direction by driving force of the motor and that is provided downstream of the reading section in the transport direction, and a measuring section 17, using an encoder sensor 15, configured to measure the rotational position of an encoder scale 13, wherein the encoder scale 13 is provided on a rotation shaft 19 of the second transporting roller 11.
    Type: Grant
    Filed: November 6, 2023
    Date of Patent: January 7, 2025
    Assignee: Seiko Epson Corporation
    Inventors: Kazuhiko Arimori, Makoto Wada, Masaya Yamasaki
  • Publication number: 20240302066
    Abstract: An air-conditioning apparatus according to the present disclosure includes: a container in which refrigerant in a liquid state can be present; a heating unit that heats the container; a temperature detection unit that detects a temperature of the container; a storage unit that stores a first time period of application of heat that elapses before a detection result provided by the temperature detection unit reaches a predetermined temperature, the first time period of application of heat, and a time when the first time period of application of heat was acquired; and a leakage determination unit that compares the first time period of application of heat stored in the storage unit with a reference time period stored in the storage unit in advance and determines whether or not there is refrigerant leakage. Thus, refrigerant leakage can be detected regardless of the form of leakage.
    Type: Application
    Filed: February 4, 2022
    Publication date: September 12, 2024
    Inventors: Makoto WADA, Masahiro ITO
  • Patent number: 12077865
    Abstract: A film forming method of forming a film on a substrate by using a film forming apparatus including a processing container, and a stage provided in an interior of the processing container to place the substrate thereon and in which aluminum is contained, includes: forming a film continuously on one substrate or on a plurality of substrates by supplying a gas for film formation to the interior of the processing container while heating the substrate placed on the stage; cleaning the interior of the processing container with a fluorine-containing gas in a state in which the substrate is unloaded from the processing container; and performing a post-process by generating plasma of an oxygen- and hydrogen-containing-gas in the interior of the processing container, wherein the forming the film, the cleaning the interior of the processing container, and the performing the post-process are repeatedly performed.
    Type: Grant
    Filed: August 19, 2022
    Date of Patent: September 3, 2024
    Assignee: Tokyo Electron Limited
    Inventors: Hideki Yuasa, Hiroyuki Ikuta, Yutaka Fujino, Makoto Wada, Hirokazu Ueda
  • Patent number: 12071320
    Abstract: A medium transport apparatus includes a controller that determines how many transport roller pairs disposed on a medium transport route are transporting a medium, based on detection information from detectors disposed in relation to respective transport roller pairs. Then, the controller sets a threshold to a larger value as a larger number of transport roller pairs are transporting the medium and sets the threshold to a lower value as a smaller number of transport roller pairs are transporting the medium.
    Type: Grant
    Filed: January 19, 2022
    Date of Patent: August 27, 2024
    Assignee: Seiko Epson Corporation
    Inventors: Kazuhiko Arimori, Kosuke Nomoto, Makoto Wada, Masaya Yamasaki, Hiromichi Kitsuki
  • Publication number: 20240281137
    Abstract: A display device according to an embodiment of the present technology includes: a first display unit; a determination unit; a virtual display region setting unit; a transmission unit; and a reception unit. The first display unit is capable of displaying an image. The determination unit determines a connection with a different display device that includes a second display unit that is capable of displaying an image. The virtual display region setting unit sets, in a case where it is determined that a connection with the different display device has been made, a second virtual display region with which each position of the second display unit is associated, in association with a first virtual display region with which each position of the first display unit is associated. The transmission unit transmits information regarding a first contact position generated in accordance with a first contact on the first display unit to the different display device determined to be connected.
    Type: Application
    Filed: March 10, 2022
    Publication date: August 22, 2024
    Inventors: MAKOTO WADA, ERI UENO
  • Patent number: 12018375
    Abstract: There is provided a film forming method of forming a carbon-containing film by a microwave plasma from a microwave source, the film forming method including: a dummy step of performing a dummy process by generating plasma of a first carbon-containing gas within a processing container; a placement step of placing a substrate on a stage within the processing container; and a film forming step of forming the carbon-containing film on the substrate using plasma of a second carbon-containing gas.
    Type: Grant
    Filed: November 30, 2020
    Date of Patent: June 25, 2024
    Assignee: TOKYO ELECTRON LIMITED
    Inventors: Ryota Ifuku, Takashi Matsumoto, Masahito Sugiura, Makoto Wada
  • Publication number: 20240174859
    Abstract: A plated molding including a plating layer formed on a part or all of a surface of the molding molded with a polyphenylene sulfide resin composition comprising 30 to 200 parts by weight of a fibrous filler (B) based on 100 parts by weight of a polyphenylene sulfide resin (A), wherein an arithmetic mean roughness of the surface of the plating layer of the plated molding is 1.5 ?m or less.
    Type: Application
    Filed: March 3, 2022
    Publication date: May 30, 2024
    Inventors: Keita Tokuzumi, Kazuya Okubo, Makoto Wada
  • Publication number: 20240155065
    Abstract: An image reading device includes a motor 3, a reading section 7 that reads an image on a medium 5, a first transporting roller 9 that transports the medium in a transport direction F by driving force of the motor and that is provided upstream of the reading section in the transport direction, a second transporting roller 11 that transports the medium in the transport direction by driving force of the motor and that is provided downstream of the reading section in the transport direction, and a measuring section 17, using an encoder sensor 15, configured to measure the rotational position of an encoder scale 13, wherein the encoder scale 13 is provided on a rotation shaft 19 of the second transporting roller 11.
    Type: Application
    Filed: November 6, 2023
    Publication date: May 9, 2024
    Inventors: Kazuhiko ARIMORI, Makoto WADA, Masaya YAMASAKI
  • Publication number: 20240146859
    Abstract: A control unit of an image reading device is configured to execute image correction control after performing a first reading operation of reading a medium while transporting the medium in a first direction, and the image correction control includes a second reading operation of reading the medium while transporting the medium in a second direction opposite to the first direction, and a combination process for combining a first area serving as a part of image data acquired through the first reading operation with a second area serving as a part of image data acquired through the second reading operation to acquire image data of one page.
    Type: Application
    Filed: October 25, 2023
    Publication date: May 2, 2024
    Inventors: Kazuhiko ARIMORI, Makoto WADA, Masaya YAMASAKI
  • Patent number: 11972929
    Abstract: There is provided a processing apparatus for forming a film with a plasma. The processing apparatus comprises: a processing container, having a ceramic sprayed coating on an inner wall on which an antenna that radiates microwaves is arranged, configured to accommodate a substrate; a mounting table configured to mount the substrate in the processing container; and a controller configured to perform a precoating process of coating a surface of the ceramic sprayed coating with a first carbon film with a plasma of a first carbon-containing gas at a first pressure and a film forming process of forming a second carbon film on the substrate with a plasma of a second carbon-containing gas at a second pressure.
    Type: Grant
    Filed: August 7, 2020
    Date of Patent: April 30, 2024
    Assignee: Tokyo Electron Limited
    Inventors: Makoto Wada, Takashi Matsumoto, Masahito Sugiura, Ryota Ifuku, Hirokazu Ueda
  • Publication number: 20240125499
    Abstract: A normalization unit acquires a normalized reference value being a value obtained from normalization of a reference value according to a predetermined normalization rule, the reference value being a status value acquired from an air conditioner during a normal estimation period during which the air conditioner is estimated to operate normally, the status value indicating an operational status of the air conditioner. An acquiring unit acquires from the air conditioner, the status value as a diagnosis value during a diagnosis period during which it is not clear whether or not the air conditioner operates normally and which is after the normal estimation period. The normalization unit normalizes the diagnosis value according to the normalization rule.
    Type: Application
    Filed: March 24, 2021
    Publication date: April 18, 2024
    Inventors: Makoto WADA, Yasutaka OCHIAI, Toshiyuki KURIYAMA, Masanori NAKATA
  • Publication number: 20240120183
    Abstract: A substrate processing method of processing a substrate includes: a carry-in process of carrying the substrate into a processing container; a first process of forming a first carbon film on the substrate with plasma of a first mixture gas containing a carbon-containing gas in a state in which interior of the processing container is maintained at a first pressure; and a second process of changing a pressure in the processing container to a second pressure higher than the first pressure.
    Type: Application
    Filed: January 24, 2022
    Publication date: April 11, 2024
    Inventors: Makoto WADA, Ryota IFUKU, Takashi MATSUMOTO, Hiroki YAMADA
  • Publication number: 20230420294
    Abstract: A substrate processing method of processing a substrate having a base film includes a loading process of loading the substrate into a processing container, a first process of performing a first plasma process in a state where the loaded substrate is held at a first position by raising substrate support pins of a stage arranged in the processing container, and a second process of performing a second plasma process while holding the substrate at a second position by lowering the substrate support pins.
    Type: Application
    Filed: November 2, 2021
    Publication date: December 28, 2023
    Inventors: Makoto WADA, Nobutake KABUKI, Ryota IFUKU, Takashi MATSUMOTO
  • Patent number: 11765591
    Abstract: There is provided a mobile terminal and an IC chip management method that make it possible to protect an IC chip from unauthorized access. An IC chip of a device includes a memory forming a protection-target region that is a storage region for predetermined information targeted for protection and a specific-state region that is a storage region for state information representing a specific state of a user. The device includes the IC chip and a control section that performs control so as to bring the protection-target region to a usage-unpermitted state in the case where, in the IC chip, the state information is changed to information representing a state in which the predetermined information is not used. The present technology can be applied to a near-field wireless communication system.
    Type: Grant
    Filed: May 7, 2019
    Date of Patent: September 19, 2023
    Assignee: FeliCa Networks, Inc.
    Inventor: Makoto Wada
  • Publication number: 20230258357
    Abstract: A control device controls a plurality of air conditioners that are placed in a space so as to adjoin. A designation unit designates an air conditioner being placed in an area in the space where presence of any person is detected, as a first air conditioner, and designates an air conditioner being placed adjacent to the first air conditioner, as a second air conditioner, among the plurality of air conditioners. A control unit causes the first air conditioner to carry out either of cooling operation and heating operation as air conditioning operation, and causes the second air conditioner to carry out air blowing operation with an air volume and a wind direction that are equivalent to an air volume and a wind direction of the air conditioning operation by the first air conditioner.
    Type: Application
    Filed: January 14, 2020
    Publication date: August 17, 2023
    Inventors: Mamoru HAMADA, Shogo TAMAKI, Makoto WADA
  • Publication number: 20230167547
    Abstract: A method of pre-coating a carbon film by plasma in a processing container, includes: pre-coating an inner wall of the processing container with a first carbon film by plasma of a first carbon-containing gas under a first pressure; and processing the first carbon film with the plasma under a second pressure.
    Type: Application
    Filed: April 16, 2021
    Publication date: June 1, 2023
    Inventors: Ryota IFUKU, Takashi MATSUMOTO, Masahito SUGIURA, Makoto WADA
  • Publication number: 20230102051
    Abstract: A film forming method includes: a loading process of loading a substrate into a processing container; a first process of forming an interface layer having an amorphous structure or a microcrystalline structure on the substrate by plasma of a first mixed gas including a carbon-containing gas; and a second process of forming a graphene film on the interface layer by plasma of a second mixed gas including the carbon-containing gas.
    Type: Application
    Filed: September 27, 2022
    Publication date: March 30, 2023
    Inventors: Ryota IFUKU, Makoto WADA, Nobutake KABUKI, Takashi MATSUMOTO, Hiroshi TERADA, Genji NAKAMURA
  • Patent number: 11609031
    Abstract: When a refrigerant leakage sensor detects a leakage of refrigerant from a refrigeration cycle apparatus having an indoor unit and an outdoor unit, a refrigerant recovery operation is started. In the refrigerant recovery operation, refrigerant is recovered in an accumulator and afterward a pump down operation is performed. In recovery of refrigerant in the accumulator, refrigerant in a liquid phase is accumulated in the accumulator as a result of circulation of refrigerant by operating a compressor in the state where a liquid shut-off valve and a gas shut-off valve are opened. After recovery of refrigerant in the accumulator is ended, the refrigerant in a liquid phase is accumulated in an outdoor heat exchanger by the pump down operation for operating the compressor in the state where the liquid shut-off valve is closed.
    Type: Grant
    Filed: March 13, 2017
    Date of Patent: March 21, 2023
    Assignee: Mitsubishi Electric Corporation
    Inventors: Takuya Matsuda, Makoto Wada, Yuji Motomura, Katsuhiro Ishimura
  • Publication number: 20230080956
    Abstract: A substrate processing method includes: a carry-in step of carrying a substrate having a silicon-containing film on a surface of the substrate into a processing container; a first step of forming an adsorption layer by supplying an oxygen-containing gas into the processing container and causing the oxygen-containing gas to be adsorbed on a surface of the silicon-containing film; a second step of forming a silicon oxide layer by supplying an argon-containing gas into the processing container and causing the adsorption layer and the surface of the silicon-containing film to react with each other with plasma of the argon-containing gas; and a third step of forming a graphene film on the silicon oxide layer by supplying a carbon-containing gas into the processing container with plasma of the carbon-containing gas.
    Type: Application
    Filed: September 14, 2022
    Publication date: March 16, 2023
    Inventors: Makoto WADA, Takashi MATSUMOTO, Ryota IFUKU, Hiroki YAMADA, Haruhiko FURUYA
  • Publication number: 20230062105
    Abstract: A film forming method includes repeatedly performing: forming a film on one substrate or consecutively on a plurality of substrates by supplying a film formation gas into a processing container while heating the substrate on a stage; cleaning an interior of the processing container by a fluorine-containing gas by setting a temperature of the stage to a first temperature at which a vapor pressure of an aluminum fluoride becomes lower than a control pressure in the processing container in a state in which the substrate is unloaded from the processing container; and performing a precoating continuously to the cleaning the interior of the processing container such that a precoat film is formed on at least a surface of the stage by setting the temperature of the stage to a second temperature at which the vapor pressure of the aluminum fluoride becomes lower than the control pressure in the processing container.
    Type: Application
    Filed: August 19, 2022
    Publication date: March 2, 2023
    Inventors: Makoto WADA, Yutaka FUJINO, Hiroyuki IKUTA, Hideki YUASA, Hirokazu UEDA