Abstract: The present disclosure relates generally to the field of power supply wiring in a semiconductor device. In one embodiment, a semiconductor device is disclosed that includes, an uppermost metal layer including a power supply enhancing wiring, power supply wiring coupled to the power supply enhancing wiring through a via between the uppermost metal layer and a metal layer underlying the uppermost metal layer, and at least one memory device component disposed in vertical alignment with the via between the uppermost metal layer and the metal layer underlying the uppermost metal layer.

Abstract: Apparatuses for controlling defective bit lines in a semiconductor device are described. An example apparatus includes: a first region including a plurality of bit lines, a plurality of word lines and a plurality of memory cells, each memory cell is coupled to an associated bit line and an associated word line; a second region including a plurality of sense amplifiers, each sense amplifier includes a sense node and a column selection switch coupled to the sense node; a third region including a plurality of bleeder circuits, and disposed between the first and second regions; and a plurality of column selection lines. Each bit line from the first region to the second region is coupled to the sense node of an associated one of the plurality of sense amplifiers, and each column selection line from the column selection switch is coupled to an associated bleeder circuit.

Abstract: Apparatuses for controlling defective bit lines in a semiconductor device are described. An example apparatus includes: a first region including a plurality of bit lines, a plurality of word lines and a plurality of memory cells, each memory cell is coupled to an associated bit line and an associated word line; a second region including a plurality of sense amplifiers, each sense amplifier includes a sense node and a column selection switch coupled to the sense node; a third region including a plurality of bleeder circuits, and disposed between the first and second regions; and a plurality of column selection lines. Each bit line from the first region to the second region is coupled to the sense node of an associated one of the plurality of sense amplifiers, and each column selection line from the column selection switch is coupled to an associated bleeder circuit.

Abstract: A semiconductor device has a first and second transistors formed on an active region defined by an insulating region. The active region is divided into a first and second portions arranged in a first direction, and into a third and fourth portions interposed between the first portion and the second portion, and provided adjacent to each other in a second direction orthogonal to the first direction. The first transistor is provided in the first and third portions, and the second transistor is provided in the second and fourth portions.

Abstract: A device includes a first transistor including a first gate electrode including first and second parallel electrode portions each extending in a first direction, and a first connecting electrode portion extending in a second direction approximately orthogonal to the first direction and connecting one ends of the first and second parallel electrode portions to each other, and first and second diffusion layers separated from each other by a channel region under the first gate electrode, a first output line connected to the first diffusion layer of the first transistor, and a second transistor comprising a second gate electrode extending in the second direction, and the second transistor being configured to use the second diffusion layer of the first transistor as one of two diffusion layers that are separated from each other by a channel region under the second gate electrode.

Abstract: A semiconductor device has a first and second transistors formed on an active region defined by an insulating region. The active region is divided into a first and second portions arranged in a first direction, and into a third and fourth portions interposed between the first portion and the second portion, and provided adjacent to each other in a second direction orthogonal to the first direction. The first transistor is provided in the first and third portions, and the second transistor is provided in the second and fourth portions.

Abstract: A semiconductor device has at least a first capacitor and a second capacitor. First electrodes of the first and second capacitors are connected in common, a first voltage (½ VPERI) is applied to the first electrodes, a second voltage (for example, VPERI) that is different from the first voltage is applied to either one of the second electrodes, and the first voltage is applied to the other second electrode. A capacitor which constitutes a dummy capacitance is provided by applying one of the second electrodes of the first and second capacitors with the same voltage as the voltage applied to their first electrodes, whereby making it possible to increase the area of the compensation capacitance in the semiconductor device without changing a specified capacitance value.

Abstract: A semiconductor device has a first and second transistors formed on an active region defined by an insulating region. The active region is divided into a first and second portions arranged in a first direction, and into a third and fourth portions interposed between the first portion and the second portion, and provided adjacent to each other in a second direction orthogonal to the first direction. The first transistor is provided in the first and third portions, and the second transistor is provided in the second and fourth portions.

Abstract: A device includes a first transistor including a first gate electrode including first and second parallel electrode portions each extending in a first direction, and a first connecting electrode portion extending in a second direction approximately orthogonal to the first direction and connecting one ends of the first and second parallel electrode portions to each other, and first and second diffusion layers separated from each other by a channel region under the first gate electrode, a first output line connected to the first diffusion layer of the first transistor, and a second transistor comprising a second gate electrode extending in the second direction, and the second transistor being configured to use the second diffusion layer of the first transistor as one of two diffusion layers that are separated from each other by a channel region under the second gate electrode.

Abstract: A semiconductor device has a first and second transistors formed on an active region defined by an insulating region. The active region is divided into a first and second portions arranged in a first direction, and into a third and fourth portions interposed between the first portion and the second portion, and provided adjacent to each other in a second direction orthogonal to the first direction. The first transistor is provided in the first and third portions, and the second transistor is provided in the second and fourth portions.

Abstract: A semiconductor device has at least a first capacitor and a second capacitor. First electrodes of the first and second capacitors are connected in common, a first voltage (½ VPERI) is applied to the first electrodes, a second voltage (for example, VPERI) that is different from the first voltage is applied to either one of the second electrodes, and the first voltage is applied to the other second electrode. A capacitor which constitutes a dummy capacitance is provided by applying one of the second electrodes of the first and second capacitors with the same voltage as the voltage applied to their first electrodes, whereby making it possible to increase the area of the compensation capacitance in the semiconductor device without changing a specified capacitance value.