Abstract: A method for preventing corrosion of a spent nuclear fuel canister by using electrolytic corrosion protection, according to the present invention, has an effect of enabling a semi-permanent operation and, particularly, has effects of preventing oxidation and corrosion problems of a canister made of a metal material, in consideration of various environmental variables that may cause corrosion, and ensuring the structural stability of the canister so as to enable a semi-permanent operation.

Abstract: The present invention relates to a constructing method for delaying corrosion of radioactive waste disposal container in concrete disposal vault and, more specifically, to a constructing method for delaying corrosion of radioactive waste disposal container in concrete disposal vault in which backfill, placed to the top, combines pH control capsules, thereby dissolving the pH control capsules in rainwater, and a pH controller, inside, is discharged, thereby preventing decrease of pH of the backfill below 8.5 and delaying corrosion in the disposal containers, upon filling in backfill after placing radioactive waste disposal containers in the concrete vault.

Abstract: The present invention relates to a system for monitoring electrical properties of materials of deep bedrock samples for estimating nuclide movement in disposal site of spent fuel and, more specifically, to a system for monitoring electrical properties of materials of deep bedrock samples for estimating nuclide movement in disposal site of spent fuel which installs a tube wherein ring-shaped potential electrode is formed in multi layers inside a column; adheres the potential electrode to deep bedrock samples by pressing on the external side of the tube while filling the deep bedrock samples inside of the tube; and reproduces real condition of deep bedrock and monitors precisely by measuring electrical resistivity for each location of the deep bedrock samples while injecting nuclide and underground water to the inside the tube.

Abstract: This invention relates to a surface modifier for uniformly modifying the surface of a substrate such as an inorganic thin film, using atomic layer deposition or chemical vapor deposition, and a method for modifying the surface of a substrate using the same.

Abstract: The present invention relates to a disposal container and a storage system for high-level radioactive waste and, more specifically, to a disposal container for high-level radioactive waste using multiple barriers and a barrier system using thereof, the disposal container having the multiple barriers consisting of an inner wall made of carbon steel for excellent corrosion resistance and ease of manufacture, a middle wall made of Inconel, which is bonded to a lateral surface of the inner wall, and an outer wall made of copper, which is bonded to a lateral surface of the middle wall.

Abstract: The present invention relates to a disposal container and a storage system for high-level radioactive waste and, more specifically, to a disposal container for high-level radioactive waste using multiple barriers and a barrier system using thereof, the disposal container having the multiple barriers consisting of an inner wall made of carbon steel for excellent corrosion resistance and ease of manufacture, a middle wall made of Inconel, which is bonded to a lateral surface of the inner wall, and an outer wall made of copper, which is bonded to a lateral surface of the middle wall.

Abstract: A method for preventing corrosion of a spent nuclear fuel canister by using electrolytic corrosion protection, according to the present invention, has an effect of enabling a semi-permanent operation and, particularly, has effects of preventing oxidation and corrosion problems of a canister made of a metal material, in consideration of various environmental variables that may cause corrosion, and ensuring the structural stability of the canister so as to enable a semi-permanent operation.

Abstract: The present invention relates to a nozzle for cleaning a substrate capable of spraying deionized water for cleaning a substrate to the substrate, the nozzle including a first body made of a resin material and provided with a first part of a deionized water passage and a deionized water supply hole to supply the deionized water, a second body made of a resin material and provided with a second part of the deionized water passage and a plurality of spray holes to spray the deionized water to the substrate, a fusible protrusion provided in the first body or the second body along the deionized water passage and configured such that a part thereof is fused during ultrasonic welding, so as to couple the first body and the second body together, and a fusible protrusion accommodating part formed in the first body or the second body to accommodate the fusible protrusion.

Abstract: A method of forming a pattern is disclosed. The method includes preparing a composition that includes a solvent and a polymer including a repeating unit in which at least one isocyanurate unit having a first structure is connected to another isocyanurate unit having a second structure different from the first structure; applying the composition on a substrate to form an underlayer; forming a photoresist layer on the underlayer; etching the photoresist layer to form a photoresist pattern; and patterning the substrate using the photoresist pattern.

Abstract: The present invention relates to a nozzle for cleaning a substrate capable of spraying deionized water for cleaning a substrate to the substrate, the nozzle including a first body made of a resin material and provided with a first part of a deionized water passage and a deionized water supply hole to supply the deionized water, a second body made of a resin material and provided with a second part of the deionized water passage and a plurality of spray holes to spray the deionized water to the substrate, a fusible protrusion provided in the first body or the second body along the deionized water passage and configured such that a part thereof is fused during ultrasonic welding, so as to couple the first body and the second body together, and a fusible protrusion accommodating part formed in the first body or the second body to accommodate the fusible protrusion.

Abstract: A method of forming a pattern is disclosed. The method includes preparing a composition that includes a solvent and a polymer including a repeating unit in which at least one isocyanurate unit having a first structure is connected to another isocyanurate unit having a second structure different from the first structure; applying the composition on a substrate to form an underlayer; forming a photoresist layer on the underlayer; etching the photoresist layer to form a photoresist pattern; and patterning the substrate using the photoresist pattern.

Abstract: Provided are a composition for forming a resist protection film for lithography and a method for forming a pattern of a semiconductor device using the same. The composition comprises a repeat unit having a fluorine-containing functional group on a side chain thereof and contains a polymer having a weight average molecular weight of 2,000-100,000 and a solvent. The solvent containing 10-100 parts by weight of a material has a Hildebrand solubility parameter of 12.5-22.0, based on 100 parts by weight of the total weight thereof.

Abstract: Provided are a composition for forming a resist protection film for lithography and a method for forming a pattern of a semiconductor device using the same. The composition comprises a repeat unit having a fluorine-containing functional group on a side chain thereof and contains a polymer having a weight average molecular weight of 2,000-100,000 and a solvent. The solvent containing 10-100 parts by weight of a material has a Hildebrand solubility parameter of 12.5-22.0, based on 100 parts by weight of the total weight thereof.

Abstract: A method for managing the security of a client device in a mobile device management system (MDMS) comprises receiving a security policy at a client device, applying the security policy on the client device, determining an occurrence of a security policy event, determining a violation based on the occurrence of the security policy event and applying different security controls based on predefined elapsed times on the client device.

Abstract: A polymer compound and a resist protective film composition for an immersion lithography process including the same.

Abstract: A method for managing the security of a client device in a mobile device management system (MDMS) comprises receiving a security policy at a client device, applying the security policy on the client device, determining an occurrence of a security policy event, determining a violation based on the occurrence of the security policy event and applying different security controls based on predefined elapsed times on the client device.

Abstract: A polymer for forming a resist protection film which is used in a liquid immersion lithography process to protect a photoresist layer, a composition for forming a resist protection film, and a method of forming a pattern of a semiconductor device using the composition are disclosed. The polymer for forming a resist protection film includes a repeating unit represented by Formula 1 below. In Formula 1, R1 is a hydrogen atom (H), a fluorine atom (F), a methyl group (—CH3), a C1-C20 fluoroalkyl group, or a C1-C5 hydroxyalkyl group, R2 is a C1-C10 linear or branched alkylene group or alkylidene group, or a C5-C10 cycloalkylene group or cycloalkylidene group, X is wherein n is an integer of 0 to 5 and * denotes the remaining moiety of Formula 1 after excluding X, and m, the stoichiometric coefficient of X, is 1 or 2.

Abstract: A polymer compound and a resist protective film composition for an immersion lithography process including the same.

Abstract: An apparatus and method for detecting a mode change in an electronic device are provided. The apparatus includes a rotary switch including a common port and a plurality of contact points corresponding to a plurality of modes, a comparator for comparing a voltage of the common port with a reference voltage to output a resultant signal, a measurement unit for measuring the voltage of the common port according to the resultant signal of the comparator, and a Micro Control Unit (MCU) for evaluating a changed mode based on the measured voltage.

Abstract: A polymer for forming an organic anti-reflective coating layer, which is soluble in alkali solutions so that an additional etching process of anti-reflective coating layer is not required, and a composition including the same are disclosed. The polymer for forming an organic anti-reflective coating layer has the following formula. Wherein, R1 is a hydrogen atom (H) or a methyl group (—CH3), R2 is a sulfur atom (S) or an oxygen atom (O), R3 is a group containing 1 to 20 carbon atoms and a terminal hydroxyl group, R4 is an alkylene group or a cycloalkylene group, and if necessary, a hetero atom is contained therein, and a, b and c independently represent weight % of repeating units constituting the polymer, and are 1 to 98 weight %, 1 to 98 weight %, and 1 to 98 weight %, respectively.