Patents by Inventor Man-Ho Han

Man-Ho Han has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 8178639
    Abstract: A polymer for forming an organic anti-reflective coating layer, which is soluble in alkali solutions so that an additional etching process of anti-reflective coating layer is not required, and a composition including the same are disclosed. The polymer for forming an organic anti-reflective coating layer has the following formula. Wherein, R1 is a hydrogen atom (H) or a methyl group (—CH3), R2 is a sulfur atom (S) or an oxygen atom (O), R3 is a group containing 1 to 20 carbon atoms and a terminal hydroxyl group, R4 is an alkylene group or a cycloalkylene group, and if necessary, a hetero atom is contained therein, and a, b and c independently represent weight % of repeating units constituting the polymer, and are 1 to 98 weight %, 1 to 98 weight %, and 1 to 98 weight %, respectively.
    Type: Grant
    Filed: June 16, 2009
    Date of Patent: May 15, 2012
    Assignee: Dongjin Semichem Co., Ltd.
    Inventors: Hyun-Jin Kim, Jae-Hyun Kim, Hyo-Jung Roh, Man-Ho Han, Dong-Kyu Ju
  • Publication number: 20120003589
    Abstract: A polymer for forming a resist protection film which is used in a liquid immersion lithography process to protect a photoresist layer, a composition for forming a resist protection film, and a method of forming a pattern of a semiconductor device using the composition are disclosed. The polymer for forming a resist protection film includes a repeating unit represented by Formula 1 below. In Formula 1, R1 is a hydrogen atom (H), a fluorine atom (F), a methyl group (—CH3), a C1-C20 fluoroalkyl group, or a C1-C5 hydroxyalkyl group, R2 is a C1-C10 linear or branched alkylene group or alkylidene group, or a C5-C10 cycloalkylene group or cycloalkylidene group, X is wherein n is an integer of 0 to 5 and * denotes the remaining moiety of Formula 1 after excluding X, and m, the stoichiometric coefficient of X, is 1 or 2.
    Type: Application
    Filed: June 30, 2011
    Publication date: January 5, 2012
    Inventors: Jong Kyoung Park, Man Ho Han, Hyun Jin Kim, Deog Bae Kim
  • Publication number: 20110068772
    Abstract: An apparatus and method for detecting a mode change in an electronic device are provided. The apparatus includes a rotary switch including a common port and a plurality of contact points corresponding to a plurality of modes, a comparator for comparing a voltage of the common port with a reference voltage to output a resultant signal, a measurement unit for measuring the voltage of the common port according to the resultant signal of the comparator, and a Micro Control Unit (MCU) for evaluating a changed mode based on the measured voltage.
    Type: Application
    Filed: September 13, 2010
    Publication date: March 24, 2011
    Applicant: SAMSUNG ELECTRONICS CO. LTD.
    Inventors: Sung-Su KIM, Man-Ho HAN, Tae-Yong KIM
  • Publication number: 20100266967
    Abstract: A polymer for forming an organic anti-reflective coating layer, which is soluble in alkali solutions so that an additional etching process of anti-reflective coating layer is not required, and a composition including the same are disclosed. The polymer for forming an organic anti-reflective coating layer has the following formula. Wherein, R1 is a hydrogen atom (H) or a methyl group (—CH3), R2 is a sulfur atom (S) or an oxygen atom (O), R3 is a group containing 1 to 20 carbon atoms and a terminal hydroxyl group, R4 is an alkylene group or a cycloalkylene group, and if necessary, a hetero atom is contained therein, and a, b and c independently represent weight % of repeating units constituting the polymer, and are 1 to 98 weight %, 1 to 98 weight %, and 1 to 98 weight %, respectively.
    Type: Application
    Filed: June 16, 2009
    Publication date: October 21, 2010
    Applicant: DONGJIN SEMICHEM CO., LTD
    Inventors: Hyun-Jin Kim, Jae-Hyun Kim, Hyo-Jung Roh, Man-Ho Han, Dong-Kyu Ju