Patents by Inventor Manabu Yano

Manabu Yano has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20210027976
    Abstract: The present disclosure aims at proposing a multi-beam irradiation device capable of correcting off-axis aberrations. In order to achieve the above object, a beam irradiation device is proposed, which includes a beam source which emits a plurality of beams; an objective lens (17) which focuses a beam on a sample; a first lens (16) which is arranged such that a lens main surface is positioned at an object point of the objective lens and deflects a plurality of incident beams toward an intersection point of a lens main surface of the objective lens and an optical axis; a second lens (15) which is arranged closer to a beam source side than the first lens and focuses the plurality of beams on a lens main surface of the first lens; and a third lens (14) which is arranged closer to the beam source side than the second lens and deflects the plurality of beams toward an intersection point of a lens main surface of the second lens and the optical axis.
    Type: Application
    Filed: October 1, 2020
    Publication date: January 28, 2021
    Inventors: Akira IKEGAMI, Yuta KAWAMOTO, Naomasa SUZUKI, Manabu YANO, Yasushi EBIZUKA, Naoma BAN
  • Patent number: 10854431
    Abstract: A plasma processing method includes executing an etching process that includes supplying an etching gas into a process container in which a target substrate is supported on a second electrode serving as a lower electrode, and applying an RF power for plasma generation and an RF power for ion attraction to turn the etching gas into plasma and to subject the target substrate to etching. The etching process includes applying a negative DC voltage to a first electrode serving as an upper electrode during the etching to increase an absolute value of self-bias on the first electrode. The etching process includes releasing DC electron current generated by the negative DC voltage to ground through plasma and a conductive member disposed as a ring around the first electrode, by using a first state where the conductive member is connected to a ground potential portion.
    Type: Grant
    Filed: December 10, 2019
    Date of Patent: December 1, 2020
    Assignee: TOKYO ELECTRON LIMITED
    Inventors: Akira Koshiishi, Masaru Sugimoto, Kunihiko Hinata, Noriyuki Kobayashi, Chishio Koshimizu, Ryuji Ohtani, Kazuo Kibi, Masashi Saito, Naoki Matsumoto, Yoshinobu Ohya, Manabu Iwata, Daisuke Yano, Yohei Yamazawa, Hidetoshi Hanaoka, Toshihiro Hayami, Hiroki Yamazaki, Manabu Sato
  • Patent number: 10832886
    Abstract: The present disclosure aims at proposing a multi-beam irradiation device capable of correcting off-axis aberrations. In order to achieve the above object, a beam irradiation device is proposed, which includes a beam source which emits a plurality of beams; an objective lens (17) which focuses a beam on a sample; a first lens (16) which is arranged such that a lens main surface is positioned at an object point of the objective lens and deflects a plurality of incident beams toward an intersection point of a lens main surface of the objective lens and an optical axis; a second lens (15) which is arranged closer to a beam source side than the first lens and focuses the plurality of beams on a lens main surface of the first lens; and a third lens (14) which is arranged closer to the beam source side than the second lens and deflects the plurality of beams toward an intersection point of a lens main surface of the second lens and the optical axis.
    Type: Grant
    Filed: March 4, 2019
    Date of Patent: November 10, 2020
    Assignee: Hitachi High-Tech Corporation
    Inventors: Akira Ikegami, Yuta Kawamoto, Naomasa Suzuki, Manabu Yano, Yasushi Ebizuka, Naoma Ban
  • Publication number: 20200295627
    Abstract: A rotating electric machine includes: a cylindrical stator core which includes a plurality of slots; a coil which includes a first coil end inserted into the slot and protruding toward one side of the stator core in an axial direction and a second coil end protruding toward the other side in the axial direction; a rotor which is disposed coaxially with the stator core; a shaft which is disposed coaxially with the rotor; and an end wall which is provided at an end side of the shaft and faces the first coil end in the axial direction. The end wall includes a refrigerant outlet which opens in the axial direction so that a refrigerant supplied from the outside is ejected toward the first coil end.
    Type: Application
    Filed: March 11, 2020
    Publication date: September 17, 2020
    Inventors: Manabu Yazaki, Atsushi Nishida, Teruhito Niimi, Takuji Yano, Akira Kito, Sachio Kawada, Yasuyuki Saito, Hiroshi Hamano, Yuji Kobayashi
  • Publication number: 20200288048
    Abstract: An image capture apparatus to which a module having a predetermined function can be attached, the apparatus comprises a connecting unit configured to attach the module, a heat transfer unit configured to exchange heat with the module, a communication unit configured to communicate with the module, and a control unit configured to control a heat dissipation state of a system including the image capture apparatus and the module on the basis of information pertaining to heat dissipation performance of the module and position information pertaining to an attachment position of the module, the information having been acquired by the communication unit.
    Type: Application
    Filed: February 19, 2020
    Publication date: September 10, 2020
    Inventors: Hironobu Makara, Tadanori Saito, Kazuaki Maruhashi, Takamichi Kosugi, Takutomi Ogawa, Tsubasa Nakatani, Naohiro Arai, Manabu Abe, Takeshi Hamada, Manami Gunji, Yuya Nagata, Yuta Nakamura, Hiroshi Yano
  • Publication number: 20200168094
    Abstract: A control device (100) includes an event detection unit (110) and a control-rule change unit (120). The event detection unit (110) determines whether or not an event to be a trigger of changing a control rule at the time of autonomous driving of a vehicle is detected while the vehicle is performing the autonomous driving using a first control rule based on machine learning. The control-rule change unit (120) changes the control rule at the time of the autonomous driving of the vehicle to a second control rule according to the event to be the trigger in a case where the event to be the trigger is detected by the event detection unit (110).
    Type: Application
    Filed: July 11, 2018
    Publication date: May 28, 2020
    Inventors: Manabu SHIMODAIRA, Kenichiro YANO, Jun OSUGI
  • Publication number: 20200111645
    Abstract: A plasma processing method includes executing an etching process that includes supplying an etching gas into a process container in which a target substrate is supported on a second electrode serving as a lower electrode, and applying an RF power for plasma generation and an RF power for ion attraction to turn the etching gas into plasma and to subject the target substrate to etching. The etching process includes applying a negative DC voltage to a first electrode serving as an upper electrode during the etching to increase an absolute value of self-bias on the first electrode. The etching process includes releasing DC electron current generated by the negative DC voltage to ground through plasma and a conductive member disposed as a ring around the first electrode, by using a first state where the conductive member is connected to a ground potential portion.
    Type: Application
    Filed: December 10, 2019
    Publication date: April 9, 2020
    Applicant: TOKYO ELECTRON LIMITED
    Inventors: Akira KOSHIISHI, Masaru SUGIMOTO, Kunihiko HINATA, Noriyuki KOBAYASHI, Chishio KOSHIMIZU, Ryuji OHTANI, Kazuo KIBI, Masashi SAITO, Naoki MATSUMOTO, Yoshinobu OHYA, Manabu IWATA, Daisuke YANO, Yohei YAMAZAWA, Hidetoshi HANAOKA, Toshihiro HAYAMI, Hiroki YAMAZAKI, Manabu SATO
  • Patent number: 10602080
    Abstract: A camera device generates a captured image, extracts flow line information relating to a staying position or a passing position of a moving object, and transmits the generated captured image and the extracted flow line information of the moving object to a server device for each predetermined transmission period. The server device generates a flow line analysis image in which the flow line information of the moving object is superimposed on the captured image and displays the generated flow line analysis image on a displayer. Furthermore, the server device switches a first flow line analysis image in a first predetermined period to a second flow line analysis image in a second predetermined period according to an operation of changing the period, and displays the resulting flow line analysis image.
    Type: Grant
    Filed: February 10, 2016
    Date of Patent: March 24, 2020
    Assignee: Panasonic I-PRO Sensing Solutions Co., Ltd.
    Inventors: Shinpei Hagisu, Tetsuo Tayama, Hidetoshi Kinoshita, Koji Yano, Manabu Nakamura, Takae Oguchi, Hideaki Takahashi
  • Patent number: 10567677
    Abstract: A camera device transmits a captured image and flow line information of moving objects to a server device for each predetermined transmission period. The server device generates a flow line analysis image in which the flow line information of the moving objects is superimposed on the captured image and displays the generated flow line analysis image on a display. The server device displays a first flow line analysis image generated based on a captured image and flow line information in a first period which is arbitrary designated, and receives an instruction by a user operation to shift the first period by an amount. The server device sets a second period by shifting the first period by the amount without changing a length in period, and displays a second flow line analysis image generated based on a captured image and flow line information in the second period.
    Type: Grant
    Filed: April 14, 2016
    Date of Patent: February 18, 2020
    Assignee: Panasonic i-PRO Sensing Solutions Co., Ltd.
    Inventors: Shinpei Hagisu, Tetsuo Tayama, Hidetoshi Kinoshita, Koji Yano, Manabu Nakamura, Takae Oguchi, Hideaki Takahashi
  • Patent number: 10546727
    Abstract: A plasma etching apparatus includes an upper electrode and a lower electrode, between which plasma of a process gas is generated to perform plasma etching on a wafer W. The apparatus further comprises a cooling ring disposed around the wafer, a correction ring disposed around the cooling ring, and a variable DC power supply directly connected to the correction ring, the DC voltage being preset to provide the correction ring with a negative bias, relative to ground potential, for attracting ions in the plasma and to increase temperature of the correction ring to compensate for a decrease in temperature of a space near the edge of the target substrate due to the cooling ring.
    Type: Grant
    Filed: September 7, 2016
    Date of Patent: January 28, 2020
    Assignee: TOKYO ELECTRON LIMITED
    Inventors: Akira Koshiishi, Masaru Sugimoto, Kunihiko Hinata, Noriyuki Kobayashi, Chishio Koshimizu, Ryuji Ohtani, Kazuo Kibi, Masashi Saito, Naoki Matsumoto, Yoshinobu Ohya, Manabu Iwata, Daisuke Yano, Yohei Yamazawa, Hidetoshi Hanaoka, Toshihiro Hayami, Hiroki Yamazaki, Manabu Sato
  • Patent number: 10529539
    Abstract: An apparatus includes an upper electrode and a lower electrode for supporting a wafer disposed opposite each other within a process chamber. A first RF power supply configured to apply a first RF power having a relatively higher frequency, and a second RF power supply configured to apply a second RF power having a relatively lower frequency is connected to the lower electrode. A variable DC power supply is connected to the upper electrode. A process gas is supplied into the process chamber to generate plasma of the process gas so as to perform plasma etching.
    Type: Grant
    Filed: October 11, 2016
    Date of Patent: January 7, 2020
    Assignee: TOKYO ELECTRON LIMITED
    Inventors: Akira Koshiishi, Masaru Sugimoto, Kunihiko Hinata, Noriyuki Kobayashi, Chishio Koshimizu, Ryuji Ohtani, Kazuo Kibi, Masashi Saito, Naoki Matsumoto, Manabu Iwata, Daisuke Yano, Yohei Yamazawa, Hidetoshi Hanaoka, Toshihiro Hayami, Hiroki Yamazaki, Manabu Sato
  • Publication number: 20190287754
    Abstract: The present disclosure aims at proposing a multi-beam irradiation device capable of correcting off-axis aberrations. In order to achieve the above object, a beam irradiation device is proposed, which includes a beam source which emits a plurality of beams; an objective lens (17) which focuses a beam on a sample; a first lens (16) which is arranged such that a lens main surface is positioned at an object point of the objective lens and deflects a plurality of incident beams toward an intersection point of a lens main surface of the objective lens and an optical axis; a second lens (15) which is arranged closer to a beam source side than the first lens and focuses the plurality of beams on a lens main surface of the first lens; and a third lens (14) which is arranged closer to the beam source side than the second lens and deflects the plurality of beams toward an intersection point of a lens main surface of the second lens and the optical axis.
    Type: Application
    Filed: March 4, 2019
    Publication date: September 19, 2019
    Inventors: Akira IKEGAMI, Yuta KAWAMOTO, Naomasa SUZUKI, Manabu YANO, Yasushi EBIZUKA, Naoma BAN
  • Patent number: 10304654
    Abstract: A purpose of the present invention is to provide a charged particle beam device that suppresses an off-axis amount when a field of view moves, said move causing an aberration, and allows large field of view moves to be carried out. In order to achieve the above-mentioned purpose, this charged particle beam device is provided with an objective lens and deflectors for field of view moves, said deflectors deflecting a charged particle beam, and is further provided with an accelerating tube positioned between the objective lens and the deflectors for field of view moves, a power source that applies a voltage to the accelerating tube, and a control device that controls the voltage to be applied to the power source in response to the deflection conditions of the deflectors for field of view moves.
    Type: Grant
    Filed: July 27, 2016
    Date of Patent: May 28, 2019
    Assignee: Hitachi High-Technologies Corporation
    Inventors: Akira Ikegami, Yuta Kawamoto, Hideto Dohi, Manabu Yano, Yutaka Tandai, Hideyuki Kazumi
  • Patent number: 10293684
    Abstract: A vehicle includes: a vehicle body; a gas tank having a tank main body that includes a cylindrical barrel part and a cap that is provided at one end of the tank main body in a longitudinal direction; a bracket fixing the cap to the vehicle body; and a band surrounding an outer circumferential surface of the barrel part and fixing the barrel part to the vehicle body, wherein the gas tank is arranged such that the longitudinal direction extends along a front-rear direction of the vehicle, the bracket includes an engaging part that restrict movement of the gas tank in the longitudinal direction by engaging with an engaged part provided in the cap, and movement of the gas tank in the longitudinal direction is restricted by the engaging part only at the one end, and not at the other end, of the gas tank in the longitudinal direction.
    Type: Grant
    Filed: March 21, 2017
    Date of Patent: May 21, 2019
    Assignee: Toyota Jidosha Kabushiki Kaisha
    Inventors: Shigeru Sasaki, Manabu Fujii, Shunichi Shibasaki, Norihide Hakamata, Shinsuke Yano
  • Publication number: 20180233320
    Abstract: A purpose of the present invention is to provide a charged particle beam device that suppresses an off-axis amount when a field of view moves, said move causing an aberration, and allows large field of view moves to be carried out. In order to achieve the above-mentioned purpose, this charged particle beam device is provided with an objective lens and deflectors for field of view moves, said deflectors deflecting a charged particle beam, and is further provided with an accelerating tube positioned between the objective lens and the deflectors for field of view moves, a power source that applies a voltage to the accelerating tube, and a control device that controls the voltage to be applied to the power source in response to the deflection conditions of the deflectors for field of view moves.
    Type: Application
    Filed: July 27, 2016
    Publication date: August 16, 2018
    Inventors: Akira IKEGAMI, Yuta KAWAMOTO, Hideto DOHI, Manabu YANO, Yutaka TANDAI, Hideyuki KAZUMI
  • Patent number: 9354049
    Abstract: A model based measurement method is capable of estimating a cross-sectional shape by matching various pre-created cross-sectional shapes with a library of SEM signal waveforms. The present invention provides a function for determining whether or not it is appropriate to create a model of a cross-sectional shape or a function for verifying the accuracy of estimation results to a conventional model based measurement method, wherein a solution space (expected solution space) is obtained by matching library waveforms and is displayed before measuring the real pattern by means of model based measurement. Moreover, after the real pattern is measured by means of model based measurement, the solution space (real solution space) is obtained by matching the real waveforms with the library waveforms and is displayed.
    Type: Grant
    Filed: October 21, 2011
    Date of Patent: May 31, 2016
    Assignee: HUTACHI HIGH-TECHNOLOGIES CORPORATION
    Inventors: Chie Shishido, Maki Tanaka, Atsushi Miyamoto, Akira Hamamatsu, Manabu Yano
  • Patent number: 8859962
    Abstract: A charged-particle-beam device is characterized in having a control value for an aligner coil (29) being determined by: a coil current and an electrode applied-voltage at a control value for objectives (30, 31), which is an electromagnetic-field superposition lens; a control value for image-shift coils (27, 28); and the acceleration voltage of the charged-particle-beam. By doing this, it has become possible to avoid image disturbances that occur on images to be displayed at boundaries between charged areas and non-charged areas, and provide a charged-particle-beam device that obtains clear images without any unevenness in brightness.
    Type: Grant
    Filed: March 17, 2014
    Date of Patent: October 14, 2014
    Assignee: Hitachi High-Technologies Corporation
    Inventors: Noritsugu Takahashi, Muneyuki Fukuda, Manabu Yano, Hirohiko Kitsuki, Kazunari Asao, Tomoyasu Shojo
  • Publication number: 20140197313
    Abstract: A charged-particle-beam device is characterized in having a control value for an aligner coil (29) being determined by: a coil current and an electrode applied-voltage at a control value for objectives (30, 31), which is an electromagnetic-field superposition lens; a control value for image-shift coils (27, 28); and the acceleration voltage of the charged-particle-beam. By doing this, it has become possible to avoid image disturbances that occur on images to be displayed at boundaries between charged areas and non-charged areas, and provide a charged-particle-beam device that obtains clear images without any unevenness in brightness.
    Type: Application
    Filed: March 17, 2014
    Publication date: July 17, 2014
    Applicant: HITACHI HIGH-TECHNOLOGIES CORPORATION
    Inventors: Noritsugu TAKAHASHI, Muneyuki FUKUDA, Manabu YANO, Hirohiko KITSUKI, Kazunari ASAO, Tomoyasu SHOJO
  • Publication number: 20130262027
    Abstract: A model based measurement method is capable of estimating a cross-sectional shape by matching various pre-created cross-sectional shapes with a library of SEM signal waveforms. The present invention provides a function for determining whether or not it is appropriate to create a model of a cross-sectional shape or a function for verifying the accuracy of estimation results to a conventional model based measurement method, wherein a solution space (expected solution space) is obtained by matching library waveforms and is displayed before measuring the real pattern by means of model based measurement. Moreover, after the real pattern is measured by means of model based measurement, the solution space (real solution space) is obtained by matching the real waveforms with the library waveforms and is displayed.
    Type: Application
    Filed: October 21, 2011
    Publication date: October 3, 2013
    Inventors: Chie Shishido, Maki Tanaka, Atsushi Miyamoto, Akira Hamamatsu, Manabu Yano
  • Patent number: 8487253
    Abstract: An object of the present invention is to provide a scanning electron microscope suitable for monitoring apparatus conditions of the microscope itself, irrespective of the presence of charge-up, specimen inclination, and the like. In order to achieve the object, proposed is a scanning electron microscope including a function to monitor the apparatus conditions on the basis of information obtained with an electron beam reflected before reaching a specimen. Specifically, for example, while applying a negative voltage to the specimen to reflect the electron beam before the electron beam reaches the specimen, and simultaneously supplying a predetermined signal to a deflector for alignment, the scanning electron microscope monitors changes of the detected positions of the reflected electrons of the electron beam. If the above-mentioned predetermined signal is under the condition where an alignment is properly performed, the changes of the detected positions of the electrons reflect deviation of an axis.
    Type: Grant
    Filed: November 18, 2011
    Date of Patent: July 16, 2013
    Assignee: Hitachi High-Technologies Corporation
    Inventors: Minoru Yamazaki, Akira Ikegami, Hideyuki Kazumi, Manabu Yano, Kazunari Asao, Takeshi Mizuno, Yuki Ojima