Patents by Inventor Manabu Yano
Manabu Yano has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Publication number: 20220298750Abstract: A hydraulic excavator includes a starter motor for starting an engine with electric power supplied from a lead-acid battery, a second electric system connected in parallel with a first electric system to connect the lead-acid battery and a 24V electrical equipment, a 48V battery for supplying electric power to the second electric system, a relay for disconnecting connection between the first electric system and the second electric system, and a vehicle body controller connected to the second electric system to control the starter motor and the relay. The vehicle body controller estimates a remaining charge amount of the lead-acid battery and disables driving of the starter motor until an estimation result is higher than or equal to a threshold, and when the estimation result is higher than or equal to the threshold, disconnects the connection between the first electric system and the second electric system by using the relay.Type: ApplicationFiled: March 30, 2020Publication date: September 22, 2022Inventors: Akira WATANABE, Manabu YANO, Yasunori OOTA, Yusuke IMAI
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Publication number: 20220282456Abstract: A work machine includes: a controller; a first electrical circuit provided with a first power supply that supplies power to the controller; an electric drive source necessary for operating the work machine; and a second electrical circuit provided with a second power supply that supplies power to the electric drive source. The work machine further includes: a capacitor provided to the second electrical circuit; a first precharge device that performs precharge of the capacitor by using power of the first power supply; and a second precharge device that performs precharge of the capacitor by using power of the second power supply. The controller performs precharge by using one of the precharge devices when it is determined that precharge by using the other one of the precharge devices is impossible.Type: ApplicationFiled: September 2, 2020Publication date: September 8, 2022Inventors: Akira WATANABE, Yasunori OTA, Yusuke IMAI, Manabu YANO
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Patent number: 11239042Abstract: The present disclosure aims at proposing a multi-beam irradiation device capable of correcting off-axis aberrations. In order to achieve the above object, a beam irradiation device is proposed, which includes a beam source which emits a plurality of beams; an objective lens (17) which focuses a beam on a sample; a first lens (16) which is arranged such that a lens main surface is positioned at an object point of the objective lens and deflects a plurality of incident beams toward an intersection point of a lens main surface of the objective lens and an optical axis; a second lens (15) which is arranged closer to a beam source side than the first lens and focuses the plurality of beams on a lens main surface of the first lens; and a third lens (14) which is arranged closer to the beam source side than the second lens and deflects the plurality of beams toward an intersection point of a lens main surface of the second lens and the optical axis.Type: GrantFiled: October 1, 2020Date of Patent: February 1, 2022Assignee: Hitachi High-Tech CorporationInventors: Akira Ikegami, Yuta Kawamoto, Naomasa Suzuki, Manabu Yano, Yasushi Ebizuka, Naoma Ban
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Publication number: 20210027976Abstract: The present disclosure aims at proposing a multi-beam irradiation device capable of correcting off-axis aberrations. In order to achieve the above object, a beam irradiation device is proposed, which includes a beam source which emits a plurality of beams; an objective lens (17) which focuses a beam on a sample; a first lens (16) which is arranged such that a lens main surface is positioned at an object point of the objective lens and deflects a plurality of incident beams toward an intersection point of a lens main surface of the objective lens and an optical axis; a second lens (15) which is arranged closer to a beam source side than the first lens and focuses the plurality of beams on a lens main surface of the first lens; and a third lens (14) which is arranged closer to the beam source side than the second lens and deflects the plurality of beams toward an intersection point of a lens main surface of the second lens and the optical axis.Type: ApplicationFiled: October 1, 2020Publication date: January 28, 2021Inventors: Akira IKEGAMI, Yuta KAWAMOTO, Naomasa SUZUKI, Manabu YANO, Yasushi EBIZUKA, Naoma BAN
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Patent number: 10832886Abstract: The present disclosure aims at proposing a multi-beam irradiation device capable of correcting off-axis aberrations. In order to achieve the above object, a beam irradiation device is proposed, which includes a beam source which emits a plurality of beams; an objective lens (17) which focuses a beam on a sample; a first lens (16) which is arranged such that a lens main surface is positioned at an object point of the objective lens and deflects a plurality of incident beams toward an intersection point of a lens main surface of the objective lens and an optical axis; a second lens (15) which is arranged closer to a beam source side than the first lens and focuses the plurality of beams on a lens main surface of the first lens; and a third lens (14) which is arranged closer to the beam source side than the second lens and deflects the plurality of beams toward an intersection point of a lens main surface of the second lens and the optical axis.Type: GrantFiled: March 4, 2019Date of Patent: November 10, 2020Assignee: Hitachi High-Tech CorporationInventors: Akira Ikegami, Yuta Kawamoto, Naomasa Suzuki, Manabu Yano, Yasushi Ebizuka, Naoma Ban
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Publication number: 20190287754Abstract: The present disclosure aims at proposing a multi-beam irradiation device capable of correcting off-axis aberrations. In order to achieve the above object, a beam irradiation device is proposed, which includes a beam source which emits a plurality of beams; an objective lens (17) which focuses a beam on a sample; a first lens (16) which is arranged such that a lens main surface is positioned at an object point of the objective lens and deflects a plurality of incident beams toward an intersection point of a lens main surface of the objective lens and an optical axis; a second lens (15) which is arranged closer to a beam source side than the first lens and focuses the plurality of beams on a lens main surface of the first lens; and a third lens (14) which is arranged closer to the beam source side than the second lens and deflects the plurality of beams toward an intersection point of a lens main surface of the second lens and the optical axis.Type: ApplicationFiled: March 4, 2019Publication date: September 19, 2019Inventors: Akira IKEGAMI, Yuta KAWAMOTO, Naomasa SUZUKI, Manabu YANO, Yasushi EBIZUKA, Naoma BAN
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Patent number: 10304654Abstract: A purpose of the present invention is to provide a charged particle beam device that suppresses an off-axis amount when a field of view moves, said move causing an aberration, and allows large field of view moves to be carried out. In order to achieve the above-mentioned purpose, this charged particle beam device is provided with an objective lens and deflectors for field of view moves, said deflectors deflecting a charged particle beam, and is further provided with an accelerating tube positioned between the objective lens and the deflectors for field of view moves, a power source that applies a voltage to the accelerating tube, and a control device that controls the voltage to be applied to the power source in response to the deflection conditions of the deflectors for field of view moves.Type: GrantFiled: July 27, 2016Date of Patent: May 28, 2019Assignee: Hitachi High-Technologies CorporationInventors: Akira Ikegami, Yuta Kawamoto, Hideto Dohi, Manabu Yano, Yutaka Tandai, Hideyuki Kazumi
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Publication number: 20180233320Abstract: A purpose of the present invention is to provide a charged particle beam device that suppresses an off-axis amount when a field of view moves, said move causing an aberration, and allows large field of view moves to be carried out. In order to achieve the above-mentioned purpose, this charged particle beam device is provided with an objective lens and deflectors for field of view moves, said deflectors deflecting a charged particle beam, and is further provided with an accelerating tube positioned between the objective lens and the deflectors for field of view moves, a power source that applies a voltage to the accelerating tube, and a control device that controls the voltage to be applied to the power source in response to the deflection conditions of the deflectors for field of view moves.Type: ApplicationFiled: July 27, 2016Publication date: August 16, 2018Inventors: Akira IKEGAMI, Yuta KAWAMOTO, Hideto DOHI, Manabu YANO, Yutaka TANDAI, Hideyuki KAZUMI
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Patent number: 9354049Abstract: A model based measurement method is capable of estimating a cross-sectional shape by matching various pre-created cross-sectional shapes with a library of SEM signal waveforms. The present invention provides a function for determining whether or not it is appropriate to create a model of a cross-sectional shape or a function for verifying the accuracy of estimation results to a conventional model based measurement method, wherein a solution space (expected solution space) is obtained by matching library waveforms and is displayed before measuring the real pattern by means of model based measurement. Moreover, after the real pattern is measured by means of model based measurement, the solution space (real solution space) is obtained by matching the real waveforms with the library waveforms and is displayed.Type: GrantFiled: October 21, 2011Date of Patent: May 31, 2016Assignee: HUTACHI HIGH-TECHNOLOGIES CORPORATIONInventors: Chie Shishido, Maki Tanaka, Atsushi Miyamoto, Akira Hamamatsu, Manabu Yano
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Patent number: 8859962Abstract: A charged-particle-beam device is characterized in having a control value for an aligner coil (29) being determined by: a coil current and an electrode applied-voltage at a control value for objectives (30, 31), which is an electromagnetic-field superposition lens; a control value for image-shift coils (27, 28); and the acceleration voltage of the charged-particle-beam. By doing this, it has become possible to avoid image disturbances that occur on images to be displayed at boundaries between charged areas and non-charged areas, and provide a charged-particle-beam device that obtains clear images without any unevenness in brightness.Type: GrantFiled: March 17, 2014Date of Patent: October 14, 2014Assignee: Hitachi High-Technologies CorporationInventors: Noritsugu Takahashi, Muneyuki Fukuda, Manabu Yano, Hirohiko Kitsuki, Kazunari Asao, Tomoyasu Shojo
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Publication number: 20140197313Abstract: A charged-particle-beam device is characterized in having a control value for an aligner coil (29) being determined by: a coil current and an electrode applied-voltage at a control value for objectives (30, 31), which is an electromagnetic-field superposition lens; a control value for image-shift coils (27, 28); and the acceleration voltage of the charged-particle-beam. By doing this, it has become possible to avoid image disturbances that occur on images to be displayed at boundaries between charged areas and non-charged areas, and provide a charged-particle-beam device that obtains clear images without any unevenness in brightness.Type: ApplicationFiled: March 17, 2014Publication date: July 17, 2014Applicant: HITACHI HIGH-TECHNOLOGIES CORPORATIONInventors: Noritsugu TAKAHASHI, Muneyuki FUKUDA, Manabu YANO, Hirohiko KITSUKI, Kazunari ASAO, Tomoyasu SHOJO
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Publication number: 20130262027Abstract: A model based measurement method is capable of estimating a cross-sectional shape by matching various pre-created cross-sectional shapes with a library of SEM signal waveforms. The present invention provides a function for determining whether or not it is appropriate to create a model of a cross-sectional shape or a function for verifying the accuracy of estimation results to a conventional model based measurement method, wherein a solution space (expected solution space) is obtained by matching library waveforms and is displayed before measuring the real pattern by means of model based measurement. Moreover, after the real pattern is measured by means of model based measurement, the solution space (real solution space) is obtained by matching the real waveforms with the library waveforms and is displayed.Type: ApplicationFiled: October 21, 2011Publication date: October 3, 2013Inventors: Chie Shishido, Maki Tanaka, Atsushi Miyamoto, Akira Hamamatsu, Manabu Yano
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Patent number: 8487253Abstract: An object of the present invention is to provide a scanning electron microscope suitable for monitoring apparatus conditions of the microscope itself, irrespective of the presence of charge-up, specimen inclination, and the like. In order to achieve the object, proposed is a scanning electron microscope including a function to monitor the apparatus conditions on the basis of information obtained with an electron beam reflected before reaching a specimen. Specifically, for example, while applying a negative voltage to the specimen to reflect the electron beam before the electron beam reaches the specimen, and simultaneously supplying a predetermined signal to a deflector for alignment, the scanning electron microscope monitors changes of the detected positions of the reflected electrons of the electron beam. If the above-mentioned predetermined signal is under the condition where an alignment is properly performed, the changes of the detected positions of the electrons reflect deviation of an axis.Type: GrantFiled: November 18, 2011Date of Patent: July 16, 2013Assignee: Hitachi High-Technologies CorporationInventors: Minoru Yamazaki, Akira Ikegami, Hideyuki Kazumi, Manabu Yano, Kazunari Asao, Takeshi Mizuno, Yuki Ojima
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Patent number: 8334520Abstract: An exemplary a charged particle beam apparatus converts an inspection position on a test sample (wafer coordinate system) to a setting position of an inspection mechanism (stage coordinate system (polar coordinate system)), a rotating arm and a rotating stage being rotated to be moved for the inspection position on the test sample. In this case, inspection devices are arranged over a locus that is drawn by the center of the rotating stage according to the rotation of the rotating arm. A function for calculating errors (e.g., center shift of the rotating stage) and compensating for the errors is provided, by which the precision of inspection is improved in a charged particle beam apparatus equipped with a biaxial rotating stage mechanism.Type: GrantFiled: October 22, 2009Date of Patent: December 18, 2012Assignee: Hitachi High-Technologies CorporationInventors: Tadashi Otaka, Hiroyuki Ito, Ryoichi Ishii, Manabu Yano, Hajime Kawano
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Publication number: 20120119087Abstract: A charged-particle-beam device is characterized in having a control value for an aligner coil (29) being determined by: a coil current and an electrode applied-voltage at a control value for objectives (30, 31), which is an electromagnetic-field superposition lens; a control value for image-shift coils (27, 28); and the acceleration voltage of the charged-particle-beam. By doing this, it has become possible to avoid image disturbances that occur on images to be displayed at boundaries between charged areas and non-charged areas, and provide a charged-particle-beam device that obtains clear images without any unevenness in brightness.Type: ApplicationFiled: July 13, 2010Publication date: May 17, 2012Applicant: HITACHI HIGH-TECHNOLOGIES CORPORATIONInventors: Noritsugu Takahashi, Muneyuki Fukuda, Manabu Yano, Hirohiko Kitsuki, Kazunari Asao, Tomoyasu Shojo
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Publication number: 20120061566Abstract: An object of the present invention is to provide a scanning electron microscope suitable for monitoring apparatus conditions of the microscope itself, irrespective of the presence of charge-up, specimen inclination, and the like. In order to achieve the object, proposed is a scanning electron microscope including a function to monitor the apparatus conditions on the basis of information obtained with an electron beam reflected before reaching a specimen. Specifically, for example, while applying a negative voltage to the specimen to reflect the electron beam before the electron beam reaches the specimen, and simultaneously supplying a predetermined signal to a deflector for alignment, the scanning electron microscope monitors changes of the detected positions of the reflected electrons of the electron beam. If the above-mentioned predetermined signal is under the condition where an alignment is properly performed, the changes of the detected positions of the electrons reflect deviation of an axis.Type: ApplicationFiled: November 18, 2011Publication date: March 15, 2012Applicant: Hitachi High-Technologies CorporationInventors: Minoru YAMAZAKI, Akira IKEGAMI, Hideyuki KAZUMI, Manabu YANO, Kazunari ASAO, Takeshi MIZUNO, Yuki OJIMA
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Patent number: 8080790Abstract: An object of the present invention is to provide a scanning electron microscope suitable for monitoring apparatus conditions of the microscope itself, irrespective of the presence of charge-up, specimen inclination, and the like. In order to achieve the object, proposed is a scanning electron microscope including a function to monitor the apparatus conditions on the basis of information obtained with an electron beam reflected before reaching a specimen. Specifically, for example, while applying a negative voltage to the specimen to reflect the electron beam before the electron beam reaches the specimen, and simultaneously supplying a predetermined signal to a deflector for alignment, the scanning electron microscope monitors changes of the detected positions of the reflected electrons of the electron beam. If the above-mentioned predetermined signal is under the condition where an alignment is properly performed, the changes of the detected positions of the electrons reflect deviation of an axis.Type: GrantFiled: February 25, 2009Date of Patent: December 20, 2011Assignee: Hitachi High-Technologies CorporationInventors: Minoru Yamazaki, Akira Ikegami, Hideyuki Kazumi, Manabu Yano, Kazunari Asao, Takeshi Mizuno, Yuki Ojima
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Publication number: 20110260057Abstract: According to a charged particle beam apparatus of this invention, an inspection position on a test sample (wafer coordinate system) is converted to a setting position of an inspection mechanism (stage coordinate system (polar coordinate system)), a rotating arm (102,1012) and a rotating stage (103,1011) being rotated to be moved for the inspection position on the test sample. In this case, a plurality of inspection devices are arranged over a locus that is drawn by the center of the rotating stage according to the rotation of the rotating arm. A function for calculating errors (e.g., center shift of the rotating stage) and compensating for the errors is provided, by which the precision of inspection is improved in a charged particle beam apparatus equipped with a biaxial rotating stage mechanism. With this configuration, a charged particle beam apparatus which is small-sized and capable of easy stage control can be realized.Type: ApplicationFiled: October 22, 2009Publication date: October 27, 2011Inventors: Tadashi Otaka, Hiroyuki Ito, Ryoichi Ishii, Manabu Yano, Hajime Kawano
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Publication number: 20100245346Abstract: This invention improves the convenience of viewing three-dimensional image displays. A mobile communications handset can accomplish three-dimensional image displays using image data received by a communications unit and a broadcast reception unit through a display unit provided with a parallax barrier panel. A control unit automatically performs actions to record the image data as an auxiliary recording while the three-dimensional image display is being performed when the three-dimensional image display is performed using the received image data. That is to say, recording of image data relating to the three-dimensional image display is performed automatically in preparation for cases where the display cannot be viewed three-dimensionally due to viewing conditions.Type: ApplicationFiled: February 22, 2010Publication date: September 30, 2010Applicant: Casio Hitachi Mobile Communications Co., Ltd.Inventors: Mikihiro Tanaka, Manabu Yano, Kazuharu Tanaike
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Publication number: 20090224170Abstract: An object of the present invention is to provide a scanning electron microscope suitable for monitoring apparatus conditions of the microscope itself, irrespective of the presence of charge-up, specimen inclination, and the like. In order to achieve the object, proposed is a scanning electron microscope including a function to monitor the apparatus conditions on the basis of information obtained with an electron beam reflected before reaching a specimen. Specifically, for example, while applying a negative voltage to the specimen to reflect the electron beam before the electron beam reaches the specimen, and simultaneously supplying a predetermined signal to a deflector for alignment, the scanning electron microscope monitors changes of the detected positions of the reflected electrons of the electron beam. If the above-mentioned predetermined signal is under the condition where an alignment is properly performed, the changes of the detected positions of the electrons reflect deviation of an axis.Type: ApplicationFiled: February 25, 2009Publication date: September 10, 2009Inventors: Minoru YAMAZAKI, Akira Ikegami, Hideyuki Kazumi, Manabu Yano, Kazunari Asao, Takeshi Mizuno, Yuki Ojima