Abstract: Described examples include a semiconductor device having a first p-channel field effect transistor (p-FET). The first p-FET includes: a first gate dielectric layer on a surface of a substrate; a first gate structure on the first gate dielectric layer; and first silicon-germanium (SiGe) regions disposed in the substrate, on both sides of the first gate structure, the first SiGe regions extended to a first depth from the surface of the substrate. The semiconductor device also has a second p-FET. The second p-FET includes a second gate dielectric layer on the surface of the substrate; a second gate structure on the second gate dielectric layer; and second SiGe regions disposed in the substrate, on both sides of the second gate structure, the second SiGe regions extended to a second depth from the surface of the substrate, the second depth different than the first depth.

Abstract: In some implementations, a method includes forming first and second fins on a semiconductor substrate. The method further includes diffusing first and second implants into the semiconductor substrate and first and second fins. The method also includes patterning a field plate on the semiconductor substrate. An active device, such as a laterally-diffused metal-oxide semiconductor field effect (LDMOS) transistor can be formed in this way.

Abstract: The present disclosure generally relates to a semiconductor device having a reduced height gate electrode layer. In an example, a semiconductor device includes a substrate, a gate dielectric layer, a gate electrode layer, a doped source/drain region, and a dielectric layer. The gate dielectric layer is on a surface of the substrate. The gate electrode layer is on the gate dielectric layer. The doped source/drain region is in the substrate and has a metallurgical junction parallel to a plane coplanar with the surface of the substrate. The metallurgical junction extends to a first vertical distance from the surface of the substrate. The gate electrode layer has a top surface that is a second vertical distance away from the surface of the substrate. The second vertical distance is equal to or less than half of the first vertical distance. The dielectric layer is over the substrate and the gate electrode layer.

Abstract: A semiconductor device including a contact plug formed in a contact hole using a multi-stage contact etch process. The semiconductor device comprises a source/drain region over a semiconductor substrate, an oxide layer extension extending from the source/drain region toward a gate dielectric layer, and a contact plug extending through a dielectric layer over the source/drain region, the contact plug extending through a first etch stop layer and a second etch stop layer to a horizontal remaining portion of the oxide layer extension.

Abstract: Transistors with raised source/drain structures and methods of making the transistors are described. A method for making such transistors includes forming a first gate and a second gate on a substrate, forming a p-doped region adjacent the first gate, and forming an n-doped region adjacent the second gate. The method further includes forming a silicon germanium (SiGe) region in a portion of the p-doped region. Subsequently, the method simultaneously forms raised source-drain structures over the SiGe region and on the n-doped region.

Abstract: A method includes forming first and second trenches in a semiconductor substrate. The method further includes filling the first and second trenches with polysilicon. The polysilicon is oppositely doped from the semiconductor substrate. A Schottky contact is formed on the semiconductor substrate between the first and second trenches. The method also includes forming an anode for the Schottky contact. The anode is coupled to the polysilicon in the first and second trenches.

Abstract: A method includes forming first and second trenches in a semiconductor substrate. The method further includes filling the first and second trenches with polysilicon. The polysilicon is oppositely doped from the semiconductor substrate. A Schottky contact is formed on the semiconductor substrate between the first and second trenches. The method also includes forming an anode for the Schottky contact. The anode is coupled to the polysilicon in the first and second trenches.

Abstract: An integrated circuit formed on a silicon substrate includes an NMOS transistor with n-channel raised source and drain (NRSD) layers adjacent to a gate of the NMOS transistor, a PMOS transistor with SiGe stressors in the substrate adjacent to a gate of the PMOS transistor, and an NPN heterojunction bipolar transistor (NHBT) with a p-type SiGe base formed in the substrate and an n-type silicon emitter formed on the SiGe base. The SiGe stressors and the SiGe base are formed by silicon-germanium epitaxy. The NRSD layers and the silicon emitter are formed by silicon epitaxy.

Abstract: In a described example, an integrated circuit includes a substrate of a semiconductor material, a source region, a gate region, a drain region and a fin structure formed on the substrate. The fin structure includes the gate region, the source region and a drift region between the gate region and the drain region. A doped control layer is formed along at least one sidewall of the fin structure over the drift region.

Abstract: In some implementations, a method includes forming first and second fins on a semiconductor substrate. The method further includes diffusing first and second implants into the semiconductor substrate and first and second fins. The method also includes patterning a field plate on the semiconductor substrate. An active device, such as a laterally-diffused metal-oxide semiconductor field effect (LDMOS) transistor can be formed in this way.

Abstract: An integrated circuit containing an n-channel finFET and a p-channel finFET is formed by forming a first polarity fin epitaxial layer for a first polarity finFET, and subsequently forming a hard mask which exposes an area for a second, opposite, polarity fin epitaxial layer for a second polarity finFET. The second polarity fin epitaxial layer is formed in the area exposed by the hard mask. A fin mask defines the first polarity fin and second polarity fin areas, and a subsequent fin etch forms the respective fins. A layer of isolation dielectric material is formed over the substrate and fins. The layer of isolation dielectric material is planarized down to the fins. The layer of isolation dielectric material is recessed so that the fins extend at least 10 nanometers above the layer of isolation dielectric material. Gate dielectric layers and gates are formed over the fins.

Abstract: An integrated circuit containing an n-channel finFET and a p-channel finFET is formed by forming a first polarity fin epitaxial layer for a first polarity finFET, and subsequently forming a hard mask which exposes an area for a second, opposite, polarity fin epitaxial layer for a second polarity finFET. The second polarity fin epitaxial layer is formed in the area exposed by the hard mask. A fin mask defines the first polarity fin and second polarity fin areas, and a subsequent fin etch forms the respective fins. A layer of isolation dielectric material is formed over the substrate and fins. The layer of isolation dielectric material is planarized down to the fins. The layer of isolation dielectric material is recessed so that the fins extend at least 10 nanometers above the layer of isolation dielectric material. Gate dielectric layers and gates are formed over the fins.

Abstract: A method includes forming first and second trenches in a semiconductor substrate. The method further includes filling the first and second trenches with polysilicon. The polysilicon is oppositely doped from the semiconductor substrate. A Schottky contact is formed on the semiconductor substrate between the first and second trenches. The method also includes forming an anode for the Schottky contact. The anode is coupled to the polysilicon in the first and second trenches.

Abstract: An integrated circuit containing an n-channel finFET and a p-channel finFET is formed by forming a first polarity fin epitaxial layer for a first polarity finFET, and subsequently forming a hard mask which exposes an area for a second, opposite, polarity fin epitaxial layer for a second polarity finFET. The second polarity fin epitaxial layer is formed in the area exposed by the hard mask. A fin mask defines the first polarity fin and second polarity fin areas, and a subsequent fin etch forms the respective fins. A layer of isolation dielectric material is formed over the substrate and fins. The layer of isolation dielectric material is planarized down to the fins. The layer of isolation dielectric material is recessed so that the fins extend at least 10 nanometers above the layer of isolation dielectric material. Gate dielectric layers and gates are formed over the fins.

Abstract: An integrated circuit containing an n-channel finFET and a p-channel finFET is formed by forming a first polarity fin epitaxial layer for a first polarity finFET, and subsequently forming a hard mask which exposes an area for a second, opposite, polarity fin epitaxial layer for a second polarity finFET. The second polarity fin epitaxial layer is formed in the area exposed by the hard mask. A fin mask defines the first polarity fin and second polarity fin areas, and a subsequent fin etch forms the respective fins. A layer of isolation dielectric material is formed over the substrate and fins. The layer of isolation dielectric material is planarized down to the fins. The layer of isolation dielectric material is recessed so that the fins extend at least 10 nanometers above the layer of isolation dielectric material. Gate dielectric layers and gates are formed over the fins.

Abstract: Apparatuses and methods to adjust voltage for thermal mitigation are provided. The apparatus includes a circuit, a plurality of switches configured to provide power of a power domain to the circuit, a plurality of thermal sensors disposed at different locations about the circuit and configured to detect temperatures at the different locations, and a control circuit configured to determine that one of the detected temperatures at one of the locations exceeds a temperature threshold, and in response, adjust one or more of the plurality of switches in proximity with the one location to reduce power provided to the circuit. The method includes providing power of a power domain through a plurality of switches, detecting a temperature at a location exceeding a temperature threshold, and adjusting the plurality of switches in proximity with the location to reduce the power provided, in response to the detecting the temperature exceeding the temperature threshold.

Abstract: Apparatuses and methods to adjust a source voltage based on stored information are provided. The apparatus includes a circuit configured to receive power from a power source through a power distribution network, a storage medium storing data specifying one or more electrical characteristics of the circuit, and a control circuit configured to adjust a source voltage at the power source based on the data stored in the storage medium. The method includes receiving power by a circuit from a power source through a power distribution network, reading data specifying one or more electrical characteristics of the circuit from a storage medium, and adjusting a source voltage at the power source based on the data stored in the storage medium.

Abstract: A process of forming an integrated circuit containing a first transistor and a second transistor of the same polarity, by forming an epitaxial spacer layer over gates of both transistors, performing an epitaxial spacer anisotropic etch process to form epitaxial spacers on vertical surfaces adjacent to the first transistor gate and removing the epitaxial spacer layer from the second transistor gate, subsequently performing a source/drain etch process and a source/drain epitaxial process to form source/drain epitaxial regions in the substrate adjacent to the first and second gates, such that the first source/drain epitaxial regions are separated from the first gate by a lateral space which is at least 2 nanometers larger than a second lateral space separating the second source/drain epitaxial regions from the second gate. An integrated circuit formed by the recited process.

Abstract: An integrated circuit and method with a metal gate NMOS transistor with a high-k first gate dielectric on a high quality thermally grown interface dielectric and with a metal gate PMOS transistor with a high-k last gate dielectric on a chemically grown interface dielectric.

Abstract: The present disclosure is directed to mitigating voltage droops. An aspect includes outputting, by a clock module coupled to a multiplexor, a first clock signal to the multiplexor, the first clock signal generated by a clock delay component of the clock module, receiving, by the clock module, a second clock signal from a phase-locked loop (PLL), wherein the PLL outputs a third clock signal to a processor coupled to the PLL and the multiplexor, selecting, by the multiplexor, the first clock signal to output to the processor based on detecting a droop in voltage on a power supply, and selecting, by the multiplexor, the third clock signal to output to the processor based on detecting that the droop in the voltage on the power supply has passed, wherein the clock module and the processor are coupled to the power supply.