Abstract: A method includes forming first and second trenches in a semiconductor substrate. The method further includes filling the first and second trenches with polysilicon. The polysilicon is oppositely doped from the semiconductor substrate. A Schottky contact is formed on the semiconductor substrate between the first and second trenches. The method also includes forming an anode for the Schottky contact. The anode is coupled to the polysilicon in the first and second trenches.

Abstract: A method includes forming first and second trenches in a semiconductor substrate. The method further includes filling the first and second trenches with polysilicon. The polysilicon is oppositely doped from the semiconductor substrate. A Schottky contact is formed on the semiconductor substrate between the first and second trenches. The method also includes forming an anode for the Schottky contact. The anode is coupled to the polysilicon in the first and second trenches.

Abstract: An integrated circuit formed on a silicon substrate includes an NMOS transistor with n-channel raised source and drain (NRSD) layers adjacent to a gate of the NMOS transistor, a PMOS transistor with SiGe stressors in the substrate adjacent to a gate of the PMOS transistor, and an NPN heterojunction bipolar transistor (NHBT) with a p-type SiGe base formed in the substrate and an n-type silicon emitter formed on the SiGe base. The SiGe stressors and the SiGe base are formed by silicon-germanium epitaxy. The NRSD layers and the silicon emitter are formed by silicon epitaxy.

Abstract: In a described example, an integrated circuit includes a substrate of a semiconductor material, a source region, a gate region, a drain region and a fin structure formed on the substrate. The fin structure includes the gate region, the source region and a drift region between the gate region and the drain region. A doped control layer is formed along at least one sidewall of the fin structure over the drift region.

Abstract: In some implementations, a method includes forming first and second fins on a semiconductor substrate. The method further includes diffusing first and second implants into the semiconductor substrate and first and second fins. The method also includes patterning a field plate on the semiconductor substrate. An active device, such as a laterally-diffused metal-oxide semiconductor field effect (LDMOS) transistor can be formed in this way.

Abstract: An integrated circuit containing an n-channel finFET and a p-channel finFET is formed by forming a first polarity fin epitaxial layer for a first polarity finFET, and subsequently forming a hard mask which exposes an area for a second, opposite, polarity fin epitaxial layer for a second polarity finFET. The second polarity fin epitaxial layer is formed in the area exposed by the hard mask. A fin mask defines the first polarity fin and second polarity fin areas, and a subsequent fin etch forms the respective fins. A layer of isolation dielectric material is formed over the substrate and fins. The layer of isolation dielectric material is planarized down to the fins. The layer of isolation dielectric material is recessed so that the fins extend at least 10 nanometers above the layer of isolation dielectric material. Gate dielectric layers and gates are formed over the fins.

Abstract: An integrated circuit containing an n-channel finFET and a p-channel finFET is formed by forming a first polarity fin epitaxial layer for a first polarity finFET, and subsequently forming a hard mask which exposes an area for a second, opposite, polarity fin epitaxial layer for a second polarity finFET. The second polarity fin epitaxial layer is formed in the area exposed by the hard mask. A fin mask defines the first polarity fin and second polarity fin areas, and a subsequent fin etch forms the respective fins. A layer of isolation dielectric material is formed over the substrate and fins. The layer of isolation dielectric material is planarized down to the fins. The layer of isolation dielectric material is recessed so that the fins extend at least 10 nanometers above the layer of isolation dielectric material. Gate dielectric layers and gates are formed over the fins.

Abstract: A method includes forming first and second trenches in a semiconductor substrate. The method further includes filling the first and second trenches with polysilicon. The polysilicon is oppositely doped from the semiconductor substrate. A Schottky contact is formed on the semiconductor substrate between the first and second trenches. The method also includes forming an anode for the Schottky contact. The anode is coupled to the polysilicon in the first and second trenches.

Abstract: An integrated circuit containing an n-channel finFET and a p-channel finFET is formed by forming a first polarity fin epitaxial layer for a first polarity finFET, and subsequently forming a hard mask which exposes an area for a second, opposite, polarity fin epitaxial layer for a second polarity finFET. The second polarity fin epitaxial layer is formed in the area exposed by the hard mask. A fin mask defines the first polarity fin and second polarity fin areas, and a subsequent fin etch forms the respective fins. A layer of isolation dielectric material is formed over the substrate and fins. The layer of isolation dielectric material is planarized down to the fins. The layer of isolation dielectric material is recessed so that the fins extend at least 10 nanometers above the layer of isolation dielectric material. Gate dielectric layers and gates are formed over the fins.

Abstract: An integrated circuit containing an n-channel finFET and a p-channel finFET is formed by forming a first polarity fin epitaxial layer for a first polarity finFET, and subsequently forming a hard mask which exposes an area for a second, opposite, polarity fin epitaxial layer for a second polarity finFET. The second polarity fin epitaxial layer is formed in the area exposed by the hard mask. A fin mask defines the first polarity fin and second polarity fin areas, and a subsequent fin etch forms the respective fins. A layer of isolation dielectric material is formed over the substrate and fins. The layer of isolation dielectric material is planarized down to the fins. The layer of isolation dielectric material is recessed so that the fins extend at least 10 nanometers above the layer of isolation dielectric material. Gate dielectric layers and gates are formed over the fins.

Abstract: Apparatuses and methods to adjust voltage for thermal mitigation are provided. The apparatus includes a circuit, a plurality of switches configured to provide power of a power domain to the circuit, a plurality of thermal sensors disposed at different locations about the circuit and configured to detect temperatures at the different locations, and a control circuit configured to determine that one of the detected temperatures at one of the locations exceeds a temperature threshold, and in response, adjust one or more of the plurality of switches in proximity with the one location to reduce power provided to the circuit. The method includes providing power of a power domain through a plurality of switches, detecting a temperature at a location exceeding a temperature threshold, and adjusting the plurality of switches in proximity with the location to reduce the power provided, in response to the detecting the temperature exceeding the temperature threshold.

Abstract: Apparatuses and methods to adjust a source voltage based on stored information are provided. The apparatus includes a circuit configured to receive power from a power source through a power distribution network, a storage medium storing data specifying one or more electrical characteristics of the circuit, and a control circuit configured to adjust a source voltage at the power source based on the data stored in the storage medium. The method includes receiving power by a circuit from a power source through a power distribution network, reading data specifying one or more electrical characteristics of the circuit from a storage medium, and adjusting a source voltage at the power source based on the data stored in the storage medium.

Abstract: A process of forming an integrated circuit containing a first transistor and a second transistor of the same polarity, by forming an epitaxial spacer layer over gates of both transistors, performing an epitaxial spacer anisotropic etch process to form epitaxial spacers on vertical surfaces adjacent to the first transistor gate and removing the epitaxial spacer layer from the second transistor gate, subsequently performing a source/drain etch process and a source/drain epitaxial process to form source/drain epitaxial regions in the substrate adjacent to the first and second gates, such that the first source/drain epitaxial regions are separated from the first gate by a lateral space which is at least 2 nanometers larger than a second lateral space separating the second source/drain epitaxial regions from the second gate. An integrated circuit formed by the recited process.

Abstract: An integrated circuit and method with a metal gate NMOS transistor with a high-k first gate dielectric on a high quality thermally grown interface dielectric and with a metal gate PMOS transistor with a high-k last gate dielectric on a chemically grown interface dielectric.

Abstract: The present disclosure is directed to mitigating voltage droops. An aspect includes outputting, by a clock module coupled to a multiplexor, a first clock signal to the multiplexor, the first clock signal generated by a clock delay component of the clock module, receiving, by the clock module, a second clock signal from a phase-locked loop (PLL), wherein the PLL outputs a third clock signal to a processor coupled to the PLL and the multiplexor, selecting, by the multiplexor, the first clock signal to output to the processor based on detecting a droop in voltage on a power supply, and selecting, by the multiplexor, the third clock signal to output to the processor based on detecting that the droop in the voltage on the power supply has passed, wherein the clock module and the processor are coupled to the power supply.

Abstract: An integrated circuit containing an n-channel finFET and a p-channel finFET has a dielectric layer over a silicon substrate. The fins of the finFETs have semiconductor materials with higher mobilities than silicon. A fin of the n-channel finFET is on a first silicon-germanium buffer in a first trench through the dielectric layer on the substrate. A fin of the p-channel finFET is on a second silicon-germanium buffer in a second trench through the dielectric layer on the substrate. The fins extend at least 10 nanometers above the dielectric layer. The fins are formed by epitaxial growth on the silicon-germanium buffers in the trenches in the dielectric layer, followed by CMP planarization down to the dielectric layer. The dielectric layer is recessed to expose the fins. The fins may be formed concurrently or separately.

Abstract: Implementations for probabilistic thermal hotspot accommodation are disclosed herein. In an example aspect, a cell library includes cells having respective leakage current characteristics that include a leakage current variability as well as a leakage current average. In another example aspect, a method obtains cell attribute collections for respective types of multiple cells, with each of the cell attribute collections including a leakage current average and a leakage current variability corresponding to a circuit device of a respective type of cell. The method also obtains an integrated circuit design that describes how multiple circuit devices are interconnected. The method then performs a thermal analysis of the integrated circuit design using the cell attribute collections for the respective types of multiple cells including at least the leakage current variability and the leakage current average.

Abstract: The present disclosure is directed to mitigating voltage droops. An aspect includes outputting, by a clock module coupled to a multiplexor, a first clock signal to the multiplexor, the first clock signal generated by a clock delay component of the clock module, receiving, by the clock module, a second clock signal from a phase-locked loop (PLL), wherein the PLL outputs a third clock signal to a processor coupled to the PLL and the multiplexor, selecting, by the multiplexor, the first clock signal to output to the processor based on detecting a droop in voltage on a power supply, and selecting, by the multiplexor, the third clock signal to output to the processor based on detecting that the droop in the voltage on the power supply has passed, wherein the clock module and the processor are coupled to the power supply.

Abstract: Apparatuses and methods to adjust voltage for thermal mitigation are provided. The apparatus includes a circuit, a plurality of switches configured to provide power of a power domain to the circuit, a plurality of thermal sensors disposed at different locations about the circuit and configured to detect temperatures at the different locations, and a control circuit configured to determine that one of the detected temperatures at one of the locations exceeds a temperature threshold, and in response, adjust one or more of the plurality of switches in proximity with the one location to reduce power provided to the circuit. The method includes providing power of a power domain through a plurality of switches, detecting a temperature at a location exceeding a temperature threshold, and adjusting the plurality of switches in proximity with the location to reduce the power provided, in response to the detecting the temperature exceeding the temperature threshold.

Abstract: Apparatuses and methods to adjust a source voltage based on stored information are provided. The apparatus includes a circuit configured to receive power from a power source through a power distribution network, a storage medium storing data specifying one or more electrical characteristics of the circuit, and a control circuit configured to adjust a source voltage at the power source based on the data stored in the storage medium. The method includes receiving power by a circuit from a power source through a power distribution network, reading data specifying one or more electrical characteristics of the circuit from a storage medium, and adjusting a source voltage at the power source based on the data stored in the storage medium.